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    • 12. 发明授权
    • Coaxial clock tree for programmable logic devices
    • 可编程逻辑器件的同轴时钟树
    • US06998876B1
    • 2006-02-14
    • US10820336
    • 2004-04-08
    • Robert O. Conn
    • Robert O. Conn
    • H03K19/00
    • H03K5/15013G06F1/10H03K19/1774H03K19/1778
    • A balanced clock tree has a coaxial structure when a piece of the tree is viewed in cross-section. A plate is capacitively coupled to the inner conductor that runs down the center of the coaxial structure. This plate is usable to AC couple into the clock signal being propagated down the clock line. A programmable structure is disclosed for doing this whereby the clock signal is capacitively coupled from the clock line onto the input lead of a latch. The latch recreates the clock signal. The latch drives the recreated clock signal onto a local clock conductor. The structure is programmable in that it either couples the clock signal onto the local conductor or not depending on the state of a configuration bit in a memory cell of the programmable structure. In one embodiment, the clock tree can be tapped without substantially affecting signal propagation characteristics of the clock tree.
    • 当横截面看到一块树时,平衡时钟树具有同轴结构。 平板电容耦合到沿着同轴结构的中心延伸的内部导体。 该板可用于交流耦合到沿时钟线传播的时钟信号。 公开了可编程结构,从而使时钟信号从时钟线电容耦合到锁存器的输入引线上。 锁存器重新创建时钟信号。 锁存器将重建的时钟信号驱动到本地时钟导体上。 该结构是可编程的,其可以根据可编程结构的存储单元中的配置位的状态将时钟信号耦合到本地导体上。 在一个实施例中,时钟树可以被抽头而基本上不影响时钟树的信号传播特性。
    • 13. 发明授权
    • Semiconductor wafer with well contacts on back side
    • 背面具有良好触点的半导体晶圆
    • US06864156B1
    • 2005-03-08
    • US10407514
    • 2003-04-04
    • Robert O. Conn
    • Robert O. Conn
    • H01L21/20H01L21/30H01L21/306H01L21/8238H01L27/092H01L27/12
    • H01L21/2007H01L21/823871H01L21/823892H01L27/0928H01L27/12
    • A supporting structure is wafer-bonded to the upper face side of a partially or fully processed device wafer. The device wafer includes a transistor having a well region that extends into the substrate material of the device wafer. The source and drain regions of the transistor extend into the well region. After attachment of the supporting structure, the device wafer is thinned from the back side until the bottom of the well region is reached. To reduce source and drain junction capacitances, etching can continue until the source and drain regions are reached. In one embodiment, all of the well-to-substrate junction is removed in a subsequent etching step, thereby reducing or eliminating the well-to-substrate junction capacitance of the resulting transistor. Resistance between the well electrode and the transistor channel is reduced because the well contact is disposed on the back side of the device wafer directly under the gate of the transistor.
    • 将支撑结构晶片结合到部分或完全处理的器件晶片的上表面侧。 器件晶片包括具有延伸到器件晶片的衬底材料中的阱区的晶体管。 晶体管的源区和漏极区延伸到阱区。 在安装支撑结构之后,装置晶片从后侧变薄直到达到井区的底部。 为了减少源极和漏极结电容,可以继续蚀​​刻直到达到源极和漏极区域。 在一个实施例中,在随后的蚀刻步骤中除去所有的阱到衬底结,从而减少或消除所得晶体管的阱到衬底结电容。 阱电极和晶体管沟道之间的电阻降低,因为阱触点直接设置在晶体管的栅极正下方的器件晶片的背面。
    • 16. 发明授权
    • Increased propagation speed across integrated circuits
    • 跨集成电路增加传播速度
    • US06204815B1
    • 2001-03-20
    • US09302587
    • 1999-04-30
    • Austin H. LeseaRobert O. Conn
    • Austin H. LeseaRobert O. Conn
    • H01Q138
    • H01Q21/0037H01Q1/38
    • The maximum propagation speed of an electrical signal travelling on a conductor in an integrated circuit is limited by the dielectric constant of the dielectric material surrounding the conductor. Rather than transmitting an electrical signal through a conductor that is surrounded with a dielectric material having a dielectric constant of two or more, the signal is propagated as an electromagnetic wave through air at a much higher speed across the surface of the integrated circuit. In one embodiment, a radio frequency (RF) signal is passed into an integrated circuit package via a transmission line. The transmission line supplies the RF signal to a waveguide-like structure disposed above the integrated circuit inside the package. The RF signal propagates as an electromagnetic wave through air in the waveguide structure across the upper surface of the integrated circuit. Antenna/receiver circuit pairs are disposed at various locations across the surface of the integrated circuit where the signal is to be received and used. Other methods and embodiments are disclosed.
    • 在集成电路中的导体上行进的电信号的最大传播速度受到围绕导体的电介质材料的介电常数的限制。 不是通过介电常数为两个或两个以上的介电材料包围的导体传输电信号,而是以跨越整个集成电路表面的高速通过空气传播信号作为电磁波。 在一个实施例中,射频(RF)信号经由传输线路传递到集成电路封装中。 传输线将RF信号提供给设置在封装内的集成电路上方的波导状结构。 RF信号通过波导结构中的空气通过集成电路的上表面传播作为电磁波。 天线/接收器电路对设置在集成电路的要被接收和使用信号的表面的各个位置处。 公开了其它方法和实施例。
    • 20. 发明申请
    • Integral metal structure with conductive post portions
    • 具有导电柱部分的整体金属结构
    • US20100187665A1
    • 2010-07-29
    • US12321833
    • 2009-01-26
    • Robert O. Conn
    • Robert O. Conn
    • H01L23/48H01L21/302H01L21/31
    • H01L23/50H01L2924/0002H01L2924/00
    • A plurality of FPGA dice is disposed upon a semiconductor substrate. In order to supply the immense power required by the plurality of FPGA dice, power is routed through the semiconductor substrate vertically from thick metal layers and large integral metal structures located on the other side of the semiconductor substrate. Because the semiconductor substrate has a different coefficient of thermal linear expansion than metal layers in contact with the substrate, delamination may occur when the structure is subject to changes in temperature. To prevent delamination of metal layers connected to the semiconductor substrate and in electrical contact with the integral metal structures, the integral metal structures are manufactured with an array of post portions. During changes in temperature, the post portions of the integral metal structures bend and slide relative to metal layers connected to the semiconductor substrate and prevent linear stresses that may otherwise cause delamination.
    • 多个FPGA管芯设置在半导体衬底上。 为了提供多个FPGA芯片所需的巨大功率,功率从位于半导体衬底另一侧的厚金属层和大的整体金属结构垂直地穿过半导体衬底。 由于半导体衬底与与衬底接触的金属层具有不同的热线性膨胀系数,所以当结构经受温度变化时,可能发生分层。 为了防止与半导体衬底连接并与整体金属结构电接触的金属层的分层,整体金属结构被制成具有一定数量的柱部分。 在温度变化期间,整体金属结构的后部相对于连接到半导体衬底的金属层弯曲和滑动,并且防止否则会引起分层的线性应力。