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11. 发明申请

US20110310524A1 WAFER CHUCK FOR EUV LITHOGRAPHY 有权
标题翻译： WAVER CHUCK FOR EUV LITHOGRAPHY
公开(公告)号：US20110310524A1
公开(公告)日：2011-12-22
申请号：US13163100
申请日：2011-06-17
申请人： Stephan Six
发明人： Stephan Six
IPC分类号： H01L21/687
CPC分类号： G03F7/70783 , G03F7/70708
摘要： A wafer chuck (1b) having a substrate (2) and having, applied to the substrate (2), an electrically conductive coating (8) for fixing a wafer (6) by electrostatic attraction and preferably having a reflective coating (10) applied to the substrate (2). The coating (8; 10) has at least a first layer (3; 11) under compressive stress and at least a second layer (7; 12) under tensile stress for compensating for the compressive stress of the first layer (3; 11) in order to keep deformation of the wafer chuck (1b) by the coating (8, 10) as low as possible.
摘要翻译：一种具有衬底（2）并且具有施加到衬底（2）上的用于通过静电吸引固定晶片（6）的导电涂层（8）并且优选地具有应用反射涂层（10）的晶片卡盘（1b）（2）。涂层（8; 10）在拉伸应力下至少具有压缩应力下的第一层（3; 11）和至少第二层（7; 12），用于补偿第一层（3; 11）的压缩应力，以便通过涂层（8,10）保持晶片卡盘（1b）的变形尽可能低。

12. 发明授权

US08007711B2 Method for operating a converter 有权
标题翻译：操作转换器的方法
公开(公告)号：US08007711B2
公开(公告)日：2011-08-30
申请号：US12443733
申请日：2007-10-02
申请人： Christian Imiela , Stephan Schulze , Stephan Six , Christoph Sundermann , Joerg Hertel , Rolf Best
发明人： Christian Imiela , Stephan Schulze , Stephan Six , Christoph Sundermann , Joerg Hertel , Rolf Best
IPC分类号： C21C5/50
CPC分类号： C21C5/50
摘要： In a method for operating a converter (1), in which the converter (1) is mounted in a carrying ring (3) by means of carrying journals (2), a gear mechanism (4) is mounted in a floating manner on the carrying journals (2), the converter (1) is configured, as a result, such that it can tilt about its horizontal axis and the gear mechanism (4) is connected rigidly to a pedestal (6) by a torque support (5), the torque support (5) connects the gear mechanism (4) to the pedestal (6) during the tilting operation of the converter (1), and the torque support (5) is released from the pedestal (6) or from the gear mechanism (4) or from both during operation of the converter (1).
摘要翻译：在用于操作转换器（1）的方法中，其中转换器（1）通过承载轴颈（2）安装在承载环（3）中，齿轮机构（4）以漂浮的方式安装在（2），转换器（1）的结构使得其能够围绕其水平轴线倾斜，并且齿轮机构（4）通过扭矩支撑件（5）刚性地连接到基座（6）在转换器（1）的倾转操作期间，扭矩支撑件（5）将齿轮机构（4）连接到基座（6），并且扭矩支撑件（5）从基座（6）或齿轮机构（4）或两者在转换器（1）的操作期间。

13. 发明申请

US20080297754A1 Microlithographic projection exposure apparatus 审中-公开
标题翻译：微光刻投影曝光装置
公开(公告)号：US20080297754A1
公开(公告)日：2008-12-04
申请号：US12031595
申请日：2008-02-14
申请人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
发明人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
IPC分类号： G03B27/54 , G02B5/00
CPC分类号： G02B1/11 , G03F7/70191 , G03F7/70308 , G03F7/70958
摘要： The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.
摘要翻译：本公开涉及一种微光刻投影曝光装置，例如用于生产大型集成电路和其它微结构元件的微光投影曝光装置。本公开特别涉及光学元件的涂层以增加或降低反射率。

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