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    • 11. 发明申请
    • Taste Improving Substances
    • 味道改善物质
    • US20080131573A1
    • 2008-06-05
    • US11815233
    • 2005-10-06
    • Chris WinkelHarry RenesJan VisserNico BouterJan BakkerBart Ruisch
    • Chris WinkelHarry RenesJan VisserNico BouterJan BakkerBart Ruisch
    • A23L1/226A23L1/229
    • A23L27/23
    • The present invention in a first aspect relates to taste improvement of foodstuffs, beverages, pharmaceutics, tobacco products and oral care products, using extremely small amounts of a substance according to formula (I), or edible salts thereof: R1—CR2(OR3)—CO—X (I). It was found that at very low concentrations, substances represented by formula (I) are capable of modifying and complementing, the sensory impact of taste imparting substances. Thus, the present taste improving substances are advantageously applied in flavour compositions, foodstuffs, pharmaceutics, tobacco products and oral care products. Typical examples of taste improving substances according to the present invention include N-lactoyl GMP, N-lactoyl AMP, N-lactoyl CMP, N-lactoyl IMP, N-gluconyl GMP, N-gluconyl AMP, N-gluconyl CMP, N-gluconyl IMP, O-lactoyl-GMP, O-lactoyl AMP, O-lactoyl CMP, O-lactoyl IMP, O-gluconyl GMP, O-gluconyl AMP, O-gluconyl CMP and O-gluconyl IMP and mixtures thereof.
    • 本发明的第一方面涉及使用极少量根据式(I)的物质或其可食用盐的食品,饮料,药物,烟草制品和口腔护理产品的味道改进:R 1, (OR 3)-OC-X(I)。 发现在非常低的浓度下,由式(I)表示的物质能够改变和补充味道赋予物质的感官影响。 因此,本发明的味道改善物质有利地用于风味组合物,食品,药物,烟草制品和口腔护理产品中。 根据本发明的味道改善物质的典型实例包括N-乳酰基GMP,N-乳酰基AMP,N-乳酰基CMP,N-乳酰基IMP,N-葡萄糖基GMP,N-葡萄糖基AMP,N-葡萄糖基酰基CMP,N-葡萄糖基 IMP,O-乳酰基-GMP,O-乳酰基AMP,O-乳酰基CMP,O-乳酰基IMP,O-葡萄糖基GMP,O-葡萄糖基AMP,O-葡萄糖基酰基CMP和O-葡萄糖基IMP及其混合物。
    • 15. 发明申请
    • Primary Container for a Security System
    • 一个安全系统的主容器
    • US20070272731A1
    • 2007-11-29
    • US10588882
    • 2005-02-09
    • Jan Visser
    • Jan Visser
    • G07D11/00
    • A45C13/24E05G1/005E05G1/14
    • A tamper evident primary container (20) for storing and/or transporting valuables, particularly currency and other documents comprising: an envelope (14) with tamper evident features; means (34) partitioning the envelope into first (30) and second portions (32) that communicate with each other through at least one path; a first opening (22) in the envelope through which articles can be inserted into the first portion; means (26) for sealing the first opening; and a second opening (36) into the second portion through which a staining medium can be introduced into the second portion when desired. The path is constructed and arranged so as at least to inhibit access to the first portion through the second portion and to indicate tampering if access is breached. The partitioning means (34, 50) is intermittent to form a plurality of paths that can permit a staining medium to be dispensed into the first portion through the second portion.
    • 一种用于存储和/或运输贵重物品,特别是货币和其他文件的防拆封主要容器(20),包括:具有篡改明显特征的信封(14) 将封套分隔成通过至少一个路径彼此连通的第一部分(30)和第二部分(32)的装置(34); 所述封套中的第一开口(22)可通过所述第一开口插入所述第一部分中; 用于密封第一开口的装置(26) 以及当需要时可以将染色介质引入到第二部分中的第二部分中的第二开口(36)。 该路径被构造和布置为至少阻止通过第二部分访问第一部分,并且如果访问被破坏则指示篡改。 分隔装置(34,50)间歇地形成多个路径,其可以允许染色介质通过第二部分分配到第一部分中。
    • 16. 发明授权
    • Method of reducing particle contamination during sputtering
    • 降低溅射过程中颗粒污染的方法
    • US6059938A
    • 2000-05-09
    • US400783
    • 1995-03-06
    • Jan Visser
    • Jan Visser
    • C23C14/34C23C14/56H01L21/203H01L21/285
    • C23C14/3492C23C14/34C23C14/564
    • Method is described of reducing particle contamination during sputtering and sputtering device for the implementation of such a method.A method of providing a layer on a substrate (1), whereby, during a certain process time, material (8) is detached from a target plate (6) through a bombardment of this target plate with ions from a gas discharge (4) under reduced pressure in a reactor chamber (2) which is provided with a support (7) for the substrate (1). Measures are taken to ensure that material deposited on a surface of chamber component (9) near the support (7) has a better adhesion. According to the invention, the measure for achieving a better adhesion of the material consists in that the surface of the chamber component (9) is first bombarded with ions from the gas discharge (4) for at least part of the process time. Material (8) detached from the target plate (6) and hitting the chamber component (9) will have a good adhesion thanks to the ion bombardment, so that no loose particles from the surface of the chamber component (9) can contaminate the layer on the substrate (1).
    • 描述了在溅射期间减少颗粒污染的方法和用于实施这种方法的溅射装置。 一种在基板(1)上提供层的方法,其中在某一处理时间内,材料(8)通过来自气体放电(4)的离子的该靶板的轰击与目标板(6)分离, 在反应器室(2)中在减压下,其设置有用于基板(1)的支撑件(7)。 采取措施确保沉积在支撑件(7)附近的腔室部件(9)的表面上的材料具有更好的附着力。 根据本发明,用于实现材料更好粘附的措施在于,在至少部分处理时间内,首先用气体放电(4)的离子轰击室部件(9)的表面。 由于离子轰击,与目标板(6)分离并撞击室部件(9)的材料(8)将具有良好的附着力,使得来自腔室部件(9)表面的松散颗粒不会污染该层 在基板(1)上。
    • 17. 发明授权
    • Device for providing a substrate with a surface layer from a vapor
    • 用于从蒸气提供具有表面层的基底的装置
    • US5356477A
    • 1994-10-18
    • US148814
    • 1993-11-08
    • Jan Visser
    • Jan Visser
    • C23C16/44C23C16/448H01L21/31C23C16/00
    • C23C16/4485
    • A substrate (2) is formed with a surface layer from a gas phase with a vapour in a device having a reactor chamber (1) and a reservoir (4), which vapour is generated through evaporation of a substance (5) in the reservoir (4) and is conducted to the reactor chamber (1) through a gas line (8) (Chemical Vapour Deposition (CVD)). According to the invention, the vapour is conducted from the reservoir (4) to the reactor chamber (1) in that it is pumped from the reservoir (4) to the reactor chamber (1) by a pump (9) included in the gas line. The use of the pump renders the method very flexible. Thus the vapour flow can be easily adapted through adaptation of a pumping rate associated with the pump. In addition, the vapour flow is not dependent on a process pressure which prevails in the reactor (1).
    • 基板(2)在具有反应室(1)和储存器(4)的装置中形成具有来自气相与蒸气的表面层,所述反应器室(1)和储存器(4)通过在所述储存器(5)中蒸发物质 (4),并通过气体管线(8)(化学气相沉积(CVD))传导到反应室(1)。 根据本发明,蒸汽从储存器(4)传导到反应器室(1),因为它通过包含在气体中的泵(9)从储存器(4)泵送到反应器室(1) 线。 泵的使用使得该方法非常灵活。 因此,可以通过适应与泵相关联的泵送速率来容易地适应蒸气流。 此外,蒸汽流量不依赖于反应器(1)中的过程压力。
    • 19. 发明授权
    • Process and apparatus for liquid-liquid extraction
    • 液 - 液萃取工艺及装置
    • US06413429B1
    • 2002-07-02
    • US09754159
    • 2001-01-04
    • Berthold Berend BremanJan Visser
    • Berthold Berend BremanJan Visser
    • B02D1100
    • B01D11/0449B01D11/0457Y10S210/05
    • Claimed are a process and an apparatus for extracting a component dissolved in a liquid by means of liquid-liquid extraction using an extraction liquid which is immiscible or only partially miscible with the liquid, in which process the extraction liquid is dispersed in the liquid in a dispersion apparatus and then coalesced in a coalescer, after which the ex traction liquid, the specific weight of which differs by at least 5% from the specific weight of the liquid to be extracted in which the component to be extracted is to be found, is separated from the liquid by gravity in a phase separator in which process in order to obtain an efficiency per extraction stage of at least 0.9 at an average residence time of at most 15 seconds in the dispersion apparatus and of at most 300 seconds in the phase separator, at a linear velocity in the coalescer related to its cross-section of at least 30 m/hour: a. the dispersion apparatus used is a centrifugal pump which will give droplets having an average diameter of 5 to 500 &mgr;m, b. the coalescer used is a packed bed of 5-100 cm high composed of dimensionally stable particles wettable by the extraction liquid having an average particle size of 0.05 to 2 mmL and c. the coagulated phase in the phase separator is separated at a linear velocity related to the cross-section of the phase separator of 0.1 to 0.7 times the linear velocity in the coalescer.
    • 本发明提供了一种通过使用与液体不混溶或仅部分混溶的萃取液的液 - 液萃取来提取溶解在液体中的组分的方法和装置,在该方法中,萃取液在液体中分散在液体中 分散装置,然后在聚结器中聚结,之后其比重与要提取的组分的待提取液体的比重相差至少5%的前牵引液体为 在相分离器中通过重力与液体分离,其中在分散装置中,为了在分散装置中平均停留时间至多为15秒,并且在相分离器中至多300秒,每个萃取阶段获得至少0.9的效率 在与聚结器相关的线速度至少为30m /小时的横截面上:a。 使用的分散装置是一种离心泵,其将产生平均直径为5至500μm的液滴,b。 所使用的聚结器是由平均粒径为0.05-2mmL的萃取液可湿化的尺寸稳定的颗粒组成的5-100cm高的填充床。 相分离器中的凝固相以与分离器的横截面相关的线速度分离成聚结器中的线速度的0.1至0.7倍。