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    • 12. 发明授权
    • Plasma processing apparatus
    • 等离子体处理装置
    • US06954033B2
    • 2005-10-11
    • US10302666
    • 2002-11-21
    • Akira NakanoTadashi KumagaiTadahiro Ohmi
    • Akira NakanoTadashi KumagaiTadahiro Ohmi
    • H01L21/205H01J37/32H01J7/24C23C16/00
    • H01J37/32082H01J37/32183
    • A plasma processing apparatus of the present invention includes a matching circuit for impedance matching between a radio-frequency generator and a plasma processing chamber, and one or a plurality of impedance converting circuits provided between the matching circuit and the radio-frequency generator. The impedance converting circuit converts an impedance to decrease a difference in impedance to be matched by the matching circuit, thereby decreasing a change in the output impedance with a moving amount of a capacitance control of one of variable passive elements of the matching circuit, such as a load capacitor and a tuning capacitor. Therefore, a change in the impedance of the plasma processing chamber can be finely controlled.
    • 本发明的等离子体处理装置包括用于射频发生器和等离子体处理室之间的阻抗匹配的匹配电路,以及设置在匹配电路和射频发生器之间的一个或多个阻抗转换电路。 阻抗转换电路将阻抗转换为减小匹配电路匹配的阻抗差,从而通过匹配电路的可变无源元件之一的电容控制的移动量来减小输出阻抗的变化,例如 负载电容器和调谐电容器。 因此,可以精细地控制等离子体处理室的阻抗的变化。
    • 13. 发明授权
    • Plasma processing apparatus
    • 等离子体处理装置
    • US06270618B1
    • 2001-08-07
    • US09205800
    • 1998-12-04
    • Akira NakanoSung Chul KimKoichi FukudaYasuhiko KasamaTadahiro OhmiShoichi Ono
    • Akira NakanoSung Chul KimKoichi FukudaYasuhiko KasamaTadahiro OhmiShoichi Ono
    • C23F102
    • H01J37/32174C23C16/4405H01J37/32082
    • A plasma processing apparatus is provided which does not require replacement of a band eliminator according to a frequency used, which is capable of performing chamber cleaning without replacing a resonance circuit, and which is capable of performing plasma cleaning of the inside of the chamber without using a bellows. The plasma processing apparatus includes a resonance circuit (band eliminator) for causing series resonance with a microwave circuit formed of at least a susceptor electrode and a processing chamber in order to trap plasma between a plasma excitation electrode and the susceptor electrode when the surface of a workpiece placed on the susceptor electrode is processed by plasma generated between the plasma excitation electrode and the susceptor electrode, which are provided inside the processing chamber; and for causing parallel resonance with the microwave circuit in order to diffuse plasma inside the processing chamber when performing plasma cleaning.
    • 提供一种等离子体处理装置,其不需要根据所使用的频率来更换带除器,其能够执行腔室清洁而不更换谐振电路,并且能够在不使用腔室内进行等离子体清洁室内 一个波纹管。 等离子体处理装置包括用于与由至少一个基座电极和一个处理室形成的微波电路进行串联谐振的谐振电路(去波器),以便在等离子体激发电极和基座电极之间捕获等离子体时 放置在基座电极上的工件通过设置在处理室内部的等离子体激发电极和基座电极之间产生的等离子体进行处理; 并且用于与微波电路并联谐振,以便在进行等离子体清洗时在等离子体清洗中扩散处理室内的等离子体。
    • 19. 发明申请
    • OXYGEN-SUPPLY-CAPABLE COOLING WATER EQUIPMENT, FILTRATION EQUIPMENT AND FILTRATION-FUNCTION-EQUIPPED COOLING WATER EQUIPMENT INCORPORATED WITH THESE EQUIPMENT
    • 氧气供应冷却水设备,过滤设备和过滤功能设备冷却水设备与这些设备合并
    • US20070131596A1
    • 2007-06-14
    • US11457915
    • 2006-07-17
    • Hisashi MiyamotoAkira Nakano
    • Hisashi MiyamotoAkira Nakano
    • C02F3/04
    • A01K63/045A01K63/042F28C1/02
    • Filtration-function-equipped cooling water equipment that includes: filtration equipment connected to water-purifying, oxygen-supply-capable cooling water equipment, wherein the filtration equipment includes a filtration space for a filter, wherein the water-purifying, oxygen-supply-capable cooling water equipment comprises a cooling oxidation unit disposed inside of a tank body, and comprising a honeycombed or latticed porous material, wherein the filtration-function-equipped cooling water equipment operates to enlarge a contact area between water and air when untreated water drips onto the cooling oxidation unit and flows through the cooling oxidation unit while forced air flows in a counter current against the flow of water in the cooling oxidation unit, thereby facilitating solubility of oxygen in the untreated water and augmenting a cooling capability due to evaporation provided by the water-purifying, oxygen-supply-capable cooling water equipment.
    • 具有过滤功能的冷却水设备,包括:与净水,供氧能力的冷却水设备连接的过滤设备,其中过滤设备包括用于过滤器的过滤空间,其中净水,供氧 - 能够使用的冷却水设备包括设置在罐体内部的冷却氧化单元,并且包括蜂窝状或网状多孔材料,其中,过滤功能配备的冷却水设备用于当未处理的水滴入到其上时扩大水和空气之间的接触面积 冷却氧化单元,并且在强制空气以相反的流动相对于冷却氧化单元中的水流动流动时流过冷却氧化单元,从而促进氧在未处理水中的溶解度,并增加由于所提供的蒸发提供的蒸发的冷却能力 净水,供氧能力的冷却水设备。