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    • 20. 发明授权
    • Nonvolatile semiconductor memory device
    • 非易失性半导体存储器件
    • US08212302B2
    • 2012-07-03
    • US11723484
    • 2007-03-20
    • Shunpei YamazakiYoshinobu AsamiTamae TakanoMakoto Furuno
    • Shunpei YamazakiYoshinobu AsamiTamae TakanoMakoto Furuno
    • H01L29/76
    • H01L29/42324H01L29/513H01L29/7883H01L29/7885
    • A nonvolatile semiconductor memory device which is superior in writing property and charge holding property, including a semiconductor substrate in which a channel formation region is formed between a pair of impurity regions, and a first insulating layer, a floating gate, a second insulating layer, and a control gate over the semiconductor substrate. The floating gate includes at least two layers. It is preferable that a band gap of a first layer included in the floating gate, which is in contact with the first insulating layer, be smaller than that of the semiconductor substrate. For example, it is preferable that the band gap of the semiconductor material for forming the floating gate be smaller than that of the channel formation region in the semiconductor substrate by 0.1 eV or more. This is because, by lowering the bottom energy level of a conduction band of the floating gate electrode than that of the channel formation region in the semiconductor substrate, a carrier injecting property and a charge holding property are improved.
    • 一种非易失性半导体存储器件,其特征在于具有在一对杂质区域之间形成沟道形成区域的半导体衬底和第一绝缘层,浮置栅极,第二绝缘层, 以及半导体衬底上的控制栅极。 浮栅包括至少两层。 与第一绝缘层接触的浮栅中包含的第一层的带隙优选小于半导体衬底的带隙。 例如,优选用于形成浮置栅极的半导体材料的带隙比半导体衬底中的沟道形成区域的带隙小0.1eV以上。 这是因为通过降低浮置栅电极的导带的底部能级比半导体衬底中的沟道形成区的底部能级降低,因此提高了载流子注入性和电荷保持性。