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    • 11. 发明授权
    • Test pattern for measuring contact resistance and method of manufacturing the same
    • 用于测量接触电阻​​的测试图案及其制造方法
    • US06734458B2
    • 2004-05-11
    • US10029390
    • 2001-12-28
    • Ki Seog KimYoung Seon YouKeun Woo LeeSung Kee Park
    • Ki Seog KimYoung Seon YouKeun Woo LeeSung Kee Park
    • H01L2358
    • H01L23/544H01L2223/54453H01L2924/0002H01L2924/00
    • The present invention relates to a test pattern for measuring a contact resistance and method of manufacturing the same. In order to confirm that a contact resistance suitable for a semiconductor device before an actual process for manufacturing the device is performed, the present invention designs a test pattern for measuring the contact resistance depending on a design rule of a line contact actually applied to an actual device. At this time, a first line contact region and a second line contact region are formed between a word line so that a line contact region can form a pair; a plurality of sources are formed in the first line contact region and a plurality of sources are formed in the second line contact region wherein neighboring sources are connected by diffusion layers so that the first line contact region and the second line contact region can be electrically connected; and a plurality of line contact patterns are formed so that the plurality of the sources can be electrically connected by every two in each of the first and second line contact regions wherein the line contact pattern formed in the first line contact region and the line contact pattern formed in the second line contact region are alternately positioned. Therefore, the present invention can allow current for measuring the resistance sequentially along the first line contact region and the second line contact region to measure the line contact resistance in which the contact resistance in every source portion is considered.
    • 本发明涉及一种测量接触电阻​​的测试图案及其制造方法。 为了确认在进行用于制造该器件的实际工艺之前适用于半导体器件的接触电阻,本发明根据实际应用于实际的线路接触的设计规则来设计用于测量接触电阻​​的测试图案 设备。 此时,在字线之间形成第一线接触区域和第二线路接触区域,使得线路接触区域可以形成一对; 多个源极形成在第一线路接触区域中,并且多个源极形成在第二线路接触区域中,其中相邻源极通过扩散层连接,使得第一线路接触区域和第二线路接触区域可以电连接 ; 并且形成多个线接触图案,使得多个源可以在形成在第一线接触区域中的线接触图案和线接触图案的第一和第二线路接触区域中的每一个中每两个电连接一次 形成在第二线接触区域中的交替位置。 因此,本发明可以允许沿着第一线路接触区域和第二线路接触区域依次测量电阻的电流来测量考虑到每个源极部分中的接触电阻的线路接触电阻。
    • 14. 发明授权
    • Row decoder in flash memory and erase method of flash memory cell using the same
    • 闪存中的行解码器和闪存单元的擦除方法使用相同
    • US06819597B2
    • 2004-11-16
    • US10614229
    • 2003-07-07
    • Ki Seog KimKeun Woo LeeSung Kee ParkYoo Nam Jeon
    • Ki Seog KimKeun Woo LeeSung Kee ParkYoo Nam Jeon
    • G11C1606
    • G11C16/08G11C16/16G11C29/70
    • Disclosed are a row decoder in a flash memory and erasing method in a flash memory cell using the same. The row decoder comprises a PMOS transistor having a gate electrode for receiving a first input signal as an input and connected between a first power supply terminal and a first node, a first NMOS transistor having a gate electrode for receiving the first input signal as an input and connected between the first node and a second node, a second NMOS transistor having a gate electrode for receiving the second input signal as an input and connected between the second node and a ground terminal, and a switching means having a gate electrode for receiving the third input signal as an input and connected between the second node and a second power supply terminal, wherein the first node is connected to word lines.
    • 本发明公开了一种闪速存储器中的行解码器和使用其的擦除方法。 行解码器包括具有用于接收第一输入信号作为输入并连接在第一电源端子和第一节点之间的栅电极的PMOS晶体管,具有用于接收第一输入信号作为输入的栅电极的第一NMOS晶体管 并连接在第一节点和第二节点之间的第二NMOS晶体管,具有用于接收第二输入信号作为输入并连接在第二节点和接地端子之间的栅电极的第二NMOS晶体管,以及具有栅电极的开关装置, 第三输入信号作为输入并连接在第二节点和第二电源端子之间,其中第一节点连接到字线。
    • 18. 发明授权
    • Flash memory device and method of manufacturing the same
    • 闪存装置及其制造方法
    • US07358560B2
    • 2008-04-15
    • US11479444
    • 2006-06-30
    • Keun Woo Lee
    • Keun Woo Lee
    • H01L29/788
    • H01L27/115H01L27/11519H01L27/11521
    • A non-volatile memory device includes a semiconductor substrate having an active region defined by isolation films that extend along a first direction. A control gate line extends along in a second direction perpendicular to the first direction. First and second floating gates are formed on the active region and below the control gate line. An island conductive line is formed between the first and second floating gates and within the isolation films. The island conductive line extends along the first direction and is configured to receive a voltage in order to prevent interference between the first and second floating gates.
    • 非易失性存储器件包括具有由沿着第一方向延伸的隔离膜限定的有源区的半导体衬底。 控制栅极线沿垂直于第一方向的第二方向延伸。 第一和第二浮栅形成在有源区和控制栅线下方。 岛状导电线形成在第一和第二浮栅之间以及隔离膜内。 岛状导电线沿着第一方向延伸并且被配置为接收电压,以便防止第一和第二浮动栅极之间的干扰。
    • 20. 发明授权
    • Structure for testing NAND flash memory and method of testing NAND flash memory
    • 用于测试NAND闪存的结构和测试NAND闪存的方法
    • US07031190B2
    • 2006-04-18
    • US10737571
    • 2003-12-16
    • Keun Woo Lee
    • Keun Woo Lee
    • G11C16/04
    • G11C29/50G11C16/04G11C16/0483G11C16/3418G11C16/3454G11C29/02G11C29/1201G11C29/50004G11C2029/1204G11C2029/5004
    • Provided is a structure for testing a NAND flash memory including a first string select transistor for controlling transfer of a voltage inputted via a first bit line; a first string having a plurality of flash memory cells, connected between the first string select transistor and a first source select transistor, and maintaining a program or erase state depending on a voltage inputted thereto; a second string select transistor for controlling transfer of a voltage inputted via a second bit line; a second string having a plurality of flash memory cells, connected between the second string select transistor and a second source select transistor, and maintaining the program or erase state depending on a voltage inputted thereto; and a measurement pad connected to a point where the first or second string select transistor and the flash memory cell are connected.
    • 提供了一种用于测试NAND闪存的结构,包括:用于控制经由第一位线输入的电压的传送的第一串选择晶体管; 连接在第一串选择晶体管和第一源选择晶体管之间的具有多个闪存单元的第一串,并且根据输入的电压保持编程或擦除状态; 第二串选择晶体管,用于控制经由第二位线输入的电压的传送; 具有连接在第二串选择晶体管和第二源极选择晶体管之间的多个闪存单元的第二串,并且根据输入的电压保持编程或擦除状态; 以及连接到第一或第二串选择晶体管和闪存单元的点连接的测量焊盘。