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11. 发明申请

US20060068512A1 Method and apparatus for detecting defects 失效
标题翻译：检测缺陷的方法和装置
公开(公告)号：US20060068512A1
公开(公告)日：2006-03-30
申请号：US11206209
申请日：2005-08-18
申请人： Yoshimasa Ohshima , Minori Noguchi , Hiroyuki Nakano
发明人： Yoshimasa Ohshima , Minori Noguchi , Hiroyuki Nakano
IPC分类号： H01L21/66 , G01R31/26
CPC分类号： G01N21/9505 , G01N21/47 , G01N21/94 , G01N21/9501
摘要： An inspection apparatus projects a laser beam on the surface of a SOI wafer and detects foreign matter on and defects in the surface of the SOI wafer by receiving scattered light reflected from the surface of the SOI wafer. The wavelength of the laser beam used by the inspection apparatus is determined so that a penetration depth of the laser beam in a Si thin film may be 10 nm or below to detect only foreign matter on and defects in the outermost surface and not to detect foreign matter and defects in a BOX layer. Only the foreign matter on and defects in the outermost surface layer can be detected without being influenced by thin-film interference by projecting the laser beam on the surface of the SOI wafer and receiving scattered light rays.
摘要翻译：检查装置将激光束投射在SOI晶片的表面上，通过接收从SOI晶片的表面反射的散射光来检测SOI晶片的异物和表面的缺陷。确定检查装置使用的激光束的波长，使得Si薄膜中的激光束的穿透深度可以为10nm以下，仅检测异物和最外表面的缺陷，并且不检测外部 BOX层的物质和缺陷。只有通过将激光束投射在SOI晶片的表面上并且接收散射光线，才能够检测出最外层的异物和缺陷，而不受薄膜干涉的影响。

12. 发明授权

US07859656B2 Defect inspection method and system 有权
标题翻译：缺陷检查方法和系统
公开(公告)号：US07859656B2
公开(公告)日：2010-12-28
申请号：US12366956
申请日：2009-02-06
申请人： Sachio Uto , Hiroyuki Nakano , Yukihiro Shibata , Akira Hamamatsu , Yuta Urano
发明人： Sachio Uto , Hiroyuki Nakano , Yukihiro Shibata , Akira Hamamatsu , Yuta Urano
IPC分类号： G01N21/00 , G01N21/88 , H01L27/00
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/4788 , G01N21/94 , G01N21/956
摘要： An inspection system includes: a facility that uses wide-band illumination light having different wavelengths and single-wavelength light to perform dark-field illumination on an object of inspection, which has the surface thereof coated with a transparent film, in a plurality of illuminating directions at a plurality of illuminating angles; a facility that detects light reflected or scattered from repetitive patterns and light reflected or scattered from non-repetitive patterns with the wavelengths thereof separated from each other; a facility that efficiently detects light reflected or scattered from a foreign matter or defect in the repetitive patterns or non-repetitive patterns or a foreign matter or defect on the surface of the transparent film; and a facility that removes light, which is diffracted by the repetitive patterns, from a diffracted light image of actual patterns or design data representing patterns. Consequently, a more microscopic defect can be detected stably.
摘要翻译：检查系统包括：使用具有不同波长的宽带照明光和单波长光的设备，在具有透明膜的表面上的多个照明中对被检查对象进行暗视场照明多个照明角度的方向; 检测从重复图案反射或散射的光和从彼此分离的波长的非重复图案反射或散射的光的设备; 有效地检测异物反射或散射的光或重复图案或非重复图案中的缺陷或透明膜表面上的异物或缺陷的设备; 以及通过重复图案衍射的光从实际图案的衍射光图像或表示图案的设计数据中去除的设施。因此，能够稳定地检测出更微细的缺陷。

13. 发明授权

US07751037B2 Method and apparatus for detecting defects 失效
标题翻译：检测缺陷的方法和装置
公开(公告)号：US07751037B2
公开(公告)日：2010-07-06
申请号：US12435523
申请日：2009-05-05
申请人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
发明人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
IPC分类号： G01N21/958 , G01N21/88
CPC分类号： G01N21/956 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N2021/8822
摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.
摘要翻译：提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。用于检测缺陷的装置包括放置基板样本并可在X-Y-Z-中的每个中任意移动的台部; 方向，用于利用来自倾斜方向的光照射电路图案的照明系统，以及用于从上下方向在检测器上形成照射的检测区域的图像的图像形成光学系统。利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。由检测器从样本接收的散射和反射光被转换成电信号。将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

14. 发明申请

US20070177136A1 Apparatus and method for inspecting defects 有权
标题翻译：用于检查缺陷的装置和方法
公开(公告)号：US20070177136A1
公开(公告)日：2007-08-02
申请号：US11653322
申请日：2007-01-16
申请人： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
发明人： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
IPC分类号： G01N21/88
CPC分类号： G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/9513 , G01N2021/95638 , H01L22/12
摘要： A defect inspection apparatus includes an irradiation optical system 20, a detection optical system 30, and an image processor 40. In the irradiation optical system, a mirror 2603 is disposed to reflect downward a beam flux that has been guided to a first or second optical path, and a cylindrical lens 251 and an inclined mirror 2604 are disposed to focus the beam flux that has been directed downward by the mirror, at an inclination angle from a required oblique direction extending horizontally, onto a substrate 1 to be inspected, as a slit-shaped beam 90.
摘要翻译：缺陷检查装置包括照射光学系统20，检测光学系统30和图像处理器40。在照射光学系统中，设置反射镜2603以向下反射已经被引导到第一或第二光路的光束，并且设置柱面透镜251和倾斜镜2604以聚焦已导向的光束作为狭缝状光束90，通过反射镜向下倾斜，从与水平方向延伸的所需倾斜方向倾斜的角度，到被检查的基板1上。

15. 发明授权

US07528942B2 Method and apparatus for detecting defects 失效
标题翻译：检测缺陷的方法和装置
公开(公告)号：US07528942B2
公开(公告)日：2009-05-05
申请号：US11472426
申请日：2006-06-22
申请人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
发明人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N2021/8822
摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.
摘要翻译：提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。用于检测缺陷的装置包括：载置基板试样的载台部分，其可以在XYZ-θ方向中任意移动;照射系统，用于利用来自倾斜方向的光照射电路图案;以及图像形成光学系统，用于从上下方向在检测器上形成照射的检测区域的图像。利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。由检测器从样本接收的散射和反射光被转换成电信号。将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

16. 发明授权

US08462330B2 Method and apparatus for detecting defects 失效
标题翻译：检测缺陷的方法和装置
公开(公告)号：US08462330B2
公开(公告)日：2013-06-11
申请号：US13362808
申请日：2012-01-31
申请人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
发明人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N2021/8822
摘要： A method and apparatus for detecting defects are provided for detecting defects or foreign matter on an object to be inspected. The apparatus includes a movable stage for mounting a specimen, an illumination system for irradiating a circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. A spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip.
摘要翻译：提供一种用于检测缺陷的方法和装置，用于检测被检测物体上的缺陷或异物。该装置包括用于安装样本的可移动台，用于从倾斜方向的光照射电路图案的照明系统和用于从上方和倾斜形成检测器上的照射检测区域的图像的图像形成光学系统方向。利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。由检测器接收的散射和反射光被转换成电信号。将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。

17. 发明申请

US20110063603A1 APPARATUS AND METHOD FOR INSPECTING DEFECTS 有权
标题翻译：检查缺陷的装置和方法
公开(公告)号：US20110063603A1
公开(公告)日：2011-03-17
申请号：US12950243
申请日：2010-11-19
申请人： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
发明人： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
IPC分类号： G01N21/88 , G01J4/00
CPC分类号： G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/9513 , G01N2021/95638 , H01L22/12
摘要： A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.
摘要翻译：缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统，包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。

18. 发明申请

US20090122303A1 Apparatus And Method For Inspecting Defects 有权
标题翻译：检查缺陷的装置和方法
公开(公告)号：US20090122303A1
公开(公告)日：2009-05-14
申请号：US12328357
申请日：2008-12-04
申请人： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
发明人： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
IPC分类号： G01N21/88
CPC分类号： G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/9513 , G01N2021/95638 , H01L22/12
摘要： A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.
摘要翻译：缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统，包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。

19. 发明授权

US07333192B2 Apparatus and method for inspecting defects 有权
标题翻译：用于检查缺陷的装置和方法
公开(公告)号：US07333192B2
公开(公告)日：2008-02-19
申请号：US11653322
申请日：2007-01-16
申请人： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
发明人： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
IPC分类号： G01N21/88
CPC分类号： G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/9513 , G01N2021/95638 , H01L22/12
摘要： A defect inspection apparatus includes an irradiation optical system 20, a detection optical system 30, and an image processor 40. In the irradiation optical system, a mirror 2603 is disposed to reflect downward a beam flux that has been guided to a first or second optical path, and a cylindrical lens 251 and an inclined mirror 2604 are disposed to focus the beam flux that has been directed downward by the mirror, at an inclination angle from a required oblique direction extending horizontally, onto a substrate 1 to be inspected, as a slit-shaped beam 90.
摘要翻译：缺陷检查装置包括照射光学系统20，检测光学系统30和图像处理器40。在照射光学系统中，设置反射镜2603以向下反射已经被引导到第一或第二光路的光束，并且设置柱面透镜251和倾斜镜2604以聚焦已导向的光束作为狭缝状光束90，通过反射镜向下倾斜，从与水平方向延伸的所需倾斜方向倾斜的角度，到被检查的基板1上。

20. 发明授权

US08218138B2 Apparatus and method for inspecting defects 有权
标题翻译：用于检查缺陷的装置和方法
公开(公告)号：US08218138B2
公开(公告)日：2012-07-10
申请号：US13172233
申请日：2011-06-29
申请人： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
发明人： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
IPC分类号： G01N21/00 , G01N21/88
CPC分类号： G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/9513 , G01N2021/95638 , H01L22/12
摘要： A defect inspection apparatus and method includes utilizing an irradiation optical system that focuses a beam flux emitted from a laser light source and formed into a slit-shaped beam so as to irradiate the beam onto the surface of the substrate to be inspected, utilizing a detection optical system that detects light from the substrate that has been irradiated with the slit-shaped beam, and utilizing a signal processor that processes a signal output from the detection optical system. The irradiation optical system includes a cylindrical lens for focusing the beam that has been emitted from the laser light source onto the substrate to be inspected, as the slit-shaped beam, wherein the cylindrical lens is disposed so as to obtain a distance between an incidence surface or emitting surface thereof and the slit-shaped beam upon the substrate to be inspected to be equal to a focal distance of the cylindrical lens.
摘要翻译：缺陷检查装置和方法包括利用照射光学系统，其将从激光源发射的光束束聚焦并形成为狭缝状光束，以便将光束照射到待检查的基板的表面上，利用检测光学系统，其检测来自已经被狭缝形光束照射的基板的光，以及利用处理从检测光学系统输出的信号的信号处理器。照射光学系统包括用于将从激光光源发射的光束聚焦到待检查的基板上的柱面透镜作为狭缝状光束，其中，设置柱面透镜以获得入射光表面或发射表面以及待检查的基板上的狭缝状光束等于柱面透镜的焦距。

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