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    • 11. 发明申请
    • Method for fabricating semiconductor laser device
    • 制造半导体激光器件的方法
    • US20070099321A1
    • 2007-05-03
    • US10581202
    • 2004-09-27
    • Mamoru MiyachiYoshinori KimuraKiyofumi Chikuma
    • Mamoru MiyachiYoshinori KimuraKiyofumi Chikuma
    • H01L21/00H01L21/28H01L21/3205
    • H01S5/4043H01S5/0217H01S5/0425H01S5/22H01S5/4087
    • A first intermediate body is fabricated on a semiconductor substrate. The first intermediate body includes a first lasing portion of a multi-layer stack and a metal adherent layer. A second intermediate body is fabricated on a support substrate. The second intermediate body includes a second lasing portion formed of a multi-layer stack to be less in size than the first lasing portion, and a groove formed adjacent thereto to form a metal adherent layer. Then, with waveguide paths brought into close proximity, the adherent layers of the first and second intermediate bodies are fused to generate an integrated adherent layer, thereby securely adhering the first and second lasing portions to each other. Thereafter, the support substrate is stripped off from the second lasing portion, thereby allowing the adherent layer to be partially exposed. A semiconductor laser device is thus fabricated which has the exposed adherent layer as a common electrode.
    • 在半导体衬底上制造第一中间体。 第一中间体包括多层堆叠的第一激光部分和金属粘附层。 在支撑基板上制造第二中间体。 第二中间体包括由多层叠层形成的尺寸小于第一激光部分的第二激光部分和与其相邻形成的沟槽以形成金属粘附层。 然后,随着波导路径相互靠近,第一和第二中间体的粘附层被熔合以产生一体化的粘合层,从而将第一和第二激光部分牢固地粘附到彼此。 此后,从第二激光部分剥离支撑基板,从而允许粘附层部分露出。 因此制造了具有暴露的粘附层作为公共电极的半导体激光器件。
    • 13. 发明授权
    • Method of fabricating nitride semiconductor laser
    • 制造氮化物半导体激光器的方法
    • US06235548B1
    • 2001-05-22
    • US09461035
    • 1999-12-15
    • Hiroyuki OtaYoshinori KimuraMamoru Miyachi
    • Hiroyuki OtaYoshinori KimuraMamoru Miyachi
    • H01L2100
    • H01S5/32341H01S5/0213H01S5/3063
    • The disclosure is a method for fabricating a nitride semiconductor laser device of group-III nitride semiconductor having a substrate. The method includes a step of forming a crystal layer made of a group-III nitride semiconductor (AlxGa1-x)1-yInyN (0≦x≦1, 0≦y≦1) having an added group II element over the substrate; a step of heating the crystal layer up to a predetermined temperature in a thermal treatment atmosphere and maintaining the predetermined temperature for a first time period; and a step of introducing a hydrocarbon gas into the thermal treatment atmosphere for at least a partial time period within the first time period. The method further includes a step of irradiating an electromagnetic wave or photons to the crystal layer in the at least a partial time period, wherein the electromagnetic wave or photons have an energy greater than an energy forbidden band width of the group III nitride semiconductor in the crystal layer.
    • 本公开是制造具有基板的III族氮化物半导体的氮化物半导体激光器件的方法。 该方法包括由具有添加的II族元素的III族氮化物半导体(Al x Ga 1-x)1-y In y N(0 <= x <= 1,0 <= y <= 1)形成的晶体层的步骤 基材; 在热处理气氛中将晶体层加热到预定温度并保持第一时间段的预定温度的步骤; 以及在第一时间段内将烃气体引入热处理气氛中至少部分时间段的步骤。 该方法还包括在至少部分时间段内将电磁波或光子照射到晶体层的步骤,其中电磁波或光子的能量大于III族氮化物半导体的能量禁带宽度 晶体层。
    • 16. 发明申请
    • MULTI-WAVELENGTH INTEGRATED SEMICONDUCTOR LASER DEVICE AND METHOD FOR MANUFACTURING SAME
    • 多波长集成半导体激光器件及其制造方法
    • US20090311815A1
    • 2009-12-17
    • US12158648
    • 2006-12-14
    • Mamoru MiyachiYoshinori Kimura
    • Mamoru MiyachiYoshinori Kimura
    • H01L21/20
    • H01S5/4043H01S5/0216H01S5/0224H01S5/02272H01S5/024H01S5/22H01S5/405H01S5/4087Y10S438/977
    • An object is to provide a multi-wavelength integrated semiconductor laser device which can reduce variations in emission point distance, can be formed by simplified manufacturing processes, and can provide improve electric characteristics.A first semiconductor laser element 100 having an active layer AL1 for emitting a laser beam of a first wavelength from its light-emitting point X1 and a second semiconductor laser element 200 having an active layer AL2 for emitting a laser beam of a second wavelength from its light-emitting point X2 are bonded to each other via an adhesive layer MC made of metal. At least either one of the semiconductor laser elements has a ridge waveguide made of an n-type semiconductor. The semiconductor laser elements 100 and 200 are bonded via the metal adhesive layer MC at the sides of their respective p-type semiconductors. A submount SUB is bonded to the first semiconductor laser element 100 via metal at a side where its ridge waveguide is formed.
    • 本发明的目的是提供一种可以减少发射点距离的变化的多波长集成半导体激光器件,可以通过简化的制造工艺形成,并且可以提供改善的电气特性。 具有从其发光点X1发射第一波长的激光束的有源层AL1的第一半导体激光元件100和具有从其发光点X1发射第二波长的激光束的有源层AL2的第二半导体激光元件200 发光点X2通过由金属制成的粘合剂层MC彼此结合。 半导体激光元件中的至少一个具有由n型半导体构成的脊状波导。 半导体激光元件100和200通过金属粘合剂层MC在它们各自的p型半导体的侧面接合。 底座SUB通过金属在其脊形波导形成的一侧与第一半导体激光元件100接合。
    • 18. 发明申请
    • Semiconductor laser device and method of manufacturing the same
    • 半导体激光器件及其制造方法
    • US20070091958A1
    • 2007-04-26
    • US10576925
    • 2004-09-27
    • Mamoru MiyachiYoshinori KimuraKiyofumi Chikuma
    • Mamoru MiyachiYoshinori KimuraKiyofumi Chikuma
    • H01S5/00
    • B82Y20/00H01S5/0201H01S5/0213H01S5/0217H01S5/0425H01S5/2004H01S5/2201H01S5/2214H01S5/2231H01S5/34326H01S5/34333H01S5/4043H01S5/4087
    • This invention is to provide a semiconductor laser device with a small interval between light emitting points of laser lights and a method of manufacturing the same. A first light emitting element 1a having a semiconductor substrate 12a and a laser oscillation section 10a, and a second light emitting element 2a having a laser oscillation section 4a, are brought together with a ridged waveguide 8 of the laser oscillation section 10a facing the ridged waveguide 5 of the laser oscillation section 4a, and then bonded together by virtue of SOGs 3a having a small thickness. A conductive wiring layer Qa1 electrically connected with an ohmic electrode layer 9a on the ridged waveguide 8a, and a wiring layer Qa2 electrically connected with an ohmic electrode layer 6a on the ridged waveguide 5a, are arranged to extend until the insulating layer 11a on the semiconductor substrate 12a. Further, the ohmic electrodes Pa1 and Pa2 are formed on the bottom surface of the semiconductor substrate 12a and the top surface of the laser oscillation section 4a, respectively. In this way, when a drive current is supplied between the ohmic electrode Pa1 and the wiring layer Qa1, the laser oscillation section 10a will emit a light. On the other hand, when a drive current is supplied between the ohmic electrode Pa2 and the wiring layer Qa2, the laser oscillation section 4a will emit a light. In this manner, since the laser oscillation sections 4a and 10a are bonded together by virtue of SOGs 3a having a small thickness, it is allowed to form a semiconductor laser device with a small interval between light emitting points.
    • 本发明提供一种在激光的发光点之间具有小间隔的半导体激光器件及其制造方法。 具有半导体衬底12a和激光振荡部分10a的第一发光元件1a和具有激光振荡部分4a的第二发光元件2a与激光振荡部分的脊状波导8一起 10a面对激光振荡部分4a的脊状波导5,然后借助于具有小厚度的SOG 3a而结合在一起。 与脊状波导管8a上的欧姆电极层9a电连接的导电布线层Qa 1和与脊状波导5a上的欧姆电极层6a电连接的布线层Qa 2被布置成延伸直到 半导体衬底12a上的绝缘层11a。 此外,欧姆电极Pa 1和Pa 2分别形成在半导体衬底12a的底表面和激光振荡部分4a的顶表面上。 以这种方式,当在欧姆电极Pa 1和布线层Qa 1之间提供驱动电流时,激光振荡部分10a将发光。 另一方面,当在欧姆电极Pa 2和布线层Qa 2之间提供驱动电流时,激光振荡部分4a将发光。 以这种方式,由于激光振荡部分4a和10a由于具有小厚度的SOG 3a而结合在一起,所以允许在发光点之间形成间隔小的半导体激光器件。