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11. 发明授权

US6060739A Non-volatile semiconductor memory device having a floating gate inside a grove 失效
标题翻译：在园林内具有浮动栅极的非易失性半导体存储器件
公开(公告)号：US6060739A
公开(公告)日：2000-05-09
申请号：US935538
申请日：1997-09-23
申请人： Kenji Saitoh
发明人： Kenji Saitoh
IPC分类号： H01L21/8247 , H01L27/115 , H01L29/423 , H01L29/788 , H01L29/792 , H01L29/76
CPC分类号： H01L27/11521 , H01L29/42324 , H01L27/115
摘要： A semiconductor well region has a groove into which a block-shaped floating gate is formed. The block-shaped floating gate has a bottom surface facing a bottom surface of the semiconductor well region served as a first channel region, a first side surface facing one of side surfaces of the semiconductor well region served as a second channel region, a second side surface facing the other of side surfaces of the semiconductor well region served as a third channel region, thereby a channel width is trebled.
摘要翻译：半导体阱区域具有形成有块状的浮动栅极的沟槽。块状浮动栅极具有面对作为第一沟道区域的半导体阱区域的底面的底面，面对作为第二沟道区域的半导体阱区域的一个侧面的第一侧面，第二侧面面对作为第三沟道区域的半导体阱区域的另一侧面的面，因此沟道宽度为三倍。

12. 发明授权

US5682239A Apparatus for detecting positional deviation of diffraction gratings on a substrate by utilizing optical heterodyne interference of light beams incident on the gratings from first and second light emitters 失效
$Apparatus for detecting positional deviation of diffraction gratings on a substrate by utilizing optical heterodyne interference of light beams incident on the gratings from first and second light emitters$
标题翻译：用于通过利用入射在来自第一和第二发光体的光栅的光束的光学外差干涉来检测基板上的衍射光栅的位置偏差的装置
公开(公告)号：US5682239A
公开(公告)日：1997-10-28
申请号：US528817
申请日：1995-09-15
申请人： Takahiro Matsumoto , Kenji Saitoh , Koichi Sentoku
发明人： Takahiro Matsumoto , Kenji Saitoh , Koichi Sentoku
IPC分类号： G01B9/02 , G01B11/00 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70633 , G03F9/70
摘要： Apparatus for detecting a positional deviation of two diffraction gratings of each of first and second pairs of diffraction gratings formed on a substrate, by utilizing an optical heterodyne interference method. The apparatus includes a first light emitter for emitting a pair of coherent light beams having different frequencies close to a first frequency, a second light emitter for emitting a pair of coherent light beams having different frequencies close to a second frequency, different from the first frequency, a four-way radiating unit radiating the two pairs of light beams in four directions and for causing a selected pair of the light beams to be incident on a corresponding one of the first and second pairs of the diffraction gratings such that corresponding beam spots overlap with each other, a splitter for splitting diffracted light beams from the diffraction gratings according to frequencies of the diffracted light beams, to separate a first diffracted light beam, which is diffracted from the first pair of diffraction gratings in a diffraction direction, and a second diffracted light beam, which is diffracted from the second pair of diffraction gratings in the same diffraction direction, a beat signal detector for detecting beat signals respectively corresponding to the split light beams, and a deviation detecting unit for receiving the detected beat signals and for detecting a positional deviation in a predetermined direction of two diffraction gratings of each of the first and second pairs, from the beat signals respectively corresponding to the two diffraction gratings of a corresponding one of the first and second pairs.
摘要翻译：用于通过利用光学外差干扰法检测形成在基板上的第一和第二对衍射光栅中的每一个的两个衍射光栅的位置偏差的装置。该装置包括用于发射具有接近于第一频率的不同频率的一对相干光束的第一光发射器，用于发射具有接近第二频率的不同频率的一对相干光束的第二光发射器，其不同于第一频率，四路辐射单元，其在四个方向上辐射两对光束，并且使所选择的一对光束入射在第一和第二对衍射光栅中的相应一个上，使得相应的光束点重叠彼此分离，用于根据衍射光束的频率从衍射光栅分离衍射光束，以在衍射方向上分离从第一对衍射光栅衍射的第一衍射光束，以及第二衍射光束衍射光束在相同的衍射光谱中衍射自第二对衍射光栅 n是用于检测分别对应于分割光束的拍频信号的拍频信号检测器，以及用于接收所检测到的拍频信号并检测第一和第二声道中的每一个的两个衍射光栅的预定方向的位置偏差的偏差检测单元从分别对应于第一和第二对应的一个的两个衍射光栅的拍子信号对。

13. 发明授权

US5502669A Electrically erasable and programmable read only memory device having selectively erasable sectors 失效
标题翻译：具有选择性可擦除扇区的电可擦除和可编程只读存储器件
公开(公告)号：US5502669A
公开(公告)日：1996-03-26
申请号：US353235
申请日：1994-12-02
申请人： Kenji Saitoh
发明人： Kenji Saitoh
IPC分类号： H01L21/8247 , G11C16/16 , H01L27/115 , H01L29/788 , H01L29/792 , G11C11/34 , H01L29/00
CPC分类号： G11C16/16 , H01L27/115
摘要： An electrically erasable and programmable memory device has a twin well electrically separated by an insulating wall into a plurality of sections respectively assigned to a plurality of memory sectors. The plurality of sections are selectively biased for erasing data bits stored in floating type field effect transistors that form the plurality of memory sectors.
摘要翻译：电可擦除和可编程的存储器件具有由绝缘壁电分离成分别分配给多个存储器扇区的多个部分的双阱。选择性地偏置多个部分以擦除存储在形成多个存储器扇区的浮动型场效应晶体管中的数据位。

14. 发明授权

US5481363A Positional deviation detecting method 失效
标题翻译：位置偏差检测方法
公开(公告)号：US5481363A
公开(公告)日：1996-01-02
申请号：US242066
申请日：1994-05-13
申请人： Masakazu Matsugu , Kenji Saitoh , Jun Hattori , Sakae Houryu
发明人： Masakazu Matsugu , Kenji Saitoh , Jun Hattori , Sakae Houryu
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/7076
摘要： A method of detecting a relative positional deviation of a first object having a first grating mark with an optical power and a second object having a second grating mark with an optical power, is disclosed, wherein a projected radiation beam is diffracted by the first and second grating marks in sequence and, on the basis of a position of convergence on a light receiving surface of plural diffraction beams produced by the diffraction through the first and second grating marks and including a signal beam having been diffracted at a predetermined order by each of the first and second grating marks, the relative positional deviation is determined, a detection zone is defined on the light receiving surface, the signal beam is converged upon the detection zone, and a predetermined diffraction beam of the plural diffraction beams which, for a relative positional deviation of the first and second objects, shows displacement different from that of the signal beam is substantially prevented from being converged upon the detection zone.
摘要翻译：公开了一种检测具有光功率的第一光栅标记的第一物体和具有光功率的第二光栅标记的第二物体的相对位置偏差的方法，其中投射的辐射束被第一和第二衍射基于通过第一和第二光栅标记的衍射产生的多个衍射光束的光接收表面上的会聚位置，并且包括以预定顺序衍射的信号光束第一和第二光栅标记，确定相对位置偏差，在光接收表面上限定检测区域，信号光束会聚在检测区域上，并且将多个衍射光束的预定衍射光束相对于相对位置显示第一和第二物体的偏差显示出与信号光束不同的位移 om会聚在检测区域。

15. 发明授权

US07605860B2 Image pickup optical system 有权
标题翻译：摄像光学系统
公开(公告)号：US07605860B2
公开(公告)日：2009-10-20
申请号：US11738773
申请日：2007-04-23
申请人： Kenji Saitoh , Hiroshi Yoshikawa , Kenichi Saito
发明人： Kenji Saitoh , Hiroshi Yoshikawa , Kenichi Saito
IPC分类号： H04N5/232
CPC分类号： G03B5/06 , G02B27/0025
摘要： Provided is an image pickup optical system capable of performing focusing in a wide region without a large increase in tilt angle in the case where an image of an object is picked up from a low angle. The image pickup optical system includes a first optical system and a second optical system, for enlarging an image formed by the first optical system and forming the enlarged image. A principal plane of the first optical system is tilted relative to an image plane of the second optical system.
摘要翻译：提供一种摄像光学系统，其能够在从低角度拾取物体的图像的情况下在宽的区域中进行聚焦，而不会大幅度地增加倾斜角度。摄像光学系统包括第一光学系统和第二光学系统，用于放大由第一光学系统形成的图像并形成放大图像。第一光学系统的主平面相对于第二光学系统的像平面倾斜。

16. 发明申请

US20070292100A1 ILLUMINATING APPARATUS AND SURFACE INSPECTION SYSTEM USING ILLUMINATING APPARATUS 有权
标题翻译：使用照明设备的照明设备和表面检查系统
公开(公告)号：US20070292100A1
公开(公告)日：2007-12-20
申请号：US11764555
申请日：2007-06-18
申请人： Hiroshi Yoshikawa , Kenji Saitoh
发明人： Hiroshi Yoshikawa , Kenji Saitoh
IPC分类号： G02B6/10
CPC分类号： G02B17/086 , G01N21/47
摘要： At least one exemplary embodiment is directed to an illuminating apparatus, configured to uniformly illuminate a surface of an object, and includes a light-guiding member configured to guide light emitted from a source to a surface to be illuminated, and a reflecting member disposed between the light-guiding member and the surface to be illuminated. The reflecting member includes a pair of reflection surfaces disposed so as to face each other in a long side direction of the surface to be illuminated, and reflects light emitted from the light-guiding member in directions having directional components parallel to a short side direction of the surface to be illuminated toward the surface to be illuminated.
摘要翻译：至少一个示例性实施例涉及一种被配置为均匀地照射物体的表面的照明装置，并且包括导光构件，其被配置为将从源发射的光引导到待照亮的表面，以及反射构件，导光构件和被照射的表面。反射构件包括一对反射面，其被布置为在被照射表面的长边方向上彼此面对，并且将从导光构件发射的光沿具有平行于短边方向的方向分量的方向反射要照亮的表面被照亮的表面。

17. 发明授权

US07217503B2 Exposure method and apparatus 有权
标题翻译：曝光方法和装置
公开(公告)号：US07217503B2
公开(公告)日：2007-05-15
申请号：US10132001
申请日：2002-04-24
申请人： Kenji Saitoh , Akiyoshi Suzuki , Kenji Yamazoe
发明人： Kenji Saitoh , Akiyoshi Suzuki , Kenji Yamazoe
IPC分类号： G03F7/20
CPC分类号： G03F1/30 , G03F1/36 , G03F7/70125 , G03F7/70466
摘要： An exposure method comprising the steps of forming onto a mask that arranges a pattern of a contact hole and a plurality of patterns each being smaller than the contact hole pattern, and illuminating the mask using plural kinds of light so as to resolve the desired pattern without the smaller patterns on a target via a projection optical system.
摘要翻译：一种曝光方法，包括以下步骤：形成掩模，所述掩模布置接触孔和多个图案的图案，每个图案都小于接触孔图案，并且使用多种光照射所述掩模，以便解析所需图案而无需通过投影光学系统在目标上的较小图案。

18. 发明授权

US07214453B2 Mask and its manufacturing method, exposure, and device fabrication method 有权
标题翻译：面罩及其制造方法，曝光和装置制造方法
公开(公告)号：US07214453B2
公开(公告)日：2007-05-08
申请号：US10783218
申请日：2004-02-20
申请人： Kenji Yamazoe , Kenji Saitoh , Akiyoshi Suzuki
发明人： Kenji Yamazoe , Kenji Saitoh , Akiyoshi Suzuki
IPC分类号： G03F1/00
CPC分类号： G03F7/70433 , G03F1/36
摘要： A mask arranges a predetermined pattern and an auxiliary pattern smaller than the predetermined pattern so that where a virtual lattice is assumed which has a lattice point located at a center of the predetermined pattern, a center of the auxiliary pattern is offset from the lattice point of the virtual lattice.
摘要翻译：掩模布置预定图案和小于预定图案的辅助图案，使得假定具有位于预定图案的中心的格子点的虚拟网格，辅助图案的中心偏离虚拟网格。

19. 发明授权

US06991877B2 Exposure method and apparatus 失效
公开(公告)号：US06991877B2
公开(公告)日：2006-01-31
申请号：US10128707
申请日：2002-04-23
申请人： Kenji Saitoh , Miyoko Kawashima
发明人： Kenji Saitoh , Miyoko Kawashima
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F1/30 , G03F7/70091 , G03F7/701 , G03F7/70283 , G03F7/70433
摘要： There is provided an exposure method that includes the steps of forming a phase shift mask having a desired pattern and a cyclic dummy pattern overlaid onto the desired pattern, a part of the desired pattern to be resolved by effects of the dummy pattern being thicker than the dummy pattern's line width, illuminating the phase shift mask by using illumination light having a peak near or on an optical axis in an intensity distribution to transfer the desired pattern onto the exposure plane by projecting light having passed through the phase shift mask onto the exposure plane.

20. 发明授权

US06828085B2 Exposure method and device manufacturing method using the same 失效
标题翻译：曝光方法及使用其的装置制造方法
公开(公告)号：US06828085B2
公开(公告)日：2004-12-07
申请号：US09391633
申请日：1999-09-07
申请人： Tetsunobu Kochi , Kenji Saitoh
发明人： Tetsunobu Kochi , Kenji Saitoh
IPC分类号： G03F700
CPC分类号： G03F7/2022 , G03F7/70466
摘要： A method of producing a semiconductor chip includes (1) a first exposure step for exposing a device range inside a chip on a substrate, to a repetition pattern including a line and a space, wherein an exposure region of the repetition pattern has a size greater than the device range inside the chip, and (2) a second exposure step for exposing the device range inside the chip on the substrate, to a pattern which includes (i) a first line being parallel to the line of the repetition pattern and having substantially the same linewidth as that of the line or a first space being parallel to the space of the repetition pattern and having substantially the same width, and (ii) a second line of a width larger than the line of the repetition pattern or a second space of a width larger than the space of the repetition pattern. The first line overlaps with a portion of lines of the repetition pattern, or the first space overlaps with a portion of spaces of the repetition pattern. Also, the first and second exposure steps are carried out without a developing step interposed therebetween.
摘要翻译：一种制造半导体芯片的方法包括：（1）第一曝光步骤，用于将衬底上的芯片内的器件范围曝光到包括线和空间的重复图案，其中重复图案的曝光区域具有更大的尺寸（2）第二曝光步骤，用于将衬底内的芯片内部的器件范围曝光到包括（i）第一线平行于重复图案的线并且具有基本上与线的线宽相同或第一空间平行于重复图案的空间并且具有基本上相同的宽度，以及（ii）宽度大于重复图案的线的第二线或第二线宽度大于重复图案的空间的空间。第一行与重复图案的一部分线重叠，或者第一空间与重复图案的空间的一部分重叠。此外，第一曝光步骤和第二曝光步骤不间断地进行显影步骤。

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