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    • 11. 发明授权
    • Plating apparatus and method
    • 电镀装置及方法
    • US07112264B2
    • 2006-09-26
    • US10606956
    • 2003-06-27
    • Hidetoshi TsuzukiNoboru ToyamaYasuyoshi TakaiRyo HayashiYuichi SonodaMasumitsu IwataYusuke Miyamoto
    • Hidetoshi TsuzukiNoboru ToyamaYasuyoshi TakaiRyo HayashiYuichi SonodaMasumitsu IwataYusuke Miyamoto
    • C25D5/02C25D7/06C25D17/00
    • C25D7/0671C25D5/028
    • A plating apparatus includes a plating vessel for holding a plating bath containing at least metal ions, a conveying device for conveying a long conductive substrate and immersing the long conductive substrate in the plating bath, a facing electrode disposed in the plating bath so as to face one surface of the conductive substrate, a voltage application device for performing plating on the one surface of the conductive substrate by applying a voltage between the conductive substrate and the facing electrode, and a film-deposition suppression device fixedly disposed in the plating vessel so that at least a portion of the film-deposition suppression means is close to shorter-direction edges of the conductive substrate. At least a portion of the film-deposition suppression device close to the shorter-direction edges of the conductive substrate is conductive. By holding the conductive portion of the film-deposition suppression device and the conductive substrate at substantially the same potential, film deposition on the other surface of the conductive substrate is suppressed.
    • 电镀装置包括用于保持至少含有金属离子的电镀槽的电镀容器,用于输送长导电性基板并将长导电性基材浸渍在电镀槽中的输送装置,设置在镀浴中的面对电极, 导电基板的一个表面,通过在导电基板和对置电极之间施加电压在导电基板的一个表面上进行电镀的电压施加装置和固定地设置在电镀槽中的成膜抑制装置,使得 至少一部分成膜抑制装置接近导电基板的短边缘。 靠近导电基板的短边缘的薄膜沉积抑制装置的至少一部分是导电的。 通过将成膜抑制装置的导电部分和导电基板保持在基本相同的电位,抑制导电基板的另一个表面上的成膜。
    • 16. 发明授权
    • Method of producing thin film of zinc oxide, process for manufacturing photovoltaic element using its method, and photovoltaic element
    • 氧化锌薄膜的制造方法,使用其制造光电元件的方法和光电元件
    • US06544877B1
    • 2003-04-08
    • US09447239
    • 1999-11-23
    • Yuichi SonodaKozo AraoNoboru ToyamaYusuke Miyamoto
    • Yuichi SonodaKozo AraoNoboru ToyamaYusuke Miyamoto
    • C25D1100
    • H01L31/022425C25D9/08H01L21/02422H01L21/02425H01L21/02491H01L21/02532H01L21/02554H01L21/02628H01L31/056Y02E10/52
    • The method of the present invention is a method of producing a thin film of zinc oxide, which comprises immersing a counter electrode and a conductive substrate as a negative electrode in an aqueous solution containing nitrate ions and 0.05 mol/liter or more of zinc ions, and passing a current between the counter electrode and the conductive substrate to electrochemically deposit zinc oxide on the conductive substrate from the aqueous solution, thereby forming a thin film of zinc oxide, wherein a film forming rate of the thin film is varied at least one time midway during an electrolytic deposition reaction for forming the thin film. The present invention can provide the following meritorious advantages: it is possible to form a texture-structured thin film effective in optical confinement in a short time by using the above electrolytic deposition method advantageous for lowering a production cost, to prevent abnormal growth of a deposited film, to have a film surface excellent in uniformity and adhesion, and to improve photoelectric characteristics and promote mass productivity by applying the present invention to the stacked structure of a photovoltaic element.
    • 本发明的方法是一种氧化锌薄膜的制造方法,其特征在于,将含有硝酸根离子和0.05mol / l以上锌离子的水溶液中的相对电极和导电性基板作为负极浸渍, 并且在对电极和导电基板之间通过电流,以从电解液中将氧化锌从水溶液中沉积在导电性基板上,由此形成氧化锌薄膜,其中薄膜的成膜速度至少改变一次 在用于形成薄膜的电解沉积反应期间的中途。 本发明可以提供以下优点:通过使用有利于降低生产成本的上述电解沉积方法,可以在短时间内形成有效的光学限制的纹理结构薄膜,以防止沉积物的异常生长 膜具有均匀性和粘合性优异的膜表面,并且通过将本发明应用于光伏元件的堆叠结构来改善光电特性并提高质量生产率。
    • 19. 发明授权
    • Apparatus and process for producing zinc oxide film
    • 用于生产氧化锌膜的设备和方法
    • US06733650B2
    • 2004-05-11
    • US09897012
    • 2001-07-03
    • Yuichi SonodaKozo AraoNoboru ToyamaYusuke Miyamoto
    • Yuichi SonodaKozo AraoNoboru ToyamaYusuke Miyamoto
    • C25D706
    • C25D9/08C25D7/0614C25D21/18
    • Disclosed are a process for producing a zinc oxide film comprising the steps of transporting a conductive long substrate via above at least one electrode comprised of zinc in an electrodeposition bath held in an electrodeposition tank and applying an electric field between the electrode and the conductive long substrate, thereby forming a zinc oxide film on the conductive long substrate, the process comprising a first step of forming the zinc oxide film on a part of the conductive long substrate; a second step of stopping the application of the electric field and the transportation; and a third step of bringing at least a region of a part of the conductive long substrate being in contact with the electrodeposition bath in the second step into non-contact with the electrodeposition bath, and an apparatus suitably used for the process. The process and apparatus enables high-quality zinc oxide films to be produced.
    • 公开了一种生产氧化锌膜的方法,包括以下步骤:将导电长基材经由上述至少一个由锌组成的电极输送到保持在电沉积槽中的电沉积浴中并在电极和导电长基板之间施加电场 从而在导电性长基板上形成氧化锌膜,该方法包括在导电性长基板的一部分上形成氧化锌膜的第一工序; 停止电场和运输的应用的第二步; 以及第三步骤,使得在第二步骤中的导电长基板的与电沉积浴接触的部分的至少一部分区域与电沉积浴非接触,以及适合用于该方法的设备。 该方法和装置能够生产出高质量的氧化锌膜。