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11. 发明授权

US07098055B2 Apparatus and method for testing defects 失效
公开(公告)号：US07098055B2
公开(公告)日：2006-08-29
申请号：US11244078
申请日：2005-10-06
申请人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
发明人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
IPC分类号： H01L21/66 , G01R31/26
CPC分类号： B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspection method includes radiating an illumination slit-shaped beam having lights substantially parallel to a longitudinal direction to a substrate having circuit patterns in a direction inclined at a predetermined gradient relative to the direction of a line normal to the substrate and inclined at a predetermined gradient on a surface with respect to a group of main straight lines of the circuit patterns with its longitudinal direction oriented almost perpendicularly to a direction of a movement of the substrate. Scattered light reflected by a defect such as a foreign particle existing on the illuminated substrate is received and converted into a detection signal by using an image sensor, and defect judging is effected of an extracted a signal indicating a defect such as a foreign particle on the basis of the detection signal output.

12. 发明授权

US5062715A Method and apparatus for detecting photoacoustic signal and method for detecting internal defect of semiconductor device 失效
标题翻译：用于检测光声信号的方法和装置以及用于检测半导体器件的内部缺陷的方法
公开(公告)号：US5062715A
公开(公告)日：1991-11-05
申请号：US479712
申请日：1990-02-14
申请人： Toshihiko Nakata , Yukio Kembo
发明人： Toshihiko Nakata , Yukio Kembo
IPC分类号： G01N29/00 , G01N29/04 , G01N29/24 , G02B21/00
CPC分类号： G02B21/0072 , G01N29/2418 , G01N2291/0423 , G01N2291/2697
摘要： A photoacoustic signal detecting method and apparatus for intensity-modulating light having a wavelength penetrating a sample such as a semiconductor device at a desired frequency, the light being emitted from a first light source, focusing the intensity-modulated light on the sample as a light spot, by changing the position of the sample and the optical constant of the means for focusing, scanning the light spot inside the sample in a depth direction thereof to detect the photoacoustic effect generated in the sample, and extracting information relative to the surface and inside of the sample and defect information therein. The photoacoustic effect is detected using an interferometer. Light incident on the sample surface for a second light source in order to obtain interference light and the interference light reflected from the sample surface are adjusted in response to a signal indicative of the depth of the light spot to detect optimum interference light. Light reflected from the sample surface when light emitted from a third light source is incident on the surface is detected through the focusing optical system to generate the signal indicative of the depth of the light spot.
摘要翻译：一种光声信号检测方法和装置，用于强度调制具有以期望频率穿透诸如半导体器件的样品的波长的光，所述光从第一光源发射，将强度调制光聚焦在样品上作为光通过改变样品的位置和聚焦装置的光学常数，扫描样品内的光斑在其深度方向上，以检测样品中产生的光声效应，并提取相对于表面和内部的信息的样品和缺陷信息。使用干涉仪检测光声效应。为了获得干涉光和从样品表面反射的干涉光，入射到用于第二光源的样品表面上的光被响应于指示光斑的深度的信号来调节以检测最佳干涉光。通过聚焦光学系统检测从第三光源发射的光入射在表面上的从样品表面反射的光，以产生指示光斑深度的信号。

13. 发明授权

US4803712A X-ray exposure system 失效
标题翻译： X射线曝光系统
公开(公告)号：US4803712A
公开(公告)日：1989-02-07
申请号：US4880
申请日：1987-01-20
申请人： Yukio Kembo , Minoru Ikeda , Motoya Taniguchi
发明人： Yukio Kembo , Minoru Ikeda , Motoya Taniguchi
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70691 , G03F7/709
摘要： An X-ray exposure system includes a frame set on the floor; an X-ray source fixedly provided in the central portion of the upper part of the frame; a mask-wafer alignment means comprising a wafer at a fixed distance from a mask, an X-Y table mounted with the wafer holder, a mask holder for holding the mask, and an alignment detecting means for detecting the alignment of the alignment pattern of the mask and that of the wafer; vibration isolators for supporting the mask-wafer alignment means so that vibrations do not propagate to the mask-wafer alignment means; detecting means for detecting the position of the mask-wafer alignment means with respect to three-dimensional directions relative to the X-ray source; an arithmetic means for calculating an exposure error of a dislocation of a mask pattern exposure on the wafer, on the basis of position data obtained by the detecting means; and correcting means for correcting the exposure error calculated by the arithmetic means.
摘要翻译： X射线曝光系统包括设置在地板上的框架; 固定地设置在所述框架的上部的中心部分的X射线源; 掩模晶片对准装置，其包括距离掩模固定距离的晶片，安装有晶片保持器的XY工作台，用于保持掩模的掩模支架，以及用于检测掩模的对准图案的对准的对准检测装置和晶片的; 用于支撑掩模 - 晶片对准装置的振动隔离器，使得振动不传播到掩模 - 晶片对准装置; 检测装置，用于相对于X射线源相对于三维方向检测掩模晶片对准装置的位置; 用于根据由检测装置获得的位置数据计算晶片上的掩模图案曝光的位错的曝光误差的算术装置; 以及校正装置，用于校正由算术装置计算出的曝光误差。

14. 发明授权

US4666291A Light-exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4666291A
公开(公告)日：1987-05-19
申请号：US852729
申请日：1986-04-16
申请人： Motoya Taniguchi , Asahiro Kuni , Ryuichi Funatsu , Yukio Kembo , Akira Inagaki
发明人： Motoya Taniguchi , Asahiro Kuni , Ryuichi Funatsu , Yukio Kembo , Akira Inagaki
IPC分类号： H01L51/00 , G03F7/20 , G03F9/00 , G03B27/68
CPC分类号： G03F9/7053 , G03F7/703 , G03F7/707
摘要： A light-exposure apparatus which can keep uniform the gap between a mask and a wafer and reduce the density of arrangement of vertical movers adapted to deform the wafer to thereby reduce cost and weight of the apparatus. The apparatus has a thin plate deforming mechanism comprising a chuck platen for holding on its top surface the wafer, the bottom surface of the chuck platen being formed with imperforate slits patterned in the form of a grid composed of a plurality of triangular meshes so that the chuck platen may be deformed along bending lines near the triangular meshes, and a plurality of vertical movers for vertically deforming the individual triangular meshes so as to flatten or deform into a desired shape the wafer.
摘要翻译：能够使掩模和晶片之间的间隙保持均匀并且减小适于使晶片变形的垂直移动器的布置密度，从而降低装置的成本和重量的曝光装置。该装置具有薄板变形机构，其包括用于在其顶表面上保持晶片的卡盘台板，卡盘台板的底表面形成为由多个三角形网格构成的网格形式的无孔狭缝，使得卡盘台板可以沿着三角形网格附近的弯曲线变形，并且多个垂直移动器用于使各个三角形网格垂直变形，以使其平坦化或变形成所需形状的晶片。

15. 发明授权

US07940383B2 Method of detecting defects on an object 失效
标题翻译：检测物体上的缺陷的方法
公开(公告)号：US07940383B2
公开(公告)日：2011-05-10
申请号：US12630307
申请日：2009-12-03
申请人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuyai Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
发明人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuyai Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
IPC分类号： G01N21/00
CPC分类号： B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method for detecting defects on an object includes an illumination optical unit which obliquely projects a laser focused onto a line on a surface of the object and white-color, a table unit which mounts the specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from the object and passed through a filter which blocks diffraction light resulting from patterns formed on the object, a signal processor which processes a signal outputted from the image sensor of the detection optical unit to extract defects of the object, and a display unit which displays information of defects extracted by the signal processor. The filter is adjustable.
摘要翻译：一种用于检测物体上的缺陷的方法包括：照射光学单元，其将聚焦在物体的表面上的线的激光倾斜投影到白色;安装样本并且可移动的台单元;检测光学单元，利用图像传感器检测由物体反射的光形成的光的图像，并通过阻挡由形成在物体上的图案产生的衍射光的滤光器，处理从检测光学单元的图像传感器输出的信号的信号处理器以提取对象的缺陷;以及显示单元，显示由信号处理器提取的缺陷的信息。过滤器可调。

16. 发明授权

US07443496B2 Apparatus and method for testing defects 失效
标题翻译：检测缺陷的装置和方法
公开(公告)号：US07443496B2
公开(公告)日：2008-10-28
申请号：US11681996
申请日：2007-03-05
申请人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
发明人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
IPC分类号： G01N21/00
CPC分类号： B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspection apparatus includes an illumination optical unit for obliquely illuminating an object with a slit-like shaped laser, a first detection optical unit for detecting a first image formed by light reflected from the object by the illumination of the slit-like shaped laser and reflected in a first direction substantially normal to a surface of the object, a second detection optical unit for detecting a second image formed by light reflected from the object by the illumination of the slit-like shaped laser and reflected in a second direction inclined to the normal direction to the surface of the object, an image signal processing unit which processes a signal outputted from the first detection optical unit and a signal outputted from the second detection optical unit, and an output unit which outputs information processed by the image signal processing unit.
摘要翻译：缺陷检查装置包括：用狭缝状激光器对物体进行倾斜照明的照明光学单元;第一检测光学单元，用于检测由所述狭缝状激光的照射而从物体反射的光形成的第一图像;以及反射在基本上垂直于物体的表面的第一方向上;第二检测光学单元，用于检测由通过照射狭缝状激光而从物体反射的光形成的第二图像，并以与第二方向倾斜的第二方向反射对象物的表面的正常方向，处理从第一检测光学单元输出的信号和从第二检测光学单元输出的信号的图像信号处理单元，以及输出单元，其输出由图像信号处理单元处理的信息。

17. 发明申请

US20080223122A1 SCANNING PROBE MICROSCOPE 有权
标题翻译：扫描探针显微镜
公开(公告)号：US20080223122A1
公开(公告)日：2008-09-18
申请号：US12023158
申请日：2008-01-31
申请人： Masahiro Watanabe , Toru KURENUMA , Hiroshi Kuroda , Takafumi Morimoto , Shuichi Baba , Toshihiko Nakata , Manabu Edamura , Yukio Kembo
发明人： Masahiro Watanabe , Toru KURENUMA , Hiroshi Kuroda , Takafumi Morimoto , Shuichi Baba , Toshihiko Nakata , Manabu Edamura , Yukio Kembo
IPC分类号： G01B5/28
CPC分类号： G01Q70/04 , G01Q10/06
摘要： A scanning probe microscope, capable of performing shape measurement not affected by electrostatic charge distribution of a sample, which: monitors an electrostatic charge state by detecting a change in a flexure or vibrating state of a cantilever due to electrostatic charges in synchronization with scanning during measurement with relative scanning between the probe and the sample, and makes potential adjustment so as to cancel an influence of electrostatic charge distribution, thus preventing damage of the probe or the sample due to discharge and achieving reduction in measurement errors due to electrostatic charge distribution.
摘要翻译：扫描探针显微镜，其能够执行不受样品静电荷分布影响的形状测量，其通过检测与测量同步的静电荷引起的静电荷的悬臂的挠曲或振动状态的变化来监测静电荷状态通过探针和样品之间的相对扫描，进行电位调整，以消除静电电荷分布的影响，从而防止由于放电而引起的探针或样品的损伤，并实现由静电电荷分布引起的测量误差的降低。

18. 发明授权

US07173693B2 Method for inspecting defects and an apparatus of the same 有权
标题翻译：检查缺陷的方法及其装置
公开(公告)号：US07173693B2
公开(公告)日：2007-02-06
申请号：US11042173
申请日：2005-01-26
申请人： Yukihiro Shibata , Shunji Maeda , Yukio Kembo
发明人： Yukihiro Shibata , Shunji Maeda , Yukio Kembo
IPC分类号： G01N21/00 , G06K9/00
CPC分类号： G01N21/956 , G01N21/9501
摘要： A method for inspecting a specimen includes obtaining an image of a specimen through a first optical system, displaying the obtained image of the specimen on a display screen; dividing the displayed image of the specimen into plural regions and setting defect detection sensitivity for each of the plural divided regions, transferring the specimen from the first optical system to a second optical system, obtaining an image of the specimen through the second optical system, detecting defects on the specimen by processing the image obtained through the second optical system using the defect detection sensitivity set for a respective region, and displaying information of the detected defects on the display screen.
摘要翻译：用于检查样本的方法包括通过第一光学系统获得样本的图像，将获得的样本图像显示在显示屏上; 将样本的显示图像分割成多个区域，并且对多个分割区域中的每一个分割区域设置缺陷检测灵敏度，将样本从第一光学系统传送到第二光学系统，通过第二光学系统获得样本的图像，检测通过使用针对各个区域设置的缺陷检测灵敏度处理通过第二光学系统获得的图像，并在显示屏幕上显示检测到的缺陷的信息，来检查样本上的缺陷。

19. 发明申请

US20060097162A1 Apparatus and method for determining surface profiles using a scanning probe microscope 有权
标题翻译：使用扫描探针显微镜确定表面轮廓的装置和方法
公开(公告)号：US20060097162A1
公开(公告)日：2006-05-11
申请号：US11251795
申请日：2005-10-18
申请人： Shigenobu Maruyama , Mineo Nomoto , Toru Kurenuma , Yuichi Kunitomo , Yukio Kembo
发明人： Shigenobu Maruyama , Mineo Nomoto , Toru Kurenuma , Yuichi Kunitomo , Yukio Kembo
IPC分类号： G21K7/00
CPC分类号： G01Q10/04
摘要： A scanning probe microscope for measuring a surface profile of a sample by bringing a probe into close proximity to or contact with the surface of the sample and scanning the sample surface includes: a sample stage movable in at least one axis direction; the probe which is brought into close proximity to or contact with the surface of the sample mounted on the sample stage and scans the sample surface; a probe-driving unit for moving the probe three-dimensionally; a probe deflection detector for detecting a deflection of the probe; and an observation optical system which has an objective lens and observes the probe disposed on substantially the optical axis of the objective lens, and the sample. The probe-driving unit is disposed with three sets of paired drive sources arranged essentially with symmetry with respect to the optical axis of the objective lens.
摘要翻译：一种扫描探针显微镜，用于通过使探针靠近或接触样品的表面并扫描样品表面来测量样品的表面轮廓，包括：可在至少一个轴向移动的样品台; 该探头与安装在样品台上的样品的表面紧密接触或接触并扫描样品表面; 用于三维移动探头的探针驱动单元; 用于检测探针偏转的探针偏转检测器; 以及观察光学系统，其具有物镜并观察设置在物镜的基本光轴上的探针和样品。探针驱动单元设置有三组成对的驱动源，其基本上相对于物镜的光轴对称布置。

20. 发明申请

US20050206887A1 Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process 失效
标题翻译：用于分析半导体制造工艺中的外来颗粒的产生状态的方法和装置
公开(公告)号：US20050206887A1
公开(公告)日：2005-09-22
申请号：US11128352
申请日：2005-05-13
申请人： Hiroshi Morioka , Minori Noguchi , Yoshimasa Ohshima , Yukio Kembo , Hidetoshi Nishiyama , Kazuhiko Matsuoka , Yoshiharu Shigyo
发明人： Hiroshi Morioka , Minori Noguchi , Yoshimasa Ohshima , Yukio Kembo , Hidetoshi Nishiyama , Kazuhiko Matsuoka , Yoshiharu Shigyo
IPC分类号： G01N21/00 , G01N21/94 , G01N21/95 , G01N21/956 , G01R31/308 , H01J37/00 , H01L21/00 , H01L21/66 , H01L21/68
CPC分类号： H01L21/681 , B82Y15/00 , G01N21/94 , G01N21/9501 , G01N21/95623 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L22/12
摘要： An apparatus and method for detecting defects on a specimen includes an illumination optical unit which obliquely projects a laser onto a region which is longer in one direction on a surface of a specimen than in a transverse direction, a table unit which mounts the specimen and which is movable, a detection optical unit which detects light from the specimen illuminated by the laser with an image sensor while the table is moving, and a signal processor. The signal processor processes a signal outputted from the image sensor of the detection optical unit and converted to a digital signal and extracts defects of the specimen by comparing the converted digital signal with a reference digital signal. A display unit displays information of defects extracted by the signal processor.
摘要翻译：用于检测试样缺陷的装置和方法包括照射光学单元，其将激光倾斜地突出到在一个方向上在一个方向上比在横向方向上更长的区域，安装样本的台单元，可移动的检测光学单元，检测光学单元，其在桌子移动时利用图像传感器检测由激光照射的样本的光，以及信号处理器。信号处理器处理从检测光学单元的图像传感器输出的信号并转换为数字信号，并通过将转换的数字信号与参考数字信号进行比较来提取样本的缺陷。显示单元显示由信号处理器提取的缺陷的信息。

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