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    • 11. 发明授权
    • Screw-fixing implement
    • 螺丝固定工具
    • US07005951B2
    • 2006-02-28
    • US10474327
    • 2003-02-06
    • Yutaka MotookaEiichi Kobayashi
    • Yutaka MotookaEiichi Kobayashi
    • H01P7/00F16B39/24
    • H01P1/00H01P1/2053H01P7/10
    • A screw-fixing implement which is low in cost and has a high reliability, a resonator device having the screw-fixing implement and having a characteristic adjusting function, a filter, an oscillator, and a communication device each containing the resonator device, and a method of adjusting a characteristic of the resonator device are provided. A nut 2 for fixing a characteristic-adjusting screw 1 is provided with a concave portion d in the vicinity to the axis of the fixing nut 2 and concaved in the thickness direction. A spring-washer 3 is provided with a convex portion p which is engaged with the concave portion d of the screw-fixing nut 2. The spring-washer 3 is sandwiched between a panel 4 and the screw-fixing nut 2. Then, the characteristic adjusting screw 1 is turned under an appropriate load. After the characteristic is adjusted, the screw-fixing nut 2 is tightened till the spring washer 3 is completely broken. Thus, these members are locked.
    • 具有低成本且高可靠性的螺钉固定器具,具有螺钉固定器具的谐振器装置,具有特征调节功能,滤波器,振荡器以及各自包含谐振器装置的通信装置,以及 提供了调节谐振器装置的特性的方法。 用于固定特性调节螺钉1的螺母2在固定螺母2的轴线附近设置有凹部d,并且在厚度方向上凹陷。 弹簧垫圈3设置有与螺钉固定螺母2的凹部d接合的凸部p。 弹簧垫圈3夹在面板4和螺钉固定螺母2之间。 然后,将特性调节螺钉1在适当的载荷下转动。 在调整特性之后,拧紧螺钉固定螺母2直到弹簧垫圈3完全断裂。 因此,这些成员被锁定。
    • 13. 发明授权
    • Seal for an anti-friction bearing
    • 用于防摩擦轴承的密封
    • US6068407A
    • 2000-05-30
    • US330006
    • 1999-06-11
    • Eiichi KobayashiYutaka Daikuhara
    • Eiichi KobayashiYutaka Daikuhara
    • F16C33/78F16C33/80F16C33/76F02F5/00F02F11/00
    • F16C33/7846F16C33/7816F16C43/045F16C19/06F16C2370/12
    • The invention permits stacking of seals without possibility of the sticking of their synthetic rubber seal members to one another. Moreover, when assembling the seals to produce anti-friction bearings, the invention permits storing the seals as a stack in a stocker of an automatic assembler and, unlike the case of using silicon or like prior art anti-sticking material, substantially eliminates generation of fine particles or the like adversely affecting precision apparatuses and deteriorating the reliability thereof. In an anti-friction bearing comprising an inner ring (1), an outer ring (2), and rolling elements (3) provided between the inner and outer rings, a side gap between the inner and outer rings is closed by seals (4) of the invention, which each include a synthetic rubber seal member (6) and a surface active material (7) coated thereon.
    • 本发明允许密封件的堆叠,而不会使它们的合成橡胶密封件彼此粘附。 此外,当组装密封件以制造抗摩擦轴承时,本发明允许将密封件作为堆叠存储在自动装配器的储料器中,并且与使用硅或类似现有技术的防粘材料的情况不同,基本上不产生 微粒等对精密装置产生不良影响,使其可靠性恶化。 在包括内圈(1),外圈(2)和设置在内圈和外圈之间的滚动元件(3)的抗摩擦轴承中,内环和外圈之间的侧间隙由密封件(4)封闭 ),其各自包括合成橡胶密封构件(6)和涂覆在其上的表面活性材料(7)。
    • 15. 发明授权
    • Radiation sensitive resin composition
    • 辐射敏感树脂组合物
    • US5679495A
    • 1997-10-21
    • US352848
    • 1994-12-02
    • Mikio YamachikaEiichi KobayashiToshiyuki OtaAkira Tsuji
    • Mikio YamachikaEiichi KobayashiToshiyuki OtaAkira Tsuji
    • G03F7/004G03F7/028G03F7/039H01L21/027G03F7/023
    • G03F7/0045G03F7/039Y10S430/106Y10S430/11Y10S430/111
    • A radiation sensitive resin composition which comprises (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid upon irradiation with a radiation, said polymer (A) comprising two recurring units represented by the general formulas (1) and (2) and a recurring unit which acts to reduce the solubility of the polymer in an alkali developer after the irradiation: ##STR1## wherein R.sup.1 represents a hydrogen atom or a methyl group and R.sup.2 represents a hydrogen atom or a methyl group. Said composition provides a chemically amplified positive resist which can give a fine pattern with a good pattern shape, and said resist is freed from volume shrinkage, peeling failure and adhesive failure, is excellent in dry etching resistance and effectively reacts with various radiations to give a good pattern shape which is excellent in photolithographic process stability, said pattern shape having no thinned portion at the upper part.
    • 一种辐射敏感性树脂组合物,其包含(A)在酸存在下变为碱溶性的聚合物和(B)辐射敏感的酸产生剂,其在辐射时产生酸,所述聚合物(A)包含两个重复 由通式(1)和(2)表示的单元和反应单元,其用于降低聚合物在照射后的碱显影剂中的溶解度:其中R1表示 氢原子或甲基,R 2表示氢原子或甲基。 所述组合物提供化学放大的正性抗蚀剂,其可以产生具有良好图案形状的精细图案,并且所述抗蚀剂没有体积收缩,剥离破坏和粘合剂破坏,具有优异的耐干蚀刻性,并且与各种辐射有效反应以产生 良好的图案形状,其光刻工艺稳定性优异,所述图案形状在上部没有变薄部分。
    • 16. 发明授权
    • Chemically amplified resist
    • 化学放大抗蚀剂
    • US5580695A
    • 1996-12-03
    • US339289
    • 1994-11-10
    • Makoto MurataTakao MiuraYoshiji YumotoToshiyuki OtaEiichi Kobayashi
    • Makoto MurataTakao MiuraYoshiji YumotoToshiyuki OtaEiichi Kobayashi
    • G03F7/004G03C1/73G03F7/038
    • G03F7/0045Y10S430/118Y10S430/121
    • A chemically amplified resist comprising an alkali-soluble resin or a resin having at least one acid-dissociable group which is alkali-insoluble or -sprairingly soluble but becomes alkali-soluble upon dissociation of said acid dissociable group due to an acid; a radiation-sensitive, acid-generating agent; and an optional component in which resist, the radiation-sensitive, acid-generating agent generates an acid upon irradiation with a radiation in the irradiated portion and the solubility of the resin component and optional component in a developing solution is varied in the irradiated portion by a chemical reaction caused by the catalytic action of the acid, whereby a pattern is formed, characterized in that a compound having a nitrogen-containing basic group is contained in the resist. Said resist is superior in developability, pattern form, resolution, focus tolerance and yield of residual film thickness, has good process stability, and can be suitably used even in irradiation with, in particular, a radiation having a wavelength equal to or smaller than far ultraviolet rays, for example, an excimer laser or the like.
    • 一种化学放大抗蚀剂,其包含碱溶性树脂或具有至少一种酸解离基团的树脂,所述酸解离基团是由于酸而导致的所述酸解离基团的解离时为碱不溶性或易溶性但是变得碱溶性的; 辐射敏感的酸产生剂; 以及任选的组分,其中抗辐射敏感的酸产生剂在照射部分中的辐射照射时产生酸,并且树脂组分和任选组分在显影溶液中的溶解度在照射部分中变化 由酸的催化作用引起的化学反应,由此形成图案,其特征在于在抗蚀剂中含有具有含氮碱性基团的化合物。 所述抗蚀剂的显影性,图案形式,分辨率,聚焦容限和残留膜厚度的产率优异,具有良好的工艺稳定性,并且可以适用于特别是具有等于或小于远的波长的辐射 紫外线,例如准分子激光等。