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151. 发明公开

US20230333531A1 TREATMENT CONDITION SETTING METHOD, STORAGE MEDIUM, AND SUBSTRATE TREATMENT SYSTEM 审中-公开
公开(公告)号：US20230333531A1
公开(公告)日：2023-10-19
申请号：US18337222
申请日：2023-06-19
申请人： Tokyo Electron Limited
发明人： Takuya MORI , Tadashi NISHIYAMA , Akiko KIYOTOMI , Hiroshi TOMITA
IPC分类号： G05B19/042 , H01L21/67 , G03F7/38 , G03F7/20 , G03F7/34
CPC分类号： G05B19/042 , H01L21/67225 , G03F7/38 , G03F7/20 , G03F7/34 , G03F7/162
摘要： This method includes: a step of imaging, by an imaging apparatus in a substrate treatment system, a reference substrate which is a reference for condition setting and acquiring a captured image of the reference substrate; a step of imaging, by the imaging apparatus, a treated substrate on which the predetermined treatment has been performed under a current treatment condition and acquiring a captured image of the treated substrate; a step of calculating a deviation amount in color information between the captured image of the treated substrate and the captured image of the reference substrate; a step of calculating a correction amount of the treatment condition based on a correlation model acquired in advance and on the deviation amount in the color information; and a step of setting the treatment condition based on the correction amount, wherein steps other than the step of acquiring a captured image of the reference substrate are performed for each of the treatment apparatuses.

152. 发明公开

US20230333489A1 EXHAUST SYSTEM WITH U-SHAPED PIPES 审中-公开
公开(公告)号：US20230333489A1
公开(公告)日：2023-10-19
申请号：US18337574
申请日：2023-06-20
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Yu-Fu Lin , Shih-Chang Shih , Chia-Chen Chen
IPC分类号： G03F7/20 , C23C16/44 , B01D53/04 , B01D53/30
CPC分类号： G03F7/70858 , C23C16/4412 , B01D53/0407 , B01D53/30 , B01D2257/93 , B01D2258/0216 , B01D2257/108 , B01D2257/553
摘要： The present disclosure provides an exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas. The exhaust system includes: a main exhaust pipe positioned above the semiconductor manufacturing equipment and having a top surface and a bottom surface extending parallel to the top surface; a first branch pipe including an upstream end coupled to a source of a gas mixture and a downstream end connected to the main exhaust pipe through the top surface; a second branch pipe including an upstream end and a downstream end connected to the main exhaust pipe through the bottom surface; and a detector configured to detect presence of the hazardous gas in the second branch pipe.

153. 发明公开

US20230333484A1 DEVICE AND METHOD FOR SETTING RELATIVE LASER INTENSITIES 审中-公开
公开(公告)号：US20230333484A1
公开(公告)日：2023-10-19
申请号：US18042256
申请日：2021-10-18
申请人： Mycronic AB
发明人： Fredric IHREN
IPC分类号： G03F1/76 , G03F7/20
CPC分类号： G03F7/70558 , G03F1/76 , G03F7/70191
摘要： A device, a computer program, a computer readable medium and a method setting respective relative laser intensities to a plurality of pixels representing a lithographic exposure. The plurality of pixels comprises at least one edge pixel arranged on an edge of an area of pixels to be exposed, and at least one neighbouring pixel. The at least one neighbouring pixel is arranged one pixel away from the at least one edge pixel in a perpendicular direction away from the edge towards the area of pixels to be exposed. The method comprises decreasing proportionally a relative laser intensity of each pixel of the plurality of pixels from a previously set respective first relative laser intensity to a respective second relative laser intensity. A laser dose translation of relative laser intensity of pixels proportionally adjusted from a previously set first laser dose translation of the first relative laser intensity to a second laser dose translation of the second relative laser intensity. The proportional adjustment is such that a respective effective exposed laser dose of each pixel is achieved by the second laser dose translation of the respective second relative laser intensity which is equal to a respective effective exposed laser dose of each pixel that would have resulted from the first laser dose translation of the respective first relative laser intensity. The respective relative laser intensity of an edge pixel of the at least one edge pixel or of a neighbouring pixel of the at least one neighbouring pixel is increased by a constant additive term from the respective second relative laser intensity to a respective third relative laser intensity.

154. 发明公开

US20230333468A1 RESIN COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM, SUBSTRATE HAVING MULTILAYER FILM, METHOD FOR PRODUCING PATTERNED SUBSTRATE, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN CURED FILM, METHOD FOR PRODUCING POLYMER, AND METHOD FOR PRODUCING RESIN COMPOSITION 审中-公开
公开(公告)号：US20230333468A1
公开(公告)日：2023-10-19
申请号：US18334125
申请日：2023-06-13
申请人： CENTRAL GLASS COMPANY, LIMITED
发明人： Takashi MASUBUCHI , Yuri OIKAWA , Kazuhiro YAMANAKA
IPC分类号： G03F7/004 , G03F7/075 , G03F7/09 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0043 , G03F7/0757 , G03F7/0048 , G03F7/094 , G03F7/0397 , G03F7/0045 , G03F7/2006 , G03F7/201
摘要： An object is to provide a resin composition, which is a homogeneous solution containing a polymer, obtained by hydrolysis and polycondensation without precipitation during the sol-gel reaction even when a metal species with high EUV absorbance is introduced. The resin component includes a polymer including a constituent unit represented by (A) a following general formula (1) and (B) a following general formula (1-A),

[(R2)d(R3)e(OR4)fSiOg/2] (1)

[(R1)bMOc/2] (1-A)

In the general formula (1), R2 is a group represented by a following general formula (1a).

155. 发明授权

US11790145B2 Method for coloring circuit layout and system for performing the same 有权
公开(公告)号：US11790145B2
公开(公告)日：2023-10-17
申请号：US17853758
申请日：2022-06-29
申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
发明人： Chia-Ping Chiang , Ming-Hui Chih , Chih-Wei Hsu , Ping-Chieh Wu , Ya-Ting Chang , Tsung-Yu Wang , Wen-Li Cheng , Hui En Yin , Wen-Chun Huang , Ru-Gun Liu , Tsai-Sheng Gau
IPC分类号： G06F30/39 , G03F1/70 , G03F7/20 , G03F7/00
CPC分类号： G06F30/39 , G03F1/70 , G03F7/70466
摘要： Implementations of the present disclosure provide coloring methods that sort and pre-color nodes of G0-linked networks in a multiple-patterning technology (MPT)-compliant layout design by coordinate. In one embodiment, a method includes identifying target networks in a circuit layout, each target network having two or more linked nodes representing circuit patterns, and each target network being presented in an imaginary X-Y coordinate plane, assigning a first feature to a first node in each target network, the first node is determined using a coordinate-based method, and assigning the first feature and a second feature to remaining nodes in each target network in an alternating manner so that any two immediately adjacent linked nodes in each target network have different features.

156. 发明授权

US11789372B2 Writing data generating method and multi charged particle beam writing apparatus 有权
公开(公告)号：US11789372B2
公开(公告)日：2023-10-17
申请号：US17708703
申请日：2022-03-30
申请人： NuFlare Technology, Inc.
发明人： Kenichi Yasui , Noriaki Nakayamada
IPC分类号： G03F7/20 , G05B19/4097 , G03F7/00
CPC分类号： G03F7/7055 , G05B19/4097
摘要： In one embodiment, a writing data generating method is for generating writing data used in a multi charged particle beam writing apparatus. The method includes calculating, for a figure containing a curve and a straight line included in design data, a plurality of control points representing the curve and a plurality of vertices of the curve and straight line, and expressing a position of each of the control points and vertices as a displacement from an adjacent control point or vertex to generate the writing data.

157. 发明授权

US11789367B2 Facet mirror for an illumination optical unit of a projection exposure apparatus 有权
公开(公告)号：US11789367B2
公开(公告)日：2023-10-17
申请号：US17695402
申请日：2022-03-15
申请人： Carl Zeiss SMT GmbH
发明人： Willi Anderl , Christian Körner , Hubert Holderer , Markus Holz , Manuel Stompe , Stefan Seitz
IPC分类号： G03F7/20 , G03F7/00
CPC分类号： G03F7/70075 , G03F7/702
摘要： A facet mirror for an illumination optical unit of a projection exposure apparatus has a large number of displaceable individual facets with a facet main body and a reflection surface arranged on it. At least some of the individual facets have a displacement range such that they come into contact with a stop surface in one or more displacement positions.

158. 发明授权

US11789365B2 Substrate processing method and substrate processing apparatus 有权
公开(公告)号：US11789365B2
公开(公告)日：2023-10-17
申请号：US16804981
申请日：2020-02-28
申请人： KIOXIA CORPORATION
发明人： Ryu Komatsu , Takeharu Motokawa , Noriko Sakurai , Hideaki Sakurai
IPC分类号： G03F7/20 , H01L21/027 , G03F7/00 , G03F7/38 , G03F7/16
CPC分类号： G03F7/2041 , G03F7/162 , G03F7/2004 , G03F7/38 , G03F7/70341 , H01L21/0271
摘要： A method for processing a substrate includes forming a pattern on a substrate, supplying water to cover the pattern, and after the supplying the water, irradiating the pattern with light having a wavelength longer that which causes dissociation of water. A substrate processing apparatus of an embodiment includes a transfer chamber to receive a patterned substrate, a water supplying chamber to cover the pattern with water, and an irradiating chamber to irradiate a portion of the pattern with near-field light.

159. 发明公开

US20230324811A1 OVERLAY MEASUREMENT APPARATUS 审中-公开
公开(公告)号：US20230324811A1
公开(公告)日：2023-10-12
申请号：US18314868
申请日：2023-05-10
申请人： AUROS TECHNOLOGY, INC.
发明人： Hyeon Gi SHIN , Bo Kyung RYU , Jung Sun KO , Jin Woo PARK
IPC分类号： G03F7/20
CPC分类号： G03F7/70633 , G03F7/70641 , G03F7/7085
摘要： An overlay measurement apparatus that can quickly measure an overlay error between layers with a large height difference is provided. The overlay measurement apparatus measures an error between a first overlay mark and a second overlay mark formed in a pair on different layers of a wafer. The overlay measurement apparatus includes an imaging system configured to acquire alignment images of a pair of first and second overlay marks at a plurality of focus positions, and a controller communicatively coupled to the imaging system. The overlay measurement apparatus can rapidly and accurately measure an overlay error between layers with a large height difference.

160. 发明公开

US20230324593A1 METHOD OF MANUFACTURING OPTICAL ELEMENT AND OPTICAL EXPOSURE SYSTEM 审中-公开
公开(公告)号：US20230324593A1
公开(公告)日：2023-10-12
申请号：US18297015
申请日：2023-04-07
申请人： HTC Corporation
发明人： Qing-Long Deng
IPC分类号： G02B5/32 , G03F7/20 , G03F7/00
CPC分类号： G02B5/32 , G03F7/2002 , G03F7/70725 , G03F7/7055
摘要： A method of manufacturing an optical element includes steps of: exposing a photopolymer to a plurality of kinds of light for a plurality of cycles, in which each of the cycles includes a plurality of exposure time sequences respectively corresponding to the kinds of light, and any adjacent two of the exposure time sequences of the cycles correspond to two of the kinds of light; and fixing the exposed photopolymer to form a holographic optical element having a plurality of holographic gratings respectively formed by the kinds of light.

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