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11. 发明授权

US06861207B2 Method for fabricating microlens with lithographic process 失效
标题翻译：用光刻工艺制造微透镜的方法
公开(公告)号：US06861207B2
公开(公告)日：2005-03-01
申请号：US10611645
申请日：2003-06-30
申请人： Hung-Jen Hsu , Chih-Kung Chang , Fu-Tien Weng , Te-Fu Tseng , Chin-Chen Kuo , Chiung-Yuan Chang
发明人： Hung-Jen Hsu , Chih-Kung Chang , Fu-Tien Weng , Te-Fu Tseng , Chin-Chen Kuo , Chiung-Yuan Chang
IPC分类号： G02B3/00 , H01L27/14
CPC分类号： G02B5/201 , G02B3/0018 , G02B3/0056 , H01L27/14685
摘要： A method of fabricating microlens devices. The method includes filling the bond pad areas and scribe lines, or other areas, to improve the topography of the semiconductor wafer surface. A microlens material is applied to the surface after the bond pad areas and scribe lines have been filled. Because of the improved topography, the thickness of the microlens material is more uniform, thereby facilitating the formation of uniformly shaped microlenses.
摘要翻译：一种制造微透镜器件的方法。该方法包括填充接合焊盘区域和划线或其它区域，以改善半导体晶片表面的形貌。在填充接合焊盘区域和划线之后，将微透镜材料施加到表面。由于形貌改善，微透镜材料的厚度更均匀，从而有助于形成均匀成形的微透镜。

12. 发明申请

US20050242271A1 Effective method to improve sub-micron color filter sensitivity 有权
标题翻译：提高亚微米滤色片灵敏度的有效方法
公开(公告)号：US20050242271A1
公开(公告)日：2005-11-03
申请号：US10833565
申请日：2004-04-28
申请人： Fu-Tien Weng , Yu-Kung Hsiao , Chin-Kung Chang , Hung-Jen Hsu , Yi-Ming Dai , Chin-Chen Kuo
发明人： Fu-Tien Weng , Yu-Kung Hsiao , Chin-Kung Chang , Hung-Jen Hsu , Yi-Ming Dai , Chin-Chen Kuo
IPC分类号： H01L27/00 , H01L27/146 , H01L31/00 , H01L31/0216 , H01L31/0232
CPC分类号： H01L27/14685 , H01L27/14621 , H01L27/14623 , H01L27/14625 , H01L27/14627
摘要： An image sensor device and method for forming said device are described. The image sensor structure comprises a substrate with photodiodes, an interconnect structure formed on the substrate, a color filter layer above the interconnect structure, a first microlens array, an overcoat layer, and a second microlens array. A key feature is that a second microlens has a larger radius of curvature than a first microlens. Additionally, each first microlens and second microlens is a flat convex lens. Thus, a thicker second microlens with a short focal length is aligned above a thinner first microlens having a long focal length. A light column that includes a first microlens, a second microlens and a color filter region is formed above each photodiode. A second embodiment involves replacing a second microlens in each light column with a plurality of smaller second microlenses that focus light onto a first microlens.
摘要翻译：描述了用于形成所述装置的图像传感器装置和方法。图像传感器结构包括具有光电二极管的衬底，形成在衬底上的互连结构，在互连结构上方的滤色器层，第一微透镜阵列，外涂层和第二微透镜阵列。一个关键特征是第二微透镜具有比第一微透镜更大的曲率半径。另外，每个第一微透镜和第二微透镜是平凸透镜。因此，具有短焦距的较厚的第二微透镜在具有长焦距的较薄的第一微透镜上对准。在每个光电二极管上方形成包括第一微透镜，第二微透镜和滤色器区域的光柱。第二实施例涉及用多个将光聚焦到第一微透镜上的多个较小的第二微透镜替换每个光柱中的第二微透镜。

13. 发明授权

US07372497B2 Effective method to improve sub-micron color filter sensitivity 有权
标题翻译：提高亚微米滤色片灵敏度的有效方法
公开(公告)号：US07372497B2
公开(公告)日：2008-05-13
申请号：US10833565
申请日：2004-04-28
申请人： Fu-Tien Weng , Yu-Kung Hsiao , Chin-Kung Chang , Hung-Jen Hsu , Yi-Ming Dai , Chin-Chen Kuo
发明人： Fu-Tien Weng , Yu-Kung Hsiao , Chin-Kung Chang , Hung-Jen Hsu , Yi-Ming Dai , Chin-Chen Kuo
IPC分类号： H04N5/225
CPC分类号： H01L27/14685 , H01L27/14621 , H01L27/14623 , H01L27/14625 , H01L27/14627
摘要： An image sensor device and method for forming said device are described. The image sensor structure comprises a substrate with photodiodes, an interconnect structure formed on the substrate, a color filter layer above the interconnect structure, a first microlens array, an overcoat layer, and a second microlens array. A key feature is that a second microlens has a larger radius of curvature than a first microlens. Additionally, each first microlens and second microlens is a flat convex lens. Thus, a thicker second microlens with a short focal length is aligned above a thinner first microlens having a long focal length. A light column that includes a first microlens, a second microlens and a color filter region is formed above each photodiode. A second embodiment involves replacing a second microlens in each light column with a plurality of smaller second microlenses that focus light onto a first microlens.
摘要翻译：描述了用于形成所述装置的图像传感器装置和方法。图像传感器结构包括具有光电二极管的衬底，形成在衬底上的互连结构，在互连结构上方的滤色器层，第一微透镜阵列，外涂层和第二微透镜阵列。一个关键特征是第二微透镜具有比第一微透镜更大的曲率半径。另外，每个第一微透镜和第二微透镜是平凸透镜。因此，具有短焦距的较厚的第二微透镜在具有长焦距的较薄的第一微透镜上对准。在每个光电二极管上方形成包括第一微透镜，第二微透镜和滤色器区域的光柱。第二实施例涉及用多个将光聚焦到第一微透镜上的多个较小的第二微透镜替换每个光柱中的第二微透镜。

14. 发明申请

US20050001281A1 Process to improve image sensor sensitivity 审中-公开
标题翻译：提高图像传感器灵敏度的过程
公开(公告)号：US20050001281A1
公开(公告)日：2005-01-06
申请号：US10858443
申请日：2004-06-01
申请人： Hung-Jen Hsu , Chiu-Kung Chang , Fu-Tien Wong , Te-Fu Tseng
发明人： Hung-Jen Hsu , Chiu-Kung Chang , Fu-Tien Wong , Te-Fu Tseng
IPC分类号： G02B3/00 , G02B27/09 , H01L27/146 , H01L27/148 , H04N5/335 , G02B9/00
CPC分类号： G02B3/0012 , G02B3/0056 , G02B27/09
摘要： A packaged image sensing device of improved sensitivity is formed by providing a mechanism for enhancing the focusing of embedded microlenses on the photosensitive elements of the image sensor. Normally, the bonding material interposed between the packaging layers and the microlenses defocuses the microlenses. In one embodiment of the present invention, the focus is restored by interposing an intermediate optically refractive layer between the bonding material and the lenses. In another embodiment, a bonding material with a lower index of refraction is used. In a final embodiment, the microlenses are formed in a material of a higher index of refraction.
摘要翻译：通过提供用于增强嵌入式微透镜在图像传感器的感光元件上的聚焦的机构来形成具有改进的灵敏度的封装图像感测装置。通常，插入在包装层和微透镜之间的接合材料使微透镜散焦。在本发明的一个实施例中，通过在接合材料和透镜之间插入中间光学折射层来恢复焦点。在另一个实施例中，使用具有较低折射率的接合材料。在最终实施例中，微透镜形成为具有较高折射率的材料。

15. 发明授权

US07126099B2 Image sensor with improved uniformity of effective incident light 有权
标题翻译：具有改善有效入射光均匀性的图像传感器
公开(公告)号：US07126099B2
公开(公告)日：2006-10-24
申请号：US10649436
申请日：2003-08-26
申请人： Hung-Jen Hsu , Chiu-Kung Chang , Chung-Sheng Hsiung , Fu-Tien Wong
发明人： Hung-Jen Hsu , Chiu-Kung Chang , Chung-Sheng Hsiung , Fu-Tien Wong
IPC分类号： H01L27/00 , H01L31/0232 , H04N3/14 , G02B27/10
CPC分类号： H01L27/14643 , H01L27/14621 , H01L27/14627
摘要： An image sensor improving the uniformity of effective incident light. In one example, the size of microlenses disposed in different regions of the image sensor is changed to balance the brightness in different regions, in which the size of each microlens is a function of the distance between the microlens to the chip center In another example, the distance between the center of the microlens and the center of the corresponding sensing area is changed to balance the brightness in different regions and the corresponding color filters are shifted such that the microlens is overlying a corresponding color filter unit without overlying adjacent regions thereof, in which the distance between the center of the microlens and the center of the corresponding sensing area is a function of the distance between the corresponding sensing area to the chip center.
摘要翻译：一种改善有效入射光均匀性的图像传感器。在一个示例中，设置在图像传感器的不同区域中的微透镜的尺寸被改变以平衡不同区域中的亮度，其中每个微透镜的尺寸是微透镜与芯片中心之间的距离的函数。在另一示例中，改变微透镜的中心与相应感测区域的中心之间的距离，以平衡不同区域中的亮度，并且相应的滤色器被移位，使得微透镜覆盖相应的滤色器单元而不覆盖其相邻区域，其中微透镜的中心与相应感测区域的中心之间的距离是与芯片中心的相应感测区域之间的距离的函数。

16. 发明申请

US20050045803A1 Image sensor with improved uniformity of effective incident light 有权
标题翻译：具有改善有效入射光均匀性的图像传感器
公开(公告)号：US20050045803A1
公开(公告)日：2005-03-03
申请号：US10649436
申请日：2003-08-26
申请人： Hung-Jen Hsu , Chiu-Kung Chang , Chung-Sheng Hsiung , Fu-Tien Wong
发明人： Hung-Jen Hsu , Chiu-Kung Chang , Chung-Sheng Hsiung , Fu-Tien Wong
IPC分类号： G02B3/00 , H01L27/00 , H01L27/14 , H01L27/146 , H04N5/335
CPC分类号： H01L27/14643 , H01L27/14621 , H01L27/14627
摘要： An image sensor improving the uniformity of effective incident light. In one example, the size of microlenses disposed in different regions of the image sensor is changed to balance the brightness in different regions, in which the size of each microlens is a function of the distance between the microlens to the chip center In another example, the distance between the center of the microlens and the center of the corresponding sensing area is changed to balance the brightness in different regions and the corresponding color filters are shifted such that the microlens is overlying a corresponding color filter unit without overlying adjacent regions thereof, in which the distance between the center of the microlens and the center of the corresponding sensing area is a function of the distance between the corresponding sensing area to the chip center.
摘要翻译：一种改善有效入射光均匀性的图像传感器。在一个示例中，设置在图像传感器的不同区域中的微透镜的尺寸被改变以平衡不同区域中的亮度，其中每个微透镜的尺寸是微透镜与芯片中心之间的距离的函数。在另一示例中，改变微透镜的中心与相应感测区域的中心之间的距离，以平衡不同区域中的亮度，并且相应的滤色器被移位，使得微透镜覆盖相应的滤色器单元而不覆盖其相邻区域，其中微透镜的中心与相应感测区域的中心之间的距离是与芯片中心的相应感测区域之间的距离的函数。

17. 发明申请

US20070087467A1 CMOS image sensor 有权
标题翻译： CMOS图像传感器
公开(公告)号：US20070087467A1
公开(公告)日：2007-04-19
申请号：US11253956
申请日：2005-10-19
申请人： Hung-Jen Hsu , Fu-Tien Wong
发明人： Hung-Jen Hsu , Fu-Tien Wong
IPC分类号： H01L21/00 , H01L23/02
CPC分类号： H01L27/14632 , H01L27/14627 , H01L27/14645 , H01L27/14685 , H01L27/14687 , H01L27/14689 , Y10S438/975
摘要： A method for forming an image sensor device. An alignment mark is formed on or in a substrate with distance from the alignment mark to the substrate edge less than about 3 mm. An array of active photosensing pixels is formed on the substrate. At least one dielectric layer is formed covering the substrate and the array. A color filter photoresist is formed on the least one dielectric layer. Subsequent to removal of the color filter photoresist from the alignment mark, the color filter photoresist is exposed with alignment to the alignment mark.
摘要翻译：一种用于形成图像传感器装置的方法。在距离对准标记至基板边缘的距离小于约3mm的基板上或基板上形成对准标记。在衬底上形成有活性感光像素阵列。形成覆盖基板和阵列的至少一个电介质层。在至少一个电介质层上形成滤色器光致抗蚀剂。在从对准标记移除滤色器光致抗蚀剂之后，将滤色器光致抗蚀剂与对准标记对齐地曝光。

18. 发明授权

US07508084B2 CMOS image sensor 有权
标题翻译： CMOS图像传感器
公开(公告)号：US07508084B2
公开(公告)日：2009-03-24
申请号：US11253956
申请日：2005-10-19
申请人： Hung-Jen Hsu , Fu-Tien Wong
发明人： Hung-Jen Hsu , Fu-Tien Wong
IPC分类号： H01L23/544 , H01L21/76 , H01L21/00
CPC分类号： H01L27/14632 , H01L27/14627 , H01L27/14645 , H01L27/14685 , H01L27/14687 , H01L27/14689 , Y10S438/975
摘要： A method for forming an image sensor device. An alignment mark is formed on or in a substrate with distance from the alignment mark to the substrate edge less than about 3 mm. An array of active photosensing pixels is formed on the substrate. At least one dielectric layer is formed covering the substrate and the array. A color filter photoresist is formed on the least one dielectric layer. Subsequent to removal of the color filter photoresist from the alignment mark, the color filter photoresist is exposed with alignment to the alignment mark.
摘要翻译：一种用于形成图像传感器装置的方法。在距离对准标记至基板边缘的距离小于约3mm的基板上或基板上形成对准标记。在衬底上形成有活性感光像素阵列。形成覆盖基板和阵列的至少一个电介质层。在至少一个电介质层上形成滤色器光致抗蚀剂。在从对准标记移除滤色器光致抗蚀剂之后，将滤色器光致抗蚀剂与对准标记对齐地曝光。

19. 发明授权

US07553689B2 Semiconductor device with micro-lens and method of making the same 有权
标题翻译：具有微透镜的半导体器件及其制造方法
公开(公告)号：US07553689B2
公开(公告)日：2009-06-30
申请号：US11181189
申请日：2005-07-13
申请人： Jeng-Shyan Lin , Chien-Hsien Tseng , Shou-Gwo Wuu , Ho-Ching Chien , Dun-Nian Yaung , Hung-Jen Hsu
发明人： Jeng-Shyan Lin , Chien-Hsien Tseng , Shou-Gwo Wuu , Ho-Ching Chien , Dun-Nian Yaung , Hung-Jen Hsu
IPC分类号： H01L21/00
CPC分类号： H01L27/14685 , H01L27/14623 , H01L27/14627 , H01L27/14632
摘要： A semiconductor device including a semiconductor substrate having a photosensor formed therein; a first layer overlying the substrate, the first layer includes a portion having a generally concave shaped surface being the negative shaped of a micro-lens to be formed there over; a second layer overlying the first layer, the second layer including a generally convex shaped portion vertically aligned with and mating with the generally concave shaped surface, the generally convex shaped portion being constructed and arranged to define a micro-lens positioned to cause parallel light passing through the micro-lens to converge on and strike the photosensor.
摘要翻译：一种半导体器件，包括其中形成有光电传感器的半导体衬底; 覆盖衬底的第一层，第一层包括具有大致凹形形状的表面的部分，其为在其上形成的微透镜的负形状; 覆盖第一层的第二层，第二层包括垂直对准并与大致凹形的表面配合的大致凸形的部分，大体上凸形的部分被构造和布置以限定微透镜，定位成使得平行光通过通过微透镜收敛并撞击光电传感器。

20. 发明申请

US20070015305A1 Semiconductor device with micro-lens and method of making the same 有权
标题翻译：具有微透镜的半导体器件及其制造方法
公开(公告)号：US20070015305A1
公开(公告)日：2007-01-18
申请号：US11181189
申请日：2005-07-13
申请人： Jeng-Shyan Lin , Chien-Hsien Tseng , Shou-Gwo Wuu , Ho-Ching Chien , Dun-Nian Yaung , Hung-Jen Hsu
发明人： Jeng-Shyan Lin , Chien-Hsien Tseng , Shou-Gwo Wuu , Ho-Ching Chien , Dun-Nian Yaung , Hung-Jen Hsu
IPC分类号： H01L21/00
CPC分类号： H01L27/14685 , H01L27/14623 , H01L27/14627 , H01L27/14632
摘要： A semiconductor device including a semiconductor substrate having a photosensor formed therein; a first layer overlying the substrate, the first layer includes a portion having a generally concave shaped surface being the negative shaped of a micro-lens to be formed there over; a second layer overlying the first layer, the second layer including a generally convex shaped portion vertically aligned with and mating with the generally concave shaped surface, the generally convex shaped portion being constructed and arranged to define a micro-lens positioned to cause parallel light passing through the micro-lens to converge on and strike the photosensor.
摘要翻译：一种半导体器件，包括其中形成有光电传感器的半导体衬底; 覆盖衬底的第一层，第一层包括具有大致凹形形状的表面的部分，其为在其上形成的微透镜的负形状; 覆盖第一层的第二层，第二层包括垂直对准并与大致凹形的表面配合的大致凸形的部分，大体上凸形的部分被构造和布置以限定微透镜，定位成使得平行光通过通过微透镜收敛并撞击光电传感器。

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