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11. 发明申请

US20120263634A1 GAS STREAM TREATMENT PROCESS 有权
标题翻译：气流处理工艺
公开(公告)号：US20120263634A1
公开(公告)日：2012-10-18
申请号：US13269206
申请日：2011-10-07
申请人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna
发明人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna
IPC分类号： B01D53/64 , B01D53/12 , B01D53/14 , B01D53/04 , B03C3/011
CPC分类号： B03C3/017 , B01D53/02 , B01D53/64 , B01D2253/106 , B01D2253/1128 , B01D2253/25 , B01D2257/602 , B01D2258/0283 , B01D2258/0291 , B03C3/011
摘要： A process of treating a gas stream containing at least one mercury compound or species, the process comprising: applying a composition into said gas stream ahead of a particulate matter collection device, wherein said composition contains a compound having the following formula (SiO2)x(OH)yMzSaF, wherein (i) SiO2 is an optional component; (ii) M comprises at least one of the following : boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; (iii) S comprises a sulfur-based species selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts; (iii) F is an optional component and comprises at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane.
摘要翻译：一种处理含有至少一种汞化合物或物质的气流的方法，所述方法包括：将组合物施加到颗粒物质收集装置之前的所述气流中，其中所述组合物含有具有下式（SiO 2）x（ OH）yMzSaF，其中（i）SiO 2是任选的组分; （ii）M包括以下中的至少一种：硼，镁，铝，钙，钛，钒，锰，铁，钴，镍，铜，锌，锆，钼，钯，银，镉，锡，铂，金和铋; （iii）S包含选自以下至少一种的硫基物质：硫化物盐，二硫代氨基甲酸盐，基于聚合物的二硫代氨基甲酸盐和多硫化物盐; （iii）F是任选的组分，并且包含以下至少一种：官能化的有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷。

12. 发明授权

US08025726B1 Sulfur containing silica particle 有权
标题翻译：含硫二氧化硅颗粒
公开(公告)号：US08025726B1
公开(公告)日：2011-09-27
申请号：US12756577
申请日：2010-04-08
申请人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna
发明人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna
IPC分类号： C01B33/00 , C01B33/113 , C09D1/00
CPC分类号： C09C1/30 , C01G3/006 , C01P2002/54 , C01P2006/12 , C01P2006/14 , C08K3/36 , C09C3/00 , C09D7/61 , C09D7/69
摘要： A silica containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzSaF: wherein M is at least one of the following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein S is a sulfur-based species selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts; wherein F optionally exists and said F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of 0.01-100%; and wherein the molar ratio of y/x is equal to 0.01-0.5, the molar ratio of x/z is equal to 3-300, and the molar ratio of a/z is 1-5.
摘要翻译：公开了含二氧化硅的组合物。该组合物包含具有下式的化合物：（SiO 2）x（OH）yMzSaF：其中M是以下金属或准金属阳离子中的至少一种：硼，镁，铝，钙，钛，钒，锰，铁，钴，镍，铜，锌，锆，钼，钯，银，镉，锡，铂，金和铋; 其中S是选自以下至少一种的硫基物质：硫化物盐，二硫代氨基甲酸盐，基于聚合物的二硫代氨基甲酸盐和多硫化物盐; 其中F任选存在并且所述F是以下至少一种：表面积覆盖率为0.01-100％的官能化有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷; 并且其中y / x的摩尔比等于0.01-0.5，x / z的摩尔比等于3-300，并且a / z的摩尔比为1-5。

13. 发明申请

US20120276275A1 SULFUR CONTAINING SILICA PARTICLE 有权
标题翻译：含硫硅胶颗粒
公开(公告)号：US20120276275A1
公开(公告)日：2012-11-01
申请号：US13269116
申请日：2011-10-07
申请人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Chen
发明人： Nicholas S. Ergang , Ian Saratovsky , Hung-Ting Chen
IPC分类号： C08K5/541 , C12H1/00 , A23L2/70 , B01J21/08
CPC分类号： A23L2/80 , B01J21/08 , B01J21/12 , B01J35/1019 , B01J35/1042 , B01J35/1047 , B01J35/1061 , B01J37/03 , B82Y30/00 , C01B33/12 , C01B33/18 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C01P2006/14 , C08K3/36 , C08K5/548 , C08K9/06 , C08K2201/006
摘要： A silica-containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzOaF.B: wherein M is at least one of the following: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein F optionally exists and comprises at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of about 0.01 to about 100%. The molar ratio of y/x is equal to about 0.01 to about 0.5, the molar ratio of x/z is equal to about 0.5 to about 300, and the molar ratio of a/z is dependent on the nature of the metal oxide. B comprises a hygroscopic solid and preferably comprises at least one alkaline earth oxide, lanthanide oxide, or combinations thereof.
摘要翻译：公开了含二氧化硅的组合物。组合物包含具有下式的化合物：（SiO 2）x（OH）yMzOaF.B：其中M是以下至少一种：硼，镁，铝，钙，钛，钒，锰，铁，钴，镍，铜，锌，锆，钼，钯，银，镉，锡，铂，金和铋; 其中F任选地存在并且包含以下至少一种：官能化的有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷，其表面积覆盖率为约0.01至约100％。 y / x的摩尔比等于约0.01至约0.5，x / z的摩尔比等于约0.5至约300，并且a / z的摩尔比取决于金属氧化物的性质。 B包含吸湿性固体，优选包含至少一种碱土金属氧化物，镧系元素氧化物或其组合。

14. 发明申请

US20120252663A1 SULFUR CONTAINING SILICA PARTICLE 有权
标题翻译：含硫硅胶颗粒
公开(公告)号：US20120252663A1
公开(公告)日：2012-10-04
申请号：US13242599
申请日：2011-09-23
申请人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna
发明人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna
IPC分类号： B01J20/10 , B82Y30/00
CPC分类号： C09C1/28 , C01P2002/54 , C01P2006/12 , C01P2006/14 , C08K3/36 , C09C1/3045 , C09D7/61 , C09D7/69
摘要： A silica-containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzSaF. M comprises at least one metal or metalloid cation. S is a sulfur-based species. F optionally exists and F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of about 0.01 to about 100%. The molar ratio of y/x is equal to about 0.01 to about 0.5, the molar ratio of x/z is equal to about 0.5 to about 300 or from about 0.5 to about 100, and the molar ratio of a/z is about 0.5 to about 5.
摘要翻译：公开了含二氧化硅的组合物。组合物包含具有下式的化合物：（SiO 2）x（OH）yMzSaF。 M包含至少一种金属或准金属阳离子。 S是硫类物质。 F任选存在，F是以下至少一种：官能化的有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷，其表面积为约0.01至约100％。 y / x的摩尔比等于约0.01至约0.5，x / z的摩尔比等于约0.5至约300或约0.5至约100，并且a / z的摩尔比为约0.5 至约5。

15. 发明申请

US20110251058A1 SULFUR CONTAINING SILICA PARTICLE 有权
标题翻译：含硫硅胶颗粒
公开(公告)号：US20110251058A1
公开(公告)日：2011-10-13
申请号：US12756577
申请日：2010-04-08
申请人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna
发明人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna
IPC分类号： C01B33/20 , C04B14/04 , C08K3/34 , B01J32/00
CPC分类号： C09C1/30 , C01G3/006 , C01P2002/54 , C01P2006/12 , C01P2006/14 , C08K3/36 , C09C3/00 , C09D7/61 , C09D7/69
摘要： A silica containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzSaF: wherein M is at least one of the following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein S is a sulfur-based species selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts;wherein F optionally exists and said F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of 0.01-100%; and wherein the molar ratio of y/x is equal to 0.01-0.5, the molar ratio of x/z is equal to 3-300, and the molar ratio of a/z is 1-5.
摘要翻译：公开了含二氧化硅的组合物。该组合物包含具有下式的化合物：（SiO 2）x（OH）yMzSaF：其中M是以下金属或准金属阳离子中的至少一种：硼，镁，铝，钙，钛，钒，锰，铁，钴，镍，铜，锌，锆，钼，钯，银，镉，锡，铂，金和铋; 其中S是选自以下至少一种的硫基物质：硫化物盐，二硫代氨基甲酸盐，基于聚合物的二硫代氨基甲酸盐和多硫化物盐;其中F任选地存在，并且所述F是以下至少一种：官能化的有机硅烷，含硫有机硅烷，含胺有机硅烷和含烷基的有机硅烷，表面积为0.01〜100％; 并且其中y / x的摩尔比等于0.01-0.5，x / z的摩尔比等于3-300，并且a / z的摩尔比为1-5。

16. 发明申请

US20110251057A1 SILICA PARTICLE MANUFACTURING PROCESS 有权
标题翻译：二氧化硅颗粒制造工艺
公开(公告)号：US20110251057A1
公开(公告)日：2011-10-13
申请号：US12756526
申请日：2010-04-08
申请人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna , Brett M. Showalter
发明人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna , Brett M. Showalter
IPC分类号： B01J32/00 , C09D7/12
CPC分类号： C01B33/18 , C01B33/1415 , C01P2006/12 , C01P2006/14 , C01P2006/16
摘要： Methods of forming a silica-based products are disclosed. One method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH less than or equal to a pH of 7; (b) optionally doping the SCP with one or more metal species, wherein said doping occurs when the solution has a pH less than or equal to a pH of 7; (c) adjusting the pH of the solution to greater than 7; (d) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS, wherein said addition occurs prior to, simultaneous with, or after the pH adjustment in step 1c; (e) optionally filtering and drying the SCP; and (f) optionally reacting the dried product from step e with a functional group and optionally wherein the resultant functionalized dried product is at least one of the following: a functionalized metal oxide-doped or metal sulfide-doped silica product. Another method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH greater than 7; (b) adjusting the pH of the solution to less than or equal to 7; (c) optionally doping the SCP with one or more metal species, wherein said doping occurs when the solution has a pH less than or equal to a pH of 7; (d) adjusting the pH of the solution to greater than 7; (e) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS, wherein said addition occurs prior to, simultaneous with, or after the pH adjustment in step 2d; (f) optionally filtering and drying the SCP; and (g) optionally reacting the dried product from step f with a functional group and optionally wherein the resultant functionalized dried product is at least one of the following: a functionalized metal oxide-doped or metal sulfide-doped silica product.
摘要翻译：公开了形成二氧化硅基产品的方法。一种方法包括：（a）提供pH小于或等于7的溶液中含有的含二氧化硅的前体（SCP）; （b）任选地用一种或多种金属物质掺杂SCP，其中当溶液的pH小于或等于pH7时，发生所述掺杂; （c）将溶液的pH调节至大于7; （d）向溶液中加入有效量的盐使溶液的电导率大于或等于4mS，其中所述添加发生在步骤1c中的pH调节之前，同时或之后，（e）任选地过滤和干燥SCP; 和（f）任选地使来自步骤e的干燥产物与官能团反应，任选地其中所得官能化干燥产物是以下至少一种：官能化金属氧化物掺杂或金属硫化物掺杂二氧化硅产物。另一种方法包括：（a）提供包含在pH大于7的溶液中的含二氧化硅的前体（SCP）; （b）将溶液的pH调节至小于或等于7; （c）任选地用一种或多种金属物质掺杂SCP，其中当溶液的pH小于或等于pH7时，发生所述掺杂; （d）将溶液的pH调节至大于7; （e）向溶液中加入有效量的盐使溶液的电导率大于或等于4mS，其中所述添加发生在步骤2d中的pH调节之前，同时或之后; （f）任选地过滤和干燥SCP; 和（g）任选地使来自步骤f的干燥产物与官能团反应，任选地其中所得官能化干燥产物是以下至少一种：官能化金属氧化物掺杂或金属硫化物掺杂二氧化硅产物。

17. 发明申请

US20110250341A1 SILICA CONTAINING PARTICLE 有权
标题翻译：含二氧化硅颗粒
公开(公告)号：US20110250341A1
公开(公告)日：2011-10-13
申请号：US12756548
申请日：2010-04-08
申请人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna
发明人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna
IPC分类号： C08K3/34 , C01B33/26 , C07F7/18 , A23L2/70 , C04B14/04 , C04B16/00 , B01J32/00 , A23L2/00 , C01B33/20 , C07F7/02
CPC分类号： B01J37/03 , A23L2/80 , B01J21/08 , B01J21/12 , B01J35/1019 , B01J35/1042 , B01J35/1047 , B01J35/1061 , B82Y30/00 , C01B33/12 , C01B33/18 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C01P2006/14 , C09D1/02
摘要： A silica containing composition is disclosed. The silica composition comprising a compound having the following formula (SiO2)x(OH)yMzOaF: wherein M optionally exists and said M is at least one of the following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein F optionally exists and said F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of 0.01-100%; and wherein the molar ratio of y/x is equal to 0.01-0.5, the molar ratio of x/z is equal to 0.1-300, and the molar ratio of a/z is dependent on the nature of the metal oxide formed.
摘要翻译：公开了含二氧化硅的组合物。二氧化硅组合物包含具有下式（SiO 2）x（OH）y M z O a F的化合物：其中M任选存在，并且所述M是以下金属或准金属阳离子中的至少一种：硼，镁，铝，钙，钛，钒，锰，铁，钴，镍，铜，锌，锆，钼，钯，银，镉，锡，铂，金和铋; 其中F任选存在并且所述F是以下至少一种：表面积覆盖率为0.01-100％的官能化有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷; 并且其中y / x的摩尔比等于0.01-0.5，x / z的摩尔比等于0.1-300，并且a / z的摩尔比取决于形成的金属氧化物的性质。

18. 发明申请

US20110250110A1 GAS STREAM TREATMENT PROCESS 有权
标题翻译：气流处理工艺
公开(公告)号：US20110250110A1
公开(公告)日：2011-10-13
申请号：US12756491
申请日：2010-04-08
申请人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna
发明人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna
IPC分类号： B01D53/46 , B03C3/011 , B01D53/30 , B01D53/12
CPC分类号： B03C3/017 , B01D53/02 , B01D53/64 , B01D2253/106 , B01D2253/1128 , B01D2253/25 , B01D2257/602 , B01D2258/0283 , B01D2258/0291 , B03C3/011
摘要： A process of treating a gas stream containing mercury is disclosed. The method comprises: applying a sorbent into said gas stream ahead of a particulate matter collection device, in order to adsorb at least a portion of a mercury containing compound, wherein said sorbent contains a composition comprising a compound having the following formula (SiO2)x(OH)yMzSaF: wherein M is at least one of the following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein S is a sulfur-based species selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts; wherein F optionally exists and said F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of 0.01-100%; and wherein the molar ratio of y/x is equal to 0.01-0.5, the molar ratio of x/z is equal to 3-300, and the molar ratio of a/z is 1-5.
摘要翻译：公开了一种处理含有汞的气流的方法。该方法包括：将吸附剂施加到颗粒物质收集装置之前的所述气流中，以便吸附至少一部分含汞化合物，其中所述吸附剂含有包含具有下式（SiO 2）x的化合物的组合物（OH）yMzSaF：其中M是以下金属或准金属阳离子中的至少一种：硼，镁，铝，钙，钛，钒，锰，铁，钴，镍，铜，锌，锆，钼，钯，银，镉，锡，铂，金和铋; 其中S是选自以下至少一种的硫基物质：硫化物盐，二硫代氨基甲酸盐，基于聚合物的二硫代氨基甲酸盐和多硫化物盐; 其中F任选存在并且所述F是以下至少一种：表面积覆盖率为0.01-100％的官能化有机硅烷，含硫有机硅烷，含胺的有机硅烷和含烷基的有机硅烷; 并且其中y / x的摩尔比等于0.01-0.5，x / z的摩尔比等于3-300，并且a / z的摩尔比为1-5。

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