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11. 发明申请

US20090038946A1 METAL OXIDE FILM, LAMINATE, METAL MEMBER AND PROCESS FOR PRODUCING THE SAME 有权
标题翻译：金属氧化物膜，层压板，金属构件及其制造方法
公开(公告)号：US20090038946A1
公开(公告)日：2009-02-12
申请号：US11917614
申请日：2006-05-09
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
IPC分类号： C25D7/12 , B32B15/04 , C23F13/00
CPC分类号： C25D11/06 , C25D11/18 , Y10T428/265
摘要： A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cm2 or less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.
摘要翻译：适用于主要由铝组成的金属保护金属氧化物膜。金属氧化物膜包括厚度为10nm以上的主要由铝构成的金属的氧化物的膜，并且具有1E18mol / cm 2以下的膜的水分释放率。此外，提供了一种制造金属氧化物膜的方法，其中主要由铝组成的金属在pH值为4至10的化学溶液中进行阳极氧化，以获得金属氧化物膜。

12. 发明申请

US20060175573A1 Diaphragm valve for the vacuum evacuation system 有权
标题翻译：隔膜阀用于真空抽气系统
公开(公告)号：US20060175573A1
公开(公告)日：2006-08-10
申请号：US10546032
申请日：2004-02-09
申请人： Tadahiro Ohmi , Nobukazu Ikeda , Michio Yamajl , Masafumi Kitano , Akihiro Morimoto
发明人： Tadahiro Ohmi , Nobukazu Ikeda , Michio Yamajl , Masafumi Kitano , Akihiro Morimoto
IPC分类号： F16K1/00
CPC分类号： F16K7/16 , F16K51/02
摘要： A diaphragm valve 1 is provided with a body 2 having a flow-in passage 6, a flow-out passage 7, and a valve seat 8 formed between the passages; a diaphragm 3 installed in the body 2 and permitted to rest on and move away from the valve seat 8; and a driving means 4 installed on the body 2 to allow the diaphragm 3 to rest on and move away from the valve seat 8, wherein synthetic resin films 5 of predetermined thickness are coated on fluid-contacting parts 25 of the afore-mentioned body 2 and diaphragm 3. A diaphragm valve in accordance with the present invention prevents corrosion of the valve members caused by accumulation and adherence of substances produced by thermal decomposition, and prevents clogging caused by substances produced, and prevents seat leakage when applied in the vacuum exhaust system of a semiconductor manufacturing facility.
摘要翻译：隔膜阀1设置有主体2，主体2具有形成在通道之间的流入通道6，流出通道7和阀座8; 隔膜3安装在主体2中并允许搁置在阀座8上并远离阀座8; 以及安装在主体2上的驱动装置4，以允许隔膜3搁置在阀座8上并远离阀座8，其中预定厚度的合成树脂膜5涂覆在上述主体2的流体接触部分25上和隔膜3.根据本发明的隔膜阀防止由热分解产生的物质的积聚和粘附引起的阀构件的腐蚀，并且防止由所产生的物质引起的堵塞，并且当应用于真空排气系统时防止阀座泄漏的半导体制造设施。

13. 发明授权

US08573151B2 Microwave plasma processing apparatus, dielectric window for use in the microwave plasma processing apparatus, and method for manufacturing the dielectric window 失效
标题翻译：微波等离子体处理装置，用于微波等离子体处理装置的电介质窗，以及制造电介质窗的方法
公开(公告)号：US08573151B2
公开(公告)日：2013-11-05
申请号：US12393724
申请日：2009-02-26
申请人： Tadahiro Ohmi , Masaki Hirayama , Tetsuya Goto , Yasuyuki Shirai , Masafumi Kitano , Kohei Watanuki , Takaaki Matsuoka , Shigemi Murakawa
发明人： Tadahiro Ohmi , Masaki Hirayama , Tetsuya Goto , Yasuyuki Shirai , Masafumi Kitano , Kohei Watanuki , Takaaki Matsuoka , Shigemi Murakawa
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , B05D5/06 , B05D3/02
CPC分类号： H01J37/32192 , H01J37/32238
摘要： A conventional microwave plasma processing apparatus, even when krypton (Kr) is used as a plasma-generation gas, can only obtain an oxide film or a nitride film having the same level of characteristics as those obtained when a rare gas such as argon (Ar) is used as a plasma-generation gas. Accordingly, instead of forming a dielectric window of a microwave plasma processing apparatus with only a ceramic member, a planarization film capable of obtaining a stoichiometric SiO2 composition by thermal treatment is coated on one of a plurality of surfaces of the ceramic member, the surface facing a process space, and then thermally-treated, thereby forming a planarization insulation film having a very flat and dense surface. A corrosion-resistant film is formed on the planarization insulation film.
摘要翻译：传统的微波等离子体处理装置即使使用氪（Kr）作为等离子体产生气体，也只能得到与稀有气体例如氩气（Ar）相同的特性水平的氧化膜或氮化物膜）用作等离子体发生气体。因此，代替形成仅具有陶瓷构件的微波等离子体处理装置的介电窗口，可以通过热处理获得化学计量的SiO 2组成的平坦化膜涂覆在陶瓷构件的多个表面中的一个表面上，处理空间，然后热处理，从而形成具有非常平坦和致密表面的平坦化绝缘膜。在平坦化绝缘膜上形成耐腐蚀膜。

14. 发明申请

US20120082596A1 Reactor for Moisture Generation 审中-公开
标题翻译：水分发生反应器
公开(公告)号：US20120082596A1
公开(公告)日：2012-04-05
申请号：US13274446
申请日：2011-10-17
申请人： Tadahiro OHMI , Koji KAWADA , Nobukazu IKEDA , Akihiro MORIMOTO , Yukio MINAMI , Keiji HIRAO , Shinji SAKAMOTO , Masafumi KITANO
发明人： Tadahiro OHMI , Koji KAWADA , Nobukazu IKEDA , Akihiro MORIMOTO , Yukio MINAMI , Keiji HIRAO , Shinji SAKAMOTO , Masafumi KITANO
IPC分类号： B01J12/00
CPC分类号： B01J23/63 , B01J12/007 , B01J23/42 , B01J35/023 , B01J37/0225 , B01J37/0244 , C01B5/00
摘要： A reactor for moisture generation generates high-purity moisture at a catalytic reaction temperature that is lower than an ignition point of hydrogen gas and oxygen gas so hydrogen and oxygen gas are supplied into the reactor having a platinum catalyst layer to catalyze the reaction of the gases without combustion, wherein the reactor maintains high adhesion strength for a long time of the platinum catalyst layer to a barrier layer provided between the base material and the platinum catalyst layer. The reactor includes a reactor main body that has a gas inlet and a moisture outlet, and the Y2O3 barrier layer is formed on at least a part of an internal wall surface of the reactor main body, and the platinum catalyst layer is formed on at least a part of the Y2O3 barrier layer. A film thickness of the Y2O3 barrier layer is preferably 50 nm to 5 μm.
摘要翻译：用于产生水分的反应器在低于氢气和氧气的点火点的催化反应温度下产生高纯度水分，因此氢气和氧气被供应到具有铂催化剂层的反应器中以催化气体的反应其中所述反应器在铂催化剂层长时间保持高粘合强度到设置在基体材料和铂催化剂层之间的阻挡层。反应器包括反应器主体，其具有气体入口和水分出口，并且Y 2 O 3阻挡层形成在反应器主体的内壁表面的至少一部分上，并且铂催化剂层至少形成 Y2O3阻挡层的一部分。 Y 2 O 3阻挡层的膜厚优选为50nm〜5μm。

15. 发明申请

US20090139397A1 Method of Manufacturing Bellows 有权
标题翻译：制造波纹管的方法
公开(公告)号：US20090139397A1
公开(公告)日：2009-06-04
申请号：US12327261
申请日：2008-12-03
申请人： Tsutomu Yoshida , Tadahiro Ohmi , Yasuyuki Shirai , Masafumi Kitano
发明人： Tsutomu Yoshida , Tadahiro Ohmi , Yasuyuki Shirai , Masafumi Kitano
IPC分类号： F01B19/00 , C23C8/18
CPC分类号： C23C8/18
摘要： Method for producing at low cost bellows which show high durability even when used in a quite reactive atmosphere. A method for manufacturing bellows includes the steps of: I: forming an untreated bellows from a flat base plate, the base plate including 15 to 30 wt % of Cr, 5 to 40 wt % of Ni, 0.9 to 6 wt % of Al, less than 1 wt % of Mo, less than 0.1 wt % of Mn, less than 0.1 wt % of C, less than 0.1 wt % of S, less than 0.1 wt % of P and a balance of Fe and an unavoidable impurity (relative to 100 wt % of the base plate); and II: heating the untreated bellows at a temperature of 750 to 895° C. in an atmosphere which contains water and hydrogen and in which the volume ratio of hydrogen to water (H2/H2O) is in the range of 2×103 to 1×1012, thereby forming an Al2O3 passivation film on a surface of the untreated bellows.
摘要翻译：低成本波纹管的生产方法，即使在相当活跃的气氛中使用也显示出高耐用性。制造波纹管的方法包括以下步骤：I：从平的基板形成未经处理的波纹管，基板包括15至30重量％的Cr，5至40重量％的Ni，0.9至6重量％的Al，小于1重量％的Mo，小于0.1重量％的Mn，小于0.1重量％的C，小于0.1重量％的S，小于0.1重量％的P和余量的Fe和不可避免的杂质（相对至100重量％）; 和II：在含有水和氢的气氛中在750至895℃的温度下加热未处理的波纹管，其中氢与水的体积比（H 2 / H 2 O）在2×10 3至1×10 12的范围内，从而在未处理的波纹管的表面上形成Al 2 O 3钝化膜。

16. 发明授权

US07416165B2 Diaphragm valve for the vacuum exhaustion system 有权
标题翻译：用于真空排气系统的隔膜阀
公开(公告)号：US07416165B2
公开(公告)日：2008-08-26
申请号：US10546032
申请日：2004-02-09
申请人： Tadahiro Ohmi , Nobukazu Ikeda , Michio Yamaji , Masafumi Kitano , Akihiro Morimoto
发明人： Tadahiro Ohmi , Nobukazu Ikeda , Michio Yamaji , Masafumi Kitano , Akihiro Morimoto
IPC分类号： F16K31/122 , F16K7/17
CPC分类号： F16K7/16 , F16K51/02
摘要： A diaphragm valve 1 is provided with a body 2 having a flow-in passage 6, a flow-out passage 7, and a valve seat 8 formed between the passages; a diaphragm 3 installed in the body 2 and permitted to rest on and move away from the valve seat 8; and a driving means 4 installed on the body 2 to allow the diaphragm 3 to rest on and move away from the valve seat 8, wherein synthetic resin films 5 of predetermined thickness are coated on fluid-contacting parts 25 of the afore-mentioned body 2 and diaphragm 3. A diaphragm valve in accordance with the present invention prevents corrosion of the valve members caused by accumulation and adherence of substances produced by thermal decomposition, and prevents clogging caused by substances produced, and prevents seat leakage when applied in the vacuum exhaust system of a semiconductor manufacturing facility.
摘要翻译：隔膜阀1设置有主体2，主体2具有形成在通道之间的流入通道6，流出通道7和阀座8; 隔膜3安装在主体2中并允许搁置在阀座8上并远离阀座8; 以及安装在主体2上的驱动装置4，以允许隔膜3搁置在阀座8上并远离阀座8，其中预定厚度的合成树脂膜5涂覆在上述主体2的流体接触部分25上和隔膜3.根据本发明的隔膜阀防止由热分解产生的物质的积聚和粘附引起的阀构件的腐蚀，并且防止由所产生的物质引起的堵塞，并且当应用于真空排气系统时防止阀座泄漏的半导体制造设施。

17. 发明授权

US07199147B2 Rho kinase inhibitors 失效
标题翻译： Rho激酶抑制剂
公开(公告)号：US07199147B2
公开(公告)日：2007-04-03
申请号：US10480526
申请日：2002-06-06
申请人： Naonori Imazaki , Masafumi Kitano , Naohito Ohashi , Kazuki Matsui
发明人： Naonori Imazaki , Masafumi Kitano , Naohito Ohashi , Kazuki Matsui
IPC分类号： A61K31/415 , C07D231/56
CPC分类号： C07D405/12 , C07D231/56 , C07D401/12 , C07D403/12 , C07D409/12 , C07D417/12
摘要： A compound represented by the formula (1): wherein R1—X— indicates that 1 to 4 R1—X— groups are present which may be the same or different, the ring A is a saturated or unsaturated 5-membered heterocyclic ring, X is a single bond, a group represented by the formula: —N(R3)—, —O— or —S—, or the like. R1 is a hydrogen atom, a halogen atom, a nitro group, a carboxyl group, a substituted or unsubstituted alkyl group, or the like, R2 is a hydrogen atom, a halogen atom, a nitro group, a carboxyl group, a substituted or unsubstituted alkyl group, or the like, and R3 is a hydrogen atom, a substituted or unsubstituted alkyl group, or the like; a prodrug of said compound, or a pharmaceutically acceptable salt of said compound or prodrug is a useful compound as a therapeutic agent for diseases for which Rho kinase is responsible.
摘要翻译：由式（1）表示的化合物：

18. 发明申请

US20060228571A1 Member of apparatus for plasma treatment, member of treating apparatus, apparatus for plasma treatment, treating apparatus and method of plasma treatment 审中-公开
标题翻译：等离子体处理装置的成员，处理装置的构件，等离子体处理装置，处理装置和等离子体处理方法
公开(公告)号：US20060228571A1
公开(公告)日：2006-10-12
申请号：US10542364
申请日：2004-01-14
申请人： Tadahiro Ohmi , Yasayuki Shirai , Masafumi Kitano
发明人： Tadahiro Ohmi , Yasayuki Shirai , Masafumi Kitano
IPC分类号： C23C22/00 , B32B15/04 , B32B9/00
CPC分类号： H01J37/32467 , C23C8/36
摘要： According to the present invention, gas in which oxygen gas and krypton are mixed is introduced into a process vessel from a process gas supply source while a processing target made of an aluminum alloy in the process chamber is kept at a predetermined temperature, and plasma is generated in the process vessel by a microwave. Radical oxidation processing by an oxygen radical generated thereby is applied to a surface of the processing target, so that a dense oxide coating film with improved corrosion resistance is formed on the surface of the processing target.
摘要翻译：根据本发明，将氧气和氪混合的气体从处理气体供给源引入到处理容器中，同时在处理室中由铝合金制成的加工对象保持在预定温度，等离子体为通过微波在处理容器中产生。由此产生的氧自由基的自由基氧化处理被施加到加工对象的表面，使得在加工对象的表面上形成具有改善的耐腐蚀性的致密氧化物涂膜。

19. 发明申请

US20060193940A1 Resin molding machine and member for resin molding machine having film in passive state 失效
标题翻译：树脂成型机和树脂成型机的构件，其具有被动状态的膜
公开(公告)号：US20060193940A1
公开(公告)日：2006-08-31
申请号：US10547696
申请日：2004-02-26
申请人： Tadahiro Ohmi , Masafumi Kitano , Naoki Tanahashi
发明人： Tadahiro Ohmi , Masafumi Kitano , Naoki Tanahashi
IPC分类号： B29D11/00
CPC分类号： B29C33/56 , B29C33/38 , B29C45/37 , B29L2031/3475 , C23C8/10 , C23C8/14 , C23C8/18 , C23C30/00 , Y10S425/808
摘要： A member for a resin molding machine wherein it has a face contacting with a molten resin, and at least a part of the face is covered with a film of an oxide of a base material of the face or a component contained in the base material. The use of the member in the molding of a resin allows the prevention of the incorporation of a contaminant associated with the deterioration of a melt of the resin into a molded article from the resin.
摘要翻译：树脂成形机的构件，其具有与熔融树脂接触的面，并且所述面的至少一部分被所述面的基材的氧化物或所述基材中所含的成分的膜覆盖。在树脂成型中使用该部件允许防止与树脂熔融物的劣化相关联的污染物与树脂混入模制品中。

20. 发明申请

US20050182040A1 Benzamide derivatives 审中-公开
标题翻译：苯甲酰胺衍生物
公开(公告)号：US20050182040A1
公开(公告)日：2005-08-18
申请号：US10509897
申请日：2003-03-28
申请人： Naonori Imazaki , Masafumi Kitano , Tatsuya Fujibayashi , Shigehiro Asano
发明人： Naonori Imazaki , Masafumi Kitano , Tatsuya Fujibayashi , Shigehiro Asano
IPC分类号： A61K31/165 , A61K31/351 , A61K31/382 , A61K31/40 , A61K31/44 , A61K31/55 , A61P1/16 , A61P9/00 , A61P11/06 , A61P13/08 , A61P13/12 , A61P15/06 , A61P15/10 , A61P19/08 , A61P27/02 , A61P29/00 , A61P31/04 , A61P31/18 , A61P35/00 , A61P37/02 , A61P37/06 , A61P43/00 , C07C235/46 , C07C235/60 , C07C237/30 , C07C237/42 , C07C317/44 , C07D207/14 , C07D211/26 , C07D211/34 , C07D211/46 , C07D211/56 , C07D211/58 , C07D211/60 , C07D211/62 , C07D211/70 , C07D211/96 , C07D213/04 , C07D213/38 , C07D213/74 , C07D223/12 , C07D295/13 , C07D295/135 , C07D295/155 , C07D309/14 , C07D335/02 , C07D451/04 , C07D453/02 , A61K31/397 , A61K31/445
CPC分类号： C07C317/44 , A61K31/165 , A61K31/351 , A61K31/382 , A61K31/40 , A61K31/44 , A61K31/55 , C07C235/46 , C07C235/60 , C07C237/30 , C07C237/42 , C07C2601/08 , C07C2601/14 , C07D207/14 , C07D211/26 , C07D211/34 , C07D211/46 , C07D211/56 , C07D211/58 , C07D211/60 , C07D211/62 , C07D211/70 , C07D211/96 , C07D213/38 , C07D213/74 , C07D223/12 , C07D295/13 , C07D295/135 , C07D295/155 , C07D309/14 , C07D335/02 , C07D451/04 , C07D453/02
摘要： A compound represented by formula (1): wherein X is a single bond or a substituted or unsubstituted lower alkylene group; Z is a saturated or unsaturated monocyclic hydrocarbon ring group or the like; and each of R1, R2, R3 and R4, which may be the same or different, is a hydrogen atom, a halogen atom, a nitro group, a cyano group, a carboxyl group, a substituted or unsubstituted alkyl group, or the like, a prodrug of said compound, or a pharmaceutically acceptable salt of said compound or prodrug has inhibitory effect on Rho kinase and hence is useful for treating diseases which are such that morbidity due to them is expected to be improved by inhibition of Rho kinase and secondary effects such as inhibition of the Na+/H+ exchange transport system caused by the Rho kinase inhibition, for example, hypertension.
摘要翻译：由式（1）表示的化合物：其中X是单键或取代或未取代的低级亚烷基; Z是饱和或不饱和的单环烃环基等; 和R 1，R 2，R 3和R 4中的每一个可以相同或不同，是氢原子，卤素原子，硝基，氰基，羧基，取代或未取代的烷基等，所述化合物的前体药物或所述化合物或前药的药学上可接受的盐具有对Rho激酶的抑制作用，因此可用于治疗通过抑制Rho激酶而预期可以改善由此引起的发病率的疾病，以及抑制Na + 由Rho激酶抑制引起的SUP> + 交换系统，例如高血压。

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