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    • 18. 发明授权
    • Method of manufacturing a microarray
    • 微阵列的制造方法
    • US07667032B2
    • 2010-02-23
    • US11748175
    • 2007-05-14
    • Jung-hwan HahSung-min ChiKyoung-seon KimWon-sun Kim
    • Jung-hwan HahSung-min ChiKyoung-seon KimWon-sun Kim
    • C07H21/00C07H21/02C12Q1/68
    • B01J19/0046B01J2219/00382B01J2219/00432B01J2219/00527B01J2219/00585B01J2219/00596B01J2219/00605B01J2219/00659B01J2219/00711B01J2219/00722B82Y30/00C40B50/18
    • A method of manufacturing a microarray includes providing a substrate having a surface that is immobilized with a functional group protected with an acid-labile protecting group and capable of coupling with an oligomer probe, providing a photoacid generator onto the substrate, disposing on the substrate an imprint template comprising a convex region and a plurality of concave regions surrounding the convex region so that the convex region contacts with or is adjacent to an upper surface of the substrate to define a plurality of reaction zones by the upper surface of the substrate and the convex region and the concave regions of the imprint template, exposing one or more of the reaction zones to light so that an acid is generated by the photoacid generator in the one or more exposed reaction zones and a functional group in the one or more exposed reaction zones is deprotected by the acid, and providing an oligomer probe onto the substrate so that the oligomer probe couples with the deprotected functional group.
    • 一种制造微阵列的方法包括提供具有固定有被酸不稳定保护基团保护的官能团并且能够与低聚物探针耦合的表面的基底,在基底上提供光致酸产生剂,在基底上设置 压印模板,其包括凸区域和围绕所述凸区域的多个凹区域,使得所述凸区域与所述衬底的上表面接触或邻近所述衬底的上表面,以通过所述衬底的上表面和所述凸起部分限定多个反应区域 区域和压印模板的凹区域,使一个或多个反应区域曝光,使得在一个或多个暴露的反应区域中的光酸产生剂产生酸,并且在一个或多个暴露的反应区域中的官能团 通过酸脱保护,并在基底上提供低聚物探针,使得寡聚物探针与沉淀物结合 无效的功能组。