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    • 19. 发明授权
    • Sputtering chamber with moving table producing orbital motion of target for improved uniformity
    • 具有移动台的溅射室产生目标的轨道运动,以提高均匀性
    • US06395156B1
    • 2002-05-28
    • US09681962
    • 2001-06-29
    • Paul HsuehAbraham C. Ma
    • Paul HsuehAbraham C. Ma
    • C23C1446
    • H01J37/3414C23C14/46H01J37/34
    • A sputtering chamber has a target that moves with an orbital motion relative to an ion beam. An X-Y assembly allows for target movement in both the horizontal and vertical directions. The X-Y assembly has a base plate, an intermediate plate, and a target mounting plate that attaches to the target. The plates are connected together by bearing blocks that slide along rails in the X and Y directions. A rotating shaft has gears that rotate a center shaft through the base and intermediate plates. The rotating center shaft has an arm on its end that attaches to the target mounting plate. The arm produces an orbital movement of the target. Rather than simply rotating the target around the center shaft, the center of the target orbits around the center of the center shaft. Ion-beam wear is spread across the target surface, extending target life and improving deposition uniformity.
    • 溅射室具有相对于离子束以轨道运动移动的靶。 X-Y组件允许水平和垂直方向上的目标移动。 X-Y组件具有附接到目标的基板,中间板和目标安装板。 板通过在X和Y方向上沿轨道滑动的轴承座连接在一起。 旋转轴具有使中心轴穿过底座和中间板的齿轮。 旋转中心轴在其端部具有附接到目标安装板的臂。 手臂产生目标的轨道运动。 而不是简单地围绕中心轴旋转目标,目标的中心围绕中心轴的中心轨道。 离子束磨损扩散到目标表面,延长靶的寿命并提高沉积均匀性。