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11. 发明申请

US20080219650A1 HEATING DEVICE OF THE LIGHT IRRADIATION TYPE 失效
标题翻译：加热装置的光照射类型
公开(公告)号：US20080219650A1
公开(公告)日：2008-09-11
申请号：US11848359
申请日：2007-08-31
申请人： Shinji Suzuki , Tetsuya Kitagawa , Kyohei Seki
发明人： Shinji Suzuki , Tetsuya Kitagawa , Kyohei Seki
IPC分类号： F21V9/00
CPC分类号： H01L21/67115 , H01L21/67109 , H05B3/0047
摘要： A heating device of the light irradiation type having an article to be heated, a guard ring located on the periphery of that article, multiple lamps located above the article to be heated and the guard ring, and a reflecting mirror located above the lamps, in which a light diffusion part is located in the upper region corresponding to the article to be heated so that the diffused light projects onto the entire surface of the article to be heated. The light diffusion part can be formed, for example, on a reflecting mirror, an optically transparent window part located between the article to be heated and the lamps or a light diffusion area formed on the light-emitting bulbs of the lamps. The size of the region occupied by the light diffusion part is such that diffused light is not projected to the guard ring.
摘要翻译：一种具有待加热物品的光照射型加热装置，位于该物品周边的保护环，位于被加热物上方的多个灯和防护环，以及位于灯的上方的反射镜，光扩散部位于对应于被加热物的上部区域，使得漫射光投射到待加热物品的整个表面上。光漫射部可以例如形成在反射镜上，位于待加热物品与灯之间的光学透明窗部或形成在灯的发光灯泡上的光扩散区域。由光扩散部占据的区域的大小使得漫射光不会被投射到防护环。

12. 发明授权

US07072375B2 Line-narrowed gas laser system 有权
标题翻译：线窄气体激光系统
公开(公告)号：US07072375B2
公开(公告)日：2006-07-04
申请号：US10371478
申请日：2003-02-20
申请人： Tatsuya Ariga , Kyohei Seki , Osamu Wakabayashi
发明人： Tatsuya Ariga , Kyohei Seki , Osamu Wakabayashi
IPC分类号： H01S3/22
CPC分类号： H01S3/225 , H01S3/134 , H01S3/139
摘要： In a line-narrowed gas laser system such as a line-narrowed molecular fluorine laser system, ASE is cut off to obtain a spectral linewidth of 0.2 pm or lower and a spectral purity of 0.5 pm or lower. The laser system comprises a laser chamber filled with an F2-containing laser gas, discharge electrodes located in the laser chamber, a laser resonator and a line-narrowing module located in the laser resonator with a wavelength selection element, so that a line-narrowed laser beam emerges from the laser resonator. To cut off ASE from the laser beam emerging from the laser resonator, the duration from laser emission by discharge to generation of a laser beam is preset. Rise of the sidelight is made so gentle that the starting point of a laser pulse can exist after the time of the first sidelight peak.
摘要翻译：在线狭窄的分子氟激光系统等线狭窄气体激光器系统中，切断ASE以获得0.2μm以下的光谱线宽和0.5μm以下的光谱纯度。激光系统包括填充有含2激光气体的激光室，位于激光室中的放电电极，激光谐振器和位于激光谐振器中的具有波长选择的线窄模块元件，使得线状窄激光束从激光谐振器中涌出。为了从激光谐振器中产生的激光束切断ASE，预设了通过放电激光发射到产生激光束的持续时间。侧光的上升使得激光脉冲的起始点在第一个侧光峰值时间之后可以存在。

13. 发明授权

US10154229B2 Storage medium storing a video reproduction controlling program, video reproduction controlling apparatus and video reproduction controlling method 有权
公开(公告)号：US10154229B2
公开(公告)日：2018-12-11
申请号：US12219932
申请日：2008-07-30
申请人： Noriyuki Sato , Shinobu Suzuki , Yasutaka Takeuchi , Takafumi Masaoka , Kyohei Seki
发明人： Noriyuki Sato , Shinobu Suzuki , Yasutaka Takeuchi , Takafumi Masaoka , Kyohei Seki
IPC分类号： H04N5/85 , G11B19/02 , G11B27/10 , H04N21/422 , H04N21/431 , H04N21/432 , H04N5/44 , H04N5/765 , H04N5/775 , H04N5/907 , H04N9/806 , H04N9/82 , H04N21/426 , H04N21/472 , H04N21/478
摘要： A game apparatus as a video reproduction controlling apparatus includes a CPU, and the CPU executes a reproduction control of a DVD. In the middle of reproducing the DVD, a content such as an video, a voice, etc. are reproduced. In a case that a reproduction operation such as pause, reproduction, fast reverse, fast forward, heading, etc. is not prohibited, in response to an instruction of the reproduced screen displayed on the monitor with a controller, an operation panel for reproduction operation is displayed. On the other hand, while a menu is reproduced or in a case that a screen button is displayed in accordance with the reproduction, the reproduction operation is prohibited, and even if the reproduced screen is instructed with the controller, the operation panel is not displayed.

14. 发明授权

US07756403B2 Heating process of the light irradiation type 有权
标题翻译：光照射类型的加热过程
公开(公告)号：US07756403B2
公开(公告)日：2010-07-13
申请号：US11536057
申请日：2006-09-28
申请人： Kyohei Seki , Shinji Suzuki , Yoichi Mizukawa
发明人： Kyohei Seki , Shinji Suzuki , Yoichi Mizukawa
IPC分类号： A45D20/40
CPC分类号： H01L21/67115
摘要： A light irradiation heating process in which, even in the case of an asymmetrical physical property of an article to be treated, uniform heating is possible, or in which heating can be performed such that the article acquires a desired physical property after heat treatment. Based on the measured value of the local physical property of the article to be treated, the emissivity distribution is obtained and the distribution pattern of the light intensity on the article to be treated is determined. According to this light intensity pattern, the individual intensity of the light emitted from respective light emitting parts of lamp units of the heating device are determined beforehand. According to this determined result, the intensity of the light emitted from the respective light emitting parts of the lamp units are controlled individually, and thus, the article to be treated is irradiated with light.
摘要翻译：即使在待处理物品的不对称物理性质的情况下也可以进行均匀加热，或者可以进行加热，使得制品在热处理后获得所需的物理性质的光照射加热过程。根据待处理物品的局部物理性质的测定值，得到辐射率分布，并确定待处理物品上光强度的分布格局。根据该光强度图案，预先确定从加热装置的灯单元的各个发光部分发射的光的单独强度。根据该确定结果，单独控制从灯单元的各个发光部分发射的光的强度，从而照射待处理的物品。

15. 发明申请

US20090214193A1 LIGHT EMISSION TYPE HEATING METHOD AND LIGHT EMISSION TYPE HEATING APPARATUS 审中-公开
标题翻译：轻型排气式加热方式和轻型排气式加热装置
公开(公告)号：US20090214193A1
公开(公告)日：2009-08-27
申请号：US12392481
申请日：2009-02-25
申请人： Shinji SUZUKI , Kyohei Seki , Tetsuya Kitagawa
发明人： Shinji SUZUKI , Kyohei Seki , Tetsuya Kitagawa
IPC分类号： F26B3/28
CPC分类号： H01L21/67115
摘要： A light emission type heating apparatus comprises a first lamp unit which includes two or more lamps, in which at least one of the lamps includes two or more filaments in its light emission bulb, and intensity of light emitted from each filament is independently controlled, and a second lamp unit which is made up of two or more lamps, and wherein the lamps of the first lamp unit are grouped, in each of which a filament of at least one of the lamps and a filament of another one of the lamps are arranged to form groups, wherein a temperature of the workpiece is detected, and electric power to be applied to each of the groups of filaments is controlled based on the detected temperature of the workpiece.
摘要翻译：发光型加热装置包括：第一灯单元，其包括两个或更多个灯，其中至少一个灯在其发光灯泡中包括两根或更多根灯丝，并且独立地控制从每根灯丝发射的光的强度，以及第二灯单元，其由两个或更多个灯组成，并且其中第一灯单元的灯分组，其中至少一个灯的灯丝和另一个灯的灯丝布置以形成组，其中检测到工件的温度，并且基于检测到的工件温度来控制施加到每组长丝的电力。

16. 发明申请

US20060243923A1 Extreme UV radiation exposure tool and extreme UV radiation source device 有权
公开(公告)号：US20060243923A1
公开(公告)日：2006-11-02
申请号：US11412793
申请日：2006-04-28
申请人： Kyohei Seki
发明人： Kyohei Seki
IPC分类号： G21G4/00
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70575
摘要： To effectively eliminate radiation outside the band with a wavelength of 13.5 nm which has adverse effects on exposure without reducing the intensity of the EUV radiation with a wavelength of 13.5 nm, in an extreme UV radiation exposure tool which has an extreme UV radiation source device with an EUV focusing mirror which focuses extreme UV radiation and radiation outside the band which is emitted by the high density and high temperature region of a plasma, an illumination optical system for projecting this radiation onto a mask, and a projection optical system which projects the radiation from the mask onto a workpiece, a radiation shield is provided of a size which enables the radiation emerging from the EUV focusing mirror to be completely incident on it, and which has an opening of a size which results in essentially only extreme UV radiation being transmitted through it.

17. 发明授权

US06879617B2 Two stage laser system 有权
标题翻译：两级激光系统
公开(公告)号：US06879617B2
公开(公告)日：2005-04-12
申请号：US10438737
申请日：2003-05-14
申请人： Tatsuya Ariga , Kyohei Seki , Osamu Wakabayashi
发明人： Tatsuya Ariga , Kyohei Seki , Osamu Wakabayashi
IPC分类号： H01S3/131 , H01S3/036 , H01S3/08 , H01S3/134 , H01S3/225 , H01S3/23 , H01S3/22
CPC分类号： H01S3/10092 , H01S3/036 , H01S3/08004 , H01S3/08009 , H01S3/08059 , H01S3/134 , H01S3/225 , H01S3/2258 , H01S3/2316
摘要： The present invention relates to a two stage laser system in which a desired spectral line width can be obtained at high output even when the integrated spectral characteristic of oscillator laser does not have the desired spectral line width, comprising an oscillator laser device 10 which has discharge electrodes 2 within a laser chamber 1 filled with laser gas containing F2 and emits laser beam which is band-narrowed by means of a band narrowing module 3 arranged in a laser resonator, and an amplifier laser device 20 which has discharge electrodes 2 within a laser chamber 1 filled with laser gas containing F2 and amplifies laser pulse injected from said oscillator laser device 10. In the system, a synchronous time interval having a predetermined spectral line width exists in laser pulse from the oscillator laser 10, and the system is set such that a discharge occurs in the amplifier laser 20 within the synchronous time interval.
摘要翻译：本发明涉及一种二阶段激光系统，其中即使当振荡器激光器的积分光谱特性不具有期望的谱线宽度时，也可以以高输出获得期望的谱线宽度，包括具有放电的振荡器激光装置10 在激光室1内的充满了含有F2的激光气体的激光器2内的电极2，并且发射通过设置在激光谐振器中的带窄化模块3而带宽化的激光束，以及在激光器内具有放电电极2的放大器激光装置20 室1充满含有F2的激光气体，并放大从所述振荡器激光装置10注入的激光脉冲。在该系统中，具有预定光谱线宽的同步时间间隔存在于来自振荡器激光器10的激光脉冲中，并且系统被设置为在同步时间间隔内在放大器激光器20中发生放电。

18. 发明授权

US06509970B1 Wavelength monitoring apparatus for laser light for semiconductor exposure 失效
标题翻译：用于半导体曝光的激光用波长监视装置
公开(公告)号：US06509970B1
公开(公告)日：2003-01-21
申请号：US09599289
申请日：2000-06-21
申请人： Kyohei Seki , Kazuaki Hotta , Takao Kobayashi
发明人： Kyohei Seki , Kazuaki Hotta , Takao Kobayashi
IPC分类号： G01B902
CPC分类号： G01J9/0246
摘要： The present invention relates to a wavelength monitoring apparatus capable of measuring both standard light and laser light for semiconductor exposure simultaneously and highly accurately, without a time lag. Entrance-side optical systems 21 and 22 allow light from a laser 20 for semiconductor exposure and reference light from a He—Ne laser 10 to be incident on different areas of a single etalon 1 in the form of diverging light, converging light or diffused light in such a manner that the respective center axes thereof are displaced relative to each other. Two focusing optical systems 31 and 32 are provided in approximately coaxial relation to the respective center axes of the laser light and reference light passing through the etalon 1. A one-dimensional array optical sensor 4 is placed in a plane P coincident with the back focal planes of the focusing optical systems 31 and 32 to receive interference fringes produced by the laser light and the reference light. The positions of the interference fringes on the one-dimensional array optical sensor 4 are detected to calculate the wavelength of the laser light for semiconductor exposure.
摘要翻译：本发明涉及一种波长监视装置，能够同时高精度地测量用于半导体曝光的标准光和激光，而不会出现时间滞后。入射侧光学系统21和22允许来自激光器20的光用于半导体曝光，并且来自He-Ne激光器10的参考光以发散光，会聚光或漫射光的形式入射到单个标准具1的不同区域使得其各自的中心轴线相对于彼此移位。两个聚焦光学系统31和32以与激光的各个中心轴和通过标准具1的参考光大致同轴的方式设置。一维阵列光学传感器4放置在与后焦点重合的平面P中聚焦光学系统31和32的平面用于接收由激光和参考光产生的干涉条纹。检测干涉条纹在一维阵列光学传感器4上的位置，以计算用于半导体曝光的激光的波长。

19. 发明授权

US5677113A Method for ashing a photoresist resin film on a semiconductor wafer and an asher 失效
标题翻译：在半导体晶片和灰浆上灰化光致抗蚀剂树脂膜的方法
公开(公告)号：US5677113A
公开(公告)日：1997-10-14
申请号：US436679
申请日：1995-05-08
申请人： Shinji Suzuki , Kyohei Seki , Nobutoshi Ebashi , Tetsuji Arai
发明人： Shinji Suzuki , Kyohei Seki , Nobutoshi Ebashi , Tetsuji Arai
IPC分类号： G03F7/42 , H01L21/027 , H01L21/30 , H01L21/302 , H01L21/3065 , H01L21/311
CPC分类号： G03F7/42 , H01L21/31138
摘要： The object of the invention is to provide an ashing method and an asher in order to avoid damage to semiconductor components occurring during ashing of a photoresist resin film by active oxygen plasma and to avoid a long treatment time occurring in an ashing method using a low pressure mercury discharge lamp. According to the invention, this object is achieved by a method and an apparatus for ashing a photoresist resin film. In the method, a wafer provided with a photoresist resin film is placed in an ozone-containing atmosphere. An activated oxygen is produced through the radiation light of a discharge lamp, which emits a continuous spectrum in a wavelength range of 200 to 300 nm. The photoresist resin film is ashed by the activated oxygen.
摘要翻译：本发明的目的是提供一种灰化方法和灰化装置，以避免对通过活性氧等离子体在光致抗蚀剂树脂膜进行灰化期间发生的半导体成分的损坏，并且避免在使用低压的灰化方法中发生长时间的处理时间汞放电灯。根据本发明，通过用于灰化光致抗蚀剂树脂膜的方法和设备来实现该目的。在该方法中，将设置有光致抗蚀剂树脂膜的晶片放置在含臭氧气氛中。通过放电灯的放射线产生活化氧，其在200〜300nm的波长范围内发射连续的光谱。光致抗蚀剂树脂膜被活化的氧气脱落。

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