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11. 发明授权

US4820899A Laser beam working system 失效
标题翻译：激光束工作系统
公开(公告)号：US4820899A
公开(公告)日：1989-04-11
申请号：US161944
申请日：1988-02-29
申请人： Ikuo Hikima , Akira Miyaji , Saburo Kamiya , Akikazu Tanimoto
发明人： Ikuo Hikima , Akira Miyaji , Saburo Kamiya , Akikazu Tanimoto
IPC分类号： B23K26/067 , H01R43/02 , B23K26/00
CPC分类号： B23K26/0673 , B23K26/067 , H01R43/0221
摘要： A laser working system comprises supplying means for supplying a laser beam, a working unit which includes a stage for supporting a workpiece and means for exposing the workpiece to the laser beam, and a room unit which includes wall means for surrounding the working unit and accomodates the working unit to spatially isolate it from outside of the wall means. The supplying means is arranged outside the room unit and includes first and second laser units each for generating the laser beam.The laser working system further comprises beam guiding means which creates first light path for optically communicating the first laser unit with the working unit through the wall means, and second light path for optically communicating the second laser unit with the working unit through the wall means, respectively.
摘要翻译：一种激光加工系统，包括用于供应激光束的供给装置，包括用于支撑工件的台和用于将工件暴露于激光束的装置的工作单元，以及包括用于围绕工作单元并适应工作单元将其与墙壁外部空间隔离。供给装置设置在房间单元的外部，并且包括用于产生激光束的第一和第二激光单元。所述激光加工系统还包括光束引导装置，所述光束引导装置产生用于通过所述壁装置将所述第一激光单元与所述工作单元光学连通的第一光路，以及用于通过所述壁装置将所述第二激光单元与所述作业单元光学连通的第二光路，分别。

12. 发明授权

US4690528A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US4690528A
公开(公告)日：1987-09-01
申请号：US656746
申请日：1984-10-01
申请人： Akikazu Tanimoto , Kazunori Imamura
发明人： Akikazu Tanimoto , Kazunori Imamura
IPC分类号： G03F7/20 , G03F7/207 , G03B3/10
CPC分类号： G03F7/70241 , G03F7/70858 , G03F7/70883 , G03F7/70891
摘要： A projection exposure apparatus used to project a minute pattern formed on a photomask or reticle onto a semiconductive wafer has a stabilized image-forming performance. The apparatus comprises a projection lens system including a plurality number of lens elements spaced apart from each other, means for supplying a gas flow to at least one of spaces through which the gas passes, means for isolating the space(s) supplied with gas from atmosphere and means for changing the refractive index of the isolated space(s).
摘要翻译：用于将形成在光掩模或掩模版上的微小图案投影到半导体晶片上的投影曝光装置具有稳定的图像形成性能。该装置包括投影透镜系统，该投影透镜系统包括彼此间隔开的多个透镜元件，用于向气体通过的空间中的至少一个供应气流的装置，用于将供应气体的空间与气氛和用于改变隔离空间的折射率的装置。

13. 发明授权

US4677301A Alignment apparatus 失效
标题翻译：校准装置
公开(公告)号：US4677301A
公开(公告)日：1987-06-30
申请号：US681843
申请日：1984-12-14
申请人： Akikazu Tanimoto , Toshio Matsuura , Seiro Murakami , Makoto Uehara , Kyoichi Suwa
发明人： Akikazu Tanimoto , Toshio Matsuura , Seiro Murakami , Makoto Uehara , Kyoichi Suwa
IPC分类号： G03B27/53 , B65G1/00 , G03F9/00 , H01L21/027 , H01L21/30 , G01N21/86 , H01J3/14
CPC分类号： G03F9/70
摘要： A position alignment apparatus aligns a photosensitive substrate and a mask (projection image) at high speed and with high precision. The apparatus has a projection optical system for projecting a pattern image on a mask or reticle onto a photosensitive substrate, a detector for detecting a two-dimensional misalignment of a projected pattern image and a wafer, and means for moving the wafer along orthogonal x- and y-axis directions and for rotating the wafer along a rotational direction within a plane defined by the x- and y-axis directions so as to eliminate the misalignment, wherein the detector has first detecting means with an optical system for detecting at least a misalignment of the wafer along the x-axis direction through the projection lens, and second detecting means with an optical system separate from the projection lens and for detecting at least a misalignment of the wafer along a rotational direction.
摘要翻译：位置对准装置以高精度和高精度对准感光基片和掩模（投影图象）。该装置具有用于将掩模或掩模版上的图案图像投影到感光基板上的投影光学系统，用于检测投影图案图像和晶片的二维未对准的检测器，以及用于沿正交x轴移动晶片的装置，和y轴方向，并且用于在由x轴方向和y轴方向限定的平面内沿着旋转方向旋转晶片，以消除所述未对准，其中所述检测器具有第一检测装置，其具有用于检测至少一个晶片沿着x轴方向通过投影透镜偏移，以及第二检测装置，其具有与投影透镜分离的光学系统，并用于至少检测晶片沿旋转方向的不对准。

14. 发明授权

US4586822A Inspecting method for mask for producing semiconductor device 失效
标题翻译：半导体器件制造掩模检测方法
公开(公告)号：US4586822A
公开(公告)日：1986-05-06
申请号：US620825
申请日：1984-06-15
申请人： Akikazu Tanimoto
发明人： Akikazu Tanimoto
IPC分类号： G01N21/94 , G03F1/84 , G01N21/00
CPC分类号： G03F1/84 , G01N21/94
摘要： A method for inspecting the presence of foreign particles on a mask comprising the steps of forming alignment marks on a wafer onto which the pattern is trially replicated, aligning projected images by means of the alignment marks to form overlapped images of the pattern of a mask to be inspected and the pattern of another mask in which the light and dark areas are inverted on a photosensitive material on the wafer, and inspecting the exposure status of the photosensitive material on the wafer after development to identify defects such as foreign particles attached to the mask to be inspected.
摘要翻译：一种用于检查掩模上外来颗粒的存在的方法，包括以下步骤：在其上三维复制图案的晶片上形成对准标记，借助于对准标记对准投影图像，以形成掩模图案的重叠图像被检查，并且其中光和暗区域在晶片上的感光材料上反转的另一个掩模的图案，并且在显影之后检查在晶片上的感光材料的曝光状态，以识别诸如附着在掩模上的异物的缺陷被检查。

15. 发明授权

US08174668B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US08174668B2
公开(公告)日：2012-05-08
申请号：US11767425
申请日：2007-06-22
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liquid to a space between the projection system and the substrate table, and a cleaning system which cleans the substrate table.
摘要翻译：光刻设备包括：保持基板的基板台，将图案化的辐射束投射到基板上的投影系统，投影系统具有邻近基板的最终光学元件;液体供应系统，投影系统和衬底台，以及清洁衬底台的清洁系统。

16. 发明授权

US08072576B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US08072576B2
公开(公告)日：2011-12-06
申请号：US11808231
申请日：2007-06-07
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译：提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板投影光学系统的像平面附近。

17. 发明申请

US20080225250A1 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20080225250A1
公开(公告)日：2008-09-18
申请号：US12153357
申请日：2008-05-16
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is different from the substrate. In the exposure operation, the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the substrate. In a cleaning operation, the member is moved to a position at which the surface of the member faces the optical element, and the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the surface of the member.
摘要翻译：液浸曝光装置包括光学元件，在曝光操作中将图案化的光束投射到基板上，液体供应系统具有供给端口，供给端口具有曝光液体，以及具有不同表面的部件从底物。在曝光操作中，液体供应系统将曝光液体从供给口提供到光学元件和基板之间的空间。在清洁操作中，构件移动到构件的表面面向光学元件的位置，并且液体供应系统将曝光液体从供给口提供到光学元件与构件表面之间的空间。

18. 发明授权

US07388649B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US07388649B2
公开(公告)日：2008-06-17
申请号：US11284187
申请日：2005-11-22
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译：提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板投影光学系统的像平面附近。

19. 发明授权

US06704088B2 Environmental-control method and apparatus for an exposure system 失效
标题翻译：曝光系统的环境控制方法和装置
公开(公告)号：US06704088B2
公开(公告)日：2004-03-09
申请号：US10323742
申请日：2002-12-20
申请人： Akikazu Tanimoto
发明人： Akikazu Tanimoto
IPC分类号： G03B2752
CPC分类号： G03F7/70883 , G03B27/52 , G03F7/70933
摘要： A specified gas is supplied into a chamber where masks or reticles to be exposed are arranged. Part of the air-gas mixture within the chamber is exhausted into the atmosphere. After that, when the gas within the chamber reaches a specified concentration, part of the air-gas mixture within the chamber is circulated and an appropriate concentration of gas is supplied to the chamber.
摘要翻译：将指定的气体供给到要暴露的掩模或掩模版布置的室中。室内气体混合物的一部分被排放到大气中。之后，当室内的气体达到规定的浓度时，室内的一部分空气 - 气体混合物循环，并向腔室供应合适浓度的气体。

20. 发明授权

US5151749A Method of and apparatus for measuring coordinate position and positioning an object 失效
标题翻译：用于测量坐标位置和定位物体的方法和装置
公开(公告)号：US5151749A
公开(公告)日：1992-09-29
申请号：US707925
申请日：1991-05-28
申请人： Akikazu Tanimoto , Saburo Kamiya
发明人： Akikazu Tanimoto , Saburo Kamiya
IPC分类号： G01B9/02 , G01B11/00 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70716 , G01B11/005 , G01B9/02018 , G01B9/02019 , G01B9/02021 , G01B9/02027 , G01B9/02061 , G03F7/70725 , G03F7/70775 , G03F9/70
摘要： A method and apparatus for measuring the coordinate position of a stage on which a semiconductor wafer or the like is placed. Two .theta. interferometers are provided as measuring means for detecting local curving deviations of reflecting surfaces of two plane mirrors perpendicular to each other which mirrors are provided on the stage for detection of the coordinate position of the stage based on the use of light wave interferometers. The curving deviations of the reflecting surfaces of the plane mirrors are measured with the .theta. interferometers to calculate the difference thereby measured and, hence, the true curving deviations of the reflecting surfaces while cancelling out errors in linear movement of the stage. The position of the stage measured with the coordinate position measuring light wave interferometers is corrected by values corresponding to the true curving deviations.
摘要翻译：一种用于测量其上放置半导体晶片等的台的坐标位置的方法和装置。提供两个θ干涉仪作为测量装置，用于检测垂直于彼此的两个平面镜的反射表面的局部弯曲偏差，这些反射镜设置在舞台上，用于基于使用光波干涉仪来检测舞台的坐标位置。使用θ干涉仪测量平面镜的反射面的弯曲偏差，以计算反射面的真实弯曲偏差，从而计算反射面的真实弯曲偏差，同时消除平台的线性运动中的误差。用坐标位置测量光波干涉仪测量的平台的位置通过对应于真实弯曲偏差的值来校正。

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