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161. 发明授权

US6159642A Exposure mask and method of manufacturing thereof, and pattern data generating method for an exposure mask 失效
标题翻译：曝光掩模及其制造方法以及曝光掩模的图案数据生成方法
公开(公告)号：US6159642A
公开(公告)日：2000-12-12
申请号：US813049
申请日：1997-03-07
申请人： Kenji Kawano , Shinichi Ito , Satoshi Tanaka , Soichi Inoue , Hideki Kanai , Ikuo Yoneda
发明人： Kenji Kawano , Shinichi Ito , Satoshi Tanaka , Soichi Inoue , Hideki Kanai , Ikuo Yoneda
IPC分类号： G03F1/30 , G03F1/68 , H01L21/027 , G03F9/00
CPC分类号： G03F1/26 , G03F1/30
摘要： An exposure mask includes a transparent substrate having a light shielding pattern and an aperture pattern thereon for transmitting an exposure light and arranged in that any two adjacent apertures of the same pattern size in the aperture pattern are different from each other in the etched depth, wherein a difference between the aperture pattern size and its adjacent light shielding pattern size, and the trench depth in the aperture pattern are determined by a sum of the aperture pattern size and its adjacent light shielding pattern size.
摘要翻译：曝光掩模包括具有遮光图案和其上的孔径图案的透明基板，用于透射曝光光，并且布置为在蚀刻深度中孔径图案中相同图案尺寸的任何两个相邻孔径彼此不同，其中孔径图案尺寸与其相邻的遮光图案尺寸之间的差异以及孔径图案中的沟槽深度由孔径图案尺寸和其相邻的遮光图案尺寸之和决定。

162. 发明授权

US6107013A Exposure method and exposure apparatus using it 失效
标题翻译：使用曝光方法和曝光装置
公开(公告)号：US6107013A
公开(公告)日：2000-08-22
申请号：US990097
申请日：1997-12-12
申请人： Tadahito Fujisawa , Satoshi Tanaka , Akiko Mimotogi , Shoji Mimotogi , Soichi Inoue
发明人： Tadahito Fujisawa , Satoshi Tanaka , Akiko Mimotogi , Shoji Mimotogi , Soichi Inoue
IPC分类号： G03F1/34 , G03F1/68 , G03F7/20 , H01L21/027 , H01L21/28 , H01L21/768
CPC分类号： G03F7/70058 , G03F7/70425 , H01L21/28123 , G03F1/26 , H01L21/76816
摘要： An exposure method includes the phase-shifting mask supply step, the phase-shifting mask being prepared by selectively forming a light-shielding portion and a phase shifter on a substrate, and the resist exposure step of performing both exposure of a resist by dark field illumination light and exposure of the resist by bright field illumination light by using the phase-shifting mask, thereby removing residual resist generated by the influence of the edge of the phase shifter.
摘要翻译：曝光方法包括相移掩模提供步骤，通过在基板上选择性地形成遮光部分和移相器来制备相移掩模，以及抗蚀剂曝光步骤，通过暗场曝光抗蚀剂通过使用移相掩模通过亮场照明光照射光和抗蚀剂曝光，从而去除由移相器的边缘的影响产生的残留抗蚀剂。

163. 发明授权

US6004701A Method for designing Levenson photomask 失效
标题翻译：设计Levenson光掩模的方法
公开(公告)号：US6004701A
公开(公告)日：1999-12-21
申请号：US46794
申请日：1998-03-24
申请人： Taiga Uno , Kiyomi Koyama , Kazuko Yamamoto , Satoshi Tanaka , Sachiko Kobayashi , Koji Hashimoto
发明人： Taiga Uno , Kiyomi Koyama , Kazuko Yamamoto , Satoshi Tanaka , Sachiko Kobayashi , Koji Hashimoto
IPC分类号： G03F1/30 , G03F1/68 , H01L21/027 , G03F9/00 , G06F17/50
CPC分类号： G03F1/30
摘要： In a Levenson photomask design method of partially forming a plurality of opening patterns for passing incident light in a light-shielding film for shielding the incident light, and arranging, on some patterns, phase shifters, line segment pairs of different patterns which are adjacent to each other within a predetermined distance R are extracted in units of line segments obtained by dividing the patterns. A pattern within a predetermined distance S from the central point of the opposite region of a line segment pair of interest in a direction perpendicular to the line segments is obtained. The obtained pattern is subjected to a process simulation to obtain resolution easiness representing the easiness in resolving the adjacent patterns. On the basis of the resolution easiness obtained for the adjacent pattern pair within the distance R, a phase shifter is arranged in ascending order of resolution easiness to give a phase difference. Resolution suitable for the exposure condition used can be obtained by a simple method. When the shifter arrangement is determined in consideration of the resolution easiness, a high-resolution shifter arrangement can be realized for a Levenson phase shift mask.
摘要翻译：在莱文森光掩模设计方法中，部分地形成用于使入射光入射到遮光膜中的入射光的多个开口图案，用于屏蔽入射光，并且在某些图案上布置移相器，与不同图案相邻的线段对以规定的距离R为单位，以通过划分图案而得到的线段为单位提取。获得与垂直于线段的方向相关的线段对的相对区域的中心点的预定距离S内的图案。对所获得的图案进行处理模拟以获得表示分辨相邻图案的容易性的分辨率容易度。基于在距离R内对相邻图案对获得的分辨率容易度，移位器按分辨率的顺序排列顺序排列以给出相位差。可以通过简单的方法获得适合于所使用的曝光条件的分辨率。考虑到分辨率容易度来确定移位器装置时，可以实现对莱文森相移掩模的高分辨率移位器装置。

164. 发明授权

US5922098A Cleaning a glass preform with a high temperature inert gas during the drawing of an optical fiber 失效
标题翻译：在拉制光纤时，用高温惰性气体清洗玻璃预制件
公开(公告)号：US5922098A
公开(公告)日：1999-07-13
申请号：US619208
申请日：1996-03-21
申请人： Katsuyuki Tsuneishi , Toshiaki Kakii , Katsuzo Mukai , Satoshi Tanaka
发明人： Katsuyuki Tsuneishi , Toshiaki Kakii , Katsuzo Mukai , Satoshi Tanaka
IPC分类号： G02B6/00 , C03B37/027 , C03B37/012
CPC分类号： C03B37/02736 , C03B37/027
摘要： In a drawing method and drawing apparatus according to the present invention, a forward end portion of an optical fiber glass preform is heated and melted while the glass preform is fed into a drawing furnace 3 so that an optical fiber is drawn, and the optical fiber glass preform is heated in a position just above the drawing furnace to make the surface of the glass preform clean.
摘要翻译：在根据本发明的拉伸方法和拉伸装置中，将玻璃预制件送入拉丝炉3中拉出玻璃纤维预成型件的前端部分，使其拉出光纤，将玻璃预成型件在刚好在拉丝炉上方的位置加热，以使玻璃预制件的表面清洁。

165. 发明授权

US5864735A Image forming apparatus comprising a combination of a host computer, a printer, a copy machine, and an automatic document feeder 失效
标题翻译：图像形成装置包括主机，打印机，复印机和自动文件馈送器的组合
公开(公告)号：US5864735A
公开(公告)日：1999-01-26
申请号：US811839
申请日：1997-03-05
申请人： Motoyuki Fukuda , Kenji Yamamura , Satoshi Tanaka
发明人： Motoyuki Fukuda , Kenji Yamamura , Satoshi Tanaka
IPC分类号： G06F3/12 , G03G15/22
CPC分类号： G06F3/1294
摘要： An image forming machine including a host computer, a printer, a copying machine, and a document supply device for conveying a document printed by the printer to an automatic document feeder of the copying machine, in which a controller is provided for controlling a copy action based on a copy command from the host computer. The controller sends a left-behind document signal when a document is present on document stand of the automatic document feeder, while the host computer shows the presence of the left-behind document on a display when receiving the left-behind document signal from the controller.
摘要翻译：一种成像机，包括主计算机，打印机，复印机和文件供应装置，用于将由打印机打印的文件传送到复印机的自动文件进给器，其中提供控制器以控制复印动作基于来自主机的复制命令。当文档存在于自动送稿器的文档台上时，控制器发送一个左后文件信号，而主机在从控制器接收到留下的文档信号时，在显示屏上显示左侧文档的存在。

166. 发明授权

US5861866A LSI mask pattern edit apparatus with contour line intensity distribution display method of resolution for lithography 失效
标题翻译：具有用于光刻的分辨率的轮廓线强度分布显示方法的LSI掩模图案编辑装置
公开(公告)号：US5861866A
公开(公告)日：1999-01-19
申请号：US816676
申请日：1997-03-13
申请人： Soichi Inoue , Satoshi Tanaka
发明人： Soichi Inoue , Satoshi Tanaka
IPC分类号： G03F1/36 , G03F1/68 , G03F7/20 , H01J37/317 , H01L21/027 , G09G5/36 , G03C5/00 , G03F9/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/70433 , G03F7/70441 , G03F7/705 , H01J37/3174 , H01J2237/31769
摘要： An intensity distribution display method of displaying a intensity distribution of electromagnetic waves or charged particle beams fallen on a sample, is characterized by comprising the step of displaying the intensity distribution with the use of contour lines defined by Ie/(1+a.multidot.n/100), where Ie is a desired intensity value, a is a constant rate (%), and n is an integer.
摘要翻译：将样品上的电磁波或带电粒子束的强度分布显示的强度分布显示方法的特征在于包括使用由Ie /（1 + axn / 100）定义的轮廓线显示强度分布的步骤，，其中Ie是期望的强度值，a是恒定速率（％），n是整数。

167. 发明授权

US5757764A Disc cartridge having a write protect operating portion disposed within the cartridge body 失效
标题翻译：盘盒具有设置在盒体内的写保护操作部分
公开(公告)号：US5757764A
公开(公告)日：1998-05-26
申请号：US729406
申请日：1996-10-11
申请人： Satoshi Tanaka
发明人： Satoshi Tanaka
IPC分类号： G11B23/03 , G11B23/28
CPC分类号： G11B23/288 , G11B23/0303 , G11B23/0317 , G11B23/0321
摘要： A cartridge body of a disc cartridge includes a disc inlet/outlet port for insertion and removal of an optical disc. A lid is mounted on the cartridge body and rotatable between a closed position wherein the lid closed the disc inlet/outlet port and an opened position wherein the lid opens the disc inlet/outlet port. The lid includes a write protect operating portion for controlling operation of recording information onto the recording medium. The write protect operating portion is arrange to be disposed inside the cartridge body and operable from outside the cartridge body while the lid is in the closed position.
摘要翻译：盘盒的盒体包括用于插入和移除光盘的盘入口/出口。盖子安装在盒体上，并可在关闭位置和关闭位置之间转动，其中盖子关闭盘片入口/出口端口和打开位置，其中盖子打开盘片入口/出口。盖子包括用于控制记录信息到记录介质上的操作的写保护操作部分。写保护操作部分布置成设置在盒体内部，并且当盖处于关闭位置时可从盒体的外部操作。

168. 发明授权

US5748609A Disc cartridge including elastically deformable lid member and engaging mechanism for locking lid member to cartridge body 失效
标题翻译：盘盒包括可弹性变形的盖构件和用于将盖构件锁定到盒体的接合机构
公开(公告)号：US5748609A
公开(公告)日：1998-05-05
申请号：US730295
申请日：1996-10-11
申请人： Satoshi Tanaka
发明人： Satoshi Tanaka
IPC分类号： G11B23/03 , G11B23/28
CPC分类号： G11B23/0317 , G11B23/0303 , G11B23/031 , G11B23/0321 , G11B23/287
摘要： A cartridge body of a disc cartridge includes a disc inlet/outlet port for introducing an optical disc into and removing an optical disc from the cartridge body. A lid member is mounted on the cartridge body to be rotatable between a closed position and an opened position. The cartridge body has an abutting portion for abutting against the lid member when the lid member is rotated to the closed position. The lid member includes a first end portion rotatably supported on the cartridge body, and a second end portion which is rotatable around the first end portion and which faces the abutting portion of the cartridge body with a clearance interposed therebetween when the lid member is disposed in the closed position and the lid member is not elastically deformed. The second portion of the lid member is elastically locked in the closed position by a locking mechanism when the second end portion of the lid member positioned in the closed position is elastically deformed in a direction toward the abutting portion so as to eliminate the clearance.
摘要翻译：盘盒的盒体包括用于将光盘引入盒式光盘并将其从盒体移除的盘入口/出口。盖构件安装在盒体上，以在关闭位置和打开位置之间旋转。当盖构件旋转到关闭位置时，盒体具有用于抵靠盖构件的抵接部。所述盖构件包括可旋转地支撑在所述盒体上的第一端部，以及当所述盖构件设置在所述第一端部中时，所述第一端部可绕所述第一端部旋转并且当所述盖构件设置在所述第二端部中时与所述盒体的抵靠部分相对置，关闭位置和盖构件没有弹性变形。当位于关闭位置的盖构件的第二端部沿朝向抵接部的方向弹性变形时，盖构件的第二部分通过锁定机构弹性地锁定在关闭位置，以消除间隙。

169. 发明授权

US5733687A Photomask, exposing method using photomask, and manufacturing method of photomask 失效
标题翻译：光掩模，使用光掩模的曝光方法和光掩模的制造方法
公开(公告)号：US5733687A
公开(公告)日：1998-03-31
申请号：US536148
申请日：1995-09-29
申请人： Satoshi Tanaka , Shoji Mimotogi , Tadahito Fujisawa , Soichi Inoue
发明人： Satoshi Tanaka , Shoji Mimotogi , Tadahito Fujisawa , Soichi Inoue
IPC分类号： G03B27/54 , G03F1/32 , G03F1/68 , G03F7/20 , H01L21/027 , G03F9/00
CPC分类号： G03F1/32 , G03F1/26 , G03F7/701 , G03F7/70125 , G03F7/70283 , G03F7/70358
摘要： When a pattern to be exposed onto a wafer is a periodic pattern, a periodic mask pattern substantially twice as large as the pattern to be exposed in the wafer is formed on a photomask by means of light transmission portions and halftone portions. The halftone portions are formed such that a phase difference between exposure light transmitted through the light transmission portions and exposure light transmitted through the halftone portions is set to be substantially 180.degree.. Moreover, in order to eliminate zeroth order diffraction light, amplitude transmittance t of the halftone portion is set to t.apprxeq.A1/A2 wherein A1 is an area of the halftone portion and A2 is an area of the light transmission portion. Further, amplitude transmittance t of the halftone portion is changed, and an amount of exposure light to the photomask is controlled, so that L&S patterns and isolated patterns are simultaneously transferred onto the wafer by one photomask.
摘要翻译：当暴露在晶片上的图案是周期性图案时，通过透光部分和半色调部分在光掩模上形成基本上是待曝光晶片的图案的两倍的周期性掩模图案。半色调部分被形成为使得透过透光部分的曝光光与透过半色调部分的曝光之间的相位差被设定为大致180度。此外，为了消除零级衍射光，将半色调部分的振幅透射率t设定为t APPROX A1 / A2，其中A1是半色调部分的面积，A2是光透射部分的面积。此外，改变半色调部分的振幅透射率t，并且控制对光掩模的曝光量，使得L＆S图案和隔离图案通过一个光掩模同时转印到晶片上。

170. 发明授权

US5520442A Protective device for a driver's cab front of large-size dump truck 失效
标题翻译：大型自卸车驾驶室前部防护装置
公开(公告)号：US5520442A
公开(公告)日：1996-05-28
申请号：US211640
申请日：1994-04-11
申请人： Nobuyuki Kisami , Kyoji Uranaka , Satoshi Tanaka
发明人： Nobuyuki Kisami , Kyoji Uranaka , Satoshi Tanaka
IPC分类号： B60P1/04 , B60R19/00 , B60R21/00 , B60R21/11 , B60R21/13 , B62D25/06 , B62D33/06 , B60P1/28
CPC分类号： B60R21/11 , B60R19/00 , B60R2021/002 , Y10S414/127
摘要： A protective device for a front of a large-size dump truck, in which a driver's cab (13) is secured on a front side of a truck body (10) and a vessel (15) is, liftably from its front side, secured on a rear side of the truck body, is characterized in that a front protective guard (20) protruding forward from a position of the driver's cab is attached on a front end portion of the vessel. A protective device for a front of a large-size dump truck, in which a driver's cab (216) is secured on a front side of a truck body (210) and a vessel (221) is, liftably from its front side, secured on a rear side of the truck body and a protective guard (217) for falling to protect an upper portion and a rear portion of the driver's cab is secured on an upper portion of the truck body between the driver's cab and the vessel, is characterized in that an front protective guard (218) is arranged to be extended between a front end portion of the protective guard for falling and a front end portion of the truck body in front of the driver's cab.
摘要翻译： PCT No.PCT / JP93 / 01152 Sec。 371日期1994年04月11日 102（e）1994年4月11日PCT PCT 1993年8月17日PCT公布。公开号WO94 / 04395 日期：1994年3月3日。一种用于大型自卸车前部的保护装置，其中驾驶室（13）固定在卡车车身（10）和船舶（15）的前侧，从其前侧可靠地固定在卡车车体的后侧，其特征在于，从驾驶室的位置向前突出的前防护罩（20）安装在船舶的前端部分上。一种用于大型自卸车前部的保护装置，驾驶室（216）从其前侧可升降地固定在卡车主体（210）的前侧和容器（221）上，固定在驾驶室本体的后侧，并且具有用于坠落以保护驾驶室的上部和后部的保护罩（217）被固定在驾驶室与容器之间的卡车车体的上部，其特征在于其特征在于，前防护罩（218）布置成在所述驾驶室前面的所述防坠落防护装置的前端部与所述卡车车身的前端部之间延伸。

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