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    • 11. 发明授权
    • Parallel multistage band-pass filter
    • 并联多级带通滤波器
    • US06914497B2
    • 2005-07-05
    • US10647504
    • 2003-08-26
    • Yasushi SanoEiichi KobayashiShingo OkajimaJun Hattori
    • Yasushi SanoEiichi KobayashiShingo OkajimaJun Hattori
    • H01P1/213H01P1/20H01P1/203H01P1/205
    • H01P1/203H01P1/20
    • In a parallel multistage band-pass filter, a transmission line having an electrical length substantially equal to half (λ/2) of the wavelength of the transmission signal is incorporated between the port on the input terminal side of the odd number (2n−1)th resonator numbered from the input terminal side and the port on the input terminal side of the even number (2n)th resonator numbered from the input terminal side; and a transmission line having an electrical length substantially equal to λ/2 is incorporated between the port on the output terminal side of the even number (2n)th resonator numbered from the input terminal side and the port on the output terminal side of the odd number (2n+1)th resonator numbered from the input terminal side. Moreover, a transmission line for adjustment of a transmission phase between the input terminal and the output terminal is incorporated between the first resonator numbered from the output terminal side and the output terminal.
    • 在并联多级带通滤波器中,具有基本上等于发送信号的波长的一半(λ/ 2)的电长度的传输线被并入奇数(2n-1)的输入端侧的端口 (2n)谐振器编号的输入端子侧的输入端子侧的端子侧; 并且在从输入端子侧编号的偶数(2n)谐振器的输出端侧的端口与奇数的输出端子侧的端口之间并入具有基本上等于λ/ 2的电气长度的传输线 第(2n + 1)个谐振器,从输入端侧编号。 此外,用于调整输入端子和输出端子之间的透射相位的传输线被并入从输出端子侧和输出端子之间编号的第一谐振器之间。
    • 12. 发明授权
    • Radiation-sensitive resin composition
    • 辐射敏感树脂组合物
    • US06465150B1
    • 2002-10-15
    • US09686930
    • 2000-10-12
    • Jun NumataShirou KusumotoEiichi Kobayashi
    • Jun NumataShirou KusumotoEiichi Kobayashi
    • G03F7004
    • G03F7/0045G03F7/0392Y10S430/115Y10S430/122
    • A radiation-sensitive resin composition exhibiting high sensitivity to various types of radiation and capable of forming a minute pattern with sufficient resolution and depth of field and small surface roughness in various types of patterns such as a dense line pattern, isolated line pattern, or contact holes, particularly in line-type patterns. The resin composition comprises (A) an aromatic sulfonic acid onium salt compound consisting of a 2,4-difluorobenzenesulfonic acid anion, 4-trifluoromethylbenzenesulfonic acid anion, or 2-trifluoromethylbenzenesulfonic acid anion, and an onium cation of sulfur or iodonium, and (B) a copolymer represented by a 4-hydroxystyrene/4-t-butoxystyrene copolymer and a 4-hydroxystyrene/4-(1′-ethoxyethoxy)styrene copolymer.
    • 对各种类型的辐射具有高灵敏度并且能够形成具有足够的分辨率和景深以及诸如密集线图案,隔离线图案或接触的各种图案中的小表面粗糙度的微小图案的辐射敏感性树脂组合物 孔,特别是线型图案。 树脂组合物包含(A)由2,4-二氟苯磺酸阴离子,4-三氟甲基苯磺酸阴离子或2-三氟甲基苯磺酸阴离子和硫或碘鎓的鎓阳离子组成的芳族磺酸鎓盐化合物和(B )由4-羟基苯乙烯/ 4-叔丁氧基苯乙烯共聚物和4-羟基苯乙烯/ 4-(1'-乙氧基乙氧基)苯乙烯共聚物表示的共聚物。
    • 13. 再颁专利
    • Radiation sensitive resin composition
    • 辐射敏感树脂组合物
    • USRE37179E1
    • 2001-05-15
    • US09420604
    • 1999-10-21
    • Mikio YamachikaEiichi KobayashiAkira TsujiToshiyuki Ota
    • Mikio YamachikaEiichi KobayashiAkira TsujiToshiyuki Ota
    • G03F7023
    • G03F7/0045G03F7/039Y10S430/106Y10S430/11Y10S430/111
    • A radiation sensitive resin composition which comprises (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid upon irradiation with a radiation, said polymer (A) comprising two recurring units represented by the general formulas (1) and (2) and a recurring unit which acts to reduce the solubility of the polymer is an alkali developer after the irradiation: wherein R1 represents a hydrogen atom or a methyl group and R2 represents a hydrogen atom or a methyl group. Said composition provides a chemically amplified positive resist which can give a fine pattern with a good pattern shape, and said resist is freed from volume shrinkage, peeling failure and adhesive failure, is excellent in dry etching resistance and effectively reacts with various radiations to give a good pattern shape which is excellent in photolithographic process stability, said pattern shape having no thinned portion at the upper part.
    • 一种辐射敏感性树脂组合物,其包含(A)在酸存在下变为碱溶性的聚合物和(B)辐射敏感的酸产生剂,其在辐射时产生酸,所述聚合物(A)包含两个重复 由通式(1)和(2)表示的单元和降低聚合物溶解度的重复单元是照射后的碱显影剂:其中R1表示氢原子或甲基,R2表示氢原子 或甲基。 所述组合物提供化学放大的正性抗蚀剂,其可以产生具有良好图案形状的精细图案,并且所述抗蚀剂没有体积收缩,剥离破坏和粘合剂破坏,具有优异的耐干蚀刻性,并且与各种辐射有效反应以产生 良好的图案形状,其光刻工艺稳定性优异,所述图案形状在上部没有变薄部分。
    • 14. 发明授权
    • Radiation sensitive resin composition
    • 辐射敏感树脂组合物
    • US6136500A
    • 2000-10-24
    • US135855
    • 1998-08-18
    • Eiichi KobayashiMakoto ShimizuTakayoshi TanabeShin-ichiro Iwanaga
    • Eiichi KobayashiMakoto ShimizuTakayoshi TanabeShin-ichiro Iwanaga
    • G03F7/004G03F7/038G03F7/039
    • G03F7/004Y10S430/115Y10S430/122
    • Positive as well as negative radiation sensitive resin compositions that, in addition to being capable of providing excellent resolution and pattern profile, are particularly excellent in avoiding the problems of "nano-edge roughness" or "coating surface roughness". The positive type radiation sensitive resin composition comprises (A) (a) an acid-decomposable group-containing resin, or (b) an alkali-soluble resin and an alkali dissolution controller, and (B) a photoacid generator comprising "a compound that upon exposure to radiation generates a carboxylic acid having a boiling point of 150.degree. C. or higher", and "a compound that upon exposure to radiation generates an acid other than a carboxylic acid". The negative type radiation sensitive resin composition comprises (C) an alkali-soluble resin, (D) a cross-linking agent, and the component (B) as described above.
    • 除了能够提供优异的分辨率和图案轮廓之外,正面和负面的辐射敏感性树脂组合物在避免“纳米边缘粗糙度”或“涂层表面粗糙度”的问题方面特别优异。 正型辐射敏感性树脂组合物包含(A)(a)含酸可分解基团的树脂,或(b)碱溶性树脂和碱溶解控制剂,和(B)光酸产生剂,其包含“ 暴露于辐射后会产生沸点为150℃以上的羧酸“,”暴露于辐射后的化合物会产生羧酸以外的酸“。 负型辐射敏感性树脂组合物包含(C)碱溶性树脂,(D)交联剂和如上所述的组分(B)。
    • 17. 发明授权
    • Transmission system for intentionally violating a class IV partial
response code to distinguish subsidiary signals from an error
    • 传输系统有意违反IV类部分响应码,以区分辅助信号与错误
    • US4472813A
    • 1984-09-18
    • US362944
    • 1982-03-29
    • Shin'ichi KoikeEiichi Kobayashi
    • Shin'ichi KoikeEiichi Kobayashi
    • H04L25/497H04B1/62
    • H04L25/497
    • In a transmission system of a class IV partial response code succession produced in accordance with a predetermined encoding rule, a transmitter intentionally violates the encoding rule to carry a subsidiary signal, so that an intentional violation appears in a receiver as two consecutive violation signals located in every other time slot, differing from an unintentional violation occurring during transmission. In the transmitter, an intermediate succession from a precoder is monitored by a detection circuit to detect an appearance of each predetermined pattern and to give the intentional violation to the code succession. In the receiver, a violation detector detects both of the intentional and the unintentional violations in accordance with a detecting rule to produce a violation signal sequence. The two consecutive violation signals are distinguished from the violation signal sequence by another detector. As the predetermined patterns, two and twelve patterns are usable in a binary and a quaternary system, respectively.
    • 在根据预定编码规则产生的IV类部分响应代码继承的传输系统中,发射机故意违反编码规则来携带辅助信号,使得有意的违规出现在接收机中,因为两个连续的违反信号位于 每隔一个时隙,与传输期间发生的意外违规不同。 在发射机中,来自预编码器的中间连续性由检测电路监视,以检测每个预定模式的外观,并给出对代码继承的有意违反。 在接收机中,违规检测器根据检测规则检测有意和无意的违规,以产生违规信号序列。 两个连续的违规信号与另一个检测器的违规信号序列不同。 作为预定模式,分别在二进制和四进制系统中使用两个和十二个模式。