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11. 发明申请

US20130206369A1 HEAT DISSIPATING DEVICE 审中-公开
标题翻译：热灭火装置
公开(公告)号：US20130206369A1
公开(公告)日：2013-08-15
申请号：US13371480
申请日：2012-02-13
申请人： Wei-I Lin , Chien-Chih Yeh , Wen-Shiang Chen , Chun-Hung Lin
发明人： Wei-I Lin , Chien-Chih Yeh , Wen-Shiang Chen , Chun-Hung Lin
IPC分类号： F28D15/04
CPC分类号： F28D15/043
摘要： A heat dissipating device includes a chamber body, a heat sink, a pipe, a first capillary structure and N vapor channels. The chamber body has an evaporation chamber and a compensation chamber, wherein the evaporation chamber has a vapor outlet and the compensation chamber has a liquid inlet. The heat sink is disposed on an outer wall of a first side of the chamber body and at least covers the compensation chamber. The pipe is installed within the heat sink, wherein a first end of the pipe is connected to the vapor outlet and a second end of the pipe is connected to the liquid inlet. The first capillary structure is formed in the evaporation chamber. The N vapor channels are formed in the first capillary structure. The N vapor channels and the compensation chamber are isolated by the first capillary structure.
摘要翻译：散热装置包括室主体，散热器，管，第一毛细管结构和N个蒸气通道。腔体具有蒸发室和补偿室，其中蒸发室具有蒸汽出口，并且补偿室具有液体入口。散热器设置在室主体的第一侧的外壁上，并且至少覆盖补偿室。管道安装在散热器内，其中管道的第一端连接到蒸汽出口，并且管道的第二端连接到液体入口。第一毛细结构形成在蒸发室中。 N蒸汽通道形成在第一毛细管结构中。 N蒸气通道和补偿室由第一毛细管结构隔离。

12. 发明申请

US20130187277A1 CRACK STOPPER ON UNDER-BUMP METALLIZATION LAYER 有权
标题翻译：在下层金属化层的破裂停止
公开(公告)号：US20130187277A1
公开(公告)日：2013-07-25
申请号：US13443556
申请日：2012-04-10
申请人： Yu-Feng Chen , Chun-Hung Lin , Han-Ping Pu , Chih-Hang Tung , Kai-Chiang Wu , Ming-Che Ho
发明人： Yu-Feng Chen , Chun-Hung Lin , Han-Ping Pu , Chih-Hang Tung , Kai-Chiang Wu , Ming-Che Ho
IPC分类号： H01L23/48
CPC分类号： H01L24/13 , H01L23/488 , H01L24/02 , H01L24/05 , H01L24/10 , H01L24/11 , H01L24/16 , H01L2224/0401 , H01L2224/05027 , H01L2224/05111 , H01L2224/05144 , H01L2224/05147 , H01L2224/05155 , H01L2224/05166 , H01L2224/05181 , H01L2224/05186 , H01L2224/05551 , H01L2224/05555 , H01L2224/05572 , H01L2224/05611 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/05666 , H01L2224/05681 , H01L2224/05686 , H01L2224/10125 , H01L2224/1146 , H01L2224/1147 , H01L2224/11849 , H01L2224/13012 , H01L2224/13076 , H01L2224/13111 , H01L2224/13113 , H01L2224/13116 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/16237 , H01L2224/16238 , H01L2224/81191 , H01L2924/00014 , H01L2924/01029 , H01L2924/12042 , H01L2924/00012 , H01L2924/014 , H01L2924/04941 , H01L2924/04953 , H01L2924/01047 , H01L2224/05552 , H01L2924/00
摘要： A semiconductor die includes a crack stopper on an under-bump metallization (UBM) layer. The crack stopper is in the shape of hollow cylinder with at least two openings.
摘要翻译：半导体管芯包括在凸块下金属化（UBM）层上的裂纹阻挡层。裂缝止动器为具有至少两个开口的中空圆筒形状。

13. 发明申请

US20130175705A1 Stress Compensation Layer for 3D Packaging 有权
标题翻译： 3D包装应力补偿层
公开(公告)号：US20130175705A1
公开(公告)日：2013-07-11
申请号：US13348449
申请日：2012-01-11
申请人： Chun-Hung Lin , Yu-Feng Chen , Han-Ping Pu , Hung-Jui Kuo
发明人： Chun-Hung Lin , Yu-Feng Chen , Han-Ping Pu , Hung-Jui Kuo
IPC分类号： H01L23/52 , H01L21/56
CPC分类号： H01L23/562 , H01L21/565 , H01L23/3121 , H01L23/3128 , H01L23/49822 , H01L25/105 , H01L2224/16225 , H01L2225/1023 , H01L2225/1058 , H01L2924/01322 , H01L2924/15311 , H01L2924/15321 , H01L2924/18161 , H01L2924/3511 , H01L2924/00
摘要： A stress compensation for use in packaging, and a method of forming, is provided. The stress compensation layer is placed on an opposing side of a substrate from an integrated circuit die. The stress compensation layer is designed to counteract at least some of the stress exerted structures on the die side of the substrate, such as stresses exerted by a molding compound that at least partially encapsulates the first integrated circuit die. A package may also be electrically coupled to the substrate.
摘要翻译：提供了用于包装的应力补偿，以及形成方法。应力补偿层从集成电路管芯放置在衬底的相对侧上。应力补偿层被设计成抵抗基板的模具侧上的应力施加结构中的至少一些，例如由至少部分地封装第一集成电路管芯的模制化合物施加的应力。封装还可以电耦合到衬底。

14. 发明授权

US08316796B2 Film coating system and isolating device thereof 有权
标题翻译：薄膜涂布系统及其隔离装置
公开(公告)号：US08316796B2
公开(公告)日：2012-11-27
申请号：US11954843
申请日：2007-12-12
申请人： Chi-Hung Liu , Chih-Ming Chen , Chun-Hsien Su , Chih-Wei Chen , Wen-Tung Hsu , Chun-Hung Lin
发明人： Chi-Hung Liu , Chih-Ming Chen , Chun-Hsien Su , Chih-Wei Chen , Wen-Tung Hsu , Chun-Hung Lin
IPC分类号： C23C16/00
CPC分类号： H01J37/32568 , H01J37/3244 , H01J37/32825 , H01J2237/20214
摘要： A film coating system for coating an object includes a working station and an isolating device. The object is disposed on the working station, and the isolating device is utilized to isolate the object. The isolating device includes a body generating a first power, a first working fluid, a second working fluid, a first guiding portion and a second guiding portion. The first guiding portion guides the first working fluid to pass through the body, thereby forming a first working region to coat the object thereon. The second guiding portion guides the second working fluid excited by the first power of the body to pass through the body, thereby forming a second working region to separate the first working region from the object.
摘要翻译：用于涂覆物体的涂膜系统包括加工台和隔离装置。物体设置在工作站上，隔离装置用于隔离物体。隔离装置包括产生第一功率的主体，第一工作流体，第二工作流体，第一引导部分和第二引导部分。第一引导部引导第一工作流体穿过主体，从而形成第一工作区域以在其上涂覆物体。第二引导部分引导由身体的第一功率激发的第二工作流体穿过主体，从而形成第二工作区域以将第一工作区域与物体分开。

15. 发明授权

US08281741B2 Plasma deposition apparatus and deposition method utilizing same 有权
标题翻译：等离子体沉积设备及其沉积方法
公开(公告)号：US08281741B2
公开(公告)日：2012-10-09
申请号：US13019269
申请日：2011-02-01
申请人： Chia-Chiang Chang , Chin-Jyi Wu , Shin-Chih Liaw , Chun-Hung Lin
发明人： Chia-Chiang Chang , Chin-Jyi Wu , Shin-Chih Liaw , Chun-Hung Lin
IPC分类号： C23C16/455 , C23C16/452 , C23C16/50 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： C23C16/402 , C23C16/345 , C23C16/45563 , C23C16/45595 , C23C16/513
摘要： A plasma deposition apparatus is provided. The plasma deposition apparatus comprises a chamber. A pedestal is placed in the chamber. A plasma generator is placed in the chamber and over the pedestal. The plasma generator comprises a plasma jet for plasma thin film deposition having a discharge direction angle θ1 larger than 0° and less than 90° between a normal direction of the pedestal and the discharge direction of the plasma jet. A gas-extracting pipe extends into the chamber and over the pedestal. The gas-extracting pipe provides a pumping path for particles and side-products having a pumping direction angle θ2 larger than 0° and less than 90° between the normal direction of the pedestal and the pumping direction of the gas-extracting pipe. The chamber is kept at an ambient atmospheric pressure.
摘要翻译：提供了一种等离子体沉积装置。等离子体沉积设备包括一个室。底座放置在腔室中。等离子体发生器放置在腔室中并在基座上方。等离子体发生器包括用于等离子体薄膜沉积的等离子体射流，其具有放电方向角度θ;在基座的法线方向与等离子体射流的排出方向之间大于0°且小于90°的1。气体提取管延伸到腔室中并且在基座上。气体提取管为具有泵送方向角度的颗粒和副产物提供泵送路径; 2在基座的法线方向与气体提取管的泵送方向之间大于0°且小于90°。室保持在环境大气压力。

16. 发明授权

US08277616B2 Surface treating device and surface treating method 有权
标题翻译：表面处理装置及表面处理方法
公开(公告)号：US08277616B2
公开(公告)日：2012-10-02
申请号：US11892853
申请日：2007-08-28
申请人： Chi-Hung Liu , Chun-Hung Lin , Chun-Hsien Su , Wen-Tung Hsu
发明人： Chi-Hung Liu , Chun-Hung Lin , Chun-Hsien Su , Wen-Tung Hsu
IPC分类号： B01J19/08
CPC分类号： A61B18/042 , A61C5/00 , A61C19/066
摘要： A surface treating method for treating a tooth surface and a surface treating device thereof are provided. First, a working gas is filled into a tube. Next, a voltage is provided to the working gas for exciting the working gas into plasma. After that, the plasma is discharged through an opening of the tube for contacting the tooth surface.
摘要翻译：提供了一种用于处理牙齿表面的表面处理方法及其表面处理装置。首先，将工作气体填充到管中。接下来，向工作气体提供用于将工作气体激发成等离子体的电压。之后，等离子体通过用于与齿面接触的管的开口排出。

17. 发明申请

US20120189958A1 IMAGE TRANSFER PROCESS 有权
标题翻译：图像传输过程
公开(公告)号：US20120189958A1
公开(公告)日：2012-07-26
申请号：US13014285
申请日：2011-01-26
申请人： Hsi-Wen Chang , Wei-Jen Lai , Pi-Ju Chiang , Chun-Hung Lin , Jung-Ya Hsieh
发明人： Hsi-Wen Chang , Wei-Jen Lai , Pi-Ju Chiang , Chun-Hung Lin , Jung-Ya Hsieh
IPC分类号： G03C5/16
CPC分类号： G03C11/12 , D06P1/0012 , D06P5/2005
摘要： The present invention relates to an image transfer process. The process includes the steps of: a) providing an image carrying device including at least one photoluminescent surface; b) displaying a luminous image on a display surface of a light-emitting medium; and c) positioning the display surface of the light-emitting medium that is displaying the luminous image at a distance from the at least one photoluminescent surface of the image carrying device shorter than a predetermined effective distance, for a predetermined period of time.
摘要翻译：本发明涉及图像转印处理。该方法包括以下步骤：a）提供包括至少一个光致发光表面的图像承载装置; b）在发光介质的显示表面上显示发光图像; 以及c）将显示所述发光图像的所述发光介质的显示表面定位在比所述图像承载装置的所述至少一个光致发光表面短一预定有效距离的预定时间段。

18. 发明申请

US20110065758A1 Compositions and assays for treatment and diagnosis of helicobacter pylori infection and conditions 有权
标题翻译：用于治疗和诊断幽门螺杆菌感染和病症的组合物和测定法
公开(公告)号：US20110065758A1
公开(公告)日：2011-03-17
申请号：US12806084
申请日：2010-08-02
申请人： Chun-Hung Lin
发明人： Chun-Hung Lin
IPC分类号： A61K31/4412 , C12N9/24 , C12Q1/34 , G01N33/573 , C40B30/00 , A61P31/04 , A61P1/04 , A61P1/16 , A61P1/00 , A61P17/00 , A61P9/00
CPC分类号： G01N33/56922 , A61K31/4412 , C12Q1/34 , G01N2333/924
摘要： Methods of diagnosing Helicobacter pylori infection or associated conditions are based in part on the correlation of the presence of a α-L-fucosidase 2 marker with the infection. Methods and compositions for treating or preventing Helicobacter pylori infection or associated conditions are based in part on administering an α-L-fucosidase 2 inhibitor to an infected subject or a subject at risk of developing the infection.
摘要翻译：诊断幽门螺杆菌感染或相关病症的方法部分基于α-L-岩藻糖苷酶2标记物与感染的相关性。用于治疗或预防幽门螺杆菌感染或相关病症的方法和组合物部分地基于向被感染的受试者或患有发展感染风险的受试者施用α-L-岩藻糖苷酶2抑制剂。

19. 发明授权

US07814276B2 Data cache architecture and cache algorithm used therein 有权
标题翻译：数据缓存体系结构和缓存算法
公开(公告)号：US07814276B2
公开(公告)日：2010-10-12
申请号：US11943228
申请日：2007-11-20
申请人： Yen-Chin Lin , Hsin-Chung Wang , Chun-Hung Lin
发明人： Yen-Chin Lin , Hsin-Chung Wang , Chun-Hung Lin
IPC分类号： G06F12/00
CPC分类号： G06F12/0804 , G06F12/0886 , G06F2212/2022
摘要： The present invention provides a data cache architecture interposed between a host and a flash memory, the data cache architecture comprising: a buffer memory, receiving data from the host; a memory controller, deploying the data in the buffer memory; and a data cache memory, controlled by the memory controller according to a cache algorithm. The data cache architecture and the cache algorithm used in the data cache architecture can be used to minimize the program/erase count of the NAND type flash device.
摘要翻译：本发明提供一种插入在主机和闪速存储器之间的数据高速缓存架构，所述数据高速缓存架构包括：缓冲存储器，从所述主机接收数据; 存储器控制器，将数据部署在缓冲存储器中; 以及由存储器控制器根据高速缓存算法控制的数据高速缓冲存储器。可以使用数据高速缓存架构中使用的数据高速缓存结构和缓存算法来最小化NAND型闪存设备的编程/擦除计数。

20. 发明授权

US07760807B2 Method and system for motion estimation using chrominance information 有权
标题翻译：使用色度信息进行运动估计的方法和系统
公开(公告)号：US07760807B2
公开(公告)日：2010-07-20
申请号：US11206137
申请日：2005-08-18
申请人： Chun-Hung Lin
发明人： Chun-Hung Lin
IPC分类号： H04N7/12
CPC分类号： H04N19/198 , H04N19/102 , H04N19/176 , H04N19/186 , H04N19/196 , H04N19/51
摘要： A method and system for motion estimation using chrominance information, which is based on each block of a current frame to find a corresponding block from a previous frame within a search area and accordingly determines a motion vector and includes first separately computing luminance differences and chrominance differences between luminance and chrominance of a target block in a current frame and luminance and chrominance of candidate blocks in a search range of a previous frame, next adjusting the luminance differences based on the first chrominance differences and the second chrominance differences and outputting adjusted luminance differences; and finally finding a minimum one among the adjusted luminance differences and accordingly determining the motion vector.
摘要翻译：一种使用色度信息的运动估计的方法和系统，其基于当前帧的每个块以从搜索区域内的先前帧中找到相应的块，并因此确定运动矢量，并且包括首先分别计算亮度差和色度差在当前帧中的目标块的亮度和色度之间以及前一帧的搜索范围内的候选块的亮度和色度，接着基于第一色差和第二色度差来调整亮度差并输出调整的亮度差; 最后在调整后的亮度差中找到最小的亮度差，从而确定运动矢量。

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