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11. 发明申请

US20090169372A1 METHOD OF PRODUCING A PROTECTIVE COATING, PROTECTIVE COATING, AND COMPONENT WITH A PROTECTIVE COATING 审中-公开
标题翻译：保护性涂料的生产方法，保护涂料和具有保护涂料的组分
公开(公告)号：US20090169372A1
公开(公告)日：2009-07-02
申请号：US12067274
申请日：2006-09-16
申请人： Christian Friedrich , Klaus Breitschwerdt
发明人： Christian Friedrich , Klaus Breitschwerdt
IPC分类号： F01D25/00 , C23C4/10
CPC分类号： C23C4/00 , C23C4/01 , Y02T50/67 , Y02T50/6765 , Y10T428/12486
摘要： A method for producing a wear-resistant, temperature-resistant, and corrosion-resistant protective coating for a component, in particular for components of a gas turbine, using thermal spraying, wherein during the application onto the component of the protective coating, which consists of a hard material-metal combination, in order to produce an abrasive surface a structuring of that surface of the protective coating that faces away from the component takes place, the hard material or materials consisting of boron nitride particles, titanium carbide particles, tungsten carbide particles, chromium carbide particles, and zirconium oxide particles, or a mixture thereof, and the hard materials having a particle size of 0.1 μm-200 μm, and the protective coating having a thickness of 10 μm-6.0 mm.
摘要翻译：一种用于制造用于组件的耐磨损，耐温和耐腐蚀的保护涂层的方法，特别是对于使用热喷涂的燃气轮机的部件，其中在施加到保护涂层的部件上时，其包括的硬质材料 - 金属组合，为了产生研磨表面，保护涂层的表面远离组分发生的结构，由氮化硼颗粒，碳化钛颗粒，碳化钨组成的硬质材料或材料颗粒，碳化铬颗粒和氧化锆颗粒或其混合物，以及具有0.1μm〜200μm的粒度的硬质材料，并且保护涂层的厚度为10μm〜6.0mm。

12. 发明授权

US07285228B2 Device and method for anisotropic plasma etching of a substrate, a silicon body in particular 有权
标题翻译：特别是用于各向异性等离子体蚀刻衬底，硅体的装置和方法
公开(公告)号：US07285228B2
公开(公告)日：2007-10-23
申请号：US10506457
申请日：2003-03-05
申请人： Franz Laermer , Klaus Breitschwerdt , Bernd Kutsch
发明人： Franz Laermer , Klaus Breitschwerdt , Bernd Kutsch
IPC分类号： C23F1/00
CPC分类号： H01L21/67069
摘要： A method and device for implementing the method for anisotropically plasma etching a substrate (e.g., silicon body). The device has a chamber and plasma source for generating a high-frequency electromagnetic alternating field and a reaction region for generating a plasma having reactive species, within the chamber, that is generated by the action of the alternating field on etching gas and passivation gas introduced at the same time but spatially separated from it. An arrangement defines at least one first zone acted on by the etching gas and at least one second zone acted on by the passivation gas in the reaction region. The device has a mixing region downstream of the reaction region in which the reactive species generated from the etching gas in the first zone and the reactive species generated from the passivation gas in the second zone are blended before they act on the substrate.
摘要翻译：一种用于实现用于各向异性等离子体蚀刻衬底（例如硅体）的方法的方法和装置。该装置具有用于产生高频电磁交变场的室和等离子体源，以及用于产生等离子体的反应区域，所述反应区域在室内产生，其通过蚀刻气体和钝化气体引入的交变场的作用而产生同时又与之空间分离。排列限定了至少一个由蚀刻气体起作用的第一区域和由反应区域中的钝化气体作用的至少一个第二区域。该装置具有在反应区域下游的混合区域，其中在第一区域内从蚀刻气体产生的反应物质和由第二区域中的钝化气体产生的反应物质在它们作用于基底之前被共混。

13. 发明授权

US07094706B2 Device and method for etching a substrate by using an inductively coupled plasma 有权
公开(公告)号：US07094706B2
公开(公告)日：2006-08-22
申请号：US10763010
申请日：2004-01-21
申请人： Klaus Breitschwerdt , Volker Becker , Franz Laermer , Andrea Schilp
发明人： Klaus Breitschwerdt , Volker Becker , Franz Laermer , Andrea Schilp
IPC分类号： H01L21/302
CPC分类号： H01J37/321 , H01J37/3266 , H01L21/3065
摘要： A device and a method for etching a substrate, in particular a silicon body, by using an inductively coupled plasma. A high-frequency electromagnetic alternating field is generated using an ICP source, and an inductively coupled plasma composed of reactive particles is generated by the action of a high-frequency electromagnetic alternating field on a reactive gas in a reactor. In addition, a static or time-variable magnetic field is generated between the substrate and the ICP source, for which purpose at least two magnetic field coils arranged one above the other are provided. The direction of the resulting magnetic field is also approximately parallel to the direction defined by the tie line connecting the substrate and the inductively coupled plasma. Finally, a first component magnetic field is generated with a first magnetic field coil, and a second component magnetic field which is equally strong at an equivalent site is generated with a second magnetic field coil, the two component magnetic fields being oriented in opposite directions.

14. 发明申请

US20050126710A1 Device and method for anisotropically plasma etching of a substrate, particularly a silicon body 有权
标题翻译：用于各向异性等离子体蚀刻衬底，特别是硅体的装置和方法
公开(公告)号：US20050126710A1
公开(公告)日：2005-06-16
申请号：US10506457
申请日：2003-03-05
申请人： Franz Laermer , Klaus Breitschwerdt , Bernd Kutsch
发明人： Franz Laermer , Klaus Breitschwerdt , Bernd Kutsch
IPC分类号： H01L21/00 , C23F1/00
CPC分类号： H01L21/67069
摘要： A method and device for implementing the method for anisotropically plasma etching a substrate (e.g., silicon body). The device has a chamber and plasma source for generating a high-frequency electromagnetic alternating field and a reaction region for generating a plasma having reactive species, within the chamber, that is generated by the action of the alternating field on etching gas and passivation gas introduced at the same time but spatially separated from it. An arrangement defines at least one first zone acted on by the etching gas and at least one second zone acted on by the passivation gas in the reaction region. The device has a mixing region downstream of the reaction region in which the reactive species generated from the etching gas in the first zone and the reactive species generated from the passivation gas in the second zone are blended before they act on the substrate.
摘要翻译：一种用于实现用于各向异性等离子体蚀刻衬底（例如硅体）的方法的方法和装置。该装置具有用于产生高频电磁交变场的室和等离子体源，以及用于产生等离子体的反应区域，所述反应区域在室内产生，其通过蚀刻气体和钝化气体引入的交变场的作用而产生同时又与之空间分离。排列限定了至少一个由蚀刻气体起作用的第一区域和由反应区域中的钝化气体作用的至少一个第二区域。该装置具有在反应区域下游的混合区域，其中在第一区域内从蚀刻气体产生的反应物质和由第二区域中的钝化气体产生的反应物质在它们作用于基底之前被共混。

15. 发明授权

US6119339A Nozzle ring for a gas turbine and method of manufacture thereof 有权
标题翻译：一种用于燃气轮机的喷嘴环及其制造方法
公开(公告)号：US6119339A
公开(公告)日：2000-09-19
申请号：US281987
申请日：1999-03-29
申请人： Karl-Hermann Richter , Josef Reischl , Hans Juergen Schmuhl , Klaus Breitschwerdt , Ulrich Knott , Siegfried Boettcher , Karlheinz Manier , Werner Humhauser
发明人： Karl-Hermann Richter , Josef Reischl , Hans Juergen Schmuhl , Klaus Breitschwerdt , Ulrich Knott , Siegfried Boettcher , Karlheinz Manier , Werner Humhauser
IPC分类号： F01D9/02 , F01D9/04 , B21D53/78
CPC分类号： F01D9/042 , Y02T50/673 , Y10T29/49321 , Y10T29/49323
摘要： A worked nozzle ring for a gas turbine, in particular an aircraft engine, having at least one shroud and at least one blade sheet arranged thereon, whereby in order to create a worked nozzle ring that is easy to manufacture, the blade sheet comprises, at the frontal side, at least one two-dimensionally profiled connecting space region that is placed in a profiled opening formed in the shroud by means of beam cutting and is connected therewith.
摘要翻译：一种用于燃气涡轮机，特别是飞机发动机的加工喷嘴环，其具有至少一个护罩和布置在其上的至少一个刀片，由此为了形成易于制造的加工喷嘴环，刀片包括在前侧，至少一个二维轮廓的连接空间区域，其通过光束切割放置在形成在护罩中的成型开口中并与其连接。

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