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11. 发明授权

US06743636B2 Microfluid driving device 失效
标题翻译：微流体驱动装置
公开(公告)号：US06743636B2
公开(公告)日：2004-06-01
申请号：US09863332
申请日：2001-05-24
申请人： Chen-Kuei Chung , Wei-Jieh Chang , Chieh-Ling Hsiao , Kuo-Yao Weng
发明人： Chen-Kuei Chung , Wei-Jieh Chang , Chieh-Ling Hsiao , Kuo-Yao Weng
IPC分类号： B01L302
CPC分类号： F04F5/54 , B01F13/0059 , B01F15/0248 , B01F15/0284 , B01L3/50273 , B01L2400/0463 , B01L2400/0487 , F04B19/006 , Y10T436/15 , Y10T436/25 , Y10T436/2575
摘要： A microfluid driving device is provided. The microfluid driving device of this invention comprises microfluid driving platform prepared in a chip, which platform comprises at least two miniature Venturi pumps, at least one microchannel and optionally micro mixers or micro reactors in said microchannel; an external pneumatic flow supply and control module that provides selectively different air flows; and an interface device connecting said microfluid driving platform and said external pneumatic flow supply and control module. The air flows supplied by said the pneumatic flow supply and control module are supplied under selected flow rates and frequencies to said at least two Venturi pumps through said interface device, such that the microfluid inside said microchannel may be driven forward or backward or halt and the transportation, mixing and reaction of the microfluid may be accomplished.
摘要翻译：提供微流体驱动装置。本发明的微流体驱动装置包括在芯片中制备的微流体驱动平台，该平台包括至少两个微型文丘里泵，所述微通道中的至少一个微通道和任选的微混合器或微反应器; 提供选择性地不同气流的外部气流供应和控制模块; 以及连接所述微流体驱动平台和所述外部气动流量供给和控制模块的接口装置。由所述气流供应和控制模块供应的空气流通过所述接口装置以选定的流量和频率供应到所述至少两个文丘里泵，使得所述微通道内的微流体可以向前或向后或向后或停止，可以实现微流体的运输，混合和反应。

12. 发明授权

US06599098B2 Thermolysis reaction actuating pump 失效
标题翻译：热解反应致动泵
公开(公告)号：US06599098B2
公开(公告)日：2003-07-29
申请号：US10039371
申请日：2001-12-31
申请人： Kuo-Yao Weng , Ching-Yi Wu
发明人： Kuo-Yao Weng , Ching-Yi Wu
IPC分类号： F04B1924
CPC分类号： F04B19/006 , F04B19/24
摘要： A thermolysis reaction actuating pump system including a first set of walls defining a channel having a cross-sectional area less than one millimeter squared, and wherein a liquid is received in the channel. A second set of walls defining a reaction chamber and a thermolytic body carried in the reaction chamber. The first set and second set of walls are constructed and arranged to allow the flow of gas from the reaction chamber into the channel. A heater is positioned to provide heat to the thermolytic body and disassociate the thermolytic body to produce gas to pump the liquid through the channel.
摘要翻译：一种热解反应致动泵系统，包括限定具有小于1毫米平方的横截面面积的通道的第一组壁，并且其中在所述通道中接收液体。限定反应室的第二组壁和承载在反应室中的热解体。第一组和第二组壁被构造和布置成允许气体从反应室流入通道。定位加热器以向热解体提供热量，并使热解体解离，产生气体以将液体泵送通过通道。

13. 发明授权

US5972234A Debris-free wafer marking method 失效
标题翻译：无碎片晶圆标记方法
公开(公告)号：US5972234A
公开(公告)日：1999-10-26
申请号：US55378
申请日：1998-04-06
申请人： Kuo-Yao Weng , Yu-Chi Lin
发明人： Kuo-Yao Weng , Yu-Chi Lin
IPC分类号： H01L21/00 , B44C1/22 , H01L21/31
CPC分类号： H01L21/67282 , B23K26/386 , B23K26/402 , H01L21/6836 , H01L23/544 , B23K2203/42 , H01L2221/68327 , H01L2223/54453 , H01L2924/0002 , H01L2924/09701 , H01L2924/10253
摘要： The present invention discloses a method for marking an electronic substrate without the splatter or debris defect which can be carried out by first providing a tape, then creating a cavity or a mark through the tape by a high-intensity energy beam or any other suitable mechanical means such that the tape can be laminated to a top surface of the substrate and exposed to an etchant until a similar mark in the substrate is reproduced by the etching process. After the tape is removed, the mark is reproduced in the surface of the electronic substrate.
摘要翻译：本发明公开了一种用于标记电子基板而不产生飞溅或碎片缺陷的方法，该方法可以通过首先提供带来进行，然后通过高强度能量束或任何其它合适的机械通过带形成空腔或标记意味着磁带可以层压到基板的顶表面并暴露于蚀刻剂，直到通过蚀刻工艺再现基板中的相似标记。在磁带去除之后，标记被再现在电子基板的表面中。

14. 发明授权

US07794665B2 Fluidic device 有权
标题翻译：流体装置
公开(公告)号：US07794665B2
公开(公告)日：2010-09-14
申请号：US11612882
申请日：2006-12-19
申请人： Kuo-Yao Weng
发明人： Kuo-Yao Weng
IPC分类号： G05D9/00
CPC分类号： B01L3/502715 , B01L3/50273 , B01L3/502738 , B01L2300/0816 , B01L2400/0406 , B01L2400/046 , B01L2400/0683
摘要： A fluidic device includes a first material defining a first region, a second material defining a second region that is separated from the first region, and a connector coupled between the first region and the second region. The connector includes a brittle material and has an open end and a closed end, the open end being disposed in the second region, the closed end being disposed in the first region. The first region is closed off from the second region by the closed end of the connector. The connector is configured such that when the closed end of the connector is broken, the connector defines a passage from the first region to the second region.
摘要翻译：流体装置包括限定第一区域的第一材料，限定与第一区域分离的第二区域的第二材料和连接在第一区域和第二区域之间的连接器。连接器包括脆性材料，并且具有开口端和封闭端，开口端设置在第二区域中，封闭端设置在第一区域中。第一区域通过连接器的封闭端从第二区域封闭。连接器构造成使得当连接器的封闭端断开时，连接器限定从第一区域到第二区域的通道。

15. 发明授权

US07541578B2 Microfluidic device and manufacturing method thereof 失效
标题翻译：微流体装置及其制造方法
公开(公告)号：US07541578B2
公开(公告)日：2009-06-02
申请号：US11614956
申请日：2006-12-21
申请人： Kuo-Yao Weng
发明人： Kuo-Yao Weng
IPC分类号： B01L3/02 , H01J49/04
CPC分类号： B01L3/502707 , A61B5/150022 , A61B5/150251 , A61B5/150274 , A61B5/150358 , A61B10/0045 , A61B10/007 , A61B2017/00526 , B01L2200/027 , B01L2200/12 , B01L2300/0816 , B01L2300/0838 , B01L2300/0887 , B01L2400/0406 , B29C55/04 , B29L2031/756 , H01J49/0018 , H01J49/165 , Y10T29/49432
摘要： A method of manufacturing a microfluidic device is described. A substrate having at least one device thereon is provided, wherein the device includes at least one channel. Next, a region beside the channel is heated, and then the substrate is pulled to neck the region such that at least one capillary connecting with the channel is formed. The present invention also provides a microfluidic device including a substrate and at least one capillary. In particular, the substrate has at least one device thereon, and the device has at least one channel. The capillary is connected with the channel, wherein the substrate and the capillary are a unity structure such that the interface between the capillary and the channel is dead-volume free.
摘要翻译：描述了一种制造微流体装置的方法。提供了其上具有至少一个器件的衬底，其中所述器件包括至少一个通道。接下来，加热通道旁边的区域，然后将基板拉动以使区域颈缩，使得形成与通道连接的至少一个毛细管。本发明还提供一种包括基底和至少一个毛细管的微流体装置。特别地，衬底上具有至少一个器件，并且该器件具有至少一个通道。毛细管与通道连接，其中基底和毛细管是单一结构，使得毛细管和通道之间的界面是无死体积的。

16. 发明申请

US20080047608A1 FLUIDIC DEVICE 有权
标题翻译：流体装置
公开(公告)号：US20080047608A1
公开(公告)日：2008-02-28
申请号：US11612896
申请日：2006-12-19
申请人： Kuo-Yao Weng
发明人： Kuo-Yao Weng
IPC分类号： F17C13/00
CPC分类号： B01L3/021 , B01L3/50273 , B01L2300/0816 , B01L2300/0838 , B01L2300/0864 , B01L2300/0867 , B01L2400/046 , B01L2400/0487 , B01L2400/049 , B01L2400/0683 , Y10T137/0396 , Y10T137/1632 , Y10T137/212 , Y10T137/2224
摘要： A fluidic device includes a first reservoir to receive a first fluid, a second reservoir to receive a second fluid, and a main channel coupled to the first and second reservoirs through one or more branch channels. A first one-use pump generates a pressure difference to move one or both of the first and second fluids when a container in the first one-use pump is broken. A second one-use pump generates a pressure difference to move one or both of the first and second fluids when a container in the second one-use pump is broken.
摘要翻译：流体装置包括用于接收第一流体的第一储存器，用于接收第二流体的第二储存器和通过一个或多个分支通道联接到第一储存器和第二储存器的主通道。当第一次使用的泵中的容器被破坏时，第一一用泵产生压力差以移动第一和第二流体中的一个或两个。当第二一次用泵中的容器被破坏时，第二一用泵产生压力差以移动第一和第二流体中的一个或两个。

17. 发明申请

US20070145263A1 MICROFLUIDIC DEVICE AND MANUFACTURING METHOD THEREOF 失效
标题翻译：微流体装置及其制造方法
公开(公告)号：US20070145263A1
公开(公告)日：2007-06-28
申请号：US11614956
申请日：2006-12-21
申请人： Kuo-Yao Weng
发明人： Kuo-Yao Weng
IPC分类号： H01J49/00 , A61B5/00
CPC分类号： B01L3/502707 , A61B5/150022 , A61B5/150251 , A61B5/150274 , A61B5/150358 , A61B10/0045 , A61B10/007 , A61B2017/00526 , B01L2200/027 , B01L2200/12 , B01L2300/0816 , B01L2300/0838 , B01L2300/0887 , B01L2400/0406 , B29C55/04 , B29L2031/756 , H01J49/0018 , H01J49/165 , Y10T29/49432
摘要： A method of manufacturing a microfluidic device is described. A substrate having at least one device thereon is provided, wherein the device includes at least one channel. Next, a region beside the channel is heated, and then the substrate is pulled to neck the region such that at least one capillary connecting with the channel is formed. The present invention also provides a microfluidic device including a substrate and at least one capillary. In particular, the substrate has at least one device thereon, and the device has at least one channel. The capillary is connected with the channel, wherein the substrate and the capillary are a unity structure such that the interface between the capillary and the channel is dead-volume free.
摘要翻译：描述了一种制造微流体装置的方法。提供了其上具有至少一个器件的衬底，其中所述器件包括至少一个通道。接下来，加热通道旁边的区域，然后将基板拉动以使区域颈缩，使得形成与通道连接的至少一个毛细管。本发明还提供一种包括基底和至少一个毛细管的微流体装置。特别地，衬底上具有至少一个器件，并且该器件具有至少一个通道。毛细管与通道连接，其中基底和毛细管是单一结构，使得毛细管和通道之间的界面是无死体积的。

18. 发明授权

US5879577A Process for wafer peripheral edge defect reduction 失效
标题翻译：晶圆周边缺陷削减工艺
公开(公告)号：US5879577A
公开(公告)日：1999-03-09
申请号：US782710
申请日：1997-01-13
申请人： Kuo-Yao Weng , Yeh-Jye Wann
发明人： Kuo-Yao Weng , Yeh-Jye Wann
IPC分类号： H01L21/311 , H01L21/302
CPC分类号： H01L21/31144 , H01L21/31111 , H01L21/31133
摘要： A method is described for selectively etching photoresist on a semiconductor substrate having one or more layers of a spin on glass, including an edge bead that was formed when the glass was originally applied. First the wafer is coated with a layer of unexposed, undeveloped negative photoresist. Then, while spinning the wafer, a vertical jet of photoresist EBR solvent is directed to a point just inside the edge so that photoresist gets removed from an annular area extending inwards from the perimeter. The edge bead is then removed using a liquid etchant and integrated circuit processing can now proceed, making use of the unexposed, undeveloped layer of photoresist in the usual way; that is, exposing it through a mask and then developing and baking it before using it as an etch mask. The method is general and may be used in other situations where selective removal of photoresist along the periphery is required and where the remaining resist is to be used for other purposes.
摘要翻译：描述了一种用于在具有一层或多层旋涂玻璃上的半导体衬底上选择性蚀刻光致抗蚀剂的方法，包括当最初施加玻璃时形成的边缘珠。首先，晶片被涂覆有未曝光的未显影的负光致抗蚀剂层。然后，当旋转晶片时，将光致抗蚀剂EBR溶剂的垂直射流引导到刚好在边缘内部的点，使得光致抗蚀剂从从周边向内延伸的环形区域移除。然后使用液体蚀刻剂去除边缘珠，现在可以以通常的方式利用未曝光的未开发的光致抗蚀剂层进行集成电路处理; 也就是说，通过掩模曝光，然后在将其用作蚀刻掩模之前将其显影和烘烤。该方法是通用的，并且可以用于沿着周边选择性去除光致抗蚀剂并且其余抗蚀剂用于其它目的的其它情况。

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