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    • 14. 发明申请
    • RFID TAG
    • RFID标签
    • US20090115577A1
    • 2009-05-07
    • US12193364
    • 2008-08-18
    • Hiroshi KobayashiKenji KobaeTakashi KubotaHidehiko Kira
    • Hiroshi KobayashiKenji KobaeTakashi KubotaHidehiko Kira
    • H04Q5/22
    • G06K19/07749G06K19/07728G06K19/0775H01L2224/16225H01L2224/16227H01L2224/81191
    • An RFID tag includes: a sheet-like base; an antenna provided on the base and extending along the base; a circuit chip mounted on the base and connected to the antenna for performing radio communication through the antenna; a protection body wider than the circuit chip and narrower than the antenna, which is located at least either above the circuit chip or on a backside of the circuit chip with the base interposed therebetween for protecting the circuit chip; and a connection section provided as a portion of the antenna at a location where an edge of the protection body and the antenna intersect with each other as viewed from a direction intersecting with a surface of the base, which includes one or more conductor patterns narrower than other portion of the antenna, and which connects inner and outer antenna portions of the edge with each other.
    • RFID标签包括:片状基底; 设置在基座上并沿基座延伸的天线; 安装在基座上并连接到天线的电路芯片,用于通过天线进行无线电通信; 比电路芯片更宽的保护体,并且比天线窄,其位于电路芯片的上方或电路芯片的背面,其中插入基板,用于保护电路芯片; 以及连接部,其在从与所述基部的表面相交的方向观察时,在所述保护体和所述天线的边缘彼此相交的位置处设置为所述天线的一部分,所述方向包括一个或多个导体图案,所述导体图案比 天线的其他部分,并且将边缘的内天线部分和外天线部分彼此连接。
    • 15. 发明授权
    • Conductive microparticle, process for producing the same and anisotropic conductive material
    • 导电微粒,其制造方法和各向异性导电材料
    • US07507477B2
    • 2009-03-24
    • US11632148
    • 2005-07-14
    • Takashi Kubota
    • Takashi Kubota
    • B32B5/66
    • H01R4/04B22F1/025B22F2998/00C23C18/1635C23C18/1651C23C18/36C23C18/50C23C18/54H01B1/02H01B1/023H01B1/22H05K3/323Y10T428/2982Y10T428/2991Y10T428/2993Y10T428/2995Y10T428/2996B22F2207/07
    • It is an object of the present invention to provide a conductive fine particle having excellent conductivity, furthermore high adhesiveness with a core particle and little cohesion, a method for producing the conductive fine particle where the plating bath is highly stable and an anisotropic conductive material using the conductive fine particle.The present invention is a conductive fine particle, wherein an alloy plated coating film containing nickel, copper and phosphorous is formed on a surface of a core particle by an electroless plating method; preferably the conductive fine particle, wherein a content of phosphorous in the alloy plated coating film in a direction of a thickness is lower on a surface side of the alloy plated coating film than on a core particle side; a method for producing the conductive fine particle, wherein a first electroless plating reaction is carried out by adding a plating solution containing a nickel salt, a phosphorous reducing agent and a pH adjustor to an aqueous suspension of the core particles supporting a metal catalyst, and then, a second electroless plating reaction is carried out by adding a plating solution containing the nickel salt, a copper salt, the phosphorous based reducing agent and the pH adjustor.
    • 本发明的目的是提供一种导电性优良的导电性细颗粒,与芯颗粒的粘合性高,凝聚力小,电镀液高度稳定的导电性微粒的制造方法以及使用了各向异性导电材料的方法 导电细粒。 本发明是一种导电性细颗粒,其中通过化学镀方法在芯颗粒的表面上形成含有镍,铜和磷的合金镀覆膜; 优选所述导电性微粒,其中,所述合金镀覆膜中的厚度方向的磷的含量比所述合金镀覆膜的表面侧比所述芯粒子侧低。 一种导电性微粒的制造方法,其中,通过将含有镍盐,磷还原剂和pH调节剂的电镀溶液添加到负载金属催化剂的核粒子的水性悬浮液中,进行第一无电镀电镀反应,以及 然后,通过加入含有镍盐,铜盐,磷系还原剂和pH调节剂的电镀液进行第二无电镀反应。
    • 18. 发明授权
    • Aluminum alloy thin film target material and method for forming thin film using the same
    • 铝合金薄膜靶材及使用其形成薄膜的方法
    • US06592812B1
    • 2003-07-15
    • US09787434
    • 2001-03-26
    • Takashi KubotaHiroshi Watanabe
    • Takashi KubotaHiroshi Watanabe
    • C22C2106
    • C23C14/3414C22C21/06C23C14/14
    • The present invention provides a heat-resistant and low-electric-resistance aluminum alloy thin film which, even after heat treatment at 300-400° C., exhibits no hillock generation and has a specific resistance of 7 &mgr;&OHgr;·cm or less and also provides a sputtering target material employed for forming such aluminum alloy thin film. The thin film of aluminum alloy of the present invention contains, as components of the alloy, aluminum, carbon, and magnesium, wherein the carbon content and the magnesium content fall within a region defined by the following formulas: X=0.61; X=8; Y=2; and Y=−0.13X+1.3, wherein Y (at %) represents the carbon content by atomic percent and X (at %) represents the magnesium content by atomic percent, and the balance of (X+Y) contains aluminum and unavoidable impurities. The sputtering target material of the present invention for forming thin film of aluminum alloy, containing, as components of the material, aluminum, carbon, magnesium, and unavoidable impurities, wherein the carbon content and the magnesium content fall within a region defined by the aforementioned formulas, and the balance of (X+Y) is aluminum and unavoidable impurities.
    • 本发明提供一种耐热低电阻铝合金薄膜,即使在300-400℃热处理后,也不发生小丘产生,电阻率为7μΩEG·cm以下, 提供了用于形成这种铝合金薄膜的溅射靶材料。 本发明的铝合金薄膜作为合金成分,含有铝,碳,镁,其中碳含量和镁含量在下述式所定义的范围内:其中Y(at%)表示 碳原子百分比和X(原子%)表示原子百分比的镁含量,(X + Y)的余量包含铝和不可避免的杂质。 本发明的用于形成铝合金薄膜的溅射靶材料,其含有作为材料成分的铝,碳,镁和不可避免的杂质,其中碳含量和镁含量落入由上述 式中,(X + Y)的平衡是铝和不可避免的杂质。