专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明申请

US20140162458A1 Methods of Forming A Pattern On A Substrate 有权
标题翻译：在基板上形成图案的方法
公开(公告)号：US20140162458A1
公开(公告)日：2014-06-12
申请号：US13712820
申请日：2012-12-12
申请人： MICRON TECHNOLOGY, INC.
发明人： Ranjan Khurana , Anton J. DeVillers , Kevin J. Torek , Shane J. Trapp , Scott L. Light , James M. Buntin
IPC分类号： H01L21/308 , H01L21/302
CPC分类号： H01L21/3086 , H01L21/0273 , H01L21/0337 , H01L21/22 , H01L21/266 , H01L21/302 , H01L21/31138 , H01L21/31144 , H01L21/32 , H01L21/76816
摘要： A method of forming a pattern on a substrate includes forming openings in material of a substrate. The openings are widened to join with immediately adjacent of the openings to form spaced pillars comprising the material after the widening. Other embodiments are disclosed.
摘要翻译：在衬底上形成图案的方法包括在衬底的材料中形成开口。开口被加宽以与紧邻的开口接合以在扩宽之后形成包括材料的间隔的柱。公开了其他实施例。

12. 发明公开

US20240130124A1 ELECTRONIC DEVICES COMPRISING ADJOINING OXIDE MATERIALS AND RELATED SYSTEMS 审中-公开
公开(公告)号：US20240130124A1
公开(公告)日：2024-04-18
申请号：US18324068
申请日：2023-05-25
申请人： Micron Technology, Inc.
发明人： Shyam Surthi , Richard J. Hill , Gurtej S. Sandhu , Byeung Chul Kim , Francois H. Fabreguette , Chris M. Carlson , Michael E. Koltonski , Shane J. Trapp
IPC分类号： H10B43/27
CPC分类号： H10B43/27
摘要： An electronic device comprising a cell region comprising stacks of alternating dielectric materials and conductive materials. A pillar region is adjacent to the cell region and comprises storage node segments adjacent to adjoining oxide materials and adjacent to a tunnel region. The storage node segments are separated by a vertical portion of the tunnel region. A high-k dielectric material is adjacent to the conductive materials of the cell region and to the adjoining oxide materials of the pillar region. Additional electronic devices are disclosed, as are methods of forming an electronic device and related systems.

13. 发明申请

US20220077176A1 ELECTRONIC DEVICES COMPRISING ADJOINING OXIDE MATERIALS AND RELATED METHODS AND SYSTEMS 有权
公开(公告)号：US20220077176A1
公开(公告)日：2022-03-10
申请号：US17013047
申请日：2020-09-04
申请人： Micron Technology, Inc.
发明人： Shyam Surthi , Richard J. Hill , Gurtej S. Sandhu , Byeung Chul Kim , Francois H. Fabreguette , Chris M. Carlson , Michael E. Koltonski , Shane J. Trapp
IPC分类号： H01L27/11582
摘要： An electronic device comprising a cell region comprising stacks of alternating dielectric materials and conductive materials. A pillar region is adjacent to the cell region and comprises storage node segments adjacent to adjoining oxide materials and adjacent to a tunnel region. The storage node segments are separated by a vertical portion of the tunnel region. A high-k dielectric material is adjacent to the conductive materials of the cell region and to the adjoining oxide materials of the pillar region. Additional electronic devices are disclosed, as are methods of forming an electronic device and related systems.

14. 发明授权

US09741580B2 Substrate mask patterns, methods of forming a structure on a substrate, methods of forming a square lattice pattern from an oblique lattice pattern, and methods of forming a pattern on a substrate 有权
公开(公告)号：US09741580B2
公开(公告)日：2017-08-22
申请号：US14674476
申请日：2015-03-31
申请人： Micron Technology, Inc.
发明人： Vishal Sipani , Anton J. deVilliers , William R. Brown , Shane J. Trapp , Ranjan Khurana , Kevin R. Shea
IPC分类号： H01L29/76 , H01L21/308 , H01L21/027 , H01L21/033 , H01L21/311 , H01L21/22 , H01L21/266 , H01L21/32 , H01L21/768 , H01L21/02
CPC分类号： H01L21/308 , H01L21/02642 , H01L21/0273 , H01L21/0337 , H01L21/22 , H01L21/266 , H01L21/31138 , H01L21/31144 , H01L21/32 , H01L21/76816
摘要： A method of forming a pattern on a substrate comprises forming spaced, upwardly-open, cylinder-like structures projecting longitudinally outward of a base. Sidewall lining is formed over inner and over outer sidewalls of the cylinder-like structures, and that forms interstitial spaces laterally outward of the cylinder-like structures. The interstitial spaces are individually surrounded by longitudinally-contacting sidewall linings that are over outer sidewalls of four of the cylinder-like structures. Other embodiments are disclosed, including structure independent of method.

15. 发明申请

US20160005693A1 Semiconductor Constructions 有权
标题翻译：半导体建筑
公开(公告)号：US20160005693A1
公开(公告)日：2016-01-07
申请号：US14321466
申请日：2014-07-01
申请人： Micron Technology, Inc.
发明人： Ashim Dutta , Mohd Kamran Akhtar , Shane J. Trapp
IPC分类号： H01L23/532 , H01L23/528
CPC分类号： H01L23/53295 , H01L21/76807 , H01L21/7682 , H01L21/76829 , H01L21/76831 , H01L21/76834 , H01L23/4821 , H01L23/5222 , H01L2221/1031 , H01L2924/0002 , H01L2924/00
摘要： Some embodiments include a construction having conductive structures spaced from one another by intervening regions. Insulative structures are within the intervening regions. The insulative structures include dielectric spacers and air gaps between the dielectric spacers. Dielectric capping material is over the air gaps. The dielectric capping material is between the dielectric spacers and not over upper surfaces of the dielectric spacers. Some embodiments include a construction having a first conductive structure with an upper surface, and having a plurality of second conductive structures electrically coupled with the upper surface of the first conductive structure and spaced from one another by intervening regions. Air gap/spacer insulative structures are within the intervening regions. The air gap/spacer insulative structures have dielectric spacers along sidewalls of the second conductive structures and air gaps between the dielectric spacers. Dielectric capping material is over the air gaps.
摘要翻译：一些实施例包括具有通过中间区域彼此间隔开的导电结构的结构。绝缘结构位于中间区域内。绝缘结构包括介电间隔物和介电间隔物之间的气隙。介质封盖材料位于气隙之上。电介质封盖材料介于介电间隔物之间，而不在电介质间隔物的上表面之上。一些实施例包括具有带有上表面的第一导电结构的结构，并且具有与第一导电结构的上表面电耦合并且通过中间区域彼此间隔开的多个第二导电结构。气隙/间隔绝缘结构位于中间区域内。气隙/间隔绝缘结构在第二导电结构的侧壁和介电间隔物之间的空气间隙具有介电间隔物。介质封盖材料位于气隙之上。

16. 发明申请

US20150206760A1 Substrate Mask Patterns, Methods Of Forming A Structure On A Substrate, Methods Of Forming A Square Lattice Pattern From An Oblique Lattice Pattern, And Methods Of Forming A Pattern On A Substrate 有权
标题翻译：底物掩模图案，在基体上形成结构的方法，从斜面图案形成方形格子图案的方法以及在基板上形成图案的方法
公开(公告)号：US20150206760A1
公开(公告)日：2015-07-23
申请号：US14674476
申请日：2015-03-31
申请人： Micron Technology, Inc.
发明人： Vishal Sipani , Anton J. deVilliers , William R. Brown , Shane J. Trapp , Ranjan Khurana , Kevin R. Shea
IPC分类号： H01L21/308 , H01L21/02
CPC分类号： H01L21/308 , H01L21/02642 , H01L21/0273 , H01L21/0337 , H01L21/22 , H01L21/266 , H01L21/31138 , H01L21/31144 , H01L21/32 , H01L21/76816
摘要： A method of forming a pattern on a substrate comprises forming spaced, upwardly-open, cylinder-like structures projecting longitudinally outward of a base. Sidewall lining is formed over inner and over outer sidewalls of the cylinder-like structures, and that forms interstitial spaces laterally outward of the cylinder-like structures. The interstitial spaces are individually surrounded by longitudinally-contacting sidewall linings that are over outer sidewalls of four of the cylinder-like structures. Other embodiments are disclosed, including structure independent of method.
摘要翻译：在衬底上形成图案的方法包括形成间隔开的向上开口的圆柱状结构，其纵向向外突出。侧壁衬里形成在圆柱状结构的内侧和上侧外侧上，并且在圆柱状结构的横向外侧形成间隙空间。间隙空间被四个圆柱状结构的外侧壁上的纵向接触的侧壁衬里分开包围。公开了其他实施例，包括与方法无关的结构。

17. 发明授权

US08889559B2 Methods of forming a pattern on a substrate 有权
标题翻译：在基板上形成图案的方法
公开(公告)号：US08889559B2
公开(公告)日：2014-11-18
申请号：US13712830
申请日：2012-12-12
申请人： Micron Technology, Inc.
发明人： Shane J. Trapp , Ranjan Khurana , Kevin R. Shea
IPC分类号： H01L21/308 , B44C1/22
CPC分类号： H01L21/308 , H01L21/0337 , H01L21/266 , H01L21/31144 , H01L21/76816 , Y10S438/947
摘要： A method of forming a pattern on a substrate includes forming spaced first material-comprising pillars projecting elevationally outward of first openings formed in second material. Sidewall spacers are formed over sidewalls of the first material-comprising pillars. The sidewall spacers form interstitial spaces laterally outward of the first material-comprising pillars. The interstitial spaces are individually surrounded by longitudinally-contacting sidewall spacers that are over sidewalls of four of the first material-comprising pillars.
摘要翻译：在衬底上形成图案的方法包括在第二材料中形成的第一开口的高度向外突出形成间隔开的第一材料包括柱。在第一含材料柱的侧壁上形成侧壁间隔物。侧壁间隔物在第一含材料柱的横向向外形成间隙空间。间隙空间由四个第一材料包括柱的侧壁上的纵向接触的侧壁间隔单独包围。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式