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    • 20. 发明授权
    • Magnetoresistance element, with lower electrode anti-erosion/flaking layer
    • 磁阻元件,具有较低的电极抗侵蚀/剥落层
    • US06493195B1
    • 2002-12-10
    • US09651068
    • 2000-08-30
    • Kazuhiko HayashiKeishi OhashiNobuyuki IshiwataMasafumi NakadaEizo FukamiHiroaki HonjoHisanao TsugeAtsushi Kamijo
    • Kazuhiko HayashiKeishi OhashiNobuyuki IshiwataMasafumi NakadaEizo FukamiHiroaki HonjoHisanao TsugeAtsushi Kamijo
    • G11B5127
    • B82Y25/00B82Y10/00B82Y40/00G01R33/09G11B5/3133G11B5/3163G11B5/3903G11B5/3909G11B5/40H01F10/3268H01F41/302
    • A magnetoresistance element includes a lower electrode layer, a magnetoresistance effect layer, an upper electrode layer and a lower electrode anti-erosion/flaking layer. The lower electrode anti-erosion/flaking layer, which is formed before a photoresist layer remaining on the patterned lower electrode layer is removed, is formed around the lower electrode layer so that its edge facing the lower electrode layer will be in contact with the edge of the lower electrode layer. By use of the lower electrode anti-erosion/flaking layer, the edge of the lower electrode layer is protected from being exposed to a release agent containing a dissolved photoresist in a photoresist layer removal step (when the photoresist layer remaining on the patterned lower electrode layer is removed), thereby the increase of roughness of the edge of the lower electrode layer due to erosion/flaking of the edge in the photoresist removal step can be avoided, and thereby electrical shorts between the upper electrode layer and the lower electrode layer can be eliminated, and thereby a magnetoresistance element of high sensitivity and high performance can be obtained and manufacturing yield of the magnetoresistance elements can be improved.
    • 磁阻元件包括下电极层,磁阻效应层,上电极层和下电极抗侵蚀/剥落层。 在除去形成在图案化的下电极层上的光致抗蚀剂层之前形成的下电极抗腐蚀/剥离层围绕下电极层形成,使得其面向下电极层的边缘将与边缘 的下电极层。 通过使用下电极抗腐蚀/剥落层,在光致抗蚀剂层去除步骤中(当残留在图案化的下电极上的光致抗蚀剂层时,保护下电极层的边缘不暴露于含有溶解的光致抗蚀剂的脱模剂 层),由此可以避免由于光致抗蚀剂去除步骤中的边缘的侵蚀/剥落引起的下电极层的边缘的粗糙度的增加,从而可以使上电极层和下电极层之间的电短路 从而可以获得高灵敏度和高性能的磁阻元件,并且可以提高磁阻元件的制造成品率。