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    • 11. 发明授权
    • Fabri-perot spectroscopy method and apparatus utilizing the same
    • Fabri-perot光谱法和利用该法的装置
    • US4850709A
    • 1989-07-25
    • US19665
    • 1987-02-27
    • Mikichi BanOsamu KakuchiHironori YamamotoMasaru OhtsukaOsamu ShibaKazuhiko Hara
    • Mikichi BanOsamu KakuchiHironori YamamotoMasaru OhtsukaOsamu ShibaKazuhiko Hara
    • G01J3/26
    • G01J3/26
    • Fabri-Perot spectroscopy method comprises a step of directing a light beam at a first refraction angle to a first Fabri-Perot interference plate and a step of directing a light beam transmitted through the first Fabri-Perot interference plate to a second Fabri-Perot interference plate at a second refraction angle, and Fabri-Perot spectroscopy apparatus comprises Fabri-Perot interference plates, a control device for changing a spacing between the Fabri-Perot interference plates, a first optical device for directing a light beam to the first Fabri-Perot interference plate at a first refraction angle, a second optical device for directing the light beam transmitted through the Fabri-Perot interference plate at a second refraction angle different from the first refraction angle to the second Fabri-Perot interference plate, and a seal for externally sealing the Fabri-Perot interference plates. Gas for protecting the Fabri-Perot interference plates is filled in the sealed space.
    • Fabri-Pérot光谱法包括将第一折射角的光束引导到第一Fabri-Pérot干涉板的步骤和将透射通过第一Fabri-Pérot干涉板的光束引导到第二Fabri-Pérot干涉 平板以第二折射角,Fabri-Pérot光谱装置包括Fabri-Pérot干涉板,用于改变Fabri-Pérot干涉板之间的间距的控制装置,用于将光束引导到第一Fabri-Pérot的第一光学装置 在第一折射角处的干涉板,用于将透射通过Fabri-Pérot干涉板的光束以不同于第一折射角的第二折射角引导到第二Fabri-Pérot干涉板的第二光学装置,以及用于外部的密封件 密封Fabri-Pérot干涉板。 用于保护Fabri-Pérot干涉板的气体填充在密封空间中。
    • 12. 发明授权
    • Method and apparatus for measuring film thickness and film thickness
distribution during polishing
    • 研磨过程中测量薄膜厚度和薄膜厚度分布的方法和装置
    • US6004187A
    • 1999-12-21
    • US917853
    • 1997-08-27
    • Masaru NyuiMikichi Ban
    • Masaru NyuiMikichi Ban
    • G01B11/06B24B49/12H01L21/66B24B49/00B24B5/00
    • B24B37/013H01L22/26
    • Disclosed is a method of polishing the surface of a film provided on a substrate, by use of a polishing device, while relatively moving the film surface and the polishing device. The method includes a position detecting step for detecting a predetermined position on the surface of the film, a first measurement step for measuring an absolute value of the film thickness at the predetermined position, and a second measurement step for measuring film thickness information of the film about the predetermined position, on the basis of a measured value obtained through the first measurement step. The method also includes a film thickness distribution measurement step for detecting a film thickness distribution of the film, on the basis of a data obtained through the first and second measurement steps, and a control step for controlling continuation/discontinuation of polishing, on the basis of a data obtained through the film thickness distribution measurement step.
    • 公开了通过使用研磨装置,在使膜面和研磨装置相对移动的同时研磨设置在基板上的膜的表面的方法。 该方法包括用于检测胶片表面上的预定位置的位置检测步骤,用于测量预定位置处的膜厚绝对值的第一测量步骤,以及用于测量胶片厚度信息的第二测量步骤 基于通过第一测量步骤获得的测量值来关于预定位置。 该方法还包括基于通过第一和第二测量步骤获得的数据以及用于控制抛光的持续/停止的控制步骤,用于检测膜的膜厚度分布的膜厚度分布测量步骤 通过膜厚分布测量步骤获得的数据。
    • 15. 发明授权
    • Depth/height measuring device
    • 深度/高度测量装置
    • US5087121A
    • 1992-02-11
    • US593253
    • 1990-10-01
    • Osamu KakuchiMikichi Ban
    • Osamu KakuchiMikichi Ban
    • G01B11/06G01B11/22
    • G01B11/22G01B11/0608
    • A device for measuring depth of a groove formed on an article includes a light source for illuminating the article, a first detector for receiving light from a portion of the article having a groove and being illuminated by the light source, and for detecting a spectral reflectance in relation to the received light, a second detector for receiving light from the article illuminated by the light source and for detecting a spectral reflectance in relation to the received light, the second detector being effective to detect the spectral reflectance in a way not affected or substantially not affected by the groove of the article as compared with the detection by the first detector, and a depth detector for detecting the depth of the groove on the basis of the results of detection by the first and second detectors.
    • 用于测量形成在物品上的凹槽的深度的装置包括用于照亮物品的光源,用于接收来自具有凹槽并由光源照射的物品的一部分的光的第一检测器,并用于检测光谱反射率 相对于所接收的光,第二检测器用于接收由光源照射的物品的光并且用于检测相对于接收的光的光谱反射率,第二检测器有效地以不受影响的方式检测光谱反射率, 与第一检测器的检测相比基本上不受制品的凹槽的影响;以及深度检测器,用于基于第一和第二检测器的检测结果来检测凹槽的深度。
    • 16. 发明授权
    • Method and apparatus for measuring the thickness of a thin film using
the spectral reflection factor of the film
    • 使用该膜的光谱反射因子测量薄膜厚度的方法和装置
    • US4787749A
    • 1988-11-29
    • US935381
    • 1986-11-26
    • Mikichi BanYuki ToriumiKazuhiko Hara
    • Mikichi BanYuki ToriumiKazuhiko Hara
    • G01B11/06
    • G01B11/0625
    • A device, usable with an object having a layer, for measuring the thickness of the layer, includes a system for irradiating the object with light while changing its wavelength, the irradiating system having a light-emitting portion disposed opposed to the surface of the object, a photodetecting unit for detecting the light from the object irradiated by the irradiating system, the photodetecting unit having a light-receiving portion disposed opposed to the object, a system for detecting the thickness of the layer of the object on the basis of the detection by the photo-detecting unit, and a setting mechanism for positioning the object, relative to the light-emitting portion and the light-receiving portion, at a distance that substantially corresponds to an extremum of the quantity of light which is to be received by the light-receiving portion and which is variable with the positional relation of the object with the light-emitting portion and the light-receiving portion.
    • 可用于具有层的物体的用于测量层的厚度的装置包括用于在改变其波长的同时照射物体的系统,该照射系统具有与物体的表面相对设置的发光部分 用于检测由照射系统照射的物体的光的光电检测单元,具有与物体相对设置的受光部的光电检测单元,基于检测来检测物体的层的厚度的系统 通过光检测单元和用于相对于发光部分和光接收部分定位物体的设置机构,其距离基本上对应于将被接收的光量的极值的极值 光接收部分,其可以随着物体与发光部分和光接收部分的位置关系而变化。
    • 19. 发明授权
    • Film thickness measuring method and apparatus
    • 薄膜厚度测量方法和装置
    • US6137575A
    • 2000-10-24
    • US177486
    • 1998-10-23
    • Yasushi SugiyamaMikichi BanTakehiko SuzukiMasaru Nyui
    • Yasushi SugiyamaMikichi BanTakehiko SuzukiMasaru Nyui
    • G01B11/06G01B9/02
    • G01B11/0625
    • A method and apparatus for measuring the thickness of a film layer provided on a predetermined surface includes a step and device for detecting light reception signals of interference light of different wavelengths generated when light illuminates the film layer on the predetermined surface, a step or device for performing a first process for obtaining an approximate value for the film thickness by selecting a combination of solutions with the closest values from among solutions for the film thickness obtainable from at least three of the light reception signals corresponding to the respective wavelengths, and a step or device for performing a second process for obtaining an exact value for the film thickness by selecting a combination of solutions with the closest values from among solutions for the film thickness obtainable from all the light reception signals corresponding to the respective wavelengths. The second process is performed on the basis of the approximate value and with a restricted range for selection of the combination.
    • 用于测量设置在预定表面上的膜层的厚度的方法和装置包括用于检测当光照射预定表面上的膜层时产生的不同波长的干涉光的光接收信号的步骤和装置,用于 通过从对应于各个波长的光接收信号中的至少三个获得的薄膜厚度的解决方案中选择具有最接近值的解的组合来获得膜厚的近似值的第一处理,以及步骤或 用于通过从对应于各个波长的所有光接收信号可获得的膜厚度的解决方案中选择具有最接近的值的解的组合来执行用于获得膜厚度的精确值的第二处理的装置。 基于近似值进行第二处理,并且具有用于选择组合的限制范围。