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11. 发明授权

US08422168B2 Magnetic write head having a self-aligned side wrap-around shield with multi-angle slanted bump 有权
标题翻译：具有具有多角度倾斜凸起的自对准侧包绕屏蔽的磁性写头
公开(公告)号：US08422168B2
公开(公告)日：2013-04-16
申请号：US12343709
申请日：2008-12-24
申请人： Wen-Chien David Hsiao , Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Wen-Chien David Hsiao , Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： G11B5/127
CPC分类号： G11B5/1278 , G11B5/112 , G11B5/3116 , G11B5/3146 , G11B5/315 , G11B5/3163
摘要： A method for forming a magnetic write head having a trailing shield with a tapered and stepped, self aligned trailing magnetic shield. The shield has a tapered portion that tapers away from the write pole as it extends away from the ABS. This tapered portion helps to channel flux to the pole tip portion of the shield, while preventing the loss of write field to the shield. The stepped portion of the shield further helps to prevent the loss of write field and also defines a secondary throat height of the shield that can be accurately located relative to the air bearing surface.
摘要翻译：一种用于形成具有带有锥形和阶梯式自对准拖尾磁屏蔽的后挡板的磁写头的方法。屏蔽件具有锥形部分，当锥形部分远离ABS延伸时，该锥形部分从写入柱逐渐变细。该锥形部分有助于将通量传导到屏蔽的极端部分，同时防止对屏蔽件的写入场的损失。护罩的台阶部分还有助于防止写入场的损失，并且还限定可相对于空气轴承表面精确定位的护罩的次级喉部高度。

12. 发明授权

US08189292B2 Method for manufacturing a magnetic write head having a write pole with a trailing edge taper using a Rieable hard mask 有权
标题翻译：一种使用可重构硬掩模制造具有后缘锥形的写极的磁写头的方法
公开(公告)号：US08189292B2
公开(公告)日：2012-05-29
申请号：US12343723
申请日：2008-12-24
申请人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163
摘要： A method for manufacturing a magnetic write head having a write pole with a tapered, stepped trailing edge. The method includes depositing a magnetic write pole material over a substrate, and then forming a magnetic step structure over the magnetic write pole material. A mask structure is then formed, which includes a multilayer hard mask formed over the magnetic write pole material and the magnetic step structure. An ion milling process is then performed to remove a portion of the write pole material to define a write pole. A non-magnetic material can be deposited and ion milling performed to form non-magnetic side gap layer at the sides of the write pole. A multi-step reactive ion milling process can then be performed to remove the remaining hard mask from over the write pole.
摘要翻译：一种用于制造磁头的方法，该写磁头具有带锥形的阶梯式后缘的写极。该方法包括将磁性写入磁极材料沉积在衬底上，然后在磁性写入磁极材料上形成磁性阶梯结构。然后形成掩模结构，其包括形成在磁性写入磁极材料和磁性步骤结构之上的多层硬掩模。然后执行离子铣削工艺以去除写入极材料的一部分以限定写入极。可以沉积非磁性材料并进行离子铣削以在写入极的两侧形成非磁性侧隙层。然后可以执行多步反应离子研磨过程，以从写极上去除剩余的硬掩模。

13. 发明授权

US08108985B2 Method for manufacturing a perpendicular magnetic write head 有权
标题翻译：用于制造垂直磁写头的方法
公开(公告)号：US08108985B2
公开(公告)日：2012-02-07
申请号：US11934687
申请日：2007-11-02
申请人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
发明人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3166 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T428/11 , Y10T428/1186
摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.
摘要翻译：一种用于制造用于垂直磁记录的磁写头的方法。该方法包括形成写极，然后沉积补充层。掩模结构可以形成在写极和再填充层上，掩模结构被配置为限定缝合极。然后可以执行离子铣或反应离子研磨以去除未被掩模结构保护的部分填充层。然后可以沉积磁性材料以形成限定二次闪光点的缝合写入极。缝合的杆也可以与电动研磨引导件自对准，以便相对于写入头的空气轴承表面精确地定位二次扩张点的前边缘。

14. 发明申请

US20100155363A1 METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD HAVING A WRITE POLE WITH A TRAILING EDGE TAPER USING A RIEABLE HARD MASK 有权
标题翻译：使用可弯曲硬掩模制造具有跟踪边缘的磁头的磁头写入头的方法
公开(公告)号：US20100155363A1
公开(公告)日：2010-06-24
申请号：US12343723
申请日：2008-12-24
申请人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： B44C1/22
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163
摘要： A method for manufacturing a magnetic write head having a write pole with a tapered, stepped trailing edge. The method includes depositing a magnetic write pole material over a substrate, and then forming a magnetic step structure over the magnetic write pole material. A mask structure is then formed, which includes a multilayer hard mask formed over the magnetic write pole material and the magnetic step structure. An ion milling process is then performed to remove a portion of the write pole material to define a write pole. A non-magnetic material can be deposited and ion milling performed to form non-magnetic side gap layer at the sides of the write pole. A multi-step reactive ion milling process can then be performed to remove the remaining hard mask from over the write pole.
摘要翻译：一种用于制造磁头的方法，该写磁头具有带锥形的阶梯式后缘的写极。该方法包括将磁性写入磁极材料沉积在衬底上，然后在磁性写入磁极材料上形成磁性阶梯结构。然后形成掩模结构，其包括形成在磁性写入磁极材料和磁性步骤结构之上的多层硬掩模。然后执行离子铣削工艺以去除写入极材料的一部分以限定写入极。可以沉积非磁性材料并进行离子铣削以在写入极的两侧形成非磁性侧隙层。然后可以执行多步反应离子研磨过程，以从写极上去除剩余的硬掩模。

15. 发明申请

US20120107645A1 METHOD FOR MANUFACTURING A SHORT FLARE DEFINITION BY ADDITIVE PROCESS FOR PERPENDICULAR HEAD 有权
标题翻译：通过添加剂进行短期定义的方法
公开(公告)号：US20120107645A1
公开(公告)日：2012-05-03
申请号：US13339310
申请日：2011-12-28
申请人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
发明人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
IPC分类号： G11B5/33 , G11B5/127
CPC分类号： G11B5/3166 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T428/11 , Y10T428/1186
摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.
摘要翻译：一种用于制造用于垂直磁记录的磁写头的方法。该方法包括形成写极，然后沉积补充层。掩模结构可以形成在写极和再填充层上，掩模结构被配置为限定缝合极。然后可以执行离子铣或反应离子研磨以去除未被掩模结构保护的部分填充层。然后可以沉积磁性材料以形成限定二次闪光点的缝合写入极。缝合的杆也可以与电动研磨引导件自对准，以便相对于写入头的空气轴承表面精确地定位二次扩张点的前边缘。

16. 发明授权

US08136228B2 Method for manufacturing a magnetic write head 有权
标题翻译：磁写头制造方法
公开(公告)号：US08136228B2
公开(公告)日：2012-03-20
申请号：US12343713
申请日：2008-12-24
申请人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , Y10T29/49032 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for manufacturing a magnetic write head that avoids the challenges associated with the formation of fence structures during write pole definition. A magnetic write pole material is deposited. A mask structure is deposited over the magnetic write pole material. The mask structure includes a first hard mask, a marker layer, a physically robust, inorganic RIEable image transfer layer, a second hard mask structure over the image transfer layer and a photoresist layer over the second hard mask. A reactive ion etching process can be used to transfer the image of the photoresist mask and second hard mask layer onto the image transfer layer. An ion milling is performed to define the write pole. A layer of non-magnetic material such as alumina is deposited. An ion milling is performed until the marker layer has been reached, and another reactive ion etching is performed to remove the remaining hard mask.
摘要翻译：一种用于制造写磁头的磁头的方法，其避免了写磁极定义期间与栅栏结构的形成有关的挑战。沉积磁性写入极材料。掩模结构沉积在磁性写入极材料上。掩模结构包括第一硬掩模，标记层，物理上坚固的无机RIEable图像转印层，图像转印层上方的第二硬掩模结构和在第二硬掩模上的光致抗蚀剂层。可以使用反应离子蚀刻工艺将光致抗蚀剂掩模和第二硬掩模层的图像转印到图像转印层上。执行离子铣削以限定写入极。沉积一层非磁性材料如氧化铝。进行离子研磨直到达到标记层，并执行另一反应离子蚀刻以除去剩余的硬掩模。

17. 发明申请

US20100155367A1 METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD HAVING A HARD MASK DEFINED WRITE POLE TRAILING EDGE STEP 有权
标题翻译：制造具有硬掩模的磁头写入头的方法定义的写入轨迹边缘步
公开(公告)号：US20100155367A1
公开(公告)日：2010-06-24
申请号：US12343720
申请日：2008-12-24
申请人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： B44C1/22
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/315 , G11B5/3163 , Y10T29/49048 , Y10T29/49052
摘要： A method for manufacturing a magnetic write head having a write pole with a tapered trailing edge step. The resulting tapered trailing edge step maximizes write field at very small bit sizes by preventing the magnetic saturation of the write pole at the pole tip. The method includes depositing a magnetic write pole material and then depositing a magnetic material over the magnetic write pole material. A RIE mask and hard mask are deposited over the magnetic bump material. A resist mask is formed over the RIE mask and hard mask, and a reactive ion etching is performed to transfer the pattern of the resist mask onto the underlying hard mask. Then an ion milling is performed to form a the magnetic step layer with a tapered edge that defines a tapered trailing edge step structure of the write pole.
摘要翻译：一种用于制造具有具有锥形后缘台阶的写极的磁写头的方法。所产生的锥形后沿步骤通过防止磁极尖端的写极的磁饱和而使非常小的位尺寸的写入场最大化。该方法包括沉积磁性写入磁极材料，然后在磁性写入磁极材料上沉积磁性材料。 RIE掩模和硬掩模沉积在磁性凸块材料上。在RIE掩模和硬掩模上形成抗蚀剂掩模，并且执行反应离子蚀刻以将抗蚀剂掩模的图案转移到下面的硬掩模上。然后执行离子铣削以形成具有锥形边缘的磁性阶梯层，其限定了写入极的锥形后缘阶梯结构。

18. 发明申请

US20090117407A1 SHORT FLARE DEFINITION BY ADDITIVE PROCESS FOR PERPENDICULAR HEAD 有权
标题翻译：通过添加剂进行快速定义
公开(公告)号：US20090117407A1
公开(公告)日：2009-05-07
申请号：US11934687
申请日：2007-11-02
申请人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
发明人： Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
IPC分类号： B05D5/12 , G11B5/33
CPC分类号： G11B5/3166 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T428/11 , Y10T428/1186
摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.
摘要翻译：一种用于制造用于垂直磁记录的磁写头的方法。该方法包括形成写极，然后沉积补充层。掩模结构可以形成在写极和再填充层上，掩模结构被配置为限定缝合极。然后可以执行离子铣或反应离子研磨以去除未被掩模结构保护的部分填充层。然后可以沉积磁性材料以形成限定二次闪光点的缝合写入极。缝合的杆也可以与电动研磨引导件自对准，以便相对于写入头的空气轴承表面精确地定位二次扩张点的前边缘。

19. 发明申请

US20100155232A1 METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD HAVING A WRITE POLE TRAILING EDGE TAPER 审中-公开
标题翻译：制造具有写波纹边缘磁头的磁头写头的方法
公开(公告)号：US20100155232A1
公开(公告)日：2010-06-24
申请号：US12343014
申请日：2008-12-23
申请人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： C23C14/00
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , G11B5/315 , H01F41/34
摘要： A method for manufacturing a magnetic write head for perpendicular magnetic data recording, having a write pole with a tapered trailing edge for improved write field at small bit lengths. The trailing edge taper is formed by a deposition process that can be performed after the write pole flare point has already been formed, and especially after a wrap around shield side gap has been formed. This advantageously allows the distance between the write pole flare point and the trailing edge taper to be closely controlled.
摘要翻译：一种用于制造用于垂直磁数据记录的磁写头的方法，具有带有锥形后缘的写极，以便以较小的位长改善写入场。后缘锥形是通过可以在已经形成写入磁极扩张点之后进行的沉积工艺形成的，特别是在形成了围绕屏蔽侧间隙之后。这有利地允许密切控制写磁极扩张点和后缘锥度之间的距离。

20. 发明申请

US20090152234A1 PROCESS FOR SELF-ALIGNED FLARE POINT AND SHIELD THROAT DEFINITION PRIOR TO MAIN POLE PATTERNING 有权
标题翻译：自动对准点的过程和主要绘图前的屏蔽定义
公开(公告)号：US20090152234A1
公开(公告)日：2009-06-18
申请号：US11956277
申请日：2007-12-13
申请人： Hung-Chin Guthrie , Ming Jiang , Edward Hin Pong Lee , Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Hung-Chin Guthrie , Ming Jiang , Edward Hin Pong Lee , Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： B44C1/22
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3146 , G11B5/315
摘要： A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.
摘要翻译：一种用于制造具有定义二次闪光点的具有扩口步骤特征的写极的磁写头的方法。该方法包括将磁性写入极材料沉积在衬底上，然后将磁性材料沉积在写入极材料上，随后是非磁性材料。形成第一掩模，其具有前边缘以限定次级火炬点的位置，并且使用一个或多个材料去除过程来去除未被该第一掩模保护的磁性层和非磁性层的部分。第一个掩模由配置为定义写入极的第二个掩模代替，并且执行离子铣削来定义写入极点。从磁性层和非磁性层的阴影形成扩张的次级耀斑点。

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