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11. 发明授权

US07394621B2 Using bilayer lithography process to define neck height for PMR 有权
标题翻译：使用双层光刻工艺来定义PMR的颈部高度
公开(公告)号：US07394621B2
公开(公告)日：2008-07-01
申请号：US10881444
申请日：2004-06-30
申请人： Donghong Li , Yoshitaka Sasaki
发明人： Donghong Li , Yoshitaka Sasaki
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/1278 , Y10T29/49021
摘要： A method for independently forming neck height (NH) and pole width dimensions in a main pole layer of a PMR write head is described. A main pole layer with a pole tip region is formed on a bottom yoke. The pole tip region is trimmed by an ion milling process to give a pole width. A bilayer resist is patterned to form an opening with an undercut on the main pole layer. The opening uncovers the pole tip region except for an NH length adjacent to the pole tip. A top yoke comprised of CoFeN with a thickness of about 0.2 microns is deposited in the opening and the bilayer resist is removed by a lift-off process. Thereafter, a write gap layer is formed on the pole tip region and then first, second, and third write shield layers are formed above the write gap layer along the ABS.
摘要翻译：描述了在PMR写头的主极层中独立地形成颈部高度（NH）和极宽度尺寸的方法。具有极尖区域的主极层形成在底架上。通过离子铣削工艺修剪极尖区域以产生极宽度。图案化双层抗蚀剂以在主极层上形成具有底切的开口。除了与极尖相邻的NH长度之外，开口露出磁极尖端区域。由厚度约0.2微米的CoFeN组成的顶部磁轭沉积在开口中，并通过剥离过程去除双层抗蚀剂。此后，在极尖区域上形成写间隙层，然后沿着ABS形成在写间隙层上方的第一，第二和第三写屏蔽层。

12. 发明申请

US20080096114A1 Neck height equalization in magnetic write pole mold 有权
标题翻译：磁写入极模具中的颈部高度均衡
公开(公告)号：US20080096114A1
公开(公告)日：2008-04-24
申请号：US12002160
申请日：2007-12-14
申请人： Donghong Li , Yoshitaka Sasaki
发明人： Donghong Li , Yoshitaka Sasaki
IPC分类号： G03F1/08
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163 , H01F41/34 , Y10T29/49032 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T29/49124 , Y10T29/49147
摘要： An improved mold, for use in the formation of a perpendicular magnetic write head, is described, together with a process for its manufacture. Conventional alumina is replaced by tantalum in the yoke portion of the mold. When both the tantalum and the alumina areas are simultaneously subjected to reactive ion etching, sloping sidewalls are obtained in the alumina area (write pole tip portion) whereas the sidewalls are almost vertical in the tantalum (yoke) area, resulting in a uniform neck height.
摘要翻译：描述了用于形成垂直磁性写入头的改进的模具，以及其制造方法。传统氧化铝在模具的磁轭部分被钽代替。当钽和氧化铝区域同时进行反应离子蚀刻时，在氧化铝区域（写磁极尖端部分）中获得倾斜的侧壁，而在钽（磁轭）区域中侧壁几乎是垂直的，从而形成均匀的颈部高度。

13. 发明申请

US20070196582A1 Protective aqueous treatment for wood and method for producing treatment 审中-公开
标题翻译：木材保护性水处理和生产处理方法
公开(公告)号：US20070196582A1
公开(公告)日：2007-08-23
申请号：US11359019
申请日：2006-02-22
申请人： John Sinko , Donghong Li , Darryl Cielinski , John Hennes
发明人： John Sinko , Donghong Li , Darryl Cielinski , John Hennes
IPC分类号： B05D3/02 , C09D5/14 , C09D5/16
CPC分类号： C09D5/14 , B27K3/16
摘要： A multi-functional aqueous protective treatment for wood substrates. The treatment comprises an aqueous solution of a zirconyl compound and incorporated bio-active constituents, providing protection against bio-degradation of wood and against degradation of aesthetic value of applied wood coatings by spontaneous staining and also protects against termites or other “in-depth” bio-degradation factors.
摘要翻译：木质底物的多功能水性保护处理。该处理包括氧化锆化合物的水溶液和掺入的生物活性组分，提供防止木材生物降解的保护性，并通过自发染色降低施用的木材涂层的美观价值，并且还防止白蚁或其他“深入” 生物降解因子。

14. 发明申请

US20060276039A1 Neck height equalization in magnetic write pole mold 有权
标题翻译：磁写入极模具中的颈部高度均衡
公开(公告)号：US20060276039A1
公开(公告)日：2006-12-07
申请号：US11146583
申请日：2005-06-07
申请人： Donghong Li , Yoshitaka Sasaki
发明人： Donghong Li , Yoshitaka Sasaki
IPC分类号： H01L21/302
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163 , H01F41/34 , Y10T29/49032 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T29/49124 , Y10T29/49147
摘要： An improved mold, for use in the formation of a perpendicular magnetic write head, is described, together with a process for its manufacture. Conventional alumina is replaced by tantalum in the yoke portion of the mold. When both the tantalum and the alumina areas are simultaneously subjected to reactive ion etching, sloping sidewalls are obtained in the alumina area (write pole tip portion) whereas the sidewalls are almost vertical in the tantalum (yoke) area, resulting in a uniform neck height.
摘要翻译：描述了用于形成垂直磁性写入头的改进的模具，以及其制造方法。传统氧化铝在模具的磁轭部分被钽代替。当钽和氧化铝区域同时进行反应离子蚀刻时，在氧化铝区域（写磁极尖端部分）中获得倾斜的侧壁，而在钽（磁轭）区域中侧壁几乎是垂直的，从而形成均匀的颈部高度。

15. 发明授权

US08533937B1 Method of forming a fully wrapped-around shielded PMR writer pole 失效
标题翻译：形成完全缠绕屏蔽PMR写入极的方法
公开(公告)号：US08533937B1
公开(公告)日：2013-09-17
申请号：US13275926
申请日：2011-10-18
申请人： Jinwen Wang , Weimin Si , Jianxin Fang , Ying Hong , Hongzhou Jiang , Ching-Huang Lu , Yan Chen , Donghong Li , Lien-Chang Wang , Lieping Zhong , Tao Pan
发明人： Jinwen Wang , Weimin Si , Jianxin Fang , Ying Hong , Hongzhou Jiang , Ching-Huang Lu , Yan Chen , Donghong Li , Lien-Chang Wang , Lieping Zhong , Tao Pan
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/112 , G11B5/1276 , G11B5/1278 , G11B5/3116 , G11B5/315 , G11B5/3153 , G11B5/3163 , H04R31/00 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method or forming a wrapped-around shielded perpendicular magnetic recording writer pole is disclosed. A structure comprising a leading shield layer and an intermediate layer disposed over the leading shield layer is provided, the intermediate layer comprising a pole material and a dielectric material. A trench is formed in the dielectric material. A non-magnetic layer in the trench is removed via an ion beam etching process. A seed layer is deposited in the trench and over the pole material. A magnetic material comprising a side shield layer is deposited on at least a portion of the seed layer.
摘要翻译：公开了一种方法或形成缠绕的屏蔽垂直磁记录写入极。提供了包括引导屏蔽层和设置在引导屏蔽层之上的中间层的结构，所述中间层包括极材料和电介质材料。在电介质材料中形成沟槽。通过离子束蚀刻工艺去除沟槽中的非磁性层。种子层沉积在沟槽中并在极材料上方。包含侧屏蔽层的磁性材料沉积在籽晶层的至少一部分上。

16. 发明申请

US20120216378A1 METHOD AND SYSTEM FOR PROVIDING A PIEZOELECTRIC MULTILAYER 有权
标题翻译：提供压电多层的方法和系统
公开(公告)号：US20120216378A1
公开(公告)日：2012-08-30
申请号：US13460190
申请日：2012-04-30
申请人： Nathan C. Emley , Donghong Li , Prakash Mani
发明人： Nathan C. Emley , Donghong Li , Prakash Mani
IPC分类号： H01L41/22
CPC分类号： H01L41/27 , H01L41/083 , H01L41/273 , H01L41/277 , H01L41/293 , H01L41/297 , H01L41/314 , H01L41/332 , Y10T29/42 , Y10T29/49126 , Y10T29/49147 , Y10T29/49155 , Y10T29/49165
摘要： A method and system for fabricating a piezoelectric multilayer are described. The method and system include providing conductive layers. Alternating conductive layers are electrically connected. A first plurality of alternating conductive layers is electrically isolated from a second plurality of alternating conductive layers. Piezoelectric layers are interleaved with the conductive layers. Apertures are provided in the piezoelectric layers. A first conductive plug electrically connects the first plurality of alternating conductive layers, includes a first plurality of segments, and is in apertures in the piezoelectric layers. Each of the first plurality of segments extends through one of the piezoelectric layers. A second conductive plug electrically connects the second plurality of alternating conductive layers, includes a second plurality of segments, and is in a second portion of the plurality of apertures. Each of the second plurality of segments extends through one of the plurality of piezoelectric layers.
摘要翻译：描述了一种用于制造压电多层的方法和系统。该方法和系统包括提供导电层。交替导电层电连接。第一多个交替导电层与第二多个交替导电层电隔离。压电层与导电层交错。在压电层中设置孔径。第一导电插塞电连接第一多个交替导电层，包括第一多个段，并且在压电层中的孔中。第一多个段中的每一个延伸穿过压电层中的一个。第二导电插塞电连接第二多个交替导电层，包括第二多个段，并且在多个孔的第二部分中。第二多个段中的每一个延伸穿过多个压电层中的一个。

17. 发明授权

US08419954B1 Method for providing a side shield for a magnetic recording transducer 失效
标题翻译：提供用于磁记录传感器的侧屏蔽的方法
公开(公告)号：US08419954B1
公开(公告)日：2013-04-16
申请号：US13285267
申请日：2011-10-31
申请人： Yan Chen , Donghong Li , Lien-Chang Wang
发明人： Yan Chen , Donghong Li , Lien-Chang Wang
IPC分类号： B44C1/22
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/315 , G11B5/3163 , Y10T29/49048
摘要： A method for fabricating a side shield for a magnetic transducer is described. The transducer has a nonmagnetic layer, a pole, a gap layer between the pole sidewalls and the nonmagnetic layer, and a hard mask having a hard mask aperture. A removal mask having a removal aperture exposing part of the pole and hard mask aperture is provided. The removal mask covers part of the hard mask aperture and the part of the hard mask. A trench in the nonmagnetic layer is formed by removing part of the nonmagnetic layer. A seed layer is deposited. A deposition mask having a deposition aperture therein is provided. The deposition aperture exposes part of the trench and part of the nonmagnetic layer. Side shield material(s) are deposited. Part of the side shield material(s) external to the deposition trench are removed. A remaining portion of the side shield material forms the side shield.
摘要翻译：描述了用于制造用于磁换能器的侧屏蔽的方法。换能器具有非磁性层，极，极侧壁和非磁性层之间的间隙层，以及具有硬掩模孔的硬掩模。提供具有暴露极和硬掩模孔的一部分的去除孔的去除掩模。去除掩模覆盖硬掩模孔的一部分和硬掩模的一部分。通过去除非磁性层的一部分来形成非磁性层中的沟槽。种子层被沉积。提供其中具有沉积孔的沉积掩模。沉积孔暴露了沟槽的一部分和非磁性层的一部分。侧屏蔽材料被沉积。除去沉积沟槽外部的侧面屏蔽材料的一部分。侧屏蔽材料的剩余部分形成侧屏蔽。

18. 发明授权

US08074345B1 Method of measuring a bevel angle in a write head 有权
标题翻译：测量写入头中斜角的方法
公开(公告)号：US08074345B1
公开(公告)日：2011-12-13
申请号：US12468006
申请日：2009-05-18
申请人： Alexandre Anguelouch , Donghong Li
发明人： Alexandre Anguelouch , Donghong Li
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , G11B5/455 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method of measuring a bevel angle in a write pole comprises the step of providing a mask over a wafer containing the write pole. The mask has a first opening over the write pole and a second opening over a sacrificial region of the wafer. The sacrificial region comprises a same material as the write pole. The method further comprises the steps of performing a beveling operation on the write pole and the sacrificial region to form a first bevel in the write pole and a second bevel in the sacrificial region, and measuring an angle of the second bevel in the sacrificial region to determine the bevel angle of the write pole.
摘要翻译：测量写入极的斜角的方法包括在包含写入极的晶片上提供掩模的步骤。掩模具有位于写入极上的第一开口和在晶片的牺牲区上方的第二开口。牺牲区域包括与写入极相同的材料。该方法还包括以下步骤：在写入极和牺牲区域上执行斜面操作以在写入极中形成第一斜面，在牺牲区域中形成第二斜面，并且将牺牲区域中的第二斜面的角度测量为确定写柱的斜角。

19. 发明授权

US08813324B2 Method for providing a piezoelectric multilayer 有权
标题翻译：提供压电多层的方法
公开(公告)号：US08813324B2
公开(公告)日：2014-08-26
申请号：US13460190
申请日：2012-04-30
申请人： Nathan C. Emley , Donghong Li , Prakash Mani
发明人： Nathan C. Emley , Donghong Li , Prakash Mani
IPC分类号： H01L41/22 , H01L41/083 , H01L41/27 , H01L41/273 , H01L41/277 , H01L41/293 , H01L41/297 , H01L41/314 , H01L41/332
CPC分类号： H01L41/27 , H01L41/083 , H01L41/273 , H01L41/277 , H01L41/293 , H01L41/297 , H01L41/314 , H01L41/332 , Y10T29/42 , Y10T29/49126 , Y10T29/49147 , Y10T29/49155 , Y10T29/49165
摘要： A method for fabricating a piezoelectric multilayer are described. The method includes providing conductive layers. Alternating conductive layers are electrically connected. A first plurality of alternating conductive layers is electrically isolated from a second plurality of alternating conductive layers. Piezoelectric layers are interleaved with the conductive layers. Apertures are provided in the piezoelectric layers. A first conductive plug electrically connects the first plurality of alternating conductive layers, includes a first plurality of segments, and is in apertures in the piezoelectric layers. Each of the first plurality of segments extends through one of the piezoelectric layers. A second conductive plug electrically connects the second plurality of alternating conductive layers, includes a second plurality of segments, and is in a second portion of the plurality of apertures. Each of the second plurality of segments extends through one of the plurality of piezoelectric layers.
摘要翻译：描述了制造压电多层的方法。该方法包括提供导电层。交替导电层电连接。第一多个交替导电层与第二多个交替导电层电隔离。压电层与导电层交错。在压电层中设置孔径。第一导电插塞电连接第一多个交替导电层，包括第一多个段，并且在压电层中的孔中。第一多个段中的每一个延伸穿过压电层中的一个。第二导电插塞电连接第二多个交替导电层，包括第二多个段，并且在多个孔的第二部分中。第二多个段中的每一个延伸穿过多个压电层中的一个。

20. 发明授权

US07975366B2 Method of manufacturing a magnetic write head mold for neck height equalization 有权
标题翻译：用于颈部高度均衡的磁性写头模具的制造方法
公开(公告)号：US07975366B2
公开(公告)日：2011-07-12
申请号：US12002160
申请日：2007-12-14
申请人： Donghong Li , Yoshitaka Sasaki
发明人： Donghong Li , Yoshitaka Sasaki
IPC分类号： H04R31/00 , C23F1/02
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163 , H01F41/34 , Y10T29/49032 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T29/49124 , Y10T29/49147
摘要： A process to reduce the bevel angle in a mold used to form a write head is disclosed. First, tantalum is used instead of alumina for the yoke area. Then both the tantalum and the alumina areas are simultaneously subjected to reactive ion etching, leading to sloping sidewalls in the alumina area (write pole) while providing near vertical sidewalls in the tantalum (yoke) area. Consequently, the neck height is the same at the cavity floor as it is at the cavity top.
摘要翻译：公开了一种减少用于形成写头的模具中的斜角的方法。首先，使用钽代替氧化铝作为磁轭区域。然后钽和氧化铝区域同时经受反应离子蚀刻，导致氧化铝区域（写极）中的倾斜侧壁，同时在钽（轭）区域中提供近似垂直的侧壁。因此，颈部的高度在空腔底部是相同的，因为它在腔顶部。

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