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11. 发明申请

US20070263196A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20070263196A1
公开(公告)日：2007-11-15
申请号：US11878076
申请日：2007-07-20
申请人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
发明人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.
摘要翻译：光刻投影装置被布置成通过限定在与基板相邻的空间的液体将图案从图案形成装置投影到基板上。该装置包括在该空间中的液体转向器，以促进流过空间的液体流动。

12. 发明申请

US20070258072A1 Exposure apparatus, method for cleaning memeber thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device 有权
标题翻译：曝光装置，其清洁装置的方法，曝光装置的维护方法，维护装置及其制造方法
公开(公告)号：US20070258072A1
公开(公告)日：2007-11-08
申请号：US11822964
申请日：2007-07-11
申请人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
发明人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
IPC分类号： G03B27/42
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/7095 , G03F7/70958 , G03F7/70975
摘要： An exposure apparatus EXS forms an immersion area AR2 of a liquid LQ on the side of the image plane of a projection optical system PL and performs exposure of a substrate P via the projection optical system PL and the liquid LQ of the immersion region AR2. The exposure apparatus EXS has an optical cleaning unit (80) which irradiates a predetermined irradiation light Lu, having an optical cleaning effect, onto, for example, the upper surface (31) of the substrate stage PST which makes contact with the liquid LQ for forming the immersion area AR2. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.
摘要翻译：曝光装置EXS在投影光学系统PL的像面侧形成液体LQ的浸渍区域AR2，经由投影光学系统PL和浸渍区域AR 2的液体LQ进行基板P的曝光。曝光装置EXS具有光学清洁单元（80），其将具有光学清洁效果的预定照射光Lu照射到例如与液体LQ接触的基板载台PST的上表面（31）形成浸渍区域AR 2。因此，可以防止由于与浸没区域中的液体接触的构件的污染导致的曝光精度和测量精度的劣化。

13. 发明申请

US20070188727A1 IMAGE FORMING STATE ADJUSTING SYSTEM, EXPOSURE METHOD AND EXPOSURE APPARATUS, AND PROGRAM AND INFORMATION STORAGE MEDIUM 有权
公开(公告)号：US20070188727A1
公开(公告)日：2007-08-16
申请号：US11736177
申请日：2007-04-17
申请人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
发明人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
IPC分类号： G03B27/52
CPC分类号： G03B21/18 , G03B27/42 , G03F7/70258 , G03F7/705 , G03F7/70508 , G03F7/70525 , G03F7/706
摘要： A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.

14. 发明申请

US20070188726A1 IMAGE FORMING STATE ADJUSTING SYSTEM, EXPOSURE METHOD AND EXPOSURE APPARATUS, AND PROGRAM AND INFORMATION STORAGE MEDIUM 有权
标题翻译：图像形成状态调整系统，曝光方法和曝光装置，以及程序和信息存储介质
公开(公告)号：US20070188726A1
公开(公告)日：2007-08-16
申请号：US11736134
申请日：2007-04-17
申请人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
发明人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
IPC分类号： G03B27/52
CPC分类号： G03B21/18 , G03B27/42 , G03F7/70258 , G03F7/705 , G03F7/70508 , G03F7/70525 , G03F7/706
摘要： A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.
摘要翻译：第二通信服务器经由第一通信服务器获取曝光装置中的调整单元的调整信息和与投影光学系统的图像形成质量（例如波前像差）有关的曝光条件下的调整信息，以及然后基于该信息计算目标曝光条件下的调整单元的最佳调整量。此外，第二通信服务器经由第一通信服务器获取投影光学系统的图像形成质量的调整和实际测量数据的调整信息，然后基于目标曝光条件计算调整单元的最佳调整量信息。并且，第二通信服务器基于计算结果经由第一通信服务器控制曝光装置中的调整单元。

15. 发明申请

US20050024612A1 Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method 失效
标题翻译：投影光学系统调整方法，预测方法，评价方法，调整方法，曝光方法和曝光装置，程序和装置制造方法
公开(公告)号：US20050024612A1
公开(公告)日：2005-02-03
申请号：US10927287
申请日：2004-08-27
申请人： Shigeru Hirukawa , Toshiharu Nakashima , Kenji Higashi
发明人： Shigeru Hirukawa , Toshiharu Nakashima , Kenji Higashi
IPC分类号： G03F7/20 , G03B27/68
CPC分类号： G03F7/706 , G03F7/70258 , G03F7/70625 , G03F7/70883
摘要： Wavefront aberration of a projection optical system is measured and information on the wavefront aberration is obtained (step 102). Furthermore, a pattern of a reticle is transferred onto a wafer via a projection optical system (steps 104 to 108). Then, the waver on which the pattern is transferred is developed, and line width measurement is performed on the resist image formed on the wafer and line width difference of images of a first line pattern extending in a predetermined direction and a second line pattern that is orthogonal to the first line pattern is measured (steps 112 to 118). And, according to a value of the 12th term of the Zernike polynomial, which is an expansion of the wavefront aberration, and the line width difference, the projection optical system is adjusted so that magnitude of the 9th term (a low order spherical aberration term) is controlled (steps 120 to 124).
摘要翻译：测量投影光学系统的波前像差，获得关于波前像差的信息（步骤102）。此外，通过投影光学系统将标线图案转印到晶片上（步骤104至108）。然后，显影图案的摇动器，对形成在晶片上的抗蚀剂图像进行线宽测量，并且对沿预定方向延伸的第一线图案和第二线图案的图像的线宽差测量与第一线图案正交的（步骤112至118）。并且，根据作为波前像差的扩展的线性宽度差的Zernike多项式的第12项的值和线宽差，调整投影光学系统，使得第9项（低阶球面像差项）（步骤120至124）。

16. 发明授权

US5525808A Alignment method and alignment apparatus with a statistic calculation using a plurality of weighted coordinate positions 失效
标题翻译：使用多个加权坐标位置进行统计计算的对准方法和对准装置
公开(公告)号：US5525808A
公开(公告)日：1996-06-11
申请号：US360028
申请日：1994-12-20
申请人： Nobuyuki Irie , Eiji Takane , Shigeru Hirukawa , Yoshichika Iwamoto , Ryoichi Kaneko
发明人： Nobuyuki Irie , Eiji Takane , Shigeru Hirukawa , Yoshichika Iwamoto , Ryoichi Kaneko
IPC分类号： G03F9/00 , G01N21/86
CPC分类号： G03F9/7003
摘要： A method of aligning each of a plurality of processing areas regularly aligned on a substrate according to designed alignment coordinates to a predetermined reference position in a static coordinate system for defining the moving position of the substrate is disclosed. The coordinate positions, on the static coordinate system, of at least three processing areas selected in advance as specific processing areas from the plurality of processing areas are measured. The coordinate positions, on the static coordinate system, of the plurality of processing areas on the substrate are determined by weighting the coordinate positions, on the static coordinate system, of the at least three specific processing areas according to the distances between a processing area of interest and each of the at least three specific processing areas in units of processing areas on the substrate, and executing a statistic calculation using the plurality of weighted coordinate positions.
摘要翻译：公开了一种将根据设计的对准坐标在基板上规则排列的多个处理区域中的每一个对齐到用于限定基板的移动位置的静态坐标系中的预定基准位置的方法。测量在静态坐标系上，从多个处理区域中预先选择的至少三个处理区域作为特定处理区域的坐标位置。通过基于静态坐标系上的坐标位置，在静态坐标系上对所述至少三个特定处理区域的坐标位置进行加权，所述坐标位置根据处理区域的处理区域感兴趣，并且在基板上的处理区域的单位中的至少三个特定处理区域中的每一个，以及使用多个加权坐标位置执行统计量计算。

17. 发明授权

US5493402A EGA alignment method using a plurality of weighting coefficients 失效
标题翻译：使用多个加权系数的EGA对准方法
公开(公告)号：US5493402A
公开(公告)日：1996-02-20
申请号：US425244
申请日：1995-04-17
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： G03F7/22 , G03F9/00 , H01L21/027 , H01L21/30 , G01B11/00
CPC分类号： G03F9/7003
摘要： An alignment method for aligning each of plural process areas arranged on a substrate to a specified point in a fixed coordinate system defining a position of movement of the substrate, comprises measuring the positions of a number of specified areas, selected in advance from the plural process areas on the substrate; determining plural amounts of deformation between the specified areas and one of the process areas; determining plural weighting coefficients corresponding to the plural amounts of distortion, for each of the specified areas; and calculating the coordinate position of the one of the process areas on the fixed coordinate system, by statistical processing of the measured coordinate positions of the specified areas, utilizing the plural weighting coefficients.
摘要翻译：一种对准方法，用于将布置在基板上的多个处理区域中的每一个对准定义基板移动位置的固定坐标系中的指定点，包括测量从多个处理中预先选择的多个指定区域的位置基材上的区域; 确定所述指定区域和所述处理区域之一中的多个变形量; 针对每个指定区域确定对应于多个失真量的多个加权系数; 并且通过利用多个加权系数统计处理所测量的指定区域的坐标位置，来计算固定坐标系上的一个处理区域的坐标位置。

18. 发明授权

US5475490A Method of measuring a leveling plane 失效
标题翻译：测量平整面的方法
公开(公告)号：US5475490A
公开(公告)日：1995-12-12
申请号：US181463
申请日：1994-01-14
申请人： Shigeru Hirukawa , Eiji Takane
发明人： Shigeru Hirukawa , Eiji Takane
IPC分类号： G03B27/34 , G01B11/26 , G03F7/20 , G03F7/207 , G03F9/00 , G11B5/31 , H01L21/027 , H01L21/30 , G01B11/00
CPC分类号： G03F9/7034 , G01B11/26
摘要： In order to measure inclination of a leveling plane with respect to the best image forming plane rapidly at a high accuracy without using a special super-flat wafer, the images of five focus measuring marks are exposed on shot areas partially overlapping with each other, on one hand, in a first exposure area when a focal position is made to coincide with a first focal position by operating a leveling mechanism and, on the other hand, in each of exposure areas when the focal positions are changed gradually. The best focal position is obtained by using an average of the mark lengths of the images of the marks as the mark lengths of the images of marks of measuring points at the upper left corners of the focal positions.
摘要翻译：为了在不使用特殊的超平坦晶片的情况下以高精度快速测量平整平面相对于最佳成像平面的倾斜度，将五个聚焦测量标记的图像暴露在彼此部分重叠的拍摄区域上，一方面，在通过操作调平机构使焦点位置与第一焦点位置一致而在第一曝光区域中，另一方面，当焦点位置逐渐变化时，在每个曝光区域中。通过使用标记的图像的标记长度的平均值作为焦点位置的左上角的测量点的标记的图像的标记长度来获得最佳焦点位置。

19. 发明授权

US5434026A Exposure condition measurement method 失效
标题翻译：曝光条件测量方法
公开(公告)号：US5434026A
公开(公告)日：1995-07-18
申请号：US989909
申请日：1992-12-11
申请人： Norihiko Takatsu , Kyoichi Suwa , Shinichi Nakamura , Hiroaki Hosokawa , Shigeru Hirukawa
发明人： Norihiko Takatsu , Kyoichi Suwa , Shinichi Nakamura , Hiroaki Hosokawa , Shigeru Hirukawa
IPC分类号： G03F7/20 , G03F7/207 , H01L21/027 , H01L21/30 , G03C5/00
CPC分类号： G03F7/2022 , G03F7/70633 , G03F7/70641 , G03F7/70675
摘要： In a method for measuring a condition for exposing, at a predetermined energy quantity, a pattern formed on a mask onto a photosensitive substrate on which a resist image is formed on the surface thereof by using an exposing device, first patterns formed at a plurality of positions on the mask are successively exposed onto a plurality of partial regions on the photosensitive substrate while changing said exposure condition. Second patterns are, with overlapping, exposed onto at least a portion of the latent image of said first patterns formed in said partial regions due to said process while changing the exposure condition. A predetermined state where the resist image is formed on the resist layer after the development is detected so that the exposure condition is measured in accordance with the state.
摘要翻译：在通过使用曝光装置测量以预定能量将形成在其上形成有抗蚀剂图像的感光基板上的掩模曝光的条件的方法中，形成多个在改变所述曝光条件的同时，将掩模上的位置依次曝光在感光基板上的多个部分区域上。在改变曝光条件的同时，由于所述处理，第二图案重叠地暴露在形成在所述部分区域中的所述第一图案的至少一部分潜像上。在显影后在抗蚀剂层上形成抗蚀剂图像的预定状态，使得根据状态测量曝光条件。

20. 发明授权

US09146474B2 Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas 有权
标题翻译：曝光方法和装置以及在轴上区域和多个离轴区域中制造具有光线大小和不同线偏振状态的光量分布的装置的方法
公开(公告)号：US09146474B2
公开(公告)日：2015-09-29
申请号：US12382277
申请日：2009-03-12
申请人： Takehito Kudo , Shigeru Hirukawa
发明人： Takehito Kudo , Shigeru Hirukawa
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70191 , G03B27/42 , G03F7/70091 , G03F7/701 , G03F7/70108 , G03F7/70158 , G03F7/70566
摘要： An exposure method and apparatus that illuminates a pattern with an illumination system to expose a substrate through a projection system are provided. The pattern is illuminated with illumination light having a light amount distribution, which is set such that an amount of light is larger in an on-axis area substantially including an optical axis and in a plurality of off-axis areas arranged out of the optical axis than in an area other than the on-axis area and the plurality of off-axis areas on a pupil plane of the illumination system. The polarization states of the illumination light are different between the on-axis area and the off-axis areas.
摘要翻译：提供了利用照明系统照亮图案以通过投影系统曝光基板的曝光方法和装置。用具有光量分布的照明光照射图案，该光量被设定为使得在基本上包括光轴的轴上区域中的光量以及布置在光轴外的多个离轴区域中的光量较大而不是在照明系统的光瞳平面上的除了轴上区域和多个离轴区域之外的区域中。照明光的偏振状态在轴上区域和离轴区域之间是不同的。

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