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121. 发明授权

US09035100B2 Method for producing phenylphosphonic acid metal salt composition, and crystal nucleating agent therefrom 有权
标题翻译：苯基膦酸金属盐组合物的制造方法及其结晶成核剂
公开(公告)号：US09035100B2
公开(公告)日：2015-05-19
申请号：US14331881
申请日：2014-07-15
申请人： NISSAN CHEMICAL INDUSTRIES, LTD.
发明人： Takeshi Suwa , Hisato Hayashi , Masahiro Hida , Masaaki Ozawa
IPC分类号： C08K5/5317 , C07F9/38
CPC分类号： C08K5/5317 , C07F9/3834
摘要： A method for producing a phenylphosphonic acid metal salt composition, including reacting a phenylphosphonic acid compound (a) with a metal salt, metal oxide or metal hydroxide (b) that is present in an amount beyond the equivalent, the phenylphosphonic acid metal salt composition containing phenylphosphonic acid metal salt, and a surplus amount of the metal salt, the metal oxide or the surplus metal hydroxide (b). A crystal nucleating agent comprises the phenylphosphonic acid metal salt composition produced by the method.
摘要翻译：一种苯基膦酸金属盐组合物的制备方法，包括使苯基膦酸化合物（a）与金属盐，金属氧化物或金属氢氧化物（b）的反应量超过当量的苯基膦酸金属盐组合物，所述苯基膦酸金属盐组合物含有苯基膦酸金属盐和剩余量的金属盐，金属氧化物或剩余金属氢氧化物（b）。晶体成核剂包括通过该方法制备的苯基膦酸金属盐组合物。

122. 发明授权

US09029467B2 Resin composition 有权
标题翻译：树脂组成
公开(公告)号：US09029467B2
公开(公告)日：2015-05-12
申请号：US14239493
申请日：2012-08-27
申请人： Hiroyuki Soda , Takahiro Sakaguchi
发明人： Hiroyuki Soda , Takahiro Sakaguchi
IPC分类号： C08L37/00 , C08L31/00 , C09D139/04 , C08F220/36 , C08F222/40 , G02B1/04 , C09D135/02
CPC分类号： C09D139/04 , C08F220/36 , C08F222/40 , C08L2203/16 , C09D135/02 , G02B1/04 , G02B1/041 , C08F2220/346 , C08F220/20 , C08F212/08 , C08L33/10 , C08L33/08 , C08L33/24
摘要： There is provided a resin composition. A resin composition includes: a copolymer having structural units of the following Formula (1), Formula (2) and Formula (3): where X is a C1-5 alkyl group, a C5-6 cycloalkyl group, a phenyl group or a benzyl group, while the alkyl group, the cycloalkyl group, the phenyl group and the benzyl group optionally have a portion or all of the hydrogen atoms substituted with halogen atoms, carboxy groups, hydroxy groups, amino groups or nitro groups; each of R1s is independently a hydrogen atom or a methyl group; R2 is a single bond or a C1-5 alkylene group; R3 is a blocked isocyanate group; Y is an —O— group or an —NH— group; R4 is a single bond or a C1-5 alkylene group; and R5 is a C1-20 hydrocarbon group or a phenyl group having a hydroxy group as a substituent; and a solvent.
摘要翻译：提供树脂组合物。树脂组合物包括：具有下式（1），式（2）和式（3）的结构单元的共聚物：其中X是C1-5烷基，C5-6环烷基，苯基或苄基，而烷基，环烷基，苯基和苄基任选地具有被卤素原子，羧基，羟基，氨基或硝基取代的部分或全部氢原子; R 1各自独立地为氢原子或甲基; R2是单键或C1-5亚烷基; R3是封端异氰酸酯基; Y是-O-基或-NH-基; R4是单键或C1-5亚烷基; R5为C1-20烃基或具有羟基作为取代基的苯基; 和溶剂。

123. 发明授权

US09023469B2 Basic zinc cyanurate fine particles, and method for producing same 有权
标题翻译：碱性氰尿酸锌微粒及其制造方法
公开(公告)号：US09023469B2
公开(公告)日：2015-05-05
申请号：US13806854
申请日：2011-06-23
申请人： Isao Oota , Masaki Oiwamoto , Takeshi Suwa
发明人： Isao Oota , Masaki Oiwamoto , Takeshi Suwa
IPC分类号： B82Y30/00 , C07D251/32 , C01C3/14
CPC分类号： C07D251/32 , B82Y30/00 , C01C3/14 , C01P2002/72 , C01P2002/88 , C01P2004/04 , C01P2004/10 , C01P2004/54 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C01P2006/22 , Y10S977/773 , Y10S977/788 , Y10S977/896 , Y10T428/2982
摘要： Basic zinc cyanurate fine particles are produced by subjecting a mixed slurry to wet dispersion using a dispersion medium at a temperature in the range of 5 to 55° C., the mixed slurry being formed by blending water, cyanuric acid, and at least one component selected from zinc oxide and basic zinc carbonate such that the cyanuric acid concentration is 0.1 to 10.0 mass % with respect to water.
摘要翻译：碱性氰尿酸锌微粒是通过使用分散介质在5至55℃的温度下对混合浆料进行湿分散而制备的，所述混合浆料是通过将水，氰尿酸和至少一种组分选自氧化锌和碱式碳酸锌，使得氰尿酸的浓度相对于水为0.1〜10.0质量％。

124. 发明申请

US20150115247A1 FILM-FORMING COMPOSITION 有权
标题翻译：成膜组合物
公开(公告)号：US20150115247A1
公开(公告)日：2015-04-30
申请号：US14400255
申请日：2013-05-10
申请人： NISSAN CHEMICAL INDUSTRIES, LTD.
发明人： Naoya Nishimura , Takahiro Kaseyama , Yasufumi Shikauchi , Natsumi Murakami , Masashi Abe , Shigeru Mitsui , Masaaki Ozawa
IPC分类号： G02B1/04 , H01L27/32 , G02B5/02 , H01L51/52
CPC分类号： G02B1/04 , C08G73/026 , C08G73/0273 , C08G73/0644 , C08J2379/04 , C09D179/04 , G02B5/0226 , G02B5/0236 , G02B5/0242 , G02B5/0268 , H01L27/3241 , H01L51/5253 , H01L51/5268 , H01L51/5275 , C08K3/22 , C08K3/36 , C08K5/0025 , C08K9/06 , C08K9/08
摘要： This film-forming composition includes, for example, a polymer, crosslinking agent and light-diffusing agent that contain a triazine ring-containing repeating unit structure such as that represented formula (17), and is able to provide cured films with good light diffusing properties. Furthermore, this film-forming composition, which includes the same polymer, crosslinking agent and fine inorganic particles having a cross-linkable functional group, is able to provide cured films with good high temperature and high humidity resistance.
摘要翻译：该成膜组合物包括例如含有如式（17）所示的含有三嗪环的重复单元结构的聚合物，交联剂和光扩散剂，并且能够提供具有良好光扩散性的固化膜属性。此外，包含相同聚合物，交联剂和具有可交联官能团的无机微粒的该成膜组合物能够提供具有良好的高温和高耐湿性的固化膜。

125. 发明授权

US08993708B2 Carbazole polymer 有权
标题翻译：咔唑聚合物
公开(公告)号：US08993708B2
公开(公告)日：2015-03-31
申请号：US14373775
申请日：2013-01-22
申请人： Nissan Chemical Industries, Ltd.
发明人： Yuki Shibano , Takuji Yoshimoto
IPC分类号： C08G59/40 , H01M4/60 , C08G61/12
CPC分类号： H01M4/608 , C07D209/86 , C08G61/124 , C08G61/128 , C08G73/0688 , C08G2261/3241 , C09D161/18 , C09D179/04 , H01M10/052
摘要： A carbazole polymer including a repeating unit represented by Formula 1 and having excellent one electron oxidation-state stability, wherein, in Formula 1, R1-R4 each independently represents an alkyl group having 1-60 carbon atoms, a haloalkyl group having 1-60 carbon atoms, or similar, Cz represents a divalent group including a carbazole skeleton represented by Formula 2, and Ar represents a divalent aromatic ring or similar; wherein, in Formula 2, R5 represents a hydrogen atom, an alkyl group having 1-60 carbon atoms, or similar, R6-R11 each independently represents a hydrogen atom, a halogen atom, or similar, and m represents an integer 1-10.
摘要翻译：一种咔唑聚合物，其包含由式1表示的重复单元并具有优异的一电子氧化态稳定性，其中在式1中，R 1 -R 4各自独立地表示具有1-60个碳原子的烷基，具有1-60个碳原子的卤代烷基碳原子或类似物，Cz表示包括由式2表示的咔唑骨架的二价基团，Ar表示二价芳环或类似物; 其中，在式2中，R 5表示氢原子，具有1-60个碳原子的烷基或类似物，R6-R11各自独立地表示氢原子，卤素原子等，m表示1-10的整数。

126. 发明授权

US08993699B2 Photosensitive resin composition for microlens 有权
标题翻译：用于微透镜的感光树脂组合物
公开(公告)号：US08993699B2
公开(公告)日：2015-03-31
申请号：US13391761
申请日：2010-06-21
申请人： Takahiro Kishioka , Takahiro Sakaguchi
发明人： Takahiro Kishioka , Takahiro Sakaguchi
IPC分类号： G03F7/004 , G02B1/04 , C08F26/06 , G03F7/00 , G03F7/023 , G03F7/40
CPC分类号： C08F26/06 , G02B1/043 , G03F7/0005 , G03F7/0233 , G03F7/40 , C08L33/24
摘要： There is provided a photosensitive resin composition for a microlens. A photosensitive resin composition for a microlens, comprising a component (A), a component (B) and a component (C), wherein the component (A) is a polymer having a maleimide structural unit of Formula (1), the component (B) is a cross-linking agent, and the component (C) is a photosensitizing agent.
摘要翻译：提供了用于微透镜的感光性树脂组合物。包含组分（A），组分（B）和组分（C）的微透镜感光树脂组合物，其中组分（A）是具有式（1）的马来酰亚胺结构单元，组分（ B）是交联剂，组分（C）是光敏剂。

127. 发明申请

US20150087155A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION 有权
标题翻译：抗静电膜成膜组合物
公开(公告)号：US20150087155A1
公开(公告)日：2015-03-26
申请号：US14399702
申请日：2013-04-26
申请人： NISSAN CHEMICAL INDUSTRIES, LTD.
发明人： Takafumi Endo , Rikimaru Sakamoto , Noriaki Fujitani
IPC分类号： C08G63/00 , H01L21/308
CPC分类号： G03F7/091 , C08G63/00 , C08G63/6856 , C08G73/101 , C09D167/00 , C09D167/02 , C09D175/12 , G03F7/11 , G03F7/2037 , G03F7/40 , H01L21/0274 , H01L21/0276 , H01L21/3065 , H01L21/3081 , H01L21/3085 , H01L21/3086
摘要： A composition forms a resist underlayer film showing improved adhesiveness to a resist pattern. A resist underlayer film-forming composition for lithography, including: a polymer that has a structure of Formula (1a), Formula (1b), or Formula (2) below on an end of the polymer; and an organic solvent: (where R1 is a hydrogen atom or a methyl group; each of R2 and R3 is independently a hydrogen atom or an organic group such as a hydrocarbon group, etc., the hydrocarbon group optionally has at least one of a hydroxy group and a methylthio group as substituent(s); R4 is a hydrogen atom or a hydroxy group; Q1 is an arylene group; v is 0 or 1; y is an integer of 1 to 4; w is an integer of 1 to 4; x1 is 0 or 1; and x2 is an integer of 1 to 5).
摘要翻译：组合物形成抗蚀剂下层膜，显示出与抗蚀剂图案的粘合性提高。一种用于光刻的抗蚀剂下层膜形成组合物，包括：聚合物末端具有式（1a），式（1b）或式（2）结构的聚合物; 和有机溶剂（其中R 1是氢原子或甲基; R 2和R 3各自独立地是氢原子或烃基等有机基团，烃基任选地具有以下中的至少一种：羟基和甲硫基作为取代基; R4是氢原子或羟基; Q1是亚芳基; v是0或1; y是1至4的整数; w是1至 4; x1为0或1; x2为1〜5的整数）。

128. 发明授权

US08946492B2 Isoxazoline-substituted benzamide compound and pesticide 有权
标题翻译：异恶唑啉取代苯甲酰胺化合物和农药
公开(公告)号：US08946492B2
公开(公告)日：2015-02-03
申请号：US13850067
申请日：2013-03-25
申请人： Nissan Chemical Industries, Ltd.
发明人： Takeshi Mita , Takamasa Kikuchi , Takashi Mizukoshi , Manabu Yaosaka , Mitsuaki Komoda
IPC分类号： C07C25/02 , C07C25/06 , C07C25/08 , C07C25/13 , C07C25/24 , C07D413/14 , A01N43/80 , C07C43/174 , C07C205/11 , C07C205/12 , C07C211/52 , C07C251/48 , C07C255/29 , C07C255/50 , C07C255/60 , C07C281/02 , C07C323/09 , C07D261/16 , C07D413/04 , C07D413/06 , C07D413/12 , C07D417/06 , C07D417/12 , C07F7/08 , C07D261/04
CPC分类号： A61K31/421 , A01N43/80 , A61K9/0053 , C07C25/02 , C07C25/06 , C07C25/08 , C07C25/13 , C07C25/24 , C07C43/1742 , C07C43/1745 , C07C205/11 , C07C205/12 , C07C211/52 , C07C251/48 , C07C255/29 , C07C255/50 , C07C255/60 , C07C281/02 , C07C323/09 , C07D261/04 , C07D261/16 , C07D413/04 , C07D413/06 , C07D413/12 , C07D413/14 , C07D417/06 , C07D417/12 , C07F7/0812
摘要： A substituted alkenylbenzene compound of formula (4): wherein X1 is selected from the group consisting of a halogen atom, —SF5, C1-C6haloalkyl, hydroxy C1-C6haloalkyl, C1-C6alkoxy C1-C6haloalkyl, C3-C8halocycloalkyl, C1-C6haloalkoxy, C1-C3haloalkoxy C1-C3haloalkoxy, C1-C6haloalkylthio, C1-C6haloalkylsulfinyl and C1-C6haloalkylsulfonyl; X3 is selected from the group consisting of a hydrogen atom, halogen atom, cyano, nitro, C1-C6alkyl, C1-C6haloalkyl, C1-C6alkoxy and C1-C6alkylthio; X4 is selected from the group consisting of a hydrogen atom, halogen atom, cyano, C1-C4alkyl, C1-C4alkoxy and C1-C4haloalkoxy; R3 is —C(R3a)(R3b)R3c, where R3a and R3b independently of each other are a halogen atom, or R3a and R3b together form 3- to 6-membered ring together with the carbon atom bonding them by forming a C2-C5haloalkylene chain, and R3c is selected from the group consisting of a hydrogen atom, halogen atom, C1-C5alkyl, C1-C5haloalkyl, C1-C4haloalkoxy and C1-C4haloalkylthio, with a proviso that in case where X1 is a fluorine atom, chlorine atom or trifluoromethyl, and both X2 and X3 are a hydrogen atom, in case where both X1 and X2 are fluorine atom and X3 is a hydrogen atom, and in case where both X1 and X2 are trifluoromethyl and X3 is a hydrogen atom, R3c is a hydrogen atom, chlorine atom, bromine atom, iodine atom, C1-C5alkyl, C1-C5haloalkyl, C1-C4haloalkoxy or C1-C4haloalkylthio.
摘要翻译：式（4）的取代烯基苯化合物：其中X 1选自卤素原子，-SF 5，C 1 -C 6卤代烷基，羟基C 1 -C 6卤代烷基，C 1 -C 6烷氧基C 1 -C 6卤代烷基，C 3 -C 8卤代环烷基，C 1 -C 6卤代烷氧基， C 1 -C 3卤代烷氧基C 1 -C 3卤代烷氧基，C 1 -C 6卤代烷硫基，C 1 -C 6卤代烷基亚磺酰基和C 1 -C 6卤代烷基磺酰基; X 3选自氢原子，卤素原子，氰基，硝基，C 1 -C 6烷基，C 1 -C 6卤代烷基，C 1 -C 6烷氧基和C 1 -C 6烷硫基; X 4选自氢原子，卤素原子，氰基，C 1 -C 4烷基，C 1 -C 4烷氧基和C 1 -C 4卤代烷氧基; R3是-C（R3a）（R3b）R3c，其中R3a和R3b彼此独立地是卤素原子，或者R3a和R3b与通过形成C2- C5卤代烷基链，R3c选自氢原子，卤素原子，C1-C5烷基，C1-C5卤代烷基，C1-C4卤代烷氧基和C1-C4卤代烷硫基，条件是在X1为氟原子的情况下，氯原子或三氟甲基，X2和X3均为氢原子，X1和X2均为氟原子，X3为氢原子的情况下，X1和X2均为三氟甲基，X3为氢原子时，R3c为氢原子，氯原子，溴原子，碘原子，C1-C5烷基，C1-C5卤代烷基，C1-C4卤代烷氧基或C1-C4卤代烷硫基。

129. 发明申请

US20150011092A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING COPOLYMER RESIN HAVING HETEROCYCLIC RING 有权
标题翻译：含有共聚物树脂的环氧树脂成膜组合物
公开(公告)号：US20150011092A1
公开(公告)日：2015-01-08
申请号：US14370256
申请日：2013-01-25
申请人： NISSAN CHEMICAL INDUSTRIES, LTD.
发明人： Yasunobu Someya , Keisuke Hashimoto , Tetsuya Shinjo , Hirokazu Nishimaki , Ryo Karasawa , Rikimaru Sakamoto
IPC分类号： G03F7/11 , H01L21/308
CPC分类号： G03F7/11 , C08G12/26 , C08G16/0275 , C08G73/06 , C08G73/0627 , C09D161/26 , C09D179/04 , G03F7/094 , H01L21/3088
摘要： A resist underlayer film-forming composition for forming a resist underlayer film having both dry etching resistance and heat resistance. A resist underlayer film-forming composition comprising a polymer containing a unit structure of Formula (1): In Formula (1), R3 is a hydrogen atom, and both n1 and n2 are 0. A method for producing a semiconductor device comprising the steps of: forming an underlayer film on a semiconductor substrate using the resist underlayer film-forming composition; forming a hard mask on the underlayer film; further forming a resist film on the hard mask; forming a resist pattern by irradiation with light or electron beams and development; etching the hard mask using the resist pattern; etching the underlayer film using the hard mask patterned; and fabricating the semiconductor substrate using the patterned underlayer film.
摘要翻译：用于形成具有耐干蚀刻性和耐热性的抗蚀剂下层膜的抗蚀剂下层膜形成组合物。一种抗蚀剂下层膜形成组合物，其包含含有式（1）的单元结构的聚合物：在式（1）中，R 3为氢原子，n 1和n 2都为0.一种半导体器件的制造方法，包括以下步骤：使用抗蚀剂下层膜形成组合物在半导体衬底上形成下层膜; 在下层膜上形成硬掩模; 进一步在硬掩模上形成抗蚀剂膜; 通过用光或电子束的照射形成抗蚀剂图案和显影; 使用抗蚀剂图案蚀刻硬掩模; 使用图案化的硬掩模蚀刻下层膜; 并使用图案化的下层膜制造半导体衬底。

130. 发明授权

US08916682B2 Lipid peptide and hydrogel 有权
标题翻译：脂质肽和水凝胶
公开(公告)号：US08916682B2
公开(公告)日：2014-12-23
申请号：US12452473
申请日：2008-07-04
申请人： Nobuhide Miyachi , Takehisa Iwama , Masahiro Gotoh , Tatsuo Maruyama , Daisuke Koda
发明人： Nobuhide Miyachi , Takehisa Iwama , Masahiro Gotoh , Tatsuo Maruyama , Daisuke Koda
IPC分类号： A61K38/04 , C07K14/50 , C07K5/107 , C07K7/06 , C07K5/103 , C07K5/11 , C07K5/117
CPC分类号： C07K7/06 , C07K5/1008 , C07K5/101 , C07K5/1016 , C07K5/1019 , C07K5/1024
摘要： There is provided a lipid peptide that is capable of forming a hydrogel with an extremely small amount thereof over a liquid property range from acidic to alkaline, and a hydrogel having high environmental suitability, biocompatibility and biodegradability. A lipid peptide represented by Formula (1): (where R1 represents an aliphatic group having 9 to 23 carbon atoms; R2, R3, R4 and R5 independently represent a hydrogen atom, an alkyl group having 1 to 7 carbon atom(s) which optionally has a branched chain having 1 to 3 carbon atom(s), a phenylmethyl group, a phenylethyl group or a —(CH2)n—X group, and at least one of R2, R3, R4 and R5 represents a —(CH2)n—X group; n represents the number of 1 to 4; X represents an amino group, a guanidine group, a —CONH2 group or a 5-membered ring, a 6-membered ring or a fused heterocyclic ring composed of a 5-membered ring and a 6-membered ring which optionally have 1 to 3 nitrogen atom(s); and in represents 1 or 2), and a hydrogel comprising the lipid peptide.
摘要翻译：提供了能够在从酸性到碱性的液体性质范围内形成极少量的水凝胶的脂质肽，以及具有高环境适应性，生物相容性和生物降解性的水凝胶。由式（1）表示的脂质肽：其中，R1表示碳原子数9〜23的脂肪族基; R2，R3，R4，R5分别表示氢原子，碳原子数1〜7的烷基，任选具有1至3个碳原子的支链，苯基甲基，苯基乙基或 - （CH 2）n -X基团，并且R 2，R 3，R 4和R 5中的至少一个表示 - （CH 2 ）n-X基; n表示1〜4的数; X表示氨基，胍基，-CONH 2基或5元环，6元环或稠合杂环，由5 含有1〜3个氮原子的6元环，代表1或2）和包含脂质肽的水凝胶。

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