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11. 发明申请

US20120241427A1 PREDICTIVE LINK PROCESSING 审中-公开
标题翻译：预测链接处理
公开(公告)号：US20120241427A1
公开(公告)日：2012-09-27
申请号：US13404930
申请日：2012-02-24
申请人： Dimitry Maltsev , Dmitry N. Romashko , Michael Plotkin , Jonathan S. Ehrmann , James J. Cordingley
发明人： Dimitry Maltsev , Dmitry N. Romashko , Michael Plotkin , Jonathan S. Ehrmann , James J. Cordingley
IPC分类号： B23K26/00
CPC分类号： B23K26/0732 , B23K26/042 , B23K26/0619 , B23K26/0622 , B23K26/082 , H01L21/76892 , H01L23/5258 , H01L2924/0002 , H01L2924/00
摘要： A method of processing material of device elements by laser interaction is disclosed. According to one aspect, the method includes generating a pulsed laser processing output along a laser beam axis, the output including a plurality of laser pulses triggered sequentially at times determined by a pulse repetition rate. A trajectory relative to locations of device elements to be processed is generated. A position of one or more designated device elements relative to an intercept point position on the trajectory at one or more laser pulse times is determined, and a laser beam is deflected based on the predicted position within a predetermined deflection range. According to some aspects, the predetermined deflection range may correspond to a compass rose or cruciform field shape. As a result, a deflection accuracy for laser processing may be improved.
摘要翻译：公开了一种通过激光相互作用处理器件元件材料的方法。根据一个方面，所述方法包括沿着激光束轴产生脉冲激光处理输出，所述输出包括在由脉冲重复率确定的时间顺序触发的多个激光脉冲。产生相对于要处理的设备元件的位置的轨迹。确定一个或多个指定装置元件相对于在一个或多个激光脉冲时间的轨迹上的截点位置的位置，并且激光束基于在预定偏转范围内的预测位置偏转。根据一些方面，预定的偏转范围可以对应于罗盘玫瑰或十字形场的形状。结果，可以提高激光加工的偏转精度。

12. 发明授权

US08253066B2 Laser-based method and system for removing one or more target link structures 有权
标题翻译：用于去除一个或多个目标链路结构的基于激光的方法和系统
公开(公告)号：US08253066B2
公开(公告)日：2012-08-28
申请号：US12950969
申请日：2010-11-19
申请人： Bo Gu , Donald V. Smart , James J. Cordingley , Joohan Lee , Donald J. Svetkoff , Shepard D. Johnson , Jonathan S. Ehrmann
发明人： Bo Gu , Donald V. Smart , James J. Cordingley , Joohan Lee , Donald J. Svetkoff , Shepard D. Johnson , Jonathan S. Ehrmann
IPC分类号： H01S3/10
CPC分类号： B23K26/0626 , B23K26/04 , B23K26/0624 , B23K26/0736 , B23K26/361 , B23K26/389 , B23K26/40 , B23K2101/38 , B23K2101/40 , B23K2103/08 , B23K2103/10 , B23K2103/12 , B23K2103/50 , H01L21/485 , H01L21/76894 , H01L22/12 , H01L23/5258 , H01L2924/0002 , H05K3/0026 , H01L2924/00
摘要： Laser-based methods and systems for removing one or more target link structures of a circuit fabricated on a substrate includes generating a pulsed laser output at a predetermined wavelength less than an absorption edge of the substrate are provided. The laser output includes at least one pulse having a pulse duration in the range of about 10 picoseconds to less than 1 nanosecond, the pulse duration being within a thermal laser processing range. The method also includes delivering and focusing the laser output onto the target link structure. The focused laser output has sufficient power density at a location within the target link structure to reduce the reflectivity of the target link structure and efficiently couple the focused laser output into the target link structure to remove the target link structure without damaging the substrate.
摘要翻译：设置用于去除在衬底上制造的电路的一个或多个目标链路结构的基于激光的方法和系统包括产生具有小于衬底的吸收边缘的预定波长的脉冲激光输出。激光输出包括脉冲持续时间在约10皮秒至小于1纳秒范围内的至少一个脉冲，脉冲持续时间在热激光器处理范围内。该方法还包括将激光输出传送和聚焦到目标链路结构上。聚焦的激光输出在目标链路结构内的位置处具有足够的功率密度，以减少目标链路结构的反射率，并将聚焦的激光输出有效地耦合到目标链路结构中以去除目标链路结构而不损坏基板。

13. 发明申请

US20110297851A1 LASER PROCESSING WITH ORIENTED SUB-ARRAYS 审中-公开
标题翻译：具有面向对象的子阵列的激光加工
公开(公告)号：US20110297851A1
公开(公告)日：2011-12-08
申请号：US13153928
申请日：2011-06-06
申请人： William Lauer , Jonathan S. Ehrmann , Joseph J. Griffiths
发明人： William Lauer , Jonathan S. Ehrmann , Joseph J. Griffiths
IPC分类号： G21K5/00
CPC分类号： B23K26/0676 , B23K26/0006 , B23K26/06 , B23K26/067 , B23K26/36 , B23K2103/56 , H01L21/02686 , H01L21/02691 , H01L23/525 , H01L2924/0002 , H01L2924/00
摘要： In a system for severing conductive links by laser irradiation to repair electronic devices, multiple laser beams are deflected at high-speed to target selected links for processing by positioning laser spots in a two dimensional pattern during relative motion of a substrate and a beam delivery system. As link targeting flexibility is increased, selection may be required from a large number of addressable link pairs. Various embodiments advantageously use beam deflection and beam splitting to improve memory repair processing rates.
摘要翻译：在用于通过激光照射来切断导电连接以修复电子设备的系统中，多个激光束在基板和光束传送系统的相对运动期间以高速偏转到目标所选择的链接以进行处理，其中定位激光斑点为二维图案。随着链路定向灵活性的增加，可能需要从大量可寻址链路对中进行选择。各种实施例有利地使用光束偏转和光束分割来改善存储器修复处理速率。

14. 发明申请

US20110062127A1 LASER-BASED METHOD AND SYSTEM FOR REMOVING ONE OR MORE TARGET LINK STRUCTURES 有权
标题翻译：基于激光的方法和系统，用于删除一个或多个目标链结构
公开(公告)号：US20110062127A1
公开(公告)日：2011-03-17
申请号：US12950969
申请日：2010-11-19
申请人： Bo Gu , Donald V. Smart , James J. Cordingley , Joohan Lee , Donald J. Svetkoff , Shepard D. Johnson , Jonathan S. Ehrmann
发明人： Bo Gu , Donald V. Smart , James J. Cordingley , Joohan Lee , Donald J. Svetkoff , Shepard D. Johnson , Jonathan S. Ehrmann
IPC分类号： B23K26/40
CPC分类号： B23K26/0626 , B23K26/04 , B23K26/0624 , B23K26/0736 , B23K26/361 , B23K26/389 , B23K26/40 , B23K2101/38 , B23K2101/40 , B23K2103/08 , B23K2103/10 , B23K2103/12 , B23K2103/50 , H01L21/485 , H01L21/76894 , H01L22/12 , H01L23/5258 , H01L2924/0002 , H05K3/0026 , H01L2924/00
摘要： Laser-based methods and systems for removing one or more target link structures of a circuit fabricated on a substrate includes generating a pulsed laser output at a predetermined wavelength less than an absorption edge of the substrate are provided. The laser output includes at least one pulse having a pulse duration in the range of about 10 picoseconds to less than 1 nanosecond, the pulse duration being within a thermal laser processing range. The method also includes delivering and focusing the laser output onto the target link structure. The focused laser output has sufficient power density at a location within the target link structure to reduce the reflectivity of the target link structure and efficiently couple the focused laser output into the target link structure to remove the target link structure without damaging the substrate.
摘要翻译：设置用于去除在衬底上制造的电路的一个或多个目标链路结构的基于激光的方法和系统包括产生具有小于衬底的吸收边缘的预定波长的脉冲激光输出。激光输出包括脉冲持续时间在约10皮秒至小于1纳秒范围内的至少一个脉冲，脉冲持续时间在热激光器处理范围内。该方法还包括将激光输出传送和聚焦到目标链路结构上。聚焦的激光输出在目标链路结构内的位置处具有足够的功率密度，以减少目标链路结构的反射率，并将聚焦的激光输出有效地耦合到目标链路结构中以去除目标链路结构而不损坏基板。

15. 发明授权

US07903336B2 Optical metrological scale and laser-based manufacturing method therefor 有权
标题翻译：光学计量尺度和激光制造方法
公开(公告)号：US07903336B2
公开(公告)日：2011-03-08
申请号：US11546024
申请日：2006-10-11
申请人： Kurt Pelsue , Stuart A. Dodson, II , Bradley L. Hunter , Donald V. Smart , Pierre-Yves Mabboux , Jonathan S. Ehrmann
发明人： Kurt Pelsue , Stuart A. Dodson, II , Bradley L. Hunter , Donald V. Smart , Pierre-Yves Mabboux , Jonathan S. Ehrmann
IPC分类号： G02B27/44 , G02F1/295 , H03M1/22 , G01B11/02
CPC分类号： B41M5/24 , B23K26/364 , G01D5/34707
摘要： A reflective metrological scale has a metal tape substrate and a scale pattern of elongated side-by-side marks surrounded by reflective surface areas of the substrate. Each mark has a furrowed cross section and may have a depth in the range of 0.5 to 2 microns. The central region of each mark may be rippled and darkened to provide an enhanced optical reflection ratio with respect to surrounding surface areas. A manufacturing method includes the repeated steps of (1) creating a scale mark by irradiating the substrate surface at a mark location with overlapped pulses from a laser, each pulse having an energy density of less than about 1 joule per cm2, and (2) changing the relative position of the laser and the substrate by a displacement amount defining a next mark location on the substrate at which a next mark of the scale is to be created.
摘要翻译：反射计量标尺具有金属带基板和由基板的反射表面区域包围的细长的并排标记的刻度图案。每个标记具有沟槽的横截面并且可以具有在0.5至2微米范围内的深度。每个标记的中心区域可能波纹和变暗，以提供相对于周围表面区域的增强的光反射率。一种制造方法包括以下重复步骤：（1）通过在来自激光器的重叠脉冲的标记位置处照射基板表面来产生刻度标记，每个脉冲具有小于约1焦耳/ cm 2的能量密度，以及（2）改变激光器和衬底的相对位置一个位移量，该位移量限定了要在其上产生刻度的下一个标记的衬底上的下一个标记位置。

16. 发明授权

US07705268B2 Method and system for laser soft marking 有权
标题翻译：激光软打标的方法和系统
公开(公告)号：US07705268B2
公开(公告)日：2010-04-27
申请号：US11270109
申请日：2005-11-09
申请人： Bo Gu , Jonathan S. Ehrmann
发明人： Bo Gu , Jonathan S. Ehrmann
IPC分类号： B23K26/36
CPC分类号： H01L21/67282 , B23K26/0622 , B23K26/40 , B23K2101/40 , B23K2103/50 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems for laser soft marking, especially for semiconductor wafers and devices, are provided. A laser-marking system for marking a semiconductor wafer to form a softmark on the wafer is provided. The system includes a laser subsystem for generating one or more laser pulses and a controller operatively connected to the laser subsystem. The controller sets a laser pulse width of the one or more laser pulses to selectively provide one or more laser output pulses having one or more set pulse widths that affect the depth of a softmark that is to be formed. The mark depth is substantially dependent on the one or more set pulse widths. The controller further sets a pulse energy of the one or more output pulses to selectively provide the one or more output pulses having a set total output energy that is within an acceptable process energy window for producing the softmark.
摘要翻译：提供了用于激光软标记的方法和系统，特别是用于半导体晶片和器件的方法和系统。提供了一种用于标记半导体晶片以在晶片上形成软标记的激光标记系统。该系统包括用于产生一个或多个激光脉冲的激光子系统和可操作地连接到激光子系统的控制器。所述控制器设置所述一个或多个激光脉冲的激光脉冲宽度以选择性地提供一个或多个激光输出脉冲，所述激光输出脉冲具有影响要形成的软标记的深度的一个或多个设定的脉冲宽度。标记深度基本上取决于一个或多个设定的脉冲宽度。所述控制器还设置所述一个或多个输出脉冲的脉冲能量以选择性地提供所述一个或多个输出脉冲，所述输出脉冲具有设定的总输出能量，所述总输出能量位于用于产生所述软标记的可接受的过程能量

17. 发明申请

US20080284837A1 METHODS AND SYSTEMS FOR THERMA-BASED LASER PROCESSING A MULTI-MATERIAL DEVICE 有权
标题翻译：用于基于激光加工的多种材料的方法和系统
公开(公告)号：US20080284837A1
公开(公告)日：2008-11-20
申请号：US12165853
申请日：2008-07-01
申请人： James J. Cordingley , Jonathan S. Ehrmann , David M. Filgas , Shepard D. Johnson , Joohan Lee , Donald V. Smart , Donald J. Svetkoff
发明人： James J. Cordingley , Jonathan S. Ehrmann , David M. Filgas , Shepard D. Johnson , Joohan Lee , Donald V. Smart , Donald J. Svetkoff
IPC分类号： B41J2/435 , G01B11/14
CPC分类号： B23K26/0736 , B23K26/032 , B23K26/04 , B23K26/043 , B23K26/0613 , B23K26/0622 , B23K26/0624 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0652 , B23K26/0665 , B23K26/067 , B23K26/082 , B23K26/10 , B23K26/16 , B23K26/361 , B23K26/389 , B23K26/40 , B23K2101/38 , B23K2101/40 , B23K2103/10 , B23K2103/12 , B23K2103/172 , B23K2103/50 , H01L21/485 , H01L21/76888 , H01L21/76894 , H01L22/12 , H01L23/5258 , H01L2924/0002 , H05K3/0026 , H01L2924/00
摘要： A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.
摘要翻译：提供一种用于局部处理形成在基板上的预定微结构而不引起基板或其上形成在基板上的其它结构的电学或物理特性的不期望的变化的方法和系统。该方法包括基于与预定微结构，衬底和其它结构的激光脉冲相互作用的模型来提供信息。基于该信息确定至少一个脉冲的至少一个特性。生成包括至少一个脉冲的脉冲激光束。该方法还包括将具有至少一个确定特性的至少一个脉冲照射到预定微结构上的点中。所述至少一个脉冲的至少一个确定的特征和其它特征足以在不引起不期望的变化的情况下局部地处理预定的微结构。

18. 发明授权

US07199882B2 Method and system for high speed measuring of microscopic targets 失效
标题翻译：用于高速测量微观目标的方法和系统
公开(公告)号：US07199882B2
公开(公告)日：2007-04-03
申请号：US11102334
申请日：2005-04-08
申请人： Donald J. Svetkoff , Donald B. T. Kilgus , Warren Lin , Jonathan S. Ehrmann
发明人： Donald J. Svetkoff , Donald B. T. Kilgus , Warren Lin , Jonathan S. Ehrmann
IPC分类号： G01B11/24
CPC分类号： G01B11/2545 , G01B11/026 , G01B11/24 , G01B11/2518 , G01N21/9501 , G02B21/22
摘要： A system including confocal and triangulation-based scanners or subsystems provides data which is both acquired and processed under the control of a control algorithm to obtain information such as dimensional information about microscopic targets which may be “non-cooperative.” The “non-cooperative” targets are illuminated with a scanning beam of electromagnetic radiation such as laser light incident from a first direction. A confocal detector of the electromagnetic radiation is placed at a first location for receiving reflected radiation which is substantially optically collinear with the incident beam of electromagnetic radiation. The system includes a spatial filter for attenuating background energy. The triangulation-based subsystem also includes a detector of electromagnetic radiation which is placed at a second location which is non-collinear with respect to the incident beam. This detector has a position sensitive axis. Digital data is derived from signals produced by the detectors. In this way, data from at least one triangulation-based channel is acquired in parallel or sequentially with at least one slice of confocal image data having substantially perfect temporal and spatial registration with the triangulation-based sensor data. This allows for fusion or further processing of the data for use with a predetermined measurement algorithm to thereby obtain information about the targets.
摘要翻译：包括基于共焦和三角测量的扫描仪或子系统的系统提供在控制算法的控制下获取和处理的数据，以获得关于可能是“非合作”的微观目标的尺寸信息。 “非协同”目标用诸如从第一方向入射的激光的电磁辐射扫描束照射。电磁辐射的共焦检测器被放置在第一位置，用于接收与入射的电磁辐射束基本上光学共线的反射辐射。该系统包括用于衰减背景能量的空间滤波器。基于三角测量的子系统还包括电磁辐射检测器，其被放置在相对于入射光束非共线的第二位置。该检测器具有位置敏感轴。数字数据源自由检测器产生的信号。以这种方式，来自至少一个基于三角测量的信道的数据被并行或顺序地与具有基于三角测量的传感器数据具有基本上完美的时间和空间配准的共焦图像数据的至少一个切片获取。这允许融合或进一步处理与预定测量算法一起使用的数据，从而获得关于目标的信息。

19. 发明授权

US06777645B2 High-speed, precision, laser-based method and system for processing material of one or more targets within a field 有权
标题翻译：高速，精密，基于激光的方法和系统，用于处理场内一个或多个靶材的材料
公开(公告)号：US06777645B2
公开(公告)日：2004-08-17
申请号：US10107027
申请日：2002-03-27
申请人： Jonathan S. Ehrmann , James J. Cordingley , Donald V. Smart , Donald J. Svetkoff
发明人： Jonathan S. Ehrmann , James J. Cordingley , Donald V. Smart , Donald J. Svetkoff
IPC分类号： B23K2606
CPC分类号： B23K26/0736 , B23K26/032 , B23K26/04 , B23K26/043 , B23K26/0613 , B23K26/0622 , B23K26/0624 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0652 , B23K26/0665 , B23K26/067 , B23K26/082 , B23K26/10 , B23K26/16 , B23K26/361 , B23K26/389 , B23K26/40 , B23K2101/38 , B23K2101/40 , B23K2103/10 , B23K2103/12 , B23K2103/172 , B23K2103/50 , H01L21/485 , H01L21/76888 , H01L21/76894 , H01L22/12 , H01L23/5258 , H01L2924/0002 , H05K3/0026 , H01L2924/00
摘要： A precision, laser-based method and system for high-speed, sequential processing of material of targets within a field are disclosed that control the irradiation distribution pattern of imaged spots. For each spot, a laser beam is incident on a first anamorphic optical device and a second anamorphic optical device so that the beam is controllably modified into an elliptical irradiance pattern. The modified beam is propagated through a scanning optical system with an objective lens to image a controlled elliptical spot on the target. In one embodiment, the relative orientations of the devices along an optical axis are controlled to modify the beam irradiance pattern to obtain an elliptical shape while the absolute orientation of the devices controls the orientation of the elliptical spot.
摘要翻译：公开了一种精确的，基于激光的方法和系统，用于高速，顺序地处理场内目标物质的方法和系统，其控制成像斑点的照射分布模式。对于每个点，激光束入射在第一变形光学器件和第二变形光学器件上，使得光束被可控地修改为椭圆辐照度图案。修改的光束通过具有物镜的扫描光学系统传播，以对靶上的受控椭圆点进行成像。在一个实施例中，控制沿着光轴的装置的相对取向以修改束辐照度图案以获得椭圆形，同时装置的绝对取向控制椭圆点的取向。

20. 发明授权

US06633338B1 Programmable illuminator for vision system 有权
标题翻译：视觉系统的可编程照明器
公开(公告)号：US06633338B1
公开(公告)日：2003-10-14
申请号：US09301002
申请日：1999-04-27
申请人： Kurt Pelsue , Jonathan S. Ehrmann
发明人： Kurt Pelsue , Jonathan S. Ehrmann
IPC分类号： H04N5222
CPC分类号： G01N21/8806
摘要： The field portion (40) of a workpiece (14) that an electro-optical system (28) can image is deflected by a field-of-view deflector (38) and an array of light sources (42, 44) illuminates the workpiece. As the field of view (40) moves about the workpiece surface, individual sources (42, 44) in the light-source array are so turned on and off that all sources that could be imaged into the field of view by specular reflection are turned off. In this way, proper dark-field illumination is maintained.
摘要翻译：电光学系统（）的工件（ 14 ）的场部分（ 40 > ）可以通过视场偏转器（ 38 ）和光源阵列（ 42，44 ）照亮工件。由于视野（ 40 ）在光线周围移动工件表面，单个光源（ 42，44 ） -source数组如此打开和关闭，所有可以通过镜面反射成像到视场的源都被关闭。以这种方式，保持适当的暗场照明。

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