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    • 11. 发明申请
    • METHOD OF FABRICATING A PIXEL ARRAY
    • 制作像素阵列的方法
    • US20120171792A1
    • 2012-07-05
    • US13050956
    • 2011-03-18
    • Yung-Hui YehChih-Ming LaiChun-Cheng Cheng
    • Yung-Hui YehChih-Ming LaiChun-Cheng Cheng
    • H01L33/02
    • H01L27/1225H01L27/3262H01L2251/5338
    • A method of fabricating a pixel array is provided. A first metal layer is formed over a substrate. The metal layer is patterned to form a plurality of data lines and a plurality of drain patterns adjacent to each data line. The data lines and the drain patterns are separated from each other. An oxide semiconductor layer and a first insulation layer covering the oxide semiconductor layer are formed over the substrate. A second metal layer is formed on the first insulation layer and patterned to form a plurality of scan lines intersected with the data lines and the drain patterns. By using the scan lines as a mask, the oxide semiconductor layer and the first insulation layer are patterned to form a plurality of oxide semiconductor channels located under each scan line. Each oxide semiconductor channel is located between one data line and one drain pattern.
    • 提供了一种制造像素阵列的方法。 第一金属层形成在衬底上。 图案化金属层以形成与每条数据线相邻的多条数据线和多条漏极图案。 数据线和漏极图案彼此分离。 在基板上形成氧化物半导体层和覆盖氧化物半导体层的第一绝缘层。 第二金属层形成在第一绝缘层上并被图案化以形成与数据线和漏极图案相交的多条扫描线。 通过使用扫描线作为掩模,对氧化物半导体层和第一绝缘层进行图案化以形成位于每条扫描线下方的多个氧化物半导体通道。 每个氧化物半导体沟道位于一个数据线和一个漏极图案之间。
    • 13. 发明授权
    • Model import for electronic design automation
    • 电子设计自动化模型导入
    • US08214772B2
    • 2012-07-03
    • US13116981
    • 2011-05-26
    • Ru-Gun LiuChih-Ming LaiWen-Chun HuangBoren LuoI-Chang ShinYao-Ching KuCliff Hou
    • Ru-Gun LiuChih-Ming LaiWen-Chun HuangBoren LuoI-Chang ShinYao-Ching KuCliff Hou
    • G06F17/50
    • G06F17/50
    • Methods and systems for providing processing parameters in a secure format are disclosed. In one aspect, a method for providing semiconductor fabrication processing parameters to a design facility is disclosed. The method comprises providing a set of processing parameters of a fabrication facility; creating a model from the set of processing parameters; converting the model into a corresponding set of kernels; converting the set of kernels into a corresponding set of matrices; and communicating the set of matrices to the design facility. In another aspect, a method for providing semiconductor fabrication processing parameters is disclosed. The method comprises providing a set of processing parameters of a fabrication facility; creating a processing model from the set of processing parameters; encrypting the processing model into a format for use with a plurality of EDA tools; and communicating the encrypted processing model format to a design facility.
    • 公开了以安全格式提供处理参数的方法和系统。 一方面,公开了一种向设计设备提供半导体制造处理参数的方法。 该方法包括提供制造设施的一组处理参数; 从一组处理参数创建模型; 将模型转换为相应的一组内核; 将所述内核集合转换成相应的矩阵集合; 并将该组矩阵传送到设计设施。 另一方面,公开了一种用于提供半导体制造处理参数的方法。 该方法包括提供制造设施的一组处理参数; 从一组处理参数创建一个处理模型; 将处理模型加密成与多个EDA工具一起使用的格式; 并将加密的处理模型格式传送到设计设施。
    • 14. 发明授权
    • Illumination device with anti-glare plate
    • 带防眩光板的照明装置
    • US08162513B2
    • 2012-04-24
    • US12621636
    • 2009-11-19
    • An-Chi WeiChih-Ming Lai
    • An-Chi WeiChih-Ming Lai
    • F21V5/00
    • F21S8/04F21V5/002F21V5/02F21Y2115/10G02B5/02G02B5/045
    • An exemplary illumination device includes a solid-state light source and an anti-glare plate. The solid-state light source is configured for generating light, and the solid-state light source defines a central axis. The anti-glare plate is arranged correspondingly generally adjacent to the solid-state light source. The plate includes an incident surface and an output surface at opposite sides thereof. The output surface has parallel micro-structures each have a length parallel to a first reference axis, and the micro-structures is arranged in two groups at opposite sides of the central axis. The micro-structures are configured for contracting a radiating range of the light entering the plate. Such contraction is along respective opposite directions of a second reference axis, and the second reference axis is substantially perpendicular to the first reference axis.
    • 示例性照明装置包括固态光源和防眩光板。 固态光源被配置为产生光,并且固态光源限定中心轴。 防眩光板通常相对于固态光源相对地布置。 板包括入射表面和在其相对侧的输出表面。 输出表面具有平行的微结构,每个微结构具有平行于第一参考轴的长度,并且微结构在中心轴的相对侧分布成两组。 微结构被配置为收缩进入板的光的辐射范围。 这种收缩沿着第二参考轴线的相反方向,并且第二参考轴线基本上垂直于第一参考轴线。
    • 17. 发明授权
    • Anti-glare indoor lamp
    • 防眩室内灯
    • US08104931B2
    • 2012-01-31
    • US12564711
    • 2009-09-22
    • Chih-Ming LaiAn-Chi Wei
    • Chih-Ming LaiAn-Chi Wei
    • F21V11/00
    • F21V17/02F21V5/02F21V9/08F21V17/101F21W2131/402F21Y2101/00F21Y2103/00F21Y2115/10
    • An exemplary anti-glare indoor lamp includes a shade, light source, and an optical sheet. The shade defines a receiving cavity therein and an opening at the bottom of the receiving cavity. The light source is received in the receiving cavity and positioned to emit light toward the opening. The optical sheet is arranged facing the opening and is sized to cover only part of the opening. The optical sheet is configured for reducing the brightness of the light passing therethrough, and is movable to cover a selected part of the opening. Therefore, the light reaching eyes of a user is reduced, and glare is avoided or at least mitigated.
    • 示例性的防眩室内灯包括遮光罩,光源和光学片。 遮光罩在其中限定了一个接收腔,在接收腔的底部形成一个开口。 光源被容纳在接收腔中并定位成朝向开口发射光。 光学片被布置成面向开口并且其尺寸被设计成仅覆盖开口的一部分。 光学片被配置为降低穿过其中的光的亮度,并且可移动以覆盖开口的选定部分。 因此,使用者的光到达眼睛减少,避免或至少减轻眩光。