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    • 162. 发明申请
    • Method For Implementing on-Ring Process, Off-Ring Process and Data Forwarding in Resilience Packet Data Ringnet and a Network Device Thereof
    • 在弹性分组数据环网及其网络设备中实现环上过程,离圈过程和数据转发的方法
    • US20080130490A1
    • 2008-06-05
    • US11814909
    • 2005-12-05
    • Yang YuWei Wang
    • Yang YuWei Wang
    • H04L1/00
    • H04L45/00H04L12/4633H04L45/586
    • An inserting and copying processing method for implementing an L2/L3 compatible RPR network is provided. The inserting processing method includes: encapsulating an Ethernet data frame with local mode or remote mode according to whether the source and destination MAC addresses of the Ethernet data frame may be found in the ring station MAC address table or in the correspondence table of host MAC address and RPR station, and whether the destination address of the Ethernet data frame is a unicast address or a non-unicast address. The copying processing method includes: recombining the RPR data frame into an Ethernet data frame according to the forwarding mode of the RPR data frame, and learning the correspondence relationship between source host address and RPR station address according to the Flooding flag and the forwarding mode of the RPR data frame. This invention also provides a data forwarding method and a network apparatus.
    • 提供了一种用于实现L2 / L3兼容RPR网络的插入和复制处理方法。 插入处理方法包括:根据是否可以在环台MAC地址表中找到以太网数据帧的源MAC地址和目的MAC地址表,或者在主机MAC地址的对应表中,根据本地模式或远程模式封装以太网数据帧 和RPR站,以及以太网数据帧的目的地址是单播地址还是非单播地址。 复制处理方法包括:根据RPR数据帧的转发方式将RPR数据帧重新组合成以太网数据帧,并根据Flooding标志和转发模式学习源主机地址和RPR站地址之间的对应关系 RPR数据帧。 本发明还提供一种数据转发方法和网络装置。
    • 163. 发明申请
    • Liquid crystal display device having decouple layers
    • 具有解耦层的液晶显示装置
    • US20080123011A1
    • 2008-05-29
    • US11986804
    • 2007-11-26
    • Wei Wang
    • Wei Wang
    • G02F1/136
    • G02F1/136286G02F2001/13606
    • An exemplary liquid crystal display device (20) includes a first substrate (21), a second substrate (23) parallel to the first substrate, and a liquid crystal layer (25) disposed between the first substrate and the second substrate. The first substrate includes a common electrode (24) adjacent to the liquid crystal layer. The second substrate includes a plurality of gate lines (26), a plurality of data lines (28) perpendicular to the gate lines, a plurality of first decouple layers (261) formed on the gate lines and a plurality of second decouple layers (281) formed on the data lines. The first and second decouple layers are connected to ground.
    • 示例性液晶显示装置(20)包括第一基板(21),平行于第一基板的第二基板(23)和设置在第一基板和第二基板之间的液晶层(25)。 第一基板包括与液晶层相邻的公共电极(24)。 第二基板包括多个栅极线(26),垂直于栅极线的多个数据线(28),形成在栅极线上的多个第一解耦层(261)和多个第二解耦层(281 )形成在数据线上。 第一和第二去耦层连接到地面。
    • 166. 发明申请
    • Apparatus and a method for cleaning a dielectric film
    • 用于清洁电介质膜的装置和方法
    • US20070113868A1
    • 2007-05-24
    • US11284775
    • 2005-11-22
    • Xinyu FuJohn ForsterWei Wang
    • Xinyu FuJohn ForsterWei Wang
    • B08B6/00
    • H01L21/02063H01J37/32357H01J37/32422H01J37/3266
    • An apparatus and a method of cleaning a dielectric film are provided in the present invention. In one embodiment, an apparatus of cleaning a dielectric film the apparatus includes a chamber body adapted to support a substrate therein, a remote plasma source adapted to provide a plurality of reactive radicals to the chamber body, a passage coupling the remote plasma source to the chamber body, and at least one magnet disposed adjacent the passage. In another embodiment, a method of cleaning a dielectric film that includes providing a substrate having an at least partially exposed dielectric layer disposed in a process chamber, generating a plurality of reactive radicals in a remote plasma source, flowing the reactive radicals from the remote plasma source into the process chamber through a passage having at least one magnet disposed adjacent the passage, and magnetically filtering the reactive radicals passing through the passage.
    • 在本发明中提供了一种清洁电介质膜的装置和方法。 在一个实施例中,一种清洁电介质膜的装置包括适于在其中支撑衬底的室主体,适于向室主体提供多个反应性基团的远程等离子体源,将远程等离子体源耦合到 室主体,以及邻近通道设置的至少一个磁体。 在另一个实施例中,一种清洁电介质膜的方法,该方法包括提供具有设置在处理室中的至少部分暴露的电介质层的衬底,在远程等离子体源中产生多个反应性基团,使来自远端等离子体的反应性基团 通过具有邻近通道设置的至少一个磁体的通道进入处理室,并对穿过通道的反应性基团进行磁过滤。
    • 167. 发明授权
    • Low drop-out voltage regulator with enhanced frequency compensation
    • 低压差稳压器,具有增强的频率补偿
    • US07218083B2
    • 2007-05-15
    • US11135180
    • 2005-05-23
    • Wei WangXiaoHu TangXiaoHua Hou
    • Wei WangXiaoHu TangXiaoHua Hou
    • G05F1/00
    • G05F1/575
    • The present invention is a voltage regulator circuit with enhanced frequency compensation. The voltage regulator includes an error amplifier, a dynamic bias circuit, an enhanced frequency compensation unit, a pass device and a compensation circuit. A signal from the pass device acts as an input signal of the error amplifier and is compared with another input signal, producing a differential signal. The differential signal is amplified and then provided to the dynamic circuit and the enhanced frequency compensation unit. The enhanced frequency compensation unit is provided such that a zero reference value in a left-hand plane can be generated to optimize the compensation for the voltage regulator circuit. The error amplifier includes a capacitor for compensating an output voltage of the voltage regulator circuit.
    • 本发明是一种具有增强的频率补偿的电压调节器电路。 电压调节器包括误差放大器,动态偏置电路,增强型频率补偿单元,通过装置和补偿电路。 来自通过装置的信号用作误差放大器的输入信号,并与另一个输入信号进行比较,产生差分信号。 差分信号被放大,然后提供给动态电路和增强型频率补偿单元。 提供增强型频率补偿单元,使得可以生成左侧平面中的零参考值以优化用于稳压器电路的补偿。 误差放大器包括用于补偿电压调节器电路的输出电压的电容器。
    • 169. 发明申请
    • Thermo-optic tunable laser apparatus
    • 热光可调谐激光装置
    • US20070002926A1
    • 2007-01-04
    • US11170893
    • 2005-06-30
    • Mark McDonaldWei Wang
    • Mark McDonaldWei Wang
    • H01S3/13H01S3/08
    • H01S5/02446H01S3/105H01S3/1062H01S5/022H01S5/02248H01S5/02415H01S5/02438H01S5/141
    • Thermo-optic tuning apparatuses and techniques that may be used in external cavity lasers are provided. A wavelength selection device may be placed in the external cavity and may include a thermally responsive substrate and tunable optical elements extending therefrom. Heating and heat monitoring actuators may be formed in the substrate itself, with the tunable optical elements being mechanically positioned in the recesses of the substrate for thermo-optic tuning. In some examples, a separate optical path length adjustment element is also placed in the thermally responsive substrate, or elsewhere, for separate frequency tuning. This adjustment element may be part of a control that is detangled from the normal servo controls used in laser tuning.
    • 提供了可用于外腔激光器的热光调谐装置和技术。 波长选择装置可以放置在外部空腔中,并且可以包括热响应基板和从其延伸的可调光学元件。 加热和热监测致动器可以形成在基板本身中,其中可调光学元件机械地定位在基板的凹部中用于热光学调谐。 在一些示例中,单独的光程长度调节元件也放置在热响应衬底或其他地方,用于单独的频率调谐。 该调整元件可以是与激光调谐中使用的普通伺服控制器相关的控制的一部分。