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11. 发明授权

US6007966A Negative-type photosensitive composition 失效
标题翻译：负型光敏组合物
公开(公告)号：US6007966A
公开(公告)日：1999-12-28
申请号：US150159
申请日：1998-09-09
申请人： Hsien-Kuang Lin
发明人： Hsien-Kuang Lin
IPC分类号： C08F257/02 , C08F267/04 , G03F7/033 , G03F7/038 , G03C1/725 , C08J3/28
CPC分类号： G03F7/033 , C08F257/02 , C08F267/04 , G03F7/0388
摘要： A photosensitive composition is disclosed particularly for making printed circuit boards. It contains: (a) a polymer binder; (b) a photoinitiator; and (c) an unsaturated photomonomer. The polymer binder is prepared from a reaction among the following reactants: (i) a styrene-maleic anhydride resin containing repeating units of styrene and anhydride groups, (ii) an unsaturated compound containing at least one hydroxy group and at least three acrylic groups, and (iii) a saturated alcohol. The styrene-maleic anhydride resin is prepared from a polymerization reaction of styrene and maleic anhydride in a molar ratio ranging from 3:1 to 1:1, and preferably has a molecular weight between 800 and 100,000.
摘要翻译：特别是公开了用于制造印刷电路板的光敏组合物。它包含：（a）聚合物粘合剂; （b）光引发剂; 和（c）不饱和光单体。聚合物粘合剂由以下反应物之间的反应制备：（i）含有苯乙烯和酸酐基团重复单元的苯乙烯 - 马来酸酐树脂，（ii）含有至少一个羟基和至少三个丙烯酸基团的不饱和化合物，和（iii）饱和醇。苯乙烯 - 马来酸酐树脂由苯乙烯和马来酸酐的摩尔比为3:1至1:1的聚合反应制备，优选分子量为800至100,000。

12. 发明授权

US5658697A Method for producing color filters by the use of anionic electrocoats 失效
标题翻译：通过使用阴离子电涂层制造滤色片的方法
公开(公告)号：US5658697A
公开(公告)日：1997-08-19
申请号：US633595
申请日：1996-04-17
申请人： Hsien-Kuang Lin
发明人： Hsien-Kuang Lin
IPC分类号： C25D13/12 , G02B5/20 , G03F7/00
CPC分类号： G02B5/201 , C25D13/12 , G03F7/0007
摘要： An improved method for making color filter plates from anionic electrocoats is disclosed. It comprises the steps of: (a) forming a positive photoresist layer on an electrically conductive transparent glass substrate; (b) exposing the portions of the glass substrate to be electrodeposited with a designated color electrocoat by removing corresponding portions of the positive photoresist layer using a photomasked light exposure procedure followed by a development procedure with a developer solution; (c) electrodepositing the designated color electrocoat on the exposed portions of the glass substrate; (d) performing a flood exposure on remaining portions of the positive photoresist; (e) performing a postbake procedure by heating the glass substrateto thereby harden the color electrocoat; (f) using a basic developer solution to remove the remaining portions of the positive photoresist; and (g) repeating steps (a) through (f) until all the desired electrocoats are electrodeposited on the glass substrate. The flood exposure step causes the photoresist to undergo a chemical reaction so that it will not crosslink during the postbake step and thus can be readily removed in step (f).
摘要翻译：公开了一种用于从阴离子电涂层制造滤色板的改进方法。其包括以下步骤：（a）在导电透明玻璃基板上形成正性光致抗蚀剂层; （b）使用光掩模的曝光程序，然后用显影剂溶液进行显影程序，用指定的彩色电泳涂层曝光所述要被电沉积的玻璃基板的部分; （c）将指定颜色的电泳涂层电镀在玻璃基板的露出部分上; （d）在正性光致抗蚀剂的剩余部分上进行泛光曝光; （e）通过加热玻璃基板进行后烘烤步骤，从而硬化颜色的电泳涂层; （f）使用碱性显影剂溶液去除正光致抗蚀剂的剩余部分; 和（g）重复步骤（a）至（f），直到所有所需的电涂层电沉积在玻璃基底上。泛光曝光步骤导致光致抗蚀剂经历化学反应，使得其在后烘烤步骤期间不会交联，因此可以在步骤（f）中容易地除去。

13. 发明授权

US5641595A Manufacture of color filters by incremental exposure method 失效
标题翻译：通过增量曝光法制造滤色片
公开(公告)号：US5641595A
公开(公告)日：1997-06-24
申请号：US591201
申请日：1996-01-16
申请人： Pao-Ju Hsieh , Hsien-Kuang Lin , Jim-Chyuan Shieh , Chao-Wen Niu , Chao-Huei Tseng , Hwa-Chi Cheng
发明人： Pao-Ju Hsieh , Hsien-Kuang Lin , Jim-Chyuan Shieh , Chao-Wen Niu , Chao-Huei Tseng , Hwa-Chi Cheng
IPC分类号： G03F7/00 , G03F7/20 , G03F9/00
CPC分类号： G03F7/0007 , G03F7/2022
摘要： A method for making color filters containing a color matrix with at least three desired colored layers comprising the steps of: (a) forming a positive energy-accumulable photoresist layer on a transparent electrically conductive substrate; (b) pre-conditioning the energy-accumulable photoresist layer to form at least three regions of different initial levels of exposure energy, from a highest to a lowest; (c) using a developer solution to develop and remove the region of the photoresist layer with the highest level of initial exposure energy to thereby cause a corresponding area of the electrically conductive substrate underlying the photoresist to be uncovered; (d) electrodepositing a photo-curable resin of a desired color and a predetermined exposure energy required for curing onto the uncovered area of the substrate; (e) overall-exposing the photoresist layer to a light source so as to impart an incremental exposure energy to all regions of the photoresist layer; (f) using a developer solution to develop and remove the region of the photoresist layer which has accumulatively attained the full exposure energy in step (e) and uncover a corresponding area on the substrate; (g) electrodepositing a photo-curable resin of another desired color onto the uncovered area of the substrate formed in step (f); and (h) repeating steps (e) through (g) until all the desired colored layers are selectively developed on the substrate. The incremental exposure energy is provided in step (e) such that: (i) it enables a region with a next highest initial exposure energy to attain full exposure energy, and (ii) it equals to or exceeds the exposure energy required for curing the photo-curable resin to thereby, at the same time, cause the photo-curable resin to become hardened.
摘要翻译：一种制备包含具有至少三个所需着色层的彩色矩阵的滤色器的方法，包括以下步骤：（a）在透明导电基底上形成正的可蓄积的光致抗蚀剂层; （b）预处理能量可聚合的光致抗蚀剂层，以形成从最高到最低的不同初始曝光能量的至少三个区域; （c）使用显影剂溶液以最高水平的初始曝光能量显影和去除光致抗蚀剂层的区域，从而使得光致抗蚀剂下面的导电基材的相应区域不被覆盖; （d）将所需颜色的光固化树脂和固化所需的预定曝光能量电沉积到基底的未覆盖区域上; （e）将光致抗蚀剂层全部曝光到光源，以便赋予光致抗蚀剂层的所有区域增加的曝光能量; （f）使用显影剂溶液来显影和去除在步骤（e）中累积获得完全曝光能量的光致抗蚀剂层的区域，并且露出基板上相应的区域; （g）将另一所需颜色的光固化树脂电沉积到在步骤（f）中形成的衬底的未覆盖区域上; 和（h）重复步骤（e）至（g），直到所有所需的着色层在衬底上选择性地显影。在步骤（e）中提供增量曝光能量，使得：（i）它能够使具有下一个最高初始曝光能量的区域获得完全的曝光能量，和（ii）它等于或超过固化所需的曝光能量光固化树脂，从而同时使光固化树脂变硬。

14. 发明授权

US5242780A Electrophoretic positive working photosensitive composition comprising as the photosensitive ingredient an aliphatic polyester having o-quinone diazide on the side chain and end groups 失效
标题翻译：电泳正性感光性组合物，作为感光性成分，在侧链和端基上含有具有邻醌二叠氮基的脂肪族聚酯
公开(公告)号：US5242780A
公开(公告)日：1993-09-07
申请号：US780691
申请日：1991-10-18
申请人： Hsien-Kuang Lin , Jim-Chyuan Shieh , Dhei-Jhai Lin
发明人： Hsien-Kuang Lin , Jim-Chyuan Shieh , Dhei-Jhai Lin
IPC分类号： G03F7/023 , G03F7/16
CPC分类号： G03F7/164 , G03F7/023 , Y10S430/111
摘要： An electrophoretic positive working photosensitive composition for producing a photoresist pattern on metal base plate comprises a photosensitive compound, in which a photosensitive quinone diazide group is grafted on a polyester, and an acrylic copolymer containing carboxyl group, the composition forms a smooth photoresist film on the plate and has a good adhesion to the surface that no pinehole is found.
摘要翻译：用于在金属基板上制造光致抗蚀剂图案的电泳正性光敏组合物包括其中将感光醌二叠氮基接枝在聚酯上的光敏化合物和含有羧基的丙烯酸共聚物，该组合物在并且对表面具有良好的粘附性，没有发现松木。

15. 发明授权

US07122955B2 Organic electroluminescent device with a nanostructured recovery layer 有权
标题翻译：具有纳米结构恢复层的有机电致发光器件
公开(公告)号：US07122955B2
公开(公告)日：2006-10-17
申请号：US10644975
申请日：2003-08-21
申请人： Mei-Rurng Tseng , Jong-Min Liu , Juen-kai Wang , Hsien-Kuang Lin
发明人： Mei-Rurng Tseng , Jong-Min Liu , Juen-kai Wang , Hsien-Kuang Lin
IPC分类号： H01J1/62 , H01J63/04
CPC分类号： B82Y30/00 , B82Y20/00 , H01L51/5262 , H01L51/5268 , H01L2251/5369
摘要： An organic electroluminescent device. The device has an organic electroluminescent light recovery layer consisting of dielectric material and nanoscale metal particles or organic material and nanoscale metal particles. The membrane of the organic electroluminescent light recovery layer cross couples with surface plasmon resonance and recovers light trapped in the device, enhancing the light emission efficiency of the organic electroluminescent device.
摘要翻译：有机电致发光器件。该器件具有由介电材料和纳米级金属颗粒或有机材料和纳米级金属颗粒组成的有机电致发光光回收层。有机电致发光光回收层的膜与表面等离子体共振交叉耦合，并回收被捕获在器件中的光，从而提高了有机电致发光器件的发光效率。

16. 发明授权

US5631111A Method for producing color filters 失效
标题翻译：滤色片生产方法
公开(公告)号：US5631111A
公开(公告)日：1997-05-20
申请号：US588962
申请日：1996-01-19
申请人： Chao-Wen Niu , Hsien-Kuang Lin , Hua-Chi Cheng , Pao-Ju Hsieh
发明人： Chao-Wen Niu , Hsien-Kuang Lin , Hua-Chi Cheng , Pao-Ju Hsieh
IPC分类号： C25D13/12 , G02B5/20
CPC分类号： G02B5/201 , C25D13/12
摘要： An improved method is disclosed for making color filters via electrodeposition or lithographic electrodeposition of a plurality of colored resins onto an electrically conductive substrate. The method comprises the steps of: (a) forming a black-hued pattern on the substrate; (b) dividing the substrate into an intended zone and a conjugate zone, the intended zone being portions of the substrate to be deposited with the colored resins and the conjugate zone being portions of the substrate not to be deposited with the colored resins; (c) forming a permanent insulation film on the conjugate zone of the substrate; and (d) electrodepositing the colored resins onto the intended zone of the substrate. The photosensitive insulation resin is preferably a negative photosensitive resin containing: (i) a resin binder containing a carboxyl (COOH) group; (ii) 1-15 wt %, based on the weight of the resin binder, of a photopolymerization initiator; and (iii) 30-100 wt %, based on the weight of the resin binder, of a photo-reactive monomer or oligomer each containing at least two unsaturated double bonds.
摘要翻译：公开了一种改进的方法，用于通过多个着色树脂的电沉积或平版印刷电沉积制成彩色滤光片到导电基底上。该方法包括以下步骤：（a）在衬底上形成黑色样式; （b）将基材分成预期区域和共轭区域，预期区域是要沉积着色树脂的基材的部分，共轭区域是不沉积着色树脂的基材的部分; （c）在所述基板的共轭区上形成永久绝缘膜; 和（d）将着色树脂电沉积到基底的预期区域上。感光性绝缘树脂优选为负型感光性树脂，其含有：（i）含有羧基（COOH）基团的树脂粘合剂; （ii）基于树脂粘合剂的重量为1-15重量％的光聚合引发剂; 和（iii）30-100重量％，基于树脂粘合剂的重量，每个含有至少两个不饱和双键的光反应性单体或低聚物。

17. 发明授权

US5229245A Positively working photosensitive composition 失效
标题翻译：正面工作感光组合物
公开(公告)号：US5229245A
公开(公告)日：1993-07-20
申请号：US736460
申请日：1991-07-26
申请人： Dhei-Jhai Lin , Hsien-Kuang Lin , Jim-Chyuan Shieh
发明人： Dhei-Jhai Lin , Hsien-Kuang Lin , Jim-Chyuan Shieh
IPC分类号： G03F7/023
CPC分类号： G03F7/0233
摘要： A positively working photosensitive composition is disclosed useful for making positively working lithographic printing plates of exceptional wear, printing and solvent-resistant characteristics. The positively working photosensitive composition essentially contains a .beta.-dicarbonyl group and a quinone diazide group.
摘要翻译：公开了一种正面工作的光敏组合物，其用于制造具有出色的耐磨性，耐印刷性和耐溶剂性的正性工作平版印刷版。正性感光组合物基本上含有β-二羰基和醌二叠氮基。

18. 发明授权

US5019483A Aqueous developable photoresist containing weak alkali soluble or dispersible thiol compounds 失效
标题翻译：含有弱碱溶性或可分散硫醇化合物的水性可显影光致抗蚀剂
公开(公告)号：US5019483A
公开(公告)日：1991-05-28
申请号：US406461
申请日：1989-09-13
申请人： Dhei-Jhai Lin , Jim-Chyuan Shieh , Hsien-Kuang Lin
发明人： Dhei-Jhai Lin , Jim-Chyuan Shieh , Hsien-Kuang Lin
IPC分类号： G03F7/027
CPC分类号： G03F7/0275
摘要： An aqueous alkali developable photoresist composition consists of (a) a carboxyl group-containing polymeric binder, (b) 1-15% by weight of a photoinitiator based on the binder, (c) 20-100% by weight based on the binder, of a photo reactive monomer or oligomer containing at least two ethylenically unsaturated double bonds, and (d) 0.05-5% by weight based on the binder of a weak alkali soluble or dispersible thiol compound represented by(X).sub.a R--SH).sub.bwhere a, b are integers equal to or greater than 1, R is an organic moiety of molecular weight less than 500, and X is a carboxyl group-containing moiety or hydrophilic organic polymeric segment with less than 100 repeating unit.
摘要翻译：含水碱性可显影光致抗蚀剂组合物由（a）含羧基的聚合物粘合剂组成，（b）基于粘合剂的1-15重量％的光引发剂，（c）基于粘合剂的20-100重量％的含有至少两个烯键式不饱和双键的光反应性单体或低聚物，和（d）基于由（X）aR-SH）b表示的弱碱可溶或可分散的硫醇化合物的粘合剂为0.05-5重量％，其中 a，b是等于或大于1的整数，R是分子量小于500的有机部分，X是含羧基的部分或具有小于100个重复单元的亲水性有机聚合物链段。

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