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11. 发明授权

US06485885B1 Photopolymerizable thermosetting resin compositions 有权
标题翻译：光聚合性热固性树脂组合物
公开(公告)号：US06485885B1
公开(公告)日：2002-11-26
申请号：US09720441
申请日：2000-12-22
申请人： Hidetaka Oka , Masaki Ohwa , Akira Matsumoto , Hisatoshi Kura
发明人： Hidetaka Oka , Masaki Ohwa , Akira Matsumoto , Hisatoshi Kura
IPC分类号： G03F7004
CPC分类号： G03F7/031 , G03F7/038
摘要： Compositions comprising (A) an oligomer or polymer containing at least one carboxylic acid group in the molecule; (B) at least one compound of formulas (I, II, III, IV, V or VI), wherein R1 inter alia is phenyl or alkyl; R2 is for example C2-C12alkonoyl which is unsubstituted or substituted or is benzoyl; R3, R4, R5, R6 and R7 independently of one another are for instance hydrogen, C1-C12alkyl, cyclohexyl or phenyl which is unsubstituted or substituted, or are benzyl, benzoyl, C2-C12alkanoyl or phenoxycarbonyl; R8 is for example hydrogen or C1-C12alkyl or a group (B); M is for example C1-C12alkylene, cyclohexylene or phenylene; M1 inter alia is a direct bond or C1-C12alkylenoxy; and Ar is a 5- or 6-membered aromatic heterocyclic ring; (C) a photopolymerizable reactive or unreactive diluent; and (D) as a thermosetting component an epoxy compound containing at least two epoxy groups in one molecule; are highly suitable as resists which are alkaline developable.
摘要翻译：包含（A）在分子中含有至少一个羧酸基团的低聚物或聚合物的组合物; （B）至少一种式（I，II，III，IV，V或VI）化合物，其中R 1特别是苯基或烷基; R2是例如未取代或取代的C 2 -C 12烷氧基或苯甲酰基; R 3，R 4，R 5，R 6和R 7彼此独立地是例如氢，C 1 -C 12烷基，环己基或未取代或取代的苯基，或者是苄基，苯甲酰基，C 2 -C 12烷酰基或苯氧基羰基; R8是例如氢或C1-C12烷基或基团（B）; M为例如C 1 -C 12亚烷基，亚环己基或亚苯基; M1特别是直接键或C1-C12亚烷基氧基; 且Ar为5-或6-元芳族杂环; （C）可光聚合反应性或非活性稀释剂; 和（D）作为热固性组分在一个分子中含有至少两个环氧基团的环氧化合物; 非常适合作为碱性显影的抗蚀剂。

12. 发明授权

US08586268B2 Oxime ester photoinitiators 有权
标题翻译：肟酯光引发剂
公开(公告)号：US08586268B2
公开(公告)日：2013-11-19
申请号：US12086567
申请日：2006-11-09
申请人： Akira Matsumoto , Junichi Tanabe , Hisatoshi Kura , Masaki Ohwa
发明人： Akira Matsumoto , Junichi Tanabe , Hisatoshi Kura , Masaki Ohwa
IPC分类号： G02B5/20 , G03F7/031
CPC分类号： G03F7/031 , B33Y70/00 , C07D209/86 , C07D409/06 , C08F2/50 , G03F7/0007 , G03F7/001
摘要： Compounds of the Formula (I) and (II) wherein M1, M2 and M3 independently of one another are no bond, a direct bond, CO, O, S, SO, SO2 or NR14; provided that at least one of M1, M2 or M3 is a direct bond, CO, O, S, SO, SO2 or NR14; M4 is a direct bond, CR″3R″4, CS, O, S, SO, or SO2; Y is S or NR18; R1 for example is hydrogen, C3-C8cycloalkyl, phenyl or naphthyl, both of which are optionally substituted; R2 for example is C1-C20alkyl; R″2 has one of the meanings given for R2; R3 and R4 are for example hydrogen, halogen, C1-C20alkyl; R′3, R′4, R″3 and R″4 independently of one another have one of the meanings given for R3 and R4; and R5 is for example hydrogen, halogen, C1-C20alkyl; provided that in the compounds of the Formula (I) at least two oxime ester groups are present; exhibit an unexpectedly good performance in photopolymerization reactions.
摘要翻译：其中M1，M2和M3彼此独立的式（I）和（II）的化合物不是键，直接键，CO，O，S，SO，SO 2或NR 14; 条件是M1，M2或M3中的至少一个是直接键，CO，O，S，SO，SO 2或NR 14; M4是直接键，CR''3R''4，CS，O，S，SO或SO2; Y为S或NR18; R 1例如是氢，C 3 -C 8环烷基，苯基或萘基，它们都是任选取代的; R 2例如是C 1 -C 20烷基; R'2具有R2中给出的含义之一; R3和R4是例如氢，卤素，C1-C20烷基; R 3，R'4，R“3和R”4彼此独立地具有R3和R4给出的含义之一; R5是例如氢，卤素，C1-C20烷基; 条件是在式（I）的化合物中存在至少两个肟酯基团; 在光聚合反应中表现出出人意料的良好性能。

13. 发明申请

US20130302728A1 PHOTORESIST COMPOSITIONS 审中-公开
标题翻译：光电组合物
公开(公告)号：US20130302728A1
公开(公告)日：2013-11-14
申请号：US13939387
申请日：2013-07-11
申请人： Hisatoshi Kura , Kaori Sameshima , Kazuhiko Kunimoto , Peter Nesvadba , Masaki Ohwa
发明人： Hisatoshi Kura , Kaori Sameshima , Kazuhiko Kunimoto , Peter Nesvadba , Masaki Ohwa
IPC分类号： G03F7/028 , C08F110/02 , C08F110/06 , G03F7/00
CPC分类号： G03F7/028 , C07D211/94 , C07D491/113 , C08F110/02 , C08F110/06 , C08F265/02 , C08K5/3435 , G03F7/0007 , G03F7/031 , G03F7/40 , C08L33/06
摘要： The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking.The present invention relates to a radically polymerizable composition comprising: (a) at least one alkaline developable resin; (b) at least one acrylate monomer; (c) at least a photoinitiator; (d) at least one hydroxylamine ester compound of formula I
摘要翻译：本发明涉及一种可自由基聚合的组合物，其包含用于制造滤色器的羟胺酯。本发明还涉及新的羟胺酯。本发明还涉及在需要后烘烤的所有液晶显示组件中使用羟胺酯。本发明涉及可自由基聚合的组合物，其包含：（a）至少一种碱性显影树脂; （b）至少一种丙烯酸酯单体; （c）至少一种光引发剂; （d）至少一种式I的羟胺酯化合物

14. 发明授权

US07829257B2 Photosensitive resin composition 有权
标题翻译：感光树脂组合物
公开(公告)号：US07829257B2
公开(公告)日：2010-11-09
申请号：US09734635
申请日：2000-12-12
申请人： Hidetaka Oka , Kazuhiko Kunimoto , Hisatoshi Kura , Masaki Ohwa , Junichi Tanabe
发明人： Hidetaka Oka , Kazuhiko Kunimoto , Hisatoshi Kura , Masaki Ohwa , Junichi Tanabe
IPC分类号： G03C1/00
CPC分类号： C08F2/50 , G03F7/031
摘要： Photosensitive compositions comprising (A) an alkali soluble compound; (B) at least one compound, of formula I or II wherein R1 inter alia is C4-C9cycloalkanoyl, C3-C12alkenoyl, or benzoyl which is unsubstituted or substituted; Ar1 is either C6-C20aryl or C6-C20aryloyl each of which is unsubstituted or substituted; x is 2 or 3; M1 when x is 2, inter alia is a group phenylene or naphthylene, each of which optionally is substituted i.a. by OR3, SR4 or NR5R6; or M1, when x is 3, is a trivalent group, optionally substituted; R3 is for example hydrogen or C1-C12alkyl; C2-C6alkyl which is for example substituted by —OH, —SH, —CN, C3-C6alkenoxy, or —OCH2CH2CN; R4 is for example hydrogen, C1-C12alkyl, C3-C12alkenyl, cyclohexyl, or phenyl which is unsubstituted or substituted; R5 and R6 independently of each other inter alia are hydrogen, C1-C12alkyl, C2-C4hydroxyalkyl, C2-C10alkoxyalkyl, C3-C5alkenyl, C3-C8cycloalkyl, phenyl-C1-C3alkyl, C1-C4alkanoyl, C3-C6alkenoyl, benzoyl or phenyl which is unsubstituted or substituted; and (C) a photopolymerizable compound; exhibit an unexpectedly good performance, in particular in photoresist technology.
摘要翻译：光敏组合物，其包含（A）碱溶性化合物; （B）至少一种式I或II的化合物，其中R 1特别是C 4 -C 9环烷酰基，C 3 -C 12烯酰基或未取代或取代的苯甲酰基; Ar 1是C 6 -C 20芳基或C 6 -C 20芳酰基，其各自为未取代或取代的; x为2或3; M1当x为2时，特别是亚苯基或亚萘基，其各自任选被取代。由OR3，SR4或NR5R6; 或M1，当x为3时，为任选取代的三价基团; R3是例如氢或C1-C12烷基; 例如被-OH，-SH，-CN，C 3 -C 6烯氧基或-OCH 2 CH 2 CN取代的C 2 -C 6烷基; R4是例如氢，C1-C12烷基，C3-C12链烯基，环己基或未取代或取代的苯基; R 5和R 6彼此独立地尤其是氢，C 1 -C 12烷基，C 2 -C 4羟烷基，C 2 -C 10烷氧基烷基，C 3 -C 5烯基，C 3 -C 8环烷基，苯基-C 1 -C 3烷基，C 1 -C 4烷酰基，C 3 -C 6烯酰基，苯甲酰基或苯基未取代或取代; 和（C）可光聚合化合物; 表现出意想不到的良好性能，特别是在光刻胶技术中。

15. 发明申请

US20100188765A1 Oxime Ester Photoinitiators 有权
标题翻译：肟酯光引发剂
公开(公告)号：US20100188765A1
公开(公告)日：2010-07-29
申请号：US12086567
申请日：2006-11-09
申请人： Akira Matsumoto , Junichi Tanabe , Hisatoshi Kura , Masaki Ohwa
发明人： Akira Matsumoto , Junichi Tanabe , Hisatoshi Kura , Masaki Ohwa
IPC分类号： G03F7/004 , C07D209/58 , C08F2/50 , G03F7/20 , G03F7/031 , G02B5/22
CPC分类号： G03F7/031 , B33Y70/00 , C07D209/86 , C07D409/06 , C08F2/50 , G03F7/0007 , G03F7/001
摘要： Compounds of the Formula (I) and (II) wherein M1, M2 and M3 independently of one another are no bond, a direct bond, CO, O, S, SO, SO2 or NR14; provided that at least one of M1, M2 or M3 is a direct bond, CO, O, S, SO, SO2 or NR14; M4 is a direct bond, CR″3R″4, CS, O, S, SO, or SO2; Y is S or NR18; R1 for example is hydrogen, C3-C8cycloalkyl, phenyl or naphthyl, both of which are optionally substituted; R2 for example is C1-C20alkyl; R″2 has one of the meanings given for R2; R3 and R4 are for example hydrogen, halogen, C1-C20alkyl; R′3, R′4, R″3 and R″4 independently of one another have one of the meanings given for R3 and R4; and R5 is for example hydrogen, halogen, C1-C20alkyl; provided that in the compounds of the Formula (I) at least two oxime ester groups are present; exhibit an unexpectedly good performance in photopolymerization reactions.
摘要翻译：其中M1，M2和M3彼此独立的式（I）和（II）的化合物不是键，直接键，CO，O，S，SO，SO 2或NR 14; 条件是M1，M2或M3中的至少一个是直接键，CO，O，S，SO，SO 2或NR 14; M4是直接键，CR“3R”4，CS，O，S，SO或SO 2; Y为S或NR18; R 1例如是氢，C 3 -C 8环烷基，苯基或萘基，它们都是任选取代的; R 2例如是C 1 -C 20烷基; R“2具有R2的含义之一; R3和R4是例如氢，卤素，C1-C20烷基; R'3，R'4，R“3和R”4彼此独立地具有R3和R4给出的含义之一; R5是例如氢，卤素，C1-C20烷基; 条件是在式（I）的化合物中存在至少两个肟酯基团; 在光聚合反应中表现出出人意料的良好性能。

16. 发明授权

US07648738B2 Oxime ester photoinitiators with heteroaromatic groups 有权
标题翻译：具有杂芳族基团的肟酯光引发剂
公开(公告)号：US07648738B2
公开(公告)日：2010-01-19
申请号：US10535962
申请日：2003-11-24
申请人： Junichi Tanabe , Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
发明人： Junichi Tanabe , Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
IPC分类号： C07C251/60 , G03F1/00 , G03C1/73
CPC分类号： C07D207/333 , B33Y70/00 , C07D207/335 , C07D209/12 , C07D209/14 , C07D209/42 , C07D333/22 , C07D333/38 , C07D333/58 , C07D401/06 , C07D403/06 , C07D405/06 , C07D409/06 , C07D409/14 , C08F2/50 , G03F7/031
摘要： Compounds of the formulae (I), (II), (III) and (IV), wherein Ch1 is e.g. the formula (V) or (VI); Ch2 is the formula (VII) or (VIII); Het1 is for example furyl, thienyl, pyrrolyl, pyridyl, benzothienyl, quinolyl or bithienyl; each of which is optionally substituted; Het2 and Het2′ e.g. are furylene, thienylene, pyrrolylene, benzothienylene, quinolylene, furylenecarbonyl, thienylenecarbonyl, benzothienylenecarbonyl or bithienylenecarbonyl; each of which is optionally substituted; A1, and Ar1′ i.a. are phenyl, naphthyl, benzoyl or naphthoyl, each of which is optionally substituted; Ar2 is for example phenylene, optionally substituted; M i.a. is C1-C20alkylene; R1 is for example C1-C12alkyl or phenyl; R2 and R2′ for example are hydrogen or C1-C20 alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.
摘要翻译：式（I），（II），（III）和（IV）的化合物，其中Ch1是例如。式（Ⅴ）或（Ⅵ）; Ch2是式（VII）或（VIII）; Het1例如是呋喃基，噻吩基，吡咯基，吡啶基，苯并噻吩基，喹啉基或二噻吩基; 它们各自任选被取代; Het2和Het2' 呋喃基，噻吩乙烯基，吡咯基，苯并噻吩基，喹啉基，呋喃基羰基，噻吩羰基，苯并噻吩羰基或二噻吩羰基; 它们各自任选被取代; A1和Ar1'i.a. 是苯基，萘基，苯甲酰基或萘甲酰基，其各自任选被取代; Ar 2是例如亚苯基，任选被取代; 我是是C 1 -C 20亚烷基; R1是例如C1-C12烷基或苯基; R2和R2'例如是氢或C1-C20烷基; 在光聚合反应中表现出出人意料的良好性能。

17. 发明授权

US07556843B2 Photosensitive resin composition 有权
标题翻译：感光树脂组合物
公开(公告)号：US07556843B2
公开(公告)日：2009-07-07
申请号：US11818073
申请日：2007-06-13
申请人： Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
发明人： Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
IPC分类号： G03F7/00 , C08J3/28
CPC分类号： C08F2/50 , B33Y70/00 , C07D295/112 , C07D295/135 , G03F7/0007 , G03F7/031
摘要： A photopolymerization process for producing pigmented and non-pigmented articles comprises irradiating with electromagnetic radiation in the range from 190 to 600 nm, or with electron beam or with X-rays a photosensitive composition which can be developed by alkali solution which composition comprises (A) a polymer containing at least one carboxylic acid group in the molecule and having a molecular weight of 200,000 or less, (B) selected α-aminoalkylphenone compounds as photoinitiators and (C) an ester of a polyol, wherein the polyol is partially or fully esterified with an ethylenically unsaturated carboxylic acid a monomeric, oligomeric or polymeric compound having at least one olefinic double bond.
摘要翻译：用于制备着色和非着色物品的光聚合方法包括用190-600nm范围内的电磁辐射或用电子束或X射线照射可由碱溶液显影的感光组合物，该组合物包含（A）在分子中含有至少一个羧酸基并且分子量为200,000以下的聚合物，（B）作为光引发剂的选择的α-氨基烷基苯酮化合物和（C）多元醇的酯，其中所述多元醇部分或完全酯化烯键式不饱和羧酸是具有至少一个烯属双键的单体，低聚物或聚合物。

18. 发明申请

US20090087759A1 Oxime Ester Photoinitiators 有权
标题翻译：肟酯光引发剂
公开(公告)号：US20090087759A1
公开(公告)日：2009-04-02
申请号：US12085383
申请日：2006-11-08
申请人： Akira Matsumoto , Junichi Tanabe , Hisatoshi Kura , Masaki Ohwa
发明人： Akira Matsumoto , Junichi Tanabe , Hisatoshi Kura , Masaki Ohwa
IPC分类号： G03F1/02 , C07D209/88 , C08F2/46 , G03F7/20
CPC分类号： C07D209/86 , C07D209/88 , C07D403/10 , C07D409/06 , C07D409/10 , G03F7/031
摘要： Compounds of the formula (I), (II), and wherein R1, R2, R′2 and R′″2 for example are C1-C20alkyl; R3, R4, and R5 for example independently of one another are hydrogen or a defined substituent provided that at least one of R3, R4 or R5 is other than hydrogen or C1-C20alkyl; R6, R7, R8, R′6, R′7, R′8, R″6, R″7, R′″6 and R′″7 for example independently of one another have one of the meanings as given for R3, R4, and R5; and R9 for example is C1-C20alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.
摘要翻译：式（I），（II）和其中R 1，R 2，R'2和R“2的化合物例如是C 1 -C 20烷基; R 3，R 4和R 5例如彼此独立地是氢或定义的取代基，条件是R 3，R 4或R 5中的至少一个不是氢或C 1 -C 20烷基; R6，R7，R8，R'6，R'7，R'8，R'6，R'7，R“'6和R”'7例如彼此独立地具有一个含义如R3，R4和R5所示; 例如，R 9为C 1 -C 20烷基; 在光聚合反应中表现出出人意料的良好性能。

19. 发明申请

US20070249748A1 Photosensitive resin composition 有权
标题翻译：感光树脂组合物
公开(公告)号：US20070249748A1
公开(公告)日：2007-10-25
申请号：US11818072
申请日：2007-06-13
申请人： Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
发明人： Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
IPC分类号： G03C1/73
CPC分类号： C08F2/50 , B33Y70/00 , C07D295/112 , C07D295/135 , G03F7/0007 , G03F7/031
摘要： Photosensitive compositions which can be developed by alkali solution, comprise (A) a polymer containing at least one carboxylic acid group in the molecule and having a molecular weight of 200,000 or less, (B) selected α-aminoalkylphenone compounds as photoinitiators and (C) an ester of a polyol, wherein the polyol is partially or fully esterified with an ethylenically unsaturated carboxylic acid a monomeric, oligomeric or polymeric compound having at least one olefinic double bond.
摘要翻译：可以通过碱溶液显影的光敏组合物包含（A）在分子中含有至少一个羧酸基并且分子量为200,000以下的聚合物，（B）选择的α-氨基烷基苯酮化合物作为光引发剂，和（C）多元醇的酯，其中所述多元醇与烯属不饱和羧酸部分或完全酯化，具有至少一个烯属双键的单体，低聚物或聚合物。

20. 发明授权

US08940464B2 Oxime ester photoinitiators 有权
标题翻译：肟酯光引发剂
公开(公告)号：US08940464B2
公开(公告)日：2015-01-27
申请号：US12085383
申请日：2006-11-08
申请人： Akira Matsumoto , Junichi Tanabe , Hisatoshi Kura , Masaki Ohwa
发明人： Akira Matsumoto , Junichi Tanabe , Hisatoshi Kura , Masaki Ohwa
IPC分类号： G02B5/20 , G03F7/031
CPC分类号： C07D209/86 , C07D209/88 , C07D403/10 , C07D409/06 , C07D409/10 , G03F7/031
摘要： Compounds of the formula (I), (II), and wherein R1, R2, R′2 and R′″2 for example are C1-C20alkyl; R3, R4, and R5 for example independently of one another are hydrogen or a defined substituent provided that at least one of R3, R4 or R5 is other than hydrogen or C1-C20alkyl; R6, R7, R8, R′6, R′7, R′8, R″6, R″7, R′″6 and R′″7 for example independently of one another have one of the meanings as given for R3, R4, and R5; and R9 for example is C1-C20alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.
摘要翻译：式（I），（II）和其中R 1，R 2，R'2和R'2的化合物例如是C 1 -C 20烷基; R 3，R 4和R 5例如彼此独立地是氢或定义的取代基，条件是R 3，R 4或R 5中的至少一个不是氢或C 1 -C 20烷基; R 6，R 7，R 8，R'6，R'7，R'8，R“6，R”7，R“6和R”7例如彼此独立地具有如R3所给出的含义之一，R4和R5; 例如，R 9为C 1 -C 20烷基; 在光聚合反应中表现出出人意料的良好性能。

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