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141. 发明授权

US10681150B2 Systems and methods for management plane—control plane interaction in software defined topology management 有权
公开(公告)号：US10681150B2
公开(公告)日：2020-06-09
申请号：US15470443
申请日：2017-03-27
申请人： Xu Li , Jaya Rao
发明人： Xu Li , Jaya Rao
IPC分类号： H04L29/08 , H04W36/00 , H04L12/717 , H04L12/24 , H04W36/08 , H04W36/22 , H04W36/32 , H04W64/00 , H04L12/18 , H04L12/751 , H04W40/20 , H04W76/34 , H04W76/22
摘要： Embodiments of the present invention provide systems and methods for a Session-level SDT component in the control plane to handle setup, recovery and mobility of individual session requests in real time. The Session-level SDT component may comprise path management that performs either stateless of stateful path switching for an ongoing session, whether download or uplink, according to the stateful requirements of the session. The path management may be in conjunction with user equipment mobility management operation; it may also be in conjunction with network scalability and automation operation, such as load balancing.

142. 发明授权

US10333851B2 Systems and methods for customizing layer-2 protocol 有权
公开(公告)号：US10333851B2
公开(公告)日：2019-06-25
申请号：US15296760
申请日：2016-10-18
申请人： Xu Li , Ngoc Dung Dao
发明人： Xu Li , Ngoc Dung Dao
IPC分类号： H04B7/26 , H04L12/813 , H04L12/26 , H04L12/801 , H04L12/805 , H04L29/08 , H04L12/24 , H04L25/02 , H04W40/34
摘要： A method includes: receiving, by a controller of a layer-2 network abstraction comprising a plurality of nodes interconnected by links, information defining at least a performance of each link; identifying, by the controller, at least one underperforming link of the network based on the received information; and for each identified under-performing link of the network: computing, by the controller, at least one updated layer-2 protocol parameter for at least one traffic flow of the under-performing link based on the information; and sending, by the controller, the at least one updated layer-2 protocol parameter to at least one node of the under-performing link.

143. 发明授权

US10320930B2 Method and system for providing network caches 有权
公开(公告)号：US10320930B2
公开(公告)日：2019-06-11
申请号：US14928165
申请日：2015-10-30
申请人： Ngoc-Dung Dao , Hamidreza Farmanbar , Xu Li
发明人： Ngoc-Dung Dao , Hamidreza Farmanbar , Xu Li
IPC分类号： H04L12/26 , H04L29/08
摘要： A method and apparatus for deploying a set of network caches in a communication network is provided. A set of network nodes is identified such that, for each of a set of client device locations, and for at least a number c of the set of nodes, output of a coverage cost function is no greater than a threshold. The coverage cost function receives as input a client location and one of the nodes. The set of network caches are then located at the respective set of nodes. The set of network nodes can be selected from plural candidate sets based on a utility criterion. The candidate sets can be generated by successive addition and/or removal of nodes. Information obtained from a Traffic Engineering function can be used to direct selection of the set of nodes. A cache-client association can be generated for directing clients to particular caches.

144. 发明申请

US20180084436A1 SYSTEMS AND METHODS FOR PLACING VIRTUAL SERVING GATEWAYS FOR MOBILITY MANAGEMENT 审中-公开
公开(公告)号：US20180084436A1
公开(公告)日：2018-03-22
申请号：US15822932
申请日：2017-11-27
申请人： Xu Li , Ngoc-Dung Dao , Hang Zhang
发明人： Xu Li , Ngoc-Dung Dao , Hang Zhang
IPC分类号： H04W16/18 , H04W88/16
CPC分类号： H04W16/18 , H04W88/16
摘要： Methods and systems for determining placement of a virtual serving gateway. The method includes obtaining a set of input information. The input information includes network information and configuration information providing one or more parameters for placing the virtual serving gateway, and includes at least one mobility insensitivity criterion. Placement of the virtual serving gateway at one or more physical hosts is determined in accordance with the network information and the configuration information. The virtual serving gateway is distributively placeable across physical hosts. A set of output information is generated. The output information includes information identifying placement of the virtual serving gateway at the physical hosts, and a hosting percentage for each physical host.

145. 发明授权

US09860758B2 Systems and methods for placing virtual serving gateways for mobility management 有权
公开(公告)号：US09860758B2
公开(公告)日：2018-01-02
申请号：US15243486
申请日：2016-08-22
申请人： Xu Li , Ngoc-Dung Dao , Hang Zhang
发明人： Xu Li , Ngoc-Dung Dao , Hang Zhang
IPC分类号： H04L5/00 , H04W16/18 , H04W88/16
CPC分类号： H04W16/18 , H04W88/16
摘要： Methods and systems for determining placement of a virtual serving gateway. The method includes obtaining a set of input information. The input information includes network information and configuration information providing one or more parameters for placing the virtual serving gateway, and includes at least one mobility insensitivity criterion. Placement of the virtual serving gateway at one or more physical hosts is determined in accordance with the network information and the configuration information. The virtual serving gateway is distributively placeable across physical hosts. A set of output information is generated. The output information includes information identifying placement of the virtual serving gateway at the physical hosts, and a hosting percentage for each physical host.

146. 发明申请

US20170288961A1 SYSTEMS AND METHODS FOR MANAGEMENT PLANE - CONTROL PLANE INTERACTION IN SOFTWARE DEFINED TOPOLOGY MANAGEMENT 审中-公开
公开(公告)号：US20170288961A1
公开(公告)日：2017-10-05
申请号：US15470443
申请日：2017-03-27
申请人： Xu Li , Jaya Rao
发明人： Xu Li , Jaya Rao
IPC分类号： H04L12/24
摘要： Embodiments of the present invention provide systems and methods for a Session-level SDT component in the control plane to handle setup, recovery and mobility of individual session requests in real time. The Session-level SDT component may comprise path management that performs either stateless of stateful path switching for an ongoing session, whether download or uplink, according to the stateful requirements of the session. The path management may be in conjunction with user equipment mobility management operation; it may also be in conjunction with network scalability and automation operation, such as load balancing.

147. 发明授权

US08852526B2 Method of fabricating microfluidic systems 有权
标题翻译：制造微流体系统的方法
公开(公告)号：US08852526B2
公开(公告)日：2014-10-07
申请号：US13003647
申请日：2009-07-10
申请人： Wei Shen , Xu Li , Junfei Tian , Mohidus Samad Khan , Gil Garnier
发明人： Wei Shen , Xu Li , Junfei Tian , Mohidus Samad Khan , Gil Garnier
IPC分类号： G01N15/06 , G01N33/00 , G01N33/48 , D21H21/16 , D21H17/17 , D21H17/16 , D21H19/10 , B01L3/00
CPC分类号： D21H17/17 , B01L3/502707 , B01L2200/10 , B01L2200/12 , B01L2300/126 , B01L2300/161 , D21H17/16 , D21H19/10 , D21H21/16 , Y10T436/11
摘要： A method of fabricating a microfluidic system having microfluidic channels on a surface of a hydrophilic substrate, the method including the steps of: hydrophobizing the substrate surface; locating a mask defining the substrate surface, the mask having open areas defining the periphery of the microfluidic channels; and applying an irradiation treatment to areas of the substrate surface exposed by the open areas of the mask, said exposed areas becoming hydrophilic to therefore form said microfluidic channels.
摘要翻译：一种在亲水基材的表面上制造具有微流体通道的微流体系统的方法，所述方法包括以下步骤：使基材表面疏水化; 定位限定衬底表面的掩模，所述掩模具有限定所述微流体通道的周边的开口区域; 以及对由所述掩模的开放区域暴露的所述衬底表面的区域进行照射处理，所述暴露区域变得亲水，从而形成所述微流体通道。

148. 发明授权

US08505478B2 Apparatus for high-efficiency synthesis of carbon nanostructure 有权
标题翻译：碳纳米结构高效合成装置
公开(公告)号：US08505478B2
公开(公告)日：2013-08-13
申请号：US12805528
申请日：2010-08-04
申请人： Osamu Suekane , Toshikazu Nosaka , Yoshikazu Nakayama , Lujun Pan , Takeshi Nagasaka , Toru Sakai , Hiroyuki Tsuchiya , Toshiki Goto , Xu Li
发明人： Osamu Suekane , Toshikazu Nosaka , Yoshikazu Nakayama , Lujun Pan , Takeshi Nagasaka , Toru Sakai , Hiroyuki Tsuchiya , Toshiki Goto , Xu Li
IPC分类号： C23C16/52 , C23C16/455 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： B82Y30/00 , B82Y40/00 , C01B32/162 , C01B2202/30
摘要： Developed is high-efficiency synthesis method and apparatus capable of promoting the initial growth of carbon nanostructure by eliminating the initial fluctuation time and rising time in raw gas flow quantity.-A high-efficiency synthesis method of carbon nanostructure according to the present invention is a high-efficiency synthesis method of carbon nanostructure, the method comprising: bringing raw material gas and a catalyst into contact with each other under reactive conditions so as to produce a carbon nanostructure, wherein: the initiation of contact of the raw material gas with the catalyst is carried out instantaneously. Reaction conditions such as temperature and raw material gas concentration are set so as to meet those for catalyst growth, and under the reaction conditions, the initiation of contact of raw material gas G with catalyst 6 is carried out instantaneously. Consequently, the initial growth of carbon nanostructure is positively carried out, and the height growth and thickness growth thereof can be effected in high efficiency. Further, high-density growth and short-time high-speed growth can be realized. The catalyst includes any forms of catalyst such as catalyst substrate, catalyst structure, catalyst powders and catalyst pellet. It is especially preferred to employ a system wherein the feed and interruption of the raw material gas G are intermittently controlled by means of an electromagnetic three-way valve 24.
摘要翻译：开发了能够通过消除原始气体流量的初始波动时间和上升时间来促进碳纳米结构的初始生长的高效合成方法和装置。根据本发明的碳纳米结构的高效合成方法是碳纳米结构的高效合成方法，其特征在于，在反应条件下使原料气体和催化剂相互接触，制成碳纳米结构体，其中：原料气与催化剂的接触开始是瞬间进行的。反应条件如温度和原料气体浓度设定为满足催化剂生长的条件，在反应条件下，原料气体G与催化剂6的接触开始立即进行。因此，积极地进行碳纳米结构的初始生长，并且可以高效率地实现其高度生长和厚度生长。此外，可以实现高密度生长和短时高速生长。催化剂包括任何形式的催化剂，如催化剂底物，催化剂结构，催化剂粉末和催化剂颗粒。特别优选采用通过电磁三通阀24间歇地控制原料气体G的进料和中断的系统。

149. 发明申请

US20120225556A1 Stable, concentratable, water soluble cellulose free chemical mechanical polishing composition 有权
标题翻译：稳定，浓缩，水溶性纤维素自由化学机械抛光组合物
公开(公告)号：US20120225556A1
公开(公告)日：2012-09-06
申请号：US13039705
申请日：2011-03-03
申请人： Hamed Lakrout , Jinjie Shi , Joseph Letizia , Xu Li , Thomas H. Kalantar , Francis Kelley , J. Keith Harris , Christopher J. Tucker
发明人： Hamed Lakrout , Jinjie Shi , Joseph Letizia , Xu Li , Thomas H. Kalantar , Francis Kelley , J. Keith Harris , Christopher J. Tucker
IPC分类号： H01L21/306 , C09K3/14 , C09K13/00
CPC分类号： H01L21/3212 , C09G1/16
摘要： A chemical mechanical polishing composition useful for chemical mechanical polishing a semiconductor wafer containing an interconnect metal is provided, comprising, as initial components: water; an azole inhibitor; an alkali metal organic surfactant; a hydrotrope; a phosphorus containing agent; optionally, a non-saccharide water soluble polymer; optionally, a water soluble acid compound of formula I, wherein R is selected from a hydrogen and a C1-5 alkyl group, and wherein x is 1 or 2; optionally, a complexing agent; optionally, an oxidizer; optionally, an organic solvent; and, optionally, an abrasive. Also, provided is a method for making a chemical mechanical polishing composition of the present invention and a method for chemical mechanical polishing of a substrate, comprising: providing a substrate, wherein the substrate is a semiconductor wafer having copper interconnects; providing a chemical mechanical polishing composition of the present invention; providing a chemical mechanical polishing pad; creating dynamic contact at an interface between the chemical mechanical polishing pad and the substrate with a down force of 0.69 to 34.5 kPa; and, dispensing the chemical mechanical polishing composition onto the chemical mechanical polishing pad at or near the interface between the chemical mechanical polishing pad and the substrate; wherein the chemical mechanical polishing composition exhibits a pH adjusted to a pH of 2 to 6 through the addition of at least one of phosphoric acid, magnesium hydroxide and lithium hydroxide.
摘要翻译：提供了用于化学机械抛光含有互连金属的半导体晶片的化学机械抛光组合物，包括作为初始组分的水; 唑类抑制剂; 碱金属有机表面活性剂; 水溶助长剂含磷剂; 任选地，非糖水溶性聚合物; 任选地，式I的水溶性酸化合物，其中R选自氢和C 1-5烷基，并且其中x是1或2; 任选地，络合剂; 任选地，氧化剂; 任选的有机溶剂; 和任选的研磨剂。此外，提供了制造本发明的化学机械抛光组合物的方法和基板的化学机械抛光方法，包括：提供基板，其中所述基板是具有铜互连的半导体晶片; 提供本发明的化学机械抛光组合物; 提供化学机械抛光垫; 在化学机械抛光垫和基板之间的界面处以0.69至34.5kPa的向下力产生动态接触; 并且将化学机械抛光组合物分配到化学机械抛光垫或化学机械抛光垫与基底之间界面附近的化学机械抛光垫上; 其中所述化学机械抛光组合物通过加入磷酸，氢氧化镁和氢氧化锂中的至少一种而显示pH调节至2至6的pH。

150. 发明申请

US20120225555A1 Stable, concentratable chemical mechanical polishing composition and methods relating thereto 有权
标题翻译：稳定，可浓缩的化学机械抛光组合物及其相关方法
公开(公告)号：US20120225555A1
公开(公告)日：2012-09-06
申请号：US13039723
申请日：2011-03-03
申请人： Hamed Lakrout , Jinjie Shi , Joseph Letizia , Xu Li , Thomas H. Kalantar , Francis Kelley , J. Keith Harris , Christopher J. Tucker
发明人： Hamed Lakrout , Jinjie Shi , Joseph Letizia , Xu Li , Thomas H. Kalantar , Francis Kelley , J. Keith Harris , Christopher J. Tucker
IPC分类号： H01L21/306 , C09K13/00
CPC分类号： H01L21/3212 , C09G1/16
摘要： A chemical mechanical polishing composition useful for chemical mechanical polishing a semiconductor wafer containing an interconnect metal is provided, comprising, as initial components: water; an azole inhibitor; an alkali metal organic surfactant; a hydrotrope; a phosphorus containing agent; a water soluble cellulose; optionally, a non-saccharide water soluble polymer; optionally, a water soluble acid compound of formula I, wherein R is selected from a hydrogen and a C1-5 alkyl group, and wherein x is 1 or 2; optionally, a complexing agent; optionally, an oxidizer; optionally, an organic solvent; and, optionally, an abrasive. Also, provided is a method of preparing a chemical mechanical polishing composition of the present invention and a method for chemical mechanical polishing of a substrate, comprising: providing a substrate, wherein the substrate is a semiconductor wafer having copper interconnects; providing a chemical mechanical polishing composition of the present invention; providing a chemical mechanical polishing pad; creating dynamic contact at an interface between the chemical mechanical polishing pad and the substrate with a down force of 0.69 to 34.5 kPa; and, dispensing the chemical mechanical polishing composition onto the chemical mechanical polishing pad at or near the interface between the chemical mechanical polishing pad and the substrate; wherein the chemical mechanical polishing composition exhibits a pH adjusted to a pH of 2 to 6 through the addition of at least one of phosphoric acid, magnesium hydroxide and lithium hydroxide.
摘要翻译：提供了用于化学机械抛光含有互连金属的半导体晶片的化学机械抛光组合物，包括作为初始组分的水; 唑类抑制剂; 碱金属有机表面活性剂; 水溶助长剂含磷剂; 水溶性纤维素; 任选地，非糖水溶性聚合物; 任选地，式I的水溶性酸化合物，其中R选自氢和C 1-5烷基，并且其中x是1或2; 任选地，络合剂; 任选地，氧化剂; 任选的有机溶剂; 和任选的研磨剂。此外，提供了制备本发明的化学机械抛光组合物的方法和基材的化学机械抛光方法，包括：提供基材，其中所述基材是具有铜互连的半导体晶片; 提供本发明的化学机械抛光组合物; 提供化学机械抛光垫; 在化学机械抛光垫和基板之间的界面处以0.69至34.5kPa的向下力产生动态接触; 并且将化学机械抛光组合物分配到化学机械抛光垫或化学机械抛光垫与基底之间界面附近的化学机械抛光垫上; 其中所述化学机械抛光组合物通过加入磷酸，氢氧化镁和氢氧化锂中的至少一种而显示pH调节至2至6的pH。

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