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    • 13. 发明授权
    • High pressure discharge lamp with start-up assist member, lamp unit, lamp system, and projector
    • 高压放电灯带启动辅助部件,灯具,灯具系统和投影机
    • US08690360B2
    • 2014-04-08
    • US13393786
    • 2011-07-06
    • Syunsuke OnoMasahiro YamamotoHiroki OgawaKazuyuki Okano
    • Syunsuke OnoMasahiro YamamotoHiroki OgawaKazuyuki Okano
    • G03B21/28
    • H01J61/547G03B21/2026H01J61/86
    • The present invention provides a high pressure discharge lamp with a start-up assist member, a lamp unit, and a lamp system that reduce breakdown voltage and provide high design flexibility by reducing restriction on a position of an adjacent conductor. In a high pressure discharge lamp (10) of a lamp unit (1), a dielectric member (20) is on the outer surface of a first sealing part (101a). The dielectric member (20) made of a titanium compound has relative permittivity higher than that of fused quartz. An upstream end of a metal wire (21) is connected to an external lead wire (102b) projecting from a second sealing part (101b). A downstream end (21A) is in contact with the dielectric member (20). Upon lighting of the lamp, a corona discharge occurs at the point where the end (21a) is in contact with the dielectric member (20) so that breakdown voltage is reduced.
    • 本发明提供一种具有启动辅助构件,灯单元和灯系统的高压放电灯,其通过减少对相邻导体的位置的限制来降低击穿电压并提供高设计灵活性。 在灯单元(1)的高压放电灯(10)中,电介质部件(20)位于第一密封部(101a)的外表面上。 由钛化合物构成的电介质构件(20)的相对介电常数高于熔融石英。 金属线(21)的上游端与从第二密封部(101b)突出的外部引线(102b)连接。 下游端(21A)与电介质构件(20)接触。 在点亮灯时,在端部(21a)与电介质构件(20)接触的点处发生电晕放电,使得击穿电压降低。
    • 15. 发明授权
    • Resist pattern slimming treatment method
    • 抗皱图案减肥治疗方法
    • US08455183B2
    • 2013-06-04
    • US12662632
    • 2010-04-27
    • Toyohisa TsurudaYoshihiro KondoAtsushi OokouchiMasahiro Yamamoto
    • Toyohisa TsurudaYoshihiro KondoAtsushi OokouchiMasahiro Yamamoto
    • G03F7/26
    • G03F7/40H01L21/67155
    • A resist pattern slimming treatment method includes: a slimming treatment step of performing a slimming treatment on a resist pattern by applying a solution containing an acid onto a substrate having the resist pattern formed thereon, then performing a heat treatment, and then performing a developing treatment. A database storing kinds of resist material for the resist pattern, concentrations of acid contained in a solution to be applied onto the substrate having the resist pattern formed thereon, and line widths of the resist pattern corresponding to the kinds of resist material and the concentrations of acid is prepared in advance. The concentration of the acid contained in the solution used in the slimming treatment step is based on a concentration of the acid obtained from the database, using, as search keys, the kind of resist material and a target value of the line width of the resist pattern.
    • 抗蚀剂图案减肥处理方法包括:减肥处理步骤,通过将含有酸的溶液涂布在其上形成有抗蚀剂图案的基材上,然后进行热处理,然后进行显影处理,对抗蚀剂图案进行减肥处理 。 存储抗蚀剂图案的各种抗蚀剂材料的数据库,涂布在其上形成有抗蚀剂图案的基板上的溶液中所含的酸的浓度,以及与抗蚀剂材料的种类对应的抗蚀剂图案的线宽度 预先准备酸。 在减肥处理步骤中使用的溶液中所含的酸的浓度基于从数据库中获得的酸的浓度,使用作为搜索关键字的抗蚀剂材料的种类和抗蚀剂的线宽度的目标值 模式。