会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 13. 发明授权
    • Inductive plasma processor having coil with plural windings and method of controlling plasma density
    • US07096819B2
    • 2006-08-29
    • US09821027
    • 2001-03-30
    • Jian J. ChenRobert G. VeltropThomas E. Wicker
    • Jian J. ChenRobert G. VeltropThomas E. Wicker
    • C23C16/00H01L21/00
    • H01J37/32174H01J37/321
    • An inductive plasma processor includes a multiple winding radio frequency coil having plural electrically parallel, spatially concentric windings (1) having different amounts of RF power supplied to them, and (2) arranged to produce electromagnetic fields having different couplings to different regions of plasma in the chamber to control plasma flux distribution incident on a processed workpiece. The coil is powered by a single radio frequency generator via a single matching network. Input and output ends of each winding are respectively connected to input and output tuning capacitors. In a first embodiment, the location of maximum inductive coupling of the radio frequency to the plasma and the current magnitude in each winding are respectively mainly determined by values of the output and input capacitors. By adjusting all the input and output capacitors simultaneously, the current to a winding can be varied while the current to the other winding can be maintained constant as if these windings were completely de-coupled and independent. Therefore, the capacitors can control the plasma density in different radial and azimuthal regions. In another embodiment, a relatively low frequency drives the coil whereby each winding has a relatively short electrical length, causing substantially small standing wave current and voltage variations. The output capacitor for each winding adjusts current magnitude, to eliminate the need for the input capacitors and reduce operational complexity.
    • 18. 发明授权
    • Tilted-translation variable optical attenuator
    • 倾斜变换光衰减器
    • US06904223B1
    • 2005-06-07
    • US10408073
    • 2003-04-04
    • Zuyun FangJianhua WangJian J. Chen
    • Zuyun FangJianhua WangJian J. Chen
    • G02B6/00G02B6/26
    • G02B6/266
    • In a preferred embodiment, a motorized variable optical attenuator comprises an input fiber collimator; an output fiber collimator disposed substantially along the first collimator; and a right-angle reflector movable relative to the input collimator and the output collimator along a translation direction forming a non-zero angle with a direction of a light beam emitted by the input collimator. The reflector comprises two mutually-perpendicular reflective surfaces for sequentially reflecting the light beam emitted by the input collimator to the output collimator. A variable attenuation imparted by the attenuator on the light beam is determined by a position of the reflector relative to the input collimator and the output collimator, along the translation direction. The reflector preferably comprises a right-angle prism adhered to a nut mounted on a threaded axle driven by a stepper motor. The attenuator can achieve stable, ripple-free attenuation characteristics at insertion losses beyond −40 dB.
    • 在优选实施例中,电动可变光衰减器包括输入光纤准直器; 基本上沿着所述第一准直仪设置的输出光纤准直器; 以及直角反射体,其相对于输入准直器和输出准直器沿着与由输入准直仪发射的光束的方向成非零角度的平移方向移动。 反射器包括两个相互垂直的反射表面,用于将由输入准直仪发射的光束顺序反射到输出准直器。 由衰减器在光束上赋予的可变衰减由反射器相对于输入准直仪和输出准直器沿平移方向的位置确定。 反射器优选地包括附接到安装在由步进马达驱动的螺纹轴上的螺母的直角棱镜。 衰减器可以在插入损耗超过-40 dB时实现稳定的无纹波衰减特性。
    • 20. 发明授权
    • Stacked RF excitation coil for inductive plasma processor
    • US06527912B2
    • 2003-03-04
    • US09821752
    • 2001-03-30
    • Jian J. ChenRobert G. VeltropThomas E. Wicker
    • Jian J. ChenRobert G. VeltropThomas E. Wicker
    • H05H1100
    • H01J37/321
    • A radio frequency excitation coil of an inductive plasma processor includes a planar turn connected in series with a segment of the coil stacked above a portion of the planar turn. The stacked segment is placed around a region having weak radio frequency coupling to plasma due to azimuthal asymmetries in the chamber and/or the excitation coil. In a single winding embodiment, the stacked segment is close to an interconnection gap between two adjacent planar turns and extends in both directions from the gap to compensate low radio frequency coupling to plasma in the gap region. In an embodiment including two electrically parallel spatially concentric windings, the stacked segment extends beyond one side of an interconnection gap of two adjacent turns, and is aligned with the planar turn such that one end of the stacked segment is directly connected to an end of the planar turn via a straight, short stub. Terminals of the coil are connected to RF excitation circuitry terminals in a housing above the coil by leads extending smoothly and gradually without sharp bends between the coil terminals and the excitation circuitry terminals. Ends of the planar turn and the stacked segment are connected by a lead extending smoothly and gradually without sharp bends between its ends.