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    • 13. 发明申请
    • Transistor Based on Resonant Tunneling Effect of Double Barrier Tunneling Junctions
    • 基于双阻挡隧道结共振隧穿效应的晶体管
    • US20080246023A1
    • 2008-10-09
    • US11663684
    • 2005-04-08
    • Zhongming ZengXiufeng HanJiafeng FengTianxing WangGuanxiang DuFeifei LiWenshan Zhan
    • Zhongming ZengXiufeng HanJiafeng FengTianxing WangGuanxiang DuFeifei LiWenshan Zhan
    • H01L29/06H01L27/082
    • H01L29/66984B82Y10/00H01L29/7376
    • The present invention relates to a transistor based on resonant tunneling effect of double barrier tunneling junctions comprising: a substrate, an emitter, a base, a collector and a first and a second tunneling barrier layers; wherein the first tunneling barrier layer is located between the emitter and the base, and the second tunneling barrier layer is located between the base and the collector; furthermore, the junction areas of the tunneling junctions which are formed between the emitter and the base and between the base and collector respectively are 1 μm2˜10000 μm2; the thickness of the base is comparable to the electron mean free path of material in the layer; the magnetization orientation is unbounded in one and only one pole of said emitter, base and collector. Because the double-barrier structure is used, it overcomes the Schottky potential between the base and the collector. Wherein the base current is a modulating signal, the collector signal is modulated to be similar to the base current's modulating mode by changing the magnetization orientation of the base or the collector, i.e., the resonant tunneling effect occurs. An amplified signal can be obtained under the suitable conditions.
    • 本发明涉及一种基于双阻挡隧道结的谐振隧道效应的晶体管,包括:衬底,发射极,基极,集电极和第一和第二隧道势垒层; 其中所述第一隧道势垒层位于所述发射极和所述基极之间,并且所述第二隧穿势垒层位于所述基极和所述集电极之间; 此外,形成在发射极和基极之间以及基极和集电极之间的隧道结的接合面分别为1μm2〜10000μm2。 基底的厚度与层中材料的电子平均自由程相当; 磁化方向在所述发射极,基极和集电极的一个且仅一个极中是无界的。 因为使用双重阻挡结构,它克服了基极和集电极之间的肖特基电位。 其中基极电流是调制信号,通过改变基极或集电极的磁化取向,即发生谐振隧穿效应,将集电极信号调制成与基极电流的调制模式相似。 在合适的条件下可以获得放大的信号。