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11. 发明授权

US06665127B2 Method and apparatus for aligning a photo-tunable microlens 失效
标题翻译：用于对准可光调微透镜的方法和装置
公开(公告)号：US06665127B2
公开(公告)日：2003-12-16
申请号：US10135973
申请日：2002-04-30
申请人： Zhenan Bao , Timofei Nikita Kroupenkine , Alan Michael Lyons , Mary Louise Mandich , Louis Thomas Manzione , Elsa Reichmanis , Shu Yang
发明人： Zhenan Bao , Timofei Nikita Kroupenkine , Alan Michael Lyons , Mary Louise Mandich , Louis Thomas Manzione , Elsa Reichmanis , Shu Yang
IPC分类号： G02B106
CPC分类号： G02B3/12 , G02B3/14 , G02F1/01 , G02F2203/18 , G02F2203/28
摘要： A tunable microlens uses a layer of photo-conducting material which results in a voltage differential between at least one of a plurality of electrodes and a droplet of conducting liquid when a light beam is incident upon the photo-conducting material. Such droplet, which forms the optics of the microlens, moves toward an electrode with higher voltage relative to other electrodes in the microlens. Thus, for example, when the light beam is misaligned with the microlens, the voltage differential causes the droplet, and hence the microlens, to realign itself with the beam.
摘要翻译：可调谐微透镜使用一层光导材料，当光束入射到光导材料上时，导致多个电极中的至少一个与导电液滴之间的电压差。形成微透镜的光学器件的这种液滴相对于微透镜中的其它电极朝向具有较高电压的电极移动。因此，例如，当光束与微透镜不对准时，电压差引起液滴，并且因此使微透镜与光束重新对准。

12. 发明授权

US08603705B2 Polymer film-producing methods and devices produced therefrom 有权
标题翻译：由其制造的聚合物膜制造方法和装置
公开(公告)号：US08603705B2
公开(公告)日：2013-12-10
申请号：US13077896
申请日：2011-03-31
申请人： Avishek Aiyar , Rakesh Nambiar , David Collard , Elsa Reichmanis
发明人： Avishek Aiyar , Rakesh Nambiar , David Collard , Elsa Reichmanis
IPC分类号： G03H3/00 , C08J3/28
CPC分类号： H01B1/127 , C08G61/126 , C08G2261/3223 , C08J5/2256 , C08J2353/02 , H01L51/0037 , H01L51/007
摘要： Described herein are improved methods of forming polymer films, the polymer films formed thereby, and electronic devices formed form the polymer films. The methods generally include contacting a polymer with a solvent to at least partially solvate the polymer in the solvent, exposing the at least partially solvated polymer and solvent to ultrasonic energy for a duration effective to form a plurality of ordered assemblies of the polymer in the solvent, and forming a solid film of the polymer, wherein the solid film comprises the plurality of ordered assemblies of the polymer.
摘要翻译：本文描述了形成聚合物膜，由此形成的聚合物膜以及由聚合物膜形成的电子器件的改进方法。方法通常包括使聚合物与溶剂接触以使溶剂中的聚合物至少部分溶剂化，将至少部分溶剂化的聚合物和溶剂暴露于超声波能量，持续时间有效地在溶剂中形成多个有序聚合物，并形成聚合物的固体膜，其中固体膜包含聚合物的多个有序组件。

13. 发明申请

US20070077681A1 Liquid phase fabrication of active devices including organic semiconductors 失效
标题翻译：包括有机半导体在内的有源器件的液相制造
公开(公告)号：US20070077681A1
公开(公告)日：2007-04-05
申请号：US11240222
申请日：2005-09-30
申请人： Florian Dotz , Howard Katz , Jimmy Granstrom , Elsa Reichmanis , Subramanian Vaidyanathan , Ingolf Hennig , Frauke Richter
发明人： Florian Dotz , Howard Katz , Jimmy Granstrom , Elsa Reichmanis , Subramanian Vaidyanathan , Ingolf Hennig , Frauke Richter
IPC分类号： H01L51/40
CPC分类号： H01L51/0068 , H01L51/0003 , H01L51/0055 , H01L51/052 , H01L51/0529
摘要： Techniques including steps of: providing a support body; forming an organic semiconductor composition body including an organic semiconductor composition on the support body, no more than 10% by weight of the organic semiconductor composition being pentacene; providing a first organic dielectric composition mobilized in a first liquid medium, the organic semiconductor composition being insoluble in the first liquid medium; and forming a first organic dielectric composition body from the first organic dielectric composition on the organic semiconductor composition body. Techniques in which an organic semiconductor composition body is formed on an organic dielectric composition body. Apparatus having an organic dielectric composition body on an organic semiconductor composition body.
摘要翻译：技术包括以下步骤：提供支撑体; 在载体上形成包含有机半导体组合物的有机半导体组合物，不超过10重量％的有机半导体组合物为并五苯; 提供在第一液体介质中移动的第一有机电介质组合物，所述有机半导体组合物不溶于所述第一液体介质; 以及在所述有机半导体组合物主体上从所述第一有机电介质组合物形成第一有机介电组合物体。在有机电介质组合物体上形成有机半导体组合物体的技术。在有机半导体组合物主体上具有有机电介质组合物本体的装置。

14. 发明申请

US20060060839A1 Organic semiconductor composition 审中-公开
标题翻译：有机半导体组成
公开(公告)号：US20060060839A1
公开(公告)日：2006-03-23
申请号：US11021586
申请日：2004-12-23
申请人： Edwin Chandross , Howard Katz , Elsa Reichmanis , Subramanian Vaidyanathan
发明人： Edwin Chandross , Howard Katz , Elsa Reichmanis , Subramanian Vaidyanathan
IPC分类号： H01L29/08
CPC分类号： H01L51/0541 , B82Y10/00 , H01L51/0036 , H01L51/0039 , H01L51/0043 , H01L51/0048 , H01L51/0068 , H01L51/0566
摘要： A solid semiconductor composition includes a solid matrix of organic semiconductor molecules and a dispersion of nanorods or nanotubes in the matrix. The nanorods or nanotubes do not form a percolating structure that spans the composition.
摘要翻译：固体半导体组合物包括有机半导体分子的固体基质和纳米棒或纳米管在基质中的分散体。纳米棒或纳米管不会形成跨越组合物的渗透结构。

15. 发明授权

US5843624A Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material 失效
标题翻译：能量敏感抗蚀剂材料和使用能量敏感抗蚀剂材料的器件制造方法
公开(公告)号：US5843624A
公开(公告)日：1998-12-01
申请号：US803703
申请日：1997-02-21
申请人： Francis Michael Houlihan , Omkaram Nalamasu , Elsa Reichmanis , Thomas Ingolf Wallow
发明人： Francis Michael Houlihan , Omkaram Nalamasu , Elsa Reichmanis , Thomas Ingolf Wallow
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03C5/00
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/114 , Y10S430/146
摘要： The present invention is directed to a process for device fabrication and resist materials that are used in the process. The resist material contains a polymer that is the polymerization product of a monomer that contains alicyclic moieties and at least one other monomer. The polymer is formed by free radical polymerization, and the resulting polymer either has alicyclic moieties incorporated into the polymer backbone or pendant to the polymer backbone via saturated hydrocarbon linkages. Other monomers are selected for polymerization with the alicyclic moiety-containing monomer on the basis of the ability of the monomer to copolymerize by free radical polymerization. Although the polymers are contemplated as useful in resist materials that are sensitive to radiation in the ultraviolet, and x-ray wavelengths as well as sensitive to electron beam radiation, the polymers are particularly advantageous for use in process in which the exposing radiation is 193 nm, because the amount of ethylenic unsaturation in these resist materials is low.
摘要翻译：本发明涉及用于该方法的器件制造和抗蚀剂材料的方法。抗蚀剂材料含有聚合物，其是含有脂环部分的单体和至少一种其它单体的聚合产物。聚合物通过自由基聚合形成，并且所得聚合物或者具有引入到聚合物主链中的脂环部分或通过饱和烃键垂饰于聚合物主链。基于单体通过自由基聚合共聚的能力，选择其它单体与含脂环部分的单体聚合。虽然聚合物被认为可用于对紫外线和X射线波长以及对电子束辐射敏感的抗辐射材料，但是聚合物特别有利于在曝光辐射为193nm ，因为这些抗蚀剂材料中的烯属不饱和基团的量低。

16. 发明授权

US5756266A Process for manufacturing devices using maleimide containing resist polymers 失效
标题翻译：使用含马来酰亚胺的抗蚀剂聚合物制造装置的方法
公开(公告)号：US5756266A
公开(公告)日：1998-05-26
申请号：US679749
申请日：1996-07-15
申请人： Mary Ellen Galvin-Donoghue , Elsa Reichmanis
发明人： Mary Ellen Galvin-Donoghue , Elsa Reichmanis
IPC分类号： G03F7/26 , G03F7/004 , G03F7/039 , G03F7/38 , H01L21/027 , G03C5/00
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/111
摘要： A lithographic process for fabricating a device is disclosed. An area of radiation sensitive material is formed on a substrate. The radiation sensitive material contains a polymeric component The polymeric component is the copolymerization product of a maleimide monomer and at least two other monomers. Acid labile groups are pendant to one of the monomers with which the maleimide monomer is copolymerized. The acid labile groups are pendant to less than 50 mole percent of the monomers that make up the copolymer. The acid labile groups are not pendant to the maleimide monomer. The radiation sensitive material is patternwise exposed to radiation after it is formed on the substrate. The patternwise exposure transfers an image into the radiation sensitive material. The image is developed into a pattern in the radiation sensitive material. The pattern is then transferred into the substrate.
摘要翻译：公开了一种用于制造器件的光刻工艺。辐射敏感材料的区域形成在基底上。辐射敏感材料含有聚合物组分聚合物组分是马来酰亚胺单体和至少两种其它单体的共聚产物。酸不稳定基团是与其中共聚有马来酰亚胺单体的单体之一。酸不稳定基团悬挂于构成共聚物的少于50摩尔％的单体。酸不稳定基团不垂饰于马来酰亚胺单体。辐射敏感材料在其形成在基底上之后被图案化地暴露于辐射。图案曝光将图像转印到辐射敏感材料中。图像被发展成为辐射敏感材料中的图案。然后将图案转移到基底中。

17. 发明授权

US5200544A Resist materials 失效
标题翻译：抵抗材料
公开(公告)号：US5200544A
公开(公告)日：1993-04-06
申请号：US825341
申请日：1992-01-24
申请人： Francis M. Houlihan , Thomas X. Neenan , Elsa Reichmanis
发明人： Francis M. Houlihan , Thomas X. Neenan , Elsa Reichmanis
IPC分类号： G03F7/039
CPC分类号： G03F7/039
摘要： A class of resist compositions sensitive to deep ultraviolet radiation includes a resin sensitive to acid and a composition that generates acid upon exposure to such radiation. A group of nitrobenzyl materials is particularly suitable for use as the acid generator.
摘要翻译：一类对深紫外线辐射敏感的抗蚀剂组合物包括对酸敏感的树脂和暴露于这种辐射时产生酸的组合物。一组硝基苄基材料特别适合用作酸产生剂。

18. 发明授权

US4701342A Negative resist with oxygen plasma resistance 失效
标题翻译：负电阻抗氧等离子体电阻
公开(公告)号：US4701342A
公开(公告)日：1987-10-20
申请号：US837018
申请日：1986-03-06
申请人： Anthony E. Novembre , Elsa Reichmanis
发明人： Anthony E. Novembre , Elsa Reichmanis
IPC分类号： H01L23/29 , G03C1/00 , G03C5/00 , G03F7/00 , G03F7/038 , G03F7/039 , G03F7/075 , G03F7/095 , G03F7/26 , H01L21/00 , H01L21/027 , H01L23/31 , B05D3/06
CPC分类号： G03F7/0758
摘要： Polymers formed from monomers such as chloromethyl styrene and trimethylsilylmethyl methacrylate form negative-acting resists that are sensitive to exposure by electron beam and deep UV radiation. These materials are particularly useful in bilevel resist applications for fabricating masks or for device processing.
摘要翻译：由诸如氯甲基苯乙烯和三甲基甲硅烷基甲基丙烯酸甲酯的单体形成的聚合物形成对电子束和深紫外线辐射的曝光敏感的负性抗蚀剂。这些材料在制造掩模或器件加工的双层抗蚀剂应用中特别有用。

19. 发明申请

US20070074540A1 Process for making crystalline structures having interconnected pores and high refractive index contrasts 审中-公开
$Process for making crystalline structures having interconnected pores and high refractive index contrasts$
标题翻译：具有互连孔和高折射率对比的结晶结构的方法
公开(公告)号：US20070074540A1
公开(公告)日：2007-04-05
申请号：US11635440
申请日：2006-12-06
申请人： Gang Chen , Ronen Rapaport , Elsa Reichmanis , Shu Yang
发明人： Gang Chen , Ronen Rapaport , Elsa Reichmanis , Shu Yang
IPC分类号： C03B37/016
CPC分类号： C03B19/12 , C03B2201/58 , C03C11/00
摘要： Techniques for producing a glass structure having interconnected macroscopic pores, including providing a polymeric structure having interconnected macroscopic pores; providing polymerizable glass precursors; filling pores in the polymeric structure with the polymerizable glass precursors; polymerizing the polymerizable glass precursors to yield a filled polymeric structure; and decomposing the filled polymeric structure to produce a glass structure having interconnected macroscopic pores. Techniques for filling pores of such glass structure with a material having a high refractive index, and for then removing the glass structure. Structures can be produced having interconnected macroscopic pores and high refractive index contrasts, which can be used, for example, as photonic band gaps.
摘要翻译：用于生产具有互连的宏观孔的玻璃结构的技术，包括提供具有互连的宏观孔的聚合物结构; 提供可聚合玻璃前体; 用可聚合玻璃前体填充聚合物结构中的孔; 聚合可聚合的玻璃前体以产生填充的聚合物结构; 并分解填充的聚合物结构以产生具有互连的宏观孔的玻璃结构。用具有高折射率的材料填充这种玻璃结构的孔的技术，然后去除玻璃结构。可以制造具有互连的宏观孔和高折射率对比度的结构，其可以用作例如光子带隙。

20. 发明授权

US07008757B2 Patterned structures of high refractive index materials 有权
$Patterned structures of high refractive index materials$
标题翻译：高折射率材料的图案化结构
公开(公告)号：US07008757B2
公开(公告)日：2006-03-07
申请号：US10321027
申请日：2002-12-17
申请人： Elsa Reichmanis , Shu Yang
发明人： Elsa Reichmanis , Shu Yang
IPC分类号： G03F7/20
CPC分类号： G03F7/2022 , G03F7/001 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/265 , G03F7/36
摘要： A process for forming a polymer template includes exposing a photoresist having polymer molecules to a light pattern and baking the photoresist to chemically react polymer molecules in portions of the photoresist that were exposed to light of the light pattern. The reacted polymer molecules have a different solubility in a solvent than chemically unreacted polymer molecules. The process also includes washing the baked photoresist with the solvent to produce a porous structure by selectively solvating one of the reacted polymer molecules and the unreacted polymer molecules. The porous structure can be used as template for forming porous structures of high refractive index materials.
摘要翻译：用于形成聚合物模板的方法包括将具有聚合物分子的光致抗蚀剂暴露于光图案并烘烤光致抗蚀剂以在暴露于光图案的光的光致抗蚀剂的部分中化学反应聚合物分子。反应的聚合物分子在溶剂中具有与化学未反应的聚合物分子不同的溶解度。该方法还包括用溶剂洗涤烘烤的光致抗蚀剂，以通过选择性地溶剂化一种反应的聚合物分子和未反应的聚合物分子来产生多孔结构。多孔结构可以用作形成高折射率材料的多孔结构的模板。

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