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    • 15. 发明授权
    • Method for fabricating thin film transistor
    • 制造薄膜晶体管的方法
    • US08222095B2
    • 2012-07-17
    • US12258451
    • 2008-10-27
    • Fang-Chen LuoShuo-Wei LiangShin-Chuan ChiangChao-Nan ChenChin-Chih Yu
    • Fang-Chen LuoShuo-Wei LiangShin-Chuan ChiangChao-Nan ChenChin-Chih Yu
    • H01L21/00
    • H01L29/7869
    • A method for fabricating a thin film transistor is provided. A gate is formed on a substrate. A gate insulating layer is formed on the substrate to cover the gate. A metal oxide material layer is formed on the gate insulating layer. A photoresist layer is formed on the metal oxide material layer, in which a thickness of the photoresist layer above the gate is larger than that of the photoresist layer above two sides adjacent to the gate. A portion of the metal oxide material layer is removed to form a metal oxide active layer by using the photoresist layer as a mask. The photoresist layer above the two sides adjacent to the gate is removed and the remaining photoresist layer covers a portion of the metal oxide active layer. A source and a drain are formed on the metal oxide active layer covered by the photoresist layer.
    • 提供一种制造薄膜晶体管的方法。 栅极形成在基板上。 在基板上形成栅极绝缘层以覆盖栅极。 在栅极绝缘层上形成金属氧化物材料层。 在金属氧化物材料层上形成光致抗蚀剂层,其中栅极上方的光致抗蚀剂层的厚度大于与栅极相邻的两侧上方的光致抗蚀剂层的厚度。 通过使用光致抗蚀剂层作为掩模,去除金属氧化物材料层的一部分以形成金属氧化物活性层。 去除与栅极相邻的两侧上方的光致抗蚀剂层,剩余的光致抗蚀剂层覆盖金属氧化物活性层的一部分。 在由光致抗蚀剂层覆盖的金属氧化物有源层上形成源极和漏极。
    • 16. 发明授权
    • Stacked storage capacitor-on-gate structure for a thin film transistor liquid crystal display
    • 用于薄膜晶体管液晶显示器的堆叠存储电容器栅极结构
    • US08184219B2
    • 2012-05-22
    • US12150132
    • 2008-04-24
    • Fang-Chen LuoChang-Cheng Lo
    • Fang-Chen LuoChang-Cheng Lo
    • G02F1/1343G02F1/1333
    • G02F1/136213H01L27/12
    • A stacked storage capacitor structure for use in each pixel of a TFT-LCD, wherein a first storage capacitor is formed by a first metal layer, a gate insulator layer and a second metal layer. The second capacitor is formed by the second metal layer, a passivation insulator layer and an ITO layer. The first metal layer and the ITO layer are joined together through a via hole which is etched in one insulator etching step during the overall fabrication process through both the gate insulator and the passivation insulator layers. As such, the two capacitors are connected in parallel in a stacked configuration. With the stacked storage capacitor structure, the charge storage capacity is increased without significantly affecting the aperture ratio of a pixel. The ITO and the pixel electrode can be different parts of an indium tine oxide layer deposited on the passivation insulator layer.
    • 一种用于TFT-LCD的每个像素的堆叠存储电容器结构,其中第一存储电容器由第一金属层,栅极绝缘体层和第二金属层形成。 第二电容器由第二金属层,钝化绝缘体层和ITO层形成。 第一金属层和ITO层通过在通过栅极绝缘体和钝化绝缘体层的整个制造工艺中的一个绝缘体蚀刻步骤中被蚀刻的通孔而接合在一起。 这样,两个电容器以堆叠的方式并联连接。 利用堆叠的存储电容器结构,电荷存储容量增加而不显着影响像素的开口率。 ITO和像素电极可以是沉积在钝化绝缘体层上的铟氧化物层的不同部分。
    • 17. 发明授权
    • Stacked storage capacitor structure for a thin film transistor liquid crystal display
    • 用于薄膜晶体管液晶显示器的堆叠存储电容器结构
    • US07675582B2
    • 2010-03-09
    • US11004389
    • 2004-12-03
    • Fang-Chen LuoChang-Cheng Lo
    • Fang-Chen LuoChang-Cheng Lo
    • G02F1/1343G02F1/13
    • G02F1/136213H01L27/12
    • A stacked storage capacitor structure for use in each pixel of a TFT-LCD, wherein a first storage capacitor is formed by a first metal layer, a gate insulator layer and a second metal layer. The second capacitor is formed by the second metal layer, a passivation insulator layer and an ITO layer. The first metal layer and the ITO layer are joined together through a via hole which is etched in one insulator etching step during the overall fabrication process through both the gate insulator and the passivation insulator layers. As such, the two capacitors are connected in parallel in a stacked configuration. With the stacked storage capacitor structure, the charge storage capacity is increased without significantly affecting the aperture ratio of a pixel. The ITO and the pixel electrode can be different parts of an indium tine oxide layer deposited on the passivation insulator layer.
    • 一种用于TFT-LCD的每个像素的堆叠存储电容器结构,其中第一存储电容器由第一金属层,栅极绝缘体层和第二金属层形成。 第二电容器由第二金属层,钝化绝缘体层和ITO层形成。 第一金属层和ITO层通过在通过栅极绝缘体和钝化绝缘体层的整个制造工艺中的一个绝缘体蚀刻步骤中被蚀刻的通孔而接合在一起。 这样,两个电容器以堆叠的方式并联连接。 利用堆叠的存储电容器结构,电荷存储容量增加而不显着影响像素的开口率。 ITO和像素电极可以是沉积在钝化绝缘体层上的铟氧化物层的不同部分。