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    • 15. 发明授权
    • Dental materials based on multicyclic allyl sulphides
    • 基于多环烯丙基硫化物的牙科材料
    • US07501457B2
    • 2009-03-10
    • US11482164
    • 2006-07-07
    • Jörg AngermannPeter BurtscherUrs Karl FischerNorbert MosznerVolker M. Rheinberger
    • Jörg AngermannPeter BurtscherUrs Karl FischerNorbert MosznerVolker M. Rheinberger
    • A61K6/083C08F28/06
    • A61K6/083A61K6/0017A61K6/0023C08L33/00
    • Dental materials and associated methods are described based on multicyclic allyl sulphides with general Formula (I): in which R1 is H or a C1-C10 alkyl radical; R2 is H or a C1-C10 alkyl radical; R3 is absent or is a C1-C20 alkylene radical which can be interrupted by O or S, a cycloaliphatic C4-C12 radical, a bicyclic C6-C12 radical, a C6-C14 arylene or C7-C20 alkylene arylene radical; R4 is an n-times substituted aliphatic C2 to C20 hydrocarbon radical which can be interrupted by O or S, a cycloaliphatic C4-C12 radical, an aromatic C6-C14 radical, an aliphatic-aromatic C7-C20 radical or a heterocyclic radical which can contain 4 to 20 carbon atoms and 1 to 6 heteroatoms which are selected from N, O, P and/or S atoms, or which is formed exclusively by these heteroatoms; R5 is absent or is a C1-C10 alkylene radical; X is absent or is O, S, —O—CO— or —O—CO—NH—; Y is absent or is O, S, —O—CO— or —O—CO—NH—; m is 0 or 1 and n is an integer from 3 to 6.
    • 基于具有通式(I)的多环烯丙基硫化物描述牙科材料和相关方法:其中R1是H或C1-C10烷基; R2是H或C1-C10烷基; R3不存在或是可被O或S间隔的C 1 -C 20亚烷基,脂环族C 4 -C 12基,双环C 6 -C 12基,C 6 -C 14亚芳基或C 7 -C 20亚烷基亚芳基; R4是可被O或S间隔的n次取代的脂族C 2 -C 20烃基,脂环族C 4 -C 12基团,芳族C 6 -C 14基团,脂族 - 芳族C 7 -C 20基团或杂环基团,其可以 含有4至20个碳原子和1至6个选自N,O,P和/或S原子的杂原子,或仅由这些杂原子形成的杂原子; R5不存在或是C1-C10亚烷基; X不存在或为O,S,-O-CO-或-O-CO-NH-; Y不存在或为O,S,-O-CO-或-O-CO-NH-; m为0或1,n为3至6的整数。
    • 16. 发明申请
    • Dental materials based on multicyclic allyl sulphides
    • 基于多环烯丙基硫化物的牙科材料
    • US20070203256A1
    • 2007-08-30
    • US11482164
    • 2006-07-07
    • Jorg AngermannPeter BurtscherUrs Karl FischerNorbert MosznerVolker M. Rheinberger
    • Jorg AngermannPeter BurtscherUrs Karl FischerNorbert MosznerVolker M. Rheinberger
    • A61K6/08
    • A61K6/083A61K6/0017A61K6/0023C08L33/00
    • Dental materials and associated methods are described based on multicyclic allyl sulphides with general Formula (I): in which R1 is H or a C1-C10 alkyl radical; R2 is H or a C1-C10 alkyl radical; R3 is absent or is a C1-C20 alkylene radical which can be interrupted by O or S, a cycloaliphatic C4-C12 radical, a bicyclic C6-C12 radical, a C6-C14 arylene or C7-C20 alkylene arylene radical; R4 is an n-times substituted aliphatic C2 to C20 hydrocarbon radical which can be interrupted by O or S, a cycloaliphatic C4-C12 radical, an aromatic C6-C14 radical, an aliphatic-aromatic C7-C20 radical or a heterocyclic radical which can contain 4 to 20 carbon atoms and 1 to 6 heteroatoms which are selected from N, O, P and/or S atoms, or which is formed exclusively by these heteroatoms; R5 is absent or is a C1-C10 alkylene radical; X is absent or is O, S, —O—CO— or —O—CO—NH—; Y is absent or is O, S, —O—CO— or —O—CO—NH—; m is 0 or 1 and n is an integer from 3 to 6.
    • 牙科材料和相关方法基于通式(I)的多环烯丙基硫化物来描述:其中R 1是H或C 1 -C 10烷基, 烷基; R 2是H或C 1 -C 10烷基; R 3不存在或是可以被O或S中断的C 1 -C 20亚烷基,脂环族C 1 -C 20烷基, 4个-C 12 - 基团,双环C 6 -C 12 - 基团,C 6 - -C 14亚芳基或C 7 -C 20亚烷基亚芳基; R 4是可以被O或S间隔的n 20取代的C 20烃基C 2〜C 20烃基, 芳族C 6 -C 14 - 基团,脂族 - 芳族C 1 -C 12烷基,芳基C 6 -C 14 - 或者可以含有4至20个碳原子和1至6个选自N,O,P和/或S原子的杂原子的杂环基团,或其中 完全由这些杂原子形成; R 5不存在或者是C 1 -C 10亚烷基; X不存在或为O,S,-O-CO-或-O-CO-NH-; Y不存在或为O,S,-O-CO-或-O-CO-NH-; m为0或1,n为3至6的整数。