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11. 发明申请

US20090214986A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20090214986A1
公开(公告)日：2009-08-27
申请号：US12463242
申请日：2009-05-08
申请人： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Paul GRAUPNER , Jan HAISMA , Nicodemus HATTU , Christiaan Alexander HOOGENDAM , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Bernard GELLRICH
发明人： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Paul GRAUPNER , Jan HAISMA , Nicodemus HATTU , Christiaan Alexander HOOGENDAM , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Bernard GELLRICH
IPC分类号： G03F7/20 , G03B27/54
CPC分类号： G03F7/70341 , G03F7/7095
摘要： The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
摘要翻译：投影系统元件及其支撑体之间的接合部包括无机层或直接接合，因此液密，能够防止浸渍液体发生变形。关节可以做温暖还是冷。焊料，胶水和胶水保护都可用于形成这种接头。在一个实施例中，元件及其支撑件由石英制成。

12. 发明申请

US20100085551A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100085551A1
公开(公告)日：2010-04-08
申请号：US12563838
申请日：2009-09-21
申请人： Marcus Martinus Petrus Adrianus VERMEULEN , Andre Bernardus JEUNINK , Erik Roelof LOOPSTRA , Joost Jeroen OTTENS , Rene Theodorus Petrus COMPEN , Peter SMITS , Martijn HOUBEN , Hendrikus Johannes Marinus VAN ABEELEN , Antonius Arnoldus MEULENDIJKS , Rene Wilhelmus Antonius Hubertus LEENAARS
发明人： Marcus Martinus Petrus Adrianus VERMEULEN , Andre Bernardus JEUNINK , Erik Roelof LOOPSTRA , Joost Jeroen OTTENS , Rene Theodorus Petrus COMPEN , Peter SMITS , Martijn HOUBEN , Hendrikus Johannes Marinus VAN ABEELEN , Antonius Arnoldus MEULENDIJKS , Rene Wilhelmus Antonius Hubertus LEENAARS
IPC分类号： G03B27/72
CPC分类号： G03F7/70716 , G03F7/70775
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 设置有构造成保持基板的基板台的反射镜块; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述反射镜块被构造和布置成减小所述反射镜块和所述基板台之间的滑动。如果镜面块的加速度高，并且衬底台相对于镜面块局部滑动，则可能发生滑移。滑动可能导致曝光误差，因为不再以所需精度确定基板的位置。

13. 发明申请

US20100002207A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100002207A1
公开(公告)日：2010-01-07
申请号：US12483703
申请日：2009-06-12
申请人： Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
发明人： Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
IPC分类号： G03B27/52
CPC分类号： G03F7/709 , G03F7/70808
摘要： A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
摘要翻译：光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。中间框架构造成分离第一室和第二室。该装置包括耦合到第一框架的支撑件。支撑构造成通过中间框架和第二室中的联接开口支撑第一室。

14. 发明申请

US20090207422A1 LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME 有权
标题翻译：平台设备及其校准方法
公开(公告)号：US20090207422A1
公开(公告)日：2009-08-20
申请号：US12426713
申请日：2009-04-20
申请人： Erik Roelof LOOPSTRA , Leon Martin LEVASIER , Rene OESTERHOLT
发明人： Erik Roelof LOOPSTRA , Leon Martin LEVASIER , Rene OESTERHOLT
IPC分类号： G01B11/14
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： A measurement system configured to measure a position of an object in a lithographic apparatus, includes at least three position detectors configured to detect the position of the object, the at least three position detectors each including a single or multi-dimensional optical encoder to provide at least six position values, the optical encoders being coupled to the object at different locations within a three dimensional coordinate system, wherein at least one position value is provided for each dimension of the three dimensional coordinate system, and wherein the measurement system is configured to calculate the position of the object within the three dimensional coordinate system from a subset of at least three of the six position values and to calculate an orientation of the object with respect to the three dimensional coordinate system from another subset of at least three of the six position values.
摘要翻译：被配置为测量光刻设备中的物体的位置的测量系统包括配置成检测物体的位置的至少三个位置检测器，所述至少三个位置检测器包括单个或多维光学编码器以提供在至少六个位置值，所述光学编码器在三维坐标系内的不同位置处耦合到所述对象，其中为所述三维坐标系的每个维度提供至少一个位置值，并且其中所述测量系统被配置为计算从六个位置值中的至少三个的子集的三维坐标系中的对象的位置，并且从六个位置中的至少三个的另一子集计算相对于三维坐标系的对象的取向价值观。

15. 发明申请

US20120026480A1 Image-Compensating Addressable Electrostatic Chuck System 审中-公开
标题翻译：图像补偿可寻址静电卡盘系统
公开(公告)号：US20120026480A1
公开(公告)日：2012-02-02
申请号：US13178377
申请日：2011-07-07
申请人： Erik Roelof LOOPSTRA , Hendrik Antony Johannes Neerhof
发明人： Erik Roelof LOOPSTRA , Hendrik Antony Johannes Neerhof
IPC分类号： G03B27/54 , H02N13/00
CPC分类号： H01L21/6831 , G03F7/70708 , G03F7/70783 , H01L21/6875 , H02N13/00
摘要： An electrostatic chuck including a substrate, a support layer to support an object, an electrode layer comprising an electrode and being disposed between the substrate and the support layer configured to apply an electrostatic attraction force on the object upon energization of the electrode, and a plurality of actuators for deforming the support layer.
摘要翻译：一种静电卡盘，包括基板，用于支撑物体的支撑层，包括电极的电极层，并且设置在基板和支撑层之间，构造成在电极通电时对物体施加静电引力;多个用于使支撑层变形的致动器。

16. 发明申请

US20120013870A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
公开(公告)号：US20120013870A1
公开(公告)日：2012-01-19
申请号：US13240867
申请日：2011-09-22
申请人： Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Johannes Henricus Wilhelmus JACOBS , Hans JANSEN , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Marco Koert STAVENGA , Bob STREEFKERK , Martinus Cornelis Maria VERHAGEN , Lejla SEUNTIENS-GRUDA
发明人： Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Johannes Henricus Wilhelmus JACOBS , Hans JANSEN , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Marco Koert STAVENGA , Bob STREEFKERK , Martinus Cornelis Maria VERHAGEN , Lejla SEUNTIENS-GRUDA
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341
摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

17. 发明申请

US20110222040A1 RADIATION SOURCE APPARATUS, LITHOGRAPHIC APPARATUS, METHOD OF GENERATING AND DELIVERING RADIATION AND METHOD FOR MANUFACTURING A DEVICE 有权
标题翻译：辐射源设备，光刻设备，产生和传送辐射的方法以及用于制造设备的方法
公开(公告)号：US20110222040A1
公开(公告)日：2011-09-15
申请号：US13046303
申请日：2011-03-11
申请人： Jens Arno STEINHOFF , Vadim Yevgenyevich BANINE , Richard Joseph BRULS , Erik Roelof LOOPSTRA , Hendrik Antony Johannes NEERHOF , Adrianus Johannes Maria VAN DIJK , Andrei Mikhailovich YAKUNIN , Luigi SCACCABAROZZI
发明人： Jens Arno STEINHOFF , Vadim Yevgenyevich BANINE , Richard Joseph BRULS , Erik Roelof LOOPSTRA , Hendrik Antony Johannes NEERHOF , Adrianus Johannes Maria VAN DIJK , Andrei Mikhailovich YAKUNIN , Luigi SCACCABAROZZI
IPC分类号： G03B27/54 , G21K5/00 , G01J3/10
CPC分类号： G03F7/70916 , H05G2/003
摘要： A contaminant trap is used in an EUV radiation source apparatus. An EUV radiation beam is generated and focused through a low pressure gaseous atmosphere into a virtual source point. The EUV radiation creates a plasma in the low pressure hydrogen atmosphere through which it passes. A contaminant trap including electrodes is located in or around radiation beam as it approaches the virtual source point. A DC biasing source is connected to the electrodes to create an electric field oriented to deflect out of the beam path contaminant particles that have been negatively charged by the plasma. Additional RF electrodes and/or an ionizer enhance the plasma to increase the charging of the particles. The deflecting electrodes can be operated with RF bias for a short time, to ensure dissipation of the enhanced plasma.
摘要翻译：在EUV辐射源装置中使用污染物阱。产生EUV辐射束并通过低压气体气氛聚焦成虚拟源点。 EUV辐射在其通过的低压氢气氛中产生等离子体。当辐射束接近虚拟源点时，包括电极的污染物陷阱位于辐射束内或周围。 DC偏置源连接到电极以产生电场，该电场被定向以偏离由等离子体带负电的光束路径污染物颗粒。附加的RF电极和/或电离器增强等离子体以增加颗粒的充电。偏转电极可以用RF偏压短时间操作，以确保增强等离子体的耗散。

18. 发明申请

US20110075154A1 LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME 有权
标题翻译：平台设备及其校准方法
公开(公告)号：US20110075154A1
公开(公告)日：2011-03-31
申请号：US12964483
申请日：2010-12-09
申请人： Erik Roelof LOOPSTRA , Leon Martin Levasier , Rene Oesterholt
发明人： Erik Roelof LOOPSTRA , Leon Martin Levasier , Rene Oesterholt
IPC分类号： G01B11/02 , G01B11/14
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.
摘要翻译：一种用于校准光刻设备中的编码器的方法，所述编码器包括传感器和光栅，所述编码器被配置为测量所述光刻设备的可移动支撑件的位置，所述方法包括使用干涉仪测量所述可移动支撑件的位置; 并且基于由干涉仪测量的可移动支撑件的位置来校准编码器。

19. 发明申请

US20100110405A1 RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 有权
标题翻译：辐射源和光刻设备
公开(公告)号：US20100110405A1
公开(公告)日：2010-05-06
申请号：US12611269
申请日：2009-11-03
申请人： Erik Roelof LOOPSTRA , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Erik Petrus Buurman
发明人： Erik Roelof LOOPSTRA , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Erik Petrus Buurman
IPC分类号： G03B27/54 , H05H1/00
CPC分类号： G03F7/70108 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： A source configured to generate EUV radiation includes a fuel droplet generator configured to deliver a droplet of fuel to an interaction point, optics configured to deliver fuel vaporizing and exciting radiation to the interaction point to generate a plasma, and a collector arranged to collect EUV radiation emitted by the plasma. The optics are arranged such that in use the fuel vaporizing and exciting radiation is incident upon more than one side of the fuel droplet at the interaction point.
摘要翻译：被配置为产生EUV辐射的源包括燃料液滴发生器，其构造成将燃料液滴输送到相互作用点，光学构造成将燃料蒸发和激发辐射输送到相互作用点以产生等离子体;以及收集器，其被布置成收集EUV辐射由等离子体发射。光学系统布置成使得在使用中，燃料蒸发和激发的辐射入射在相互作用点处的燃料液滴的多于一侧。

20. 发明申请

US20100053576A1 RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：US20100053576A1
公开(公告)日：2010-03-04
申请号：US12553368
申请日：2009-09-03
申请人： Erik Roelof LOOPSTRA , Gerardus Hubertus Petrus Maria Swinkels
发明人： Erik Roelof LOOPSTRA , Gerardus Hubertus Petrus Maria Swinkels
IPC分类号： G03B27/52 , G03B27/54 , H05H1/00 , B08B7/00
CPC分类号： H05G2/006 , G03F7/70033 , G03F7/70891 , G03F7/70916 , G21K1/06 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.
摘要翻译：辐射源被配置为产生极紫外辐射。辐射源包括在其中使用中产生等离子体的腔室，以及蒸发表面，该蒸发表面构造成蒸发由等离子体形成的副产物并被发射到蒸发表面的材料。用于在平版印刷设备的等离子体辐射源中除去或来自等离子体辐射源的副产物材料的方法包括在等离子体中蒸发在使用中发射到该表面的材料。

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