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11. 发明申请

US20090148067A1 IMAGE PROCESSING METHOD AND RELATED APPARATUS FOR PERFORMING IMAGE PROCESSING OPERATION ACCORDING TO IMAGE BLOCKS IN HORIZONTAL DIRECTION 有权
标题翻译：图像处理方法及相关装置，用于根据水平方向的图像块执行图像处理操作
公开(公告)号：US20090148067A1
公开(公告)日：2009-06-11
申请号：US12265725
申请日：2008-11-05
申请人： Jen-Shi Wu , Chung-Yi Chen
发明人： Jen-Shi Wu , Chung-Yi Chen
IPC分类号： G06K9/32
CPC分类号： H04N19/176 , H04N19/423 , H04N19/57
摘要： An image processing method includes generating a block matching result by performing a block matching operation according to a plurality of image blocks in the horizontal direction without referring to an image block in the vertical or other directions and performing an image processing operation according to the block matching result of the block matching operation.
摘要翻译：图像处理方法包括：通过在水平方向上执行与多个图像块的块匹配操作来生成块匹配结果，而不参照垂直方向或其他方向的图像块，并根据块匹配执行图像处理操作块匹配操作的结果。

12. 发明授权

US07271083B2 One-transistor random access memory technology compatible with metal gate process 有权
标题翻译：单晶体管随机存取技术兼容金属栅极工艺
公开(公告)号：US07271083B2
公开(公告)日：2007-09-18
申请号：US10896491
申请日：2004-07-22
申请人： Kuo-Chi Tu , Kuo-Chyuan Tzeng , Chung-Yi Chen , C. Y. Shen , Chun-Yao Chen , Hsiang-Fan Lee
发明人： Kuo-Chi Tu , Kuo-Chyuan Tzeng , Chung-Yi Chen , C. Y. Shen , Chun-Yao Chen , Hsiang-Fan Lee
IPC分类号： H01L29/76
CPC分类号： H01L27/10861 , H01L27/10873
摘要： One-transistor RAM technology compatible with a metal gate process fabricates a metal gate electrode formed of the same metal material as a top electrode of a MIM capacitor embedded isolation structure. A gate dielectric layer is formed of the same high-k dielectric material as a capacitor dielectric of the MIM capacitor embedded isolation structure.
摘要翻译：与金属栅极工艺兼容的单晶体管RAM技术制造由与MIM电容器嵌入式隔离结构的顶部电极相同的金属材料形成的金属栅电极。栅极电介质层由与MIM电容器嵌入式隔离结构的电容器电介质相同的高k电介质材料形成。

13. 发明授权

US06664172B2 Method of forming a MOS transistor with improved threshold voltage stability 失效
公开(公告)号：US06664172B2
公开(公告)日：2003-12-16
申请号：US09683578
申请日：2002-01-22
申请人： Tong-Hsin Lee , Chung-Yi Chen
发明人： Tong-Hsin Lee , Chung-Yi Chen
IPC分类号： H01L21425
CPC分类号： H01L21/425
摘要： The gate for at least one transistor is formed on the surface of the semiconductor substrate and the gate is utilized as a mask to form a lightly doped drain of the transistor. A low thermal budget deposition process is performed to form a silicon nitride layer on the surface or the semiconductor substrate. An ion implantation process is performed to implant fluorine atoms into the silicon nitride layer. After that, an etching process is performed to form a spacer in the periphery of the gate. Finally, a source/drain of the transistor is formed. The implanted fluorine atoms bond with the hydrogen atoms and keep them from becoming interface trapped charges. This increases the threshold voltage stability of the transistor.

14. 发明授权

US06300238B1 Method of fabricating node contact opening 失效
标题翻译：节点接触开口的制作方法
公开(公告)号：US06300238B1
公开(公告)日：2001-10-09
申请号：US09390104
申请日：1999-09-03
申请人： Tong-Hsin Lee , Terry Chung-Yi Chen
发明人： Tong-Hsin Lee , Terry Chung-Yi Chen
IPC分类号： H01L218242
CPC分类号： H01L27/10855 , H01L27/10814
摘要： A fabrication method of a node contact opening involves forming a first insulating layer on the substrate, in which a bit line, which contacts the substrate, is formed on the first insulating layer. A conformal second insulating layer that serves as an etching stop layer is formed after the formation of bit line. A third insulating layer is then formed to isolate the subsequently formed capacitor and bit line. A pattern mask is formed on the third insulating layer, while a pattern of the pattern mask is transferred into the third insulating layer, so that an opening is formed in the third insulating layer. After the second insulating layer in the opening is removed, a spacer is formed on a sidewall of the opening. With the pattern mask and the spacer serving as an etching mask, the first insulating layer below the bit line is etched until the opening is extended through to the substrate, so that a contact opening is formed.
摘要翻译：节点接触开口的制造方法包括在衬底上形成第一绝缘层，其中在第一绝缘层上形成接触衬底的位线。在形成位线之后形成用作蚀刻停止层的保形第二绝缘层。然后形成第三绝缘层以隔离随后形成的电容器和位线。在第三绝缘层上形成图形掩模，同时将图案掩模的图案转移到第三绝缘层中，从而在第三绝缘层中形成开口。在开口中的第二绝缘层被去除之后，在开口的侧壁上形成间隔物。利用图案掩模和间隔件作为蚀刻掩模，蚀刻位线下方的第一绝缘层直到开口延伸到基板，从而形成接触开口。

15. 发明授权

US09277167B2 Compensation de-interlacing image processing apparatus and associated method 有权
标题翻译：补偿去隔行图像处理装置及相关方法
公开(公告)号：US09277167B2
公开(公告)日：2016-03-01
申请号：US13337453
申请日：2011-12-27
申请人： Yu-Jen Wang , Chung-Yi Chen
发明人： Yu-Jen Wang , Chung-Yi Chen
IPC分类号： H04N7/12 , H04N11/02 , H04N11/04 , H04N7/01
CPC分类号： H04N7/012 , H04N7/014
摘要： A motion compensation de-interlacing image processing apparatus is provided. The apparatus includes a motion compensation module, a still compensation module, a motion detection module, and a de-interlacing blending module. The motion compensation module generates a motion compensation pixel according to at least one of a current field, a previous field, and a next field of a target pixel to be interpolated. The still compensation module generates a still compensation pixel according to the previous field and the next field of the target pixel. The motion detection module determines a motion index according to the previous field and the next field of the target pixel. The de-interlacing blending module generates the target pixel by weighted averaging the motion compensation pixel and the still compensation pixel according to the motion index.
摘要翻译：提供一种运动补偿去隔行图像处理装置。该装置包括运动补偿模块，静止补偿模块，运动检测模块和去隔行混合模块。运动补偿模块根据要内插的目标像素的当前场，先前场和下一场中的至少一个产生运动补偿像素。静止补偿模块根据目标像素的前一场和下一场产生静止补偿像素。运动检测模块根据目标像素的前一场和下一个场来确定运动索引。去隔行混合模块通过根据运动索引对运动补偿像素和静止补偿像素进行加权平均来生成目标像素。

16. 发明授权

US09196015B2 Image processing apparatus, image processing method and image display system 有权
标题翻译：图像处理装置，图像处理方法和图像显示系统
公开(公告)号：US09196015B2
公开(公告)日：2015-11-24
申请号：US13572897
申请日：2012-08-13
申请人： Chia-Hao Chung , Chung-Yi Chen
发明人： Chia-Hao Chung , Chung-Yi Chen
IPC分类号： H04N7/12 , G06T3/40 , H04N19/105 , H04N19/176 , H04N19/154 , H04N19/587 , H04N7/01
CPC分类号： G06T3/4007 , H04N7/0127 , H04N7/014 , H04N19/105 , H04N19/154 , H04N19/176 , H04N19/587
摘要： An image processing apparatus for generating an intermediate frame according to a previous frame and a next frame is provided. The apparatus includes a determining module and a selecting module. The intermediate frame includes a plurality of intermediate image blocks, each of which corresponds to a motion vector. For each intermediate image block, the determining module determines whether an interpolated image generated according to the motion vector meets a correctness requirement. According to whether the interpolated image meets the correctness requirement, the selecting module selects the interpolated image or a substitutive image different from the interpolated image to represent the intermediate image block.
摘要翻译：提供一种用于根据前一帧和下一帧产生中间帧的图像处理装置。该装置包括确定模块和选择模块。中间帧包括多个中间图像块，每个中间图像块对应于运动矢量。对于每个中间图像块，确定模块确定根据运动矢量生成的内插图像是否满足正确性要求。根据内插图像是否满足正确性要求，选择模块选择内插图像或与内插图像不同的替代图像来表示中间图像块。

17. 发明授权

US08772347B2 Use of a pharmaceutical composition for promoting proliferation and/or migration of skin cells, and for improving wound healing in a subject 有权
标题翻译：使用药物组合物促进皮肤细胞的增殖和/或迁移，以及改善受试者的伤口愈合
公开(公告)号：US08772347B2
公开(公告)日：2014-07-08
申请号：US13445451
申请日：2012-04-12
申请人： Hui-Min Wang , Chung-Yi Chen , Chien-Chih Chiu , Yi-Ting Chou
发明人： Hui-Min Wang , Chung-Yi Chen , Chien-Chih Chiu , Yi-Ting Chou
IPC分类号： A61K31/12 , C07C49/255 , A61K8/35 , A61Q19/08 , A61K8/97
CPC分类号： A61K8/35 , A61K8/97 , A61Q19/08
摘要： A method for promoting proliferation and/or migration of skin cells includes providing a composition containing a compound of formula (I) below; and administrating to the skin cells the composition. A method for improving wound healing in a subject includes providing a composition containing a compound of formula (I) below; and administrating to the subject the composition
摘要翻译：用于促进皮肤细胞增殖和/或迁移的方法包括提供含有下述式（I）化合物的组合物; 并向皮肤细胞施用组合物。一种改善受试者伤口愈合的方法包括提供含有下述式（I）化合物的组合物; 并向受试者施用组合物

18. 发明申请

US20130158195A1 Delustrant Composed of Polyimide Powder, Polyimide Film Incorporating The Delustrant, and Manufacture Thereof 审中-公开
标题翻译：由聚酰亚胺粉末组成的消泡剂，包含该消泡剂的聚酰亚胺膜及其制造
公开(公告)号：US20130158195A1
公开(公告)日：2013-06-20
申请号：US13600293
申请日：2012-08-31
申请人： Chung-Yi Chen , Sheng-Yu Huang , Wei-Dun Jhuang
发明人： Chung-Yi Chen , Sheng-Yu Huang , Wei-Dun Jhuang
IPC分类号： C08L79/08 , C08K3/04 , B29C41/00 , C08G73/16
CPC分类号： C08J5/18 , C08G73/1046 , C08J2379/08 , C08J2479/08 , C09D179/08 , Y10T428/2982
摘要： A polyimide film with low gloss comprising a polyimide base polymer constituting the film, and a polyimide powder distributed in the film, the polyimide film having a 60° gloss value smaller or equal to about 50. The polyimide powder used as delustrant can have an average particle size between about 0.5 μm and about 15 μm. Embodiments described herein also include methods of preparing the polyimide film and the delustrant.
摘要翻译：包含构成膜的聚酰亚胺基础聚合物的聚酰亚胺薄膜和分布在该膜中的聚酰亚胺粉末，聚酰亚胺薄膜的光泽度小于或等于约50°。用作消光剂的聚酰亚胺粉末可具有平均粒径粒度在约0.5μm至约15μm之间。本文所述的实施方案还包括制备聚酰亚胺膜和消光剂的方法。

19. 发明授权

US08437399B2 Method and associated apparatus for determining motion vectors 有权
标题翻译：用于确定运动矢量的方法和相关装置
公开(公告)号：US08437399B2
公开(公告)日：2013-05-07
申请号：US12366684
申请日：2009-02-06
申请人： Chung-Yi Chen , Su Chun Wang
发明人： Chung-Yi Chen , Su Chun Wang
IPC分类号： H04N7/12
CPC分类号： H04N5/145 , H04N7/014 , H04N19/51 , H04N19/577
摘要： A method and an associated apparatus for determining a motion vector are disclosed. The method includes performing block matching for a first block where an interpolated block is located according to the first frame and the second frame to generate a first candidate motion vector of the interpolated block, performing block matching for a second block where the interpolated block is located according to the first frame and the second frame to generate a second candidate motion vector of the interpolated block, and determining a target motion vector of the interpolated block according to either of the first motion vector and the second candidate motion vector.
摘要翻译：公开了一种用于确定运动矢量的方法和相关联的装置。该方法包括根据第一帧和第二帧对内插块所位于的第一块执行块匹配，以生成内插块的第一候选运动矢量，对内插块所在的第二块执行块匹配根据第一帧和第二帧，生成内插块的第二候选运动矢量，根据第一运动矢量和第二候选运动矢量中的任一个确定内插块的目标运动矢量。

20. 发明申请

US20130065033A1 Multilayer Polyimide-Containing Film and Manufacturing Method Thereof 审中-公开
标题翻译：含多层聚酰亚胺的膜及其制造方法
公开(公告)号：US20130065033A1
公开(公告)日：2013-03-14
申请号：US13538083
申请日：2012-06-29
申请人： Paul S. C. WU , Chi-Huan Lo , Ching-Wen Yu , Chung-Yi Chen , Sheng-Yu Huang , Cheng-Han Chen WU , Wen-Hsuan Chung
发明人： Paul S. C. WU , Chi-Huan Lo , Ching-Wen Yu , Chung-Yi Chen , Sheng-Yu Huang , Cheng-Han Chen WU , Wen-Hsuan Chung
IPC分类号： B32B27/36 , B32B7/02
CPC分类号： B32B27/08 , B32B27/18 , B32B27/20 , B32B27/281 , B32B2037/243 , B32B2250/24 , B32B2307/402 , B32B2309/105 , B32B2379/08 , B32B2457/00 , B32B2457/08 , Y10T428/24942 , Y10T428/265
摘要： A multilayer polyimide-containing film comprises a coloring layer containing a pigment, and a first protection layer disposed on one surface of the coloring layer, the first protection layer having a thickness between about 0.5 and about 3 micrometers. In some embodiments, methods of manufacturing the multilayer polyimide-containing film are also described.
摘要翻译：含有多层含聚酰亚胺的膜包括含有颜料的着色层和设置在着色层的一个表面上的第一保护层，第一保护层的厚度在约0.5微米至约3微米之间。在一些实施例中，还描述了制造含多层聚酰亚胺的膜的方法。

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