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11. 发明授权

US09028917B2 High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films 有权
标题翻译：高分子量烷基烯丙基钴三羰基配合物及其用于制备电介质薄膜的用途
公开(公告)号：US09028917B2
公开(公告)日：2015-05-12
申请号：US13388861
申请日：2010-07-27
申请人： Rajesh Odedra , Neil Boag , Jeff Anthis , Ravi Kanjolia
发明人： Rajesh Odedra , Neil Boag , Jeff Anthis , Ravi Kanjolia
IPC分类号： C23C16/00 , C07F15/00 , C07F15/06 , C23C16/40 , C23C16/455
CPC分类号： C07F15/06 , C23C16/406 , C23C16/45553
摘要： A method for forming a cobalt-containing thin film by a vapor deposition process is provided. The method comprises using at least one precursor corresponding in structure to Formula (I); wherein R1 and R2 are independently C2-C8-alkyl; x is zero, 1 or 2; and y is zero or 1; wherein both x and y can not be zero simultaneously.
摘要翻译：提供了一种通过气相沉积工艺形成含钴薄膜的方法。该方法包括使用至少一种在结构上对应于式（I）的前体; 其中R 1和R 2独立地为C 2 -C 8 - 烷基; x为零，1或2; y为0或1; 其中x和y两者不能同时为零。

12. 发明申请

US20120266967A1 EVAPORATOR 有权
标题翻译：蒸发器
公开(公告)号：US20120266967A1
公开(公告)日：2012-10-25
申请号：US13504838
申请日：2010-10-21
申请人： Ravi Kanjolia , Chris Platts , Nam Nguyen , Mark Wilkinson
发明人： Ravi Kanjolia , Chris Platts , Nam Nguyen , Mark Wilkinson
IPC分类号： C23C16/455
CPC分类号： C23C16/4483 , C23C14/243 , C23C16/4481 , Y10T137/0318 , Y10T137/4891 , Y10T137/7976 , Y10T137/8122 , Y10T137/8622
摘要： A solid precursor delivery assembly generally includes a container having upper and lower portions and chambers defined within the container, including an inlet chamber, an outlet chamber, and first and second precursor chambers. The first and second precursor chambers are configured for holding precursor material within the container. Sintered frits are fixedly coupled and sealed to an interior portion of the container, and define at least part of the chambers within the container. At least one of the sintered frits is configured for retaining precursor material thereon within the first precursor chamber, and at least one of the sintered frits is configured for retaining precursor material thereon within the second precursor chamber. An inlet is coupled to the container for delivering carrier gas into the container, and an outlet is coupled to the container for use in removing vaporized precursor material and carrier gas from the container.
摘要翻译：固体前体输送组件通常包括具有限定在容器内的上部和下部和室的容器，包括入口室，出口室以及第一和第二前体室。第一和第二前体室被配置用于将前体材料保持在容器内。烧结玻璃料被固定地联接并密封到容器的内部，并且限定容器内的至少一部分室。烧结的玻璃料中的至少一个被配置用于将第一前体室内的前体材料保持在其上，并且至少一个烧结的玻璃料构造成用于在第二前体室内保留前体材料。入口耦合到容器以将载气输送到容器中，并且出口连接到容器以用于从容器中除去汽化的前体材料和载气。

13. 发明授权

US08272626B2 Bubbler for the transportation of substances by a carrier gas 有权
标题翻译：用于通过载气运送物质的鼓泡器
公开(公告)号：US08272626B2
公开(公告)日：2012-09-25
申请号：US12093893
申请日：2006-10-12
申请人： Hugh Cunning , Graham Williams , Rajesh Odedra , Ravi Kanjolia
发明人： Hugh Cunning , Graham Williams , Rajesh Odedra , Ravi Kanjolia
IPC分类号： C23C16/00
CPC分类号： C23C16/4481
摘要： A bubbler (2) for delivering liquid or solid metalorganic compounds to a reactor site. The bubbler has an inner and outer chamber and has a member (14) positioned between its inlet (6) and outlet (8) that is provided with a plurality of apertures therein. The member (14) is preferably in the form of a perforated disc having a predefined density of apertures therein to provide optimum pick up and flow of carrier gas through the bubbler.
摘要翻译：用于将液体或固体金属有机化合物输送到反应器位置的起泡器（2）。起泡器具有内室和外室，并且具有位于其入口（6）和出口（8）之间的构件（14），其中设有多个孔。构件（14）优选为具有预定密度的孔的穿孔盘的形式，以提供载气通过起泡器的最佳拾取和流动。

14. 发明申请

US20100256406A1 ORGANOMETALLIC PRECURSORS FOR USE IN CHEMICAL PHASE DEPOSITION PROCESSES 有权
标题翻译：用于化学相沉积工艺的有机前驱体
公开(公告)号：US20100256406A1
公开(公告)日：2010-10-07
申请号：US12670022
申请日：2008-07-24
申请人： Ravi Kanjolia , Rajesh Odedra , Neil Boag
发明人： Ravi Kanjolia , Rajesh Odedra , Neil Boag
IPC分类号： C07F15/00 , C07F15/02
CPC分类号： C23C16/45525 , C07F17/02 , C23C16/16 , C23C16/18
摘要： An organometallic precursor is provided. The precursor corresponds in structure to Formula (I): Cp(R)nM(CO)2(X), wherein: M is Ru, Fe or Os; R is C1-C10-alkyl; X is C1-C10-alkyl; and n is 1, 2, 3, 4 or 5. The precursors are useful in chemical phase deposition processes, such as atomic layer deposition (ALD) and chemical vapor deposition (CVD).
摘要翻译：提供有机金属前体。前体在结构上对应于式（I）：Cp（R）nM（CO）2（X）），其中：M是Ru，Fe或Os; R是C 1 -C 10 - 烷基; X是C 1 -C 10 - 烷基; 并且n为1,2,3,4或5.前体可用于化学相沉积工艺，例如原子层沉积（ALD）和化学气相沉积（CVD）。

15. 发明申请

US20080251016A1 Bubbler For the Transportation of Substances By a Carrier Gas 有权
标题翻译：运输气体运输物质的起泡器
公开(公告)号：US20080251016A1
公开(公告)日：2008-10-16
申请号：US12093893
申请日：2006-10-12
申请人： Hugh Cunning , Graham Williams , Rajesh Odedra , Ravi Kanjolia
发明人： Hugh Cunning , Graham Williams , Rajesh Odedra , Ravi Kanjolia
IPC分类号： C23C16/00
CPC分类号： C23C16/4481
摘要： A bubbler (2) for delivering liquid or solid metalorganic compounds to a reactor site. The bubbler has an inner and outer chamber and has a member (14) positioned between its inlet (6) and outlet (8) that is provided with a plurality of apertures therein. The member (14) is preferably in the form of a perforated disc having a predefined density of apertures therein to provide optimum pick up and flow of carrier gas through the bubbler.
摘要翻译：用于将液体或固体金属有机化合物输送到反应器位置的起泡器（2）。起泡器具有内室和外室，并且具有位于其入口（6）和出口（8）之间的构件（14），其中设有多个孔。构件（14）优选为具有预定密度的孔的穿孔盘的形式，以提供载气通过起泡器的最佳拾取和流动。

16. 发明授权

US5603988A Method for depositing a titanium or tantalum nitride or nitride silicide 失效
标题翻译：沉积钛或氮化钽或氮化硅硅化物的方法
公开(公告)号：US5603988A
公开(公告)日：1997-02-18
申请号：US459500
申请日：1995-06-02
申请人： Michael Shapiro , Ravi Kanjolia , Ben C. Hui , Paul F. Seidler , Karen Holloway , Richard Conti , Jonathan Chapple-Sokol
发明人： Michael Shapiro , Ravi Kanjolia , Ben C. Hui , Paul F. Seidler , Karen Holloway , Richard Conti , Jonathan Chapple-Sokol
IPC分类号： C23C16/18 , C23C16/34 , C23C16/42
CPC分类号： C23C16/18 , C23C16/34
摘要： Titanium and/or tantalum nitrides or nitride silicides are deposited onto a substrate by chemical vapor deposition of a titanium and/or tantalum silylamido complex.
摘要翻译：钛和/或钽氮化物或氮化硅硅化物通过化学气相沉积钛和/或钽硅烷酰氨基复合物沉积到基底上。

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