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11. 发明授权

US07981589B2 Fluorinated monomer, fluorinated polymer, resist composition and patterning process 有权
标题翻译：氟化单体，含氟聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07981589B2
公开(公告)日：2011-07-19
申请号：US12146375
申请日：2008-06-25
申请人： Koji Hasegawa , Takeshi Kinsho , Katsuhiro Kobayashi , Tsunehiro Nishi , Takeru Watanabe
发明人： Koji Hasegawa , Takeshi Kinsho , Katsuhiro Kobayashi , Tsunehiro Nishi , Takeru Watanabe
IPC分类号： G03F7/004 , C08F32/04 , C08F32/08
CPC分类号： C07C69/67 , C07C69/753 , C07C2601/08 , C07C2602/42 , C08F220/24 , C08F220/26 , C08F232/08 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： Fluorinated monomers of formula (1) are useful in producing polymers for the formulation of radiation-sensitive resist compositions. R1 is H or monovalent C1-C20 hydrocarbon group, R2 is H, F, methyl or trifluoromethyl, R3 and R4 are H or a monovalent C1-C8 hydrocarbon group, or R3 and R4 may form an aliphatic hydrocarbon ring, and A is a divalent C1-C6 hydrocarbon group
摘要翻译：式（1）的氟化单体可用于制备用于制备辐射敏感抗蚀剂组合物的聚合物。 R1是H或一价C1-C20烃基，R2是H，F，甲基或三氟甲基，R3和R4是H或一价C1-C8烃基，或R3和R4可以形成脂族烃环，A是二价C1-C6烃基

12. 发明授权

US07928262B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process 有权
公开(公告)号：US07928262B2
公开(公告)日：2011-04-19
申请号：US11767783
申请日：2007-06-25
申请人： Katsuhiro Kobayashi , Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe
发明人： Katsuhiro Kobayashi , Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe
IPC分类号： C07C309/08 , G03C1/00 , G03F7/00
CPC分类号： C07C381/12 , C07C309/08 , C07C381/00 , C07D333/46 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/0757 , G03F7/0758 , G03F7/2041
摘要： Sulfonate salts have the formula: HOCH2CH2CF2CF2SO3−M+ wherein M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oxime sulfonates and sulfonyloxyimides derived from these salts are effective photoacid generators in chemically amplified resist compositions.

13. 发明授权

US07569324B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process 有权
标题翻译：磺酸盐和衍生物，光酸产生剂，抗蚀剂组合物和图案化方法
公开(公告)号：US07569324B2
公开(公告)日：2009-08-04
申请号：US11767821
申请日：2007-06-25
申请人： Katsuhiro Kobayashi , Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe
发明人： Katsuhiro Kobayashi , Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe
IPC分类号： G03F7/00 , G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： C07C381/12 , C07C309/00 , C07C309/12 , C07C2601/14 , C07C2603/74 , C07D207/48 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , Y10S430/114 , Y10S430/115
摘要： Sulfonate salts have the formula: R1COOCH2CH2CF2CF2SO3−M+ wherein R1 is alkyl, aryl or hetero-aryl, M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oxime sulfonates and sulfonyloxyimides derived from these salts are effective photoacid generators in chemically amplified resist compositions.
摘要翻译：磺酸盐具有下式：R1COOCH2CH2CF2CF2SO3-M +，其中R1是烷基，芳基或杂芳基，M +是Li，Na，K，铵或四甲基铵离子。衍生自这些盐的鎓盐，肟磺酸盐和磺酰氧基酰亚胺是化学放大抗蚀剂组合物中有效的光酸产生剂。

14. 发明授权

US07556909B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process 有权
标题翻译：磺酸盐和衍生物，光酸产生剂，抗蚀剂组合物和图案化方法
公开(公告)号：US07556909B2
公开(公告)日：2009-07-07
申请号：US11588414
申请日：2006-10-27
申请人： Katsuhiro Kobayashi , Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe , Masaki Ohashi
发明人： Katsuhiro Kobayashi , Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe , Masaki Ohashi
IPC分类号： G03F7/00 , G03F7/004 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0045 , C07C309/08 , C07C381/12 , G03F7/0392 , Y10S430/114 , Y10S430/115
摘要： Sulfonate salts have the formula: CF3—CH(OH)—CF2SO3−M+ wherein M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Because of inclusion within the molecule of a hydroxyl group which is a polar group, the sulfonic acids are effective for restraining the length of acid diffusion through hydrogen bond or the like. The photoacid generators that generate these sulfonic acids perform well during the device fabrication process including coating, pre-baking, exposure, post-exposure baking, and developing steps. The photoacid generators are little affected by water left on the wafer during the ArF immersion lithography.
摘要翻译：磺酸盐具有式：CF 3 -CH（OH）-CF 2 SO 3 -M +，其中M +是Li，Na，K，铵或四甲基铵离子。由于在分子内包含作为极性基团的羟基，所以磺酸对于抑制通过氢键等的酸扩散的长度是有效的。产生这些磺酸的光酸产生剂在器件制造过程中表现良好，包括涂层，预烘焙，曝光，曝光后烘烤和显影步骤。在ArF浸没光刻期间，光致酸发生器几乎不受水晶体上剩余的水分的影响。

15. 发明授权

US07511169B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process 有权
标题翻译：磺酸盐和衍生物，光酸产生剂，抗蚀剂组合物和图案化方法
公开(公告)号：US07511169B2
公开(公告)日：2009-03-31
申请号：US11397526
申请日：2006-04-05
申请人： Youichi Ohsawa , Takeru Watanabe , Takeshi Kinsho , Katsuhiro Kobayashi
发明人： Youichi Ohsawa , Takeru Watanabe , Takeshi Kinsho , Katsuhiro Kobayashi
IPC分类号： C07C309/06 , G03F7/004
CPC分类号： C07C309/12 , C07C381/12 , C07D307/64 , C07D307/68 , C07D333/46 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/126
摘要： Sulfonate salts have the formula: CF3—CH(OCOR)—CF2SO3−M+ wherein R is C1-C20 alkyl or C6-C14 aryl, and M+ is a lithium, sodium, potassium, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions.
摘要翻译：磺酸盐具有式：CF 3 -CH（OCOR）-CF 2 SO 3 -M +，其中R是C 1 -C 20烷基或C 6 -C 14芳基，M +是锂，钠，钾，铵或四甲基铵离子。鎓盐，肟磺酸盐和磺酰氧基酰亚胺以及衍生自这些磺酸盐的其它化合物是化学放大抗蚀剂组合物中有效的光致酸产生剂。

16. 发明授权

US07276324B2 Nitrogen-containing organic compound, resist composition and patterning process 有权
标题翻译：含氮有机化合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07276324B2
公开(公告)日：2007-10-02
申请号：US10984933
申请日：2004-11-10
申请人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Katsuya Takemura , Kazumi Noda , Katsuhiro Kobayashi
发明人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Katsuya Takemura , Kazumi Noda , Katsuhiro Kobayashi
IPC分类号： G03C1/73 , G03F7/038 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0382
摘要： Chemically amplified resist compositions comprising nitrogen-containing organic compounds having an aromatic carboxylic acid ester structure have an excellent resolution and provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light.
摘要翻译：包含具有芳族羧酸酯结构的含氮有机化合物的化学扩增抗蚀剂组合物具有优异的分辨率并提供精确的图案轮廓，并且可用于使用电子束或深紫外光的微细加工。

17. 发明授权

US06713612B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process 有权
标题翻译：磺酰基重氮甲烷，光酸产生剂，抗蚀剂组合物和图案化工艺
公开(公告)号：US06713612B2
公开(公告)日：2004-03-30
申请号：US10426623
申请日：2003-05-01
申请人： Katsuhiro Kobayashi , Youichi Ohsawa , Koji Hasegawa , Takao Yoshihara , Kazunori Maeda , Toshihiko Fujii
发明人： Katsuhiro Kobayashi , Youichi Ohsawa , Koji Hasegawa , Takao Yoshihara , Kazunori Maeda , Toshihiko Fujii
IPC分类号： C07C24514
CPC分类号： G03F7/0382 , C07C317/28 , G03F7/0045 , G03F7/0392
摘要： Sulfonyldiazomethane compounds containing a long-chain alkylcyclohexyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development.
摘要翻译：含有长链烷基环己基的磺酰基重氮甲烷化合物是新颖的，可用作光致酸发生剂。包含该化合物的化学放大型抗蚀剂组合物由于包括改进的分辨率，改善的聚焦纬度，最小化的线宽变化或最小化的线宽变化或形状退化，甚至在长时间的PED，最小的残留在涂层，显影和剥离之后的碎片以及改进的许多优点也适用于微细加工。开发后的图案样式。

18. 发明授权

US07565774B2 Seismic isolation apparatus 有权
标题翻译：隔震装置
公开(公告)号：US07565774B2
公开(公告)日：2009-07-28
申请号：US11294438
申请日：2005-12-06
申请人： Takahisa Shizuku , Masami Kikuchi , Katsuhiro Kobayashi , Yoshikatsu Sakai , Wataru Seki , Takashi Yokoi
发明人： Takahisa Shizuku , Masami Kikuchi , Katsuhiro Kobayashi , Yoshikatsu Sakai , Wataru Seki , Takashi Yokoi
IPC分类号： E04H9/00 , E04B1/98 , F16M13/00
CPC分类号： E04H9/022
摘要： A seismic isolation apparatus features damping characteristics equivalent to or better than prior art, without burdening the environment. In this seismic isolation apparatus, a cylindrical cavity portion is formed at the middle of an outer side laminated body, which has a form in which respective pluralities of resiliently deformable rubber rings and metal rings for maintaining rigidity are alternately laminated. A helically formed coil spring is disposed in this cavity portion so as to be snugly fitted. An inner side laminated body, which has a form in which respective pluralities of resiliently deformable rubber plates and metal plates for maintaining rigidity are alternately laminated, is disposed at an inner peripheral side of the coil spring.
摘要翻译：抗震隔离装置具有与现有技术相当或优于现有技术的阻尼特性，而不会对环境造成负担。在该隔震装置中，在外侧层叠体的中央部形成有圆筒状的空腔部，该外侧层叠体的形状为多个可弹性变形的橡胶环和保持刚性的金属环交替层叠。螺旋形螺旋弹簧设置在该空腔部分中以便紧密配合。具有多个可弹性变形的橡胶板和用于保持刚性的金属板交替层叠的形式的内侧层叠体设置在螺旋弹簧的内周侧。

19. 发明授权

US07211367B2 Photo acid generator, chemical amplification resist material 有权
标题翻译：照片酸发生器，化学放大抗蚀材料
公开(公告)号：US07211367B2
公开(公告)日：2007-05-01
申请号：US11373925
申请日：2006-03-13
申请人： Tomohiro Kobayashi , Satoshi Watanabe , Tsunehiro Nishi , Youichi Ohsawa , Katsuhiro Kobayashi
发明人： Tomohiro Kobayashi , Satoshi Watanabe , Tsunehiro Nishi , Youichi Ohsawa , Katsuhiro Kobayashi
IPC分类号： G03F7/031
CPC分类号： G03F7/0045 , C07D327/06 , G03F7/0395 , G03F7/0397 , G03F7/0758
摘要： A high resolution resist material comprising an acid generator is provided so that high sensitivity and high resolution for high energy rays of 300 nm or less, small line-edge roughness, and excellence in heat stability and storage stability are obtained. Moreover, a pattern formation method using this resist material are provided. Specifically, a novel compound of the following general formula (1); and a positive resist material comprising this compound preferably as a photo acid generator, and a base resin; are provided. This positive resist material may contain a basic compound or a dissolution inhibitor. Further, the present invention provides a pattern formation method comprising the steps of applying this positive resist material on a substrate, then heat-treating the material, exposing the treated material to a high energy ray having a wavelength of 300 nm or less via a photo mask, optionally heat-treating the exposed material, and developing the material using a developer
摘要翻译：提供了包含酸产生器的高分辨率抗蚀剂材料，从而获得了300nm以下的高能量射线的高灵敏度和高分辨率，小的线边缘粗糙度，以及热稳定性和储存稳定性方面的优异性。此外，提供了使用该抗蚀剂材料的图案形成方法。具体地，下述通式（1）的新化合物; 以及优选含有该化合物作为光酸发生剂的正性抗蚀剂材料和基础树脂; 被提供。该正性抗蚀剂材料可含有碱性化合物或溶解抑制剂。此外，本发明提供了一种图案形成方法，包括以下步骤：将该正性抗蚀剂材料涂布在基板上，然后对该材料进行热处理，通过照片将经处理的材料暴露于波长为300nm以下的高能量射线掩模，任选地热处理暴露的材料，以及使用显影剂显影材料

20. 发明申请

US20070021234A1 Golf club 有权
标题翻译：高尔夫俱乐部
公开(公告)号：US20070021234A1
公开(公告)日：2007-01-25
申请号：US11482117
申请日：2006-07-07
申请人： Masaei Tsurumaki , Katsuhiro Kobayashi , Takayuki Ando
发明人： Masaei Tsurumaki , Katsuhiro Kobayashi , Takayuki Ando
IPC分类号： A63B53/00
CPC分类号： A63B53/0466 , A63B2053/0416 , A63B2053/0433 , A63B2053/045
摘要： In a driver golf head (1) comprising a face (4) having a hitting surface, a sole (3) forming a lower portion, and a crown (5) forming an upper portion, the sole (3) is improved. The sole (3) in the position close to the face (4) was formed into an elastically deformable recess-projection shape, and part of the face (4) was formed into a projecting shape and integrated with the sole (3) to increase rigidity. Using a configuration with increased rigidity and decreased rigidity between the face (4) and sole to obtain an elastically deformable portion and providing a high-rigidity body (12) increased the repulsion force in the lower portion of the face and extended the traveling distance of the golf ball.
摘要翻译：在包括具有击打面的面（4）的驱动器高尔夫球头（1）中，形成下部的鞋底（3）和形成上部的胎冠（5）被改善。在靠近面（4）的位置处的鞋底（3）形成为可弹性变形的凹凸形状，并且面部（4）的一部分形成为突出形状并与鞋底（3）一体化以增加刚性。使用具有增加的刚性并且在面部（4）和鞋底之间的刚性降低的构造以获得可弹性变形部分并且提供高刚性体（12）的构造增加了面部下部的排斥力并延长了高尔夫球。

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