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11. 发明授权

US08524952B2 Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound 有权
标题翻译：改性萘甲醛树脂，含三环癸烷骨架的萘酚化合物和酯化合物
公开(公告)号：US08524952B2
公开(公告)日：2013-09-03
申请号：US13423962
申请日：2012-03-19
申请人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
发明人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
IPC分类号： C07C49/317 , C07C49/323 , C07C49/345
CPC分类号： C07C45/68 , C07C67/14 , C07C69/753 , C07C2603/68 , C08G8/28 , G03F7/094 , C07C49/83
摘要： A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included.
摘要翻译：通过将分子中具有下述通式[1]表示的构成单元的多官能二甲基萘甲醛树脂与选自下述通式[1]所示的苯酚中的至少一种进行改性而得到的改性二甲基萘甲醛树脂， 2]，由以下通式[3]表示的萘酚和由以下通式[4]表示的萘酚，条件是至少任何由通式[3]表示的萘酚或由通式 [4]必须包括在内。

12. 发明申请

US20080113294A1 Compound for Resist and Radiation-Sensitive Composition 有权
标题翻译：抗蚀剂和辐射敏感组合物的化合物
公开(公告)号：US20080113294A1
公开(公告)日：2008-05-15
申请号：US11722636
申请日：2005-12-26
申请人： Masatoshi Echigo , Dai Oguro
发明人： Masatoshi Echigo , Dai Oguro
IPC分类号： G03C1/00
CPC分类号： G03F7/0045 , C07C39/15 , C07C43/164 , C07C43/18 , C07C43/196 , C07C43/2055 , C07C43/225 , C07C43/315 , C07C49/747 , C07C69/96 , C07C2601/14 , C07C2603/74 , G03F7/0392 , Y10S430/106
摘要： A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.
摘要翻译：含有1至80重量％固体组分和20至99重量％溶剂的辐射敏感组合物。固体成分含有化合物B，该化合物B具有（a）由多酚化合物A导入的结构，该酸结合基通过将多元酚化合物A中的至少一个酚羟基引入到通过二 - 具有5至36个碳原子的四官能芳族酮或芳族醛与具有1至3个酚羟基和6至15个碳原子的化合物，和（b）分子量为400至2000.含有化合物B的组合物是有用的作为酸性扩增的非聚合抗蚀剂材料，因为它对诸如KrF准分子激光器，极紫外线，电子束和X射线的辐射高度敏感，并且提供具有高分辨率，高耐热性的抗蚀剂图案，耐腐蚀性高。

13. 发明申请

US20070059632A1 Method of manufacturing a semiconductor device 审中-公开
标题翻译：制造半导体器件的方法
公开(公告)号：US20070059632A1
公开(公告)日：2007-03-15
申请号：US10570855
申请日：2004-08-30
申请人： Dai Oguro , Masatoshi Echigo
发明人： Dai Oguro , Masatoshi Echigo
IPC分类号： G03C1/00
CPC分类号： G03F7/0045 , C07D311/82 , G03F7/0392
摘要： The compound of the present invention is represented by the following formula 1: wherein R1, R2, R4, R5, m0 to m2, and n0 to n2 are as defined in the description. Radiation sensitive compositions containing the compound of the formula 1 as a main component of the solid component are excellent in sensitivity, resolution, heat resistance, etching resistance, and solubility in solvent.
摘要翻译：本发明的化合物由下式1表示：其中R 1，R 2，R 4，R 5，，m0〜m2，n0〜n2如说明书所述。含有作为固体成分的主要成分的式1化合物的辐射敏感性组合物在溶剂中的灵敏度，分辨率，耐热性，耐蚀刻性和溶解性优异。

14. 发明授权

US09150491B2 Bicyclohexane derivative compound and manufacturing method of the same 有权
标题翻译：双环己烷衍生物化合物及其制备方法
公开(公告)号：US09150491B2
公开(公告)日：2015-10-06
申请号：US13522292
申请日：2011-01-13
申请人： Masatoshi Echigo , Dai Oguro
发明人： Masatoshi Echigo , Dai Oguro
IPC分类号： C07C69/54 , C07C43/12 , C07C43/23 , C07C59/72 , C07C69/712 , C08F20/28 , C08F220/28 , C08K5/04 , G03F7/039
CPC分类号： C07C69/54 , C07C43/12 , C07C43/23 , C07C59/72 , C07C69/712 , C07C2601/14 , C08F20/28 , C08F220/28 , C08K5/04 , G03F7/0392 , G03F7/0397 , C08F2220/282 , C08F2220/283 , C08F220/20
摘要： A bicyclohexane derivative compound useful in the field of photoresist, the field of intermediate of drugs and pesticides, and the like, and a manufacturing method of the same are provided. A bicyclohexane derivative compound represented by the following general formula (II) is provided. (In formula (II), Y independently represents an alkyl group of 1 to 10 carbons, a halogen atom, an acyloxy group, an alkoxycarbonyl group or a hydroxyl group, X1 represents a halogen atom, m represents an integer of 0 to 11, and m represents an integer of 0 to 10.).
摘要翻译：提供了可用于光致抗蚀剂领域的双环己烷衍生物化合物，药物和农药中间体领域等及其制备方法。提供由以下通式（II）表示的双环己烷衍生物化合物。（式（II）中，Y独立地表示碳数1〜10的烷基，卤素原子，酰氧基，烷氧基羰基或羟基，X1表示卤素原子，m表示0〜11的整数， m表示0〜10的整数。

15. 发明授权

US08748078B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern 有权
标题翻译：环状化合物，其制备方法，辐射敏感性组合物和形成抗蚀剂图案的方法
公开(公告)号：US08748078B2
公开(公告)日：2014-06-10
申请号：US13393988
申请日：2010-08-30
申请人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
发明人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
IPC分类号： G03F7/004 , G03F7/028 , C07C69/95 , C07C39/12 , C07C39/16
CPC分类号： C07C37/20 , C07C39/17 , C07C47/546 , C07C2601/14 , C07C2603/92 , G03F7/038 , G03F7/0382
摘要： A cyclic compound represented by formula (1): wherein L, R1, R′, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.
摘要翻译：由式（1）表示的环状化合物：其中L，R1，R'和m如说明书中所定义。式（1）的环状化合物对安全性溶剂高度可溶，高度敏感，能够形成具有良好外观的抗蚀剂图案。因此，环状化合物可用作辐射敏感性组合物的组分。

16. 发明授权

US08592134B2 Composition for forming base film for lithography and method for forming multilayer resist pattern 有权
标题翻译：用于形成用于光刻的基底膜的组合物和用于形成多层抗蚀剂图案的方法
公开(公告)号：US08592134B2
公开(公告)日：2013-11-26
申请号：US12746421
申请日：2008-12-01
申请人： Dai Oguro , Go Higashihara , Seiji Kita , Mitsuharu Kitamura , Masashi Ogiwara
发明人： Dai Oguro , Go Higashihara , Seiji Kita , Mitsuharu Kitamura , Masashi Ogiwara
IPC分类号： G03F7/00 , G03F7/11 , G03F7/32 , C08F283/00
CPC分类号： C08G10/02 , G03F7/094
摘要： A composition for forming an underlayer film for lithography for imparting excellent optical characteristics and etching resistance to an underlayer film for lithography, an underlayer film being formed of the composition and having a high refractive index (n) and a low extinction coefficient (k), being transparent, having high etching resistance, containing a significantly small amount of a sublimable component, and a method for forming a pattern using the underlayer film are provided. The composition for forming an underlayer film contains a naphthalene formaldehyde polymer having a specific unit obtained by reacting naphthalene and/or alkylnaphthalene with formaldehyde, and an organic solvent.
摘要翻译：一种用于形成用于光刻的下层膜的组合物，用于赋予用于光刻的下层膜优异的光学特性和耐蚀刻性，由该组合物形成且具有高折射率（n）和低消光系数（k）的下层膜，具有高耐腐蚀性，含有极少量的可升华成分的透明性，以及使用该下层膜形成图案的方法。用于形成下层膜的组合物含有具有通过萘和/或烷基萘与甲醛反应获得的特定单元的萘甲醛聚合物和有机溶剂。

17. 发明申请

US20120251947A1 CYCLIC COMPOUND, METHOD OF PRODUCING THE SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：环化合物，其制造方法，辐射敏感性组合物和形成耐药性图案的方法
公开(公告)号：US20120251947A1
公开(公告)日：2012-10-04
申请号：US13500715
申请日：2010-09-27
申请人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
发明人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
IPC分类号： C07C39/17 , G03F7/20 , C07D319/06 , G03F7/027 , C07C37/00 , C07C47/36
CPC分类号： G03F7/0382 , C07C37/20 , C08G8/04 , C07C39/17
摘要： This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition.
摘要翻译：本发明涉及提供在安全溶剂中具有高溶解度的环状化合物和高灵敏度并且所得抗蚀剂图案的形状良好的环状化合物的方法，其制备方法，包含其的辐射敏感组合物和方法使用该辐射敏感组合物形成抗蚀剂图案。作为解决问题的手段，提供了具有特定结构的环状化合物，包含该化合物的辐射敏感性组合物，以及使用该组合物形成抗蚀剂图案的方法。

18. 发明申请

US20120238781A1 MODIFIED NAPHTHALENE FORMALDEHYDE RESIN, TRICYCLODECANE SKELETON-CONTAINING NAPHTHOL COMPOUND AND ESTER COMPOUND 有权
公开(公告)号：US20120238781A1
公开(公告)日：2012-09-20
申请号：US13423962
申请日：2012-03-19
申请人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
发明人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
IPC分类号： C07C49/83 , C07C45/42
CPC分类号： C07C45/68 , C07C67/14 , C07C69/753 , C07C2603/68 , C08G8/28 , G03F7/094 , C07C49/83
摘要： A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included.

19. 发明授权

US08519177B2 Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound 有权
公开(公告)号：US08519177B2
公开(公告)日：2013-08-27
申请号：US13423996
申请日：2012-03-19
申请人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
发明人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
IPC分类号： C07C69/753 , C07C67/14
CPC分类号： C07C45/68 , C07C67/14 , C07C69/753 , C07C2603/68 , C08G8/28 , G03F7/094 , C07C49/83
摘要： A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included.

20. 发明申请

US20130030211A1 BICYCLOHEXANE DERIVATIVE COMPOUND AND MANUFACTURING METHOD OF THE SAME 有权
标题翻译： BICYCLOHEXANE衍生化合物及其制造方法
公开(公告)号：US20130030211A1
公开(公告)日：2013-01-31
申请号：US13522292
申请日：2011-01-13
申请人： Masatoshi Echigo , Dai Oguro
发明人： Masatoshi Echigo , Dai Oguro
IPC分类号： C07C69/708 , C07C69/533 , C07C39/06 , C07C43/12
CPC分类号： C07C69/54 , C07C43/12 , C07C43/23 , C07C59/72 , C07C69/712 , C07C2601/14 , C08F20/28 , C08F220/28 , C08K5/04 , G03F7/0392 , G03F7/0397 , C08F2220/282 , C08F2220/283 , C08F220/20
摘要： A bicyclohexane derivative compound useful in the field of photoresist, the field of intermediate of drugs and pesticides, and the like, and a manufacturing method of the same are provided. A bicyclohexane derivative compound represented by the following general formula (II) is provided. (In formula (II), Y independently represents an alkyl group of 1 to 10 carbons, a halogen atom, an acyloxy group, an alkoxycarbonyl group or a hydroxyl group, X1 represents a halogen atom, m represents an integer of 0 to 11, and m represents an integer of 0 to 10.)
摘要翻译：提供了可用于光致抗蚀剂领域的双环己烷衍生物化合物，药物和农药中间体领域等及其制备方法。提供由以下通式（II）表示的双环己烷衍生物化合物。（式（II）中，Y独立地表示碳数1〜10的烷基，卤素原子，酰氧基，烷氧基羰基或羟基，X1表示卤素原子，m表示0〜11的整数， m表示0〜10的整数。）

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